CN2037874U - Automatic film-conveying and-withdrawing device - Google Patents
Automatic film-conveying and-withdrawing device Download PDFInfo
- Publication number
- CN2037874U CN2037874U CN 88212755 CN88212755U CN2037874U CN 2037874 U CN2037874 U CN 2037874U CN 88212755 CN88212755 CN 88212755 CN 88212755 U CN88212755 U CN 88212755U CN 2037874 U CN2037874 U CN 2037874U
- Authority
- CN
- China
- Prior art keywords
- automatic film
- withdrawing device
- conveying
- inner slider
- film conveying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Electron Beam Exposure (AREA)
Abstract
The utility model provides a high-precision automatic film-conveying and withdrawing device which can be used on an electron beam exposure apparatus with uncomplicated structure and simple processing, assembly and adjustment; the utility model can not only be used in the vacuum chambers (box), but also can be used in other purposes. The high-precision automatic film-conveying and withdrawing device creates an important condition for the electron beam exposure technique and focused ion beam exposure technique of China to move towards actual production from the laboratory.
Description
The utility model relates to a kind of manufacturing process equipment of semiconductor integrated circuit, is made up of drive system and manipulator two parts.
Electron beam exposure apparatus is a key equipment of making extensive and very lagre scale integrated circuit (VLSIC), and the automatic film-transporter system is the main device of this key equipment.The up-to-date manufacturing technology of this kind equipment holds in close confidence in the world, domesticly retrieve one piece of " CN85 2 04855 " patent documentation, though this patent has been avoided the Japan Patent spy to open clear " 58-77239 " direct pulldown and has easily been made the cracked danger of slice, thin piece, avoided the Japan Patent spy to open clear " 58-118124 " complex structure again, the shortcoming of complex operation, but see from this patent accompanying drawing 1, the cantilever of its driven rod manipulator is extremely long, see that from accompanying drawing 2 manipulator and flat fork directly lift the substrate that is transferred, again sending to and fetching through long distance.Again from the described content of this patent specification, also the requirement of processing technologys such as plasma etching, reactive ion etching, chemical vapour deposition (CVD) and magnetron sputtering can only be suitable for, and the high-precision requirement that electron beam exposure technology is required can not be applicable to.
The purpose of this utility model is to make that a kind of to be suitable for the precision that electron beam exposure apparatus uses very high, and conveying sheet is steady, structure is terse, manufacturing process is easy to automatic transport sheet device.
The utility model adopts manipulator pushing piece folder, and sheet clamps and carries the scheme that processed substrate carries and solved.
Specified below in conjunction with accompanying drawing:
The utility model has following advantage: at first, for making China's electron beam lithography march toward the actual essential condition of having created of production from the laboratory, this mechanism not only can be used in the electron beam exposure apparatus system, also can be used in the focused ion beam exposure machine system.Since be to use microcomputer automatic control, fully can be in remote operation.This apparatus structure is uncomplicated, and all than being easier to reach the high requirement of precision, very suitable application in vacuum chamber (case) also can be applicable to other purposes for part processing and assembling and setting.This device design science, action is dexterous, dependable performance, time-consuming 30 seconds of do action of every film conveying and withdrawing folder.According to valut sheet folder number, film conveying and withdrawing presss from both sides 12 continuously, or 12 with interior arbitrary number.
Description of drawings:
Fig. 1 is the drive system schematic diagram, and Fig. 2 is the manipulator schematic diagram.Wherein: (1) stepping motor, (2) shaft coupling, (3), (6) bearing, (4) bevel gear a, (5) axle, (7) bevel gear b, (8) spur gear, (9) pulley, (10) outer slide plate, (11) guide rail, (12) inner slider, (13) steel ball, (14) travel switch c, (15) back locking bail, (16) backstop, (17) travel switch a, (18) extension spring, (19) bearing, (20) pulldown hook, (21) location fork, (22) preceding locking bail, (23) positive stop, (24) travel switch b, (25) locating piece a, (26) locating piece b, (27) spacing addendum cone, (28) sheet folder.
Fig. 3 is that automatic film movement device is at electron beam exposure apparatus advance system service position schematic diagram.Wherein: (1) valve cover plate, (2) valve housing, (3) drive nut, (4), (6), (14) stepping motor, (5) valut housing, (7) drive screw mandrel, (8) guide pillar, (9) sheet folder frame, (10) sheet folder, (11) manipulator case top lid, (12) driving gearbox, (13) manipulator (slide plate assembly), (15) sheet grip box.
Embodiment:
Disturb for avoiding magnetic that the electron beam deflecting is produced, the part of film conveying and withdrawing mechanism adopts magnetism-free stainless steel or tin bronze to make as far as possible, stepping motor will be installed in outside the vacuum chamber (case), as (4) among Fig. 3, (6), (14).
The thickness of whole slide plate (manipulator) should press from both sides thin thickness than sheet.
Claims (5)
1. automatic film conveying and withdrawing device of forming by drive system and manipulator, it is characterized in that the manipulator slide plate is made up of inner slider (12), two guide rails (11) and outer slide plate (10), between guide rail and inner slider, have steel ball (13) some.
2. automatic film conveying and withdrawing device according to claim 1, it is characterized in that the inner slider head is taper, be fixed with location fork (21), stuck the hook groove, afterbody is fixed with locating piece b (26) and back locking bail block.
3. automatic film conveying and withdrawing device according to claim 1 is characterized in that being fixed with on the outer slide plate (10) pulldown hook (20) and preceding locking bail (22), back locking bail (15).
4. according to claim 1 or 3 described automatic film conveying and withdrawing devices, it is characterized in that the pulldown hook has spring (18) and bearing (19), bearing contacts with the inner slider conical head.
5. automatic film conveying and withdrawing device according to claim 1 is characterized in that being fixed with on the fuselage pulley (9), forward and backward baffle plate (16) (23) and three pieces of travel switches (14) (17) (24).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 88212755 CN2037874U (en) | 1988-02-03 | 1988-02-03 | Automatic film-conveying and-withdrawing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 88212755 CN2037874U (en) | 1988-02-03 | 1988-02-03 | Automatic film-conveying and-withdrawing device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN2037874U true CN2037874U (en) | 1989-05-17 |
Family
ID=4846022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 88212755 Expired - Lifetime CN2037874U (en) | 1988-02-03 | 1988-02-03 | Automatic film-conveying and-withdrawing device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN2037874U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020057114A1 (en) * | 2018-09-19 | 2020-03-26 | 武汉华星光电技术有限公司 | Exposure machine and substrate transfer method therefor |
-
1988
- 1988-02-03 CN CN 88212755 patent/CN2037874U/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020057114A1 (en) * | 2018-09-19 | 2020-03-26 | 武汉华星光电技术有限公司 | Exposure machine and substrate transfer method therefor |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CX01 | Expiry of patent term |