CN203732747U - Metallic glass thin film micro device for plastic deformation processing - Google Patents

Metallic glass thin film micro device for plastic deformation processing Download PDF

Info

Publication number
CN203732747U
CN203732747U CN201420043016.6U CN201420043016U CN203732747U CN 203732747 U CN203732747 U CN 203732747U CN 201420043016 U CN201420043016 U CN 201420043016U CN 203732747 U CN203732747 U CN 203732747U
Authority
CN
China
Prior art keywords
metallic glass
plastic deformation
thin film
film
deformation processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201420043016.6U
Other languages
Chinese (zh)
Inventor
孙理斌
胡晓琳
史斌
叶鸣
徐越
王超
张冬仙
蒋建中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhejiang University ZJU
Original Assignee
Zhejiang University ZJU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhejiang University ZJU filed Critical Zhejiang University ZJU
Priority to CN201420043016.6U priority Critical patent/CN203732747U/en
Application granted granted Critical
Publication of CN203732747U publication Critical patent/CN203732747U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

本实用新型公开了一种用于塑性变形加工的金属玻璃薄膜微器件。一种热塑性强、玻璃转变温度低、平整度高、耐腐蚀的镧基金属玻璃薄膜,该系合金的结构式为La100-x-yCoxAly,其中x为Co元素的原子百分数,y为Al元素的原子百分数,5≤x≤35,5≤y≤35,25≤x+y≤50在锆吸附的氩气电弧中电弧熔炼四次以上,获得混合均匀的合金块体,最后利用线切割得到符合镀膜要求的靶材,利用直流磁控溅射,获得所需厚度的金属玻璃薄膜。用于塑性变形加工的金属玻璃薄膜微器件,获得的具有偏振不敏感特性的二维亚波长透射光栅滤波片,光栅单元为凸起正方形阵列,高度200nm,正方形阵列周期240nm,正方形边长120nm,具有对入射光偏振不敏感特性,可以提高入射光的透射率,实现对蓝光的筛选。

The utility model discloses a metallic glass thin film micro device used for plastic deformation processing. A lanthanum-based metallic glass film with strong thermoplasticity, low glass transition temperature, high flatness, and corrosion resistance. The structural formula of this alloy is La 100-xy Co x Al y , where x is the atomic percentage of Co, and y is Al The atomic percentage of the element, 5≤x≤35, 5≤y≤35, 25≤x+y≤50, is arc smelted more than four times in the argon arc adsorbed by zirconium to obtain a uniformly mixed alloy block, and finally uses wire cutting Obtain a target material that meets the coating requirements, and use DC magnetron sputtering to obtain a metallic glass film with the required thickness. Metallic glass thin film micro-devices for plastic deformation processing, obtained two-dimensional sub-wavelength transmission grating filter with polarization insensitive characteristics, the grating unit is a raised square array, the height is 200nm, the square array period is 240nm, and the square side length is 120nm. It is insensitive to the polarization of incident light, which can improve the transmittance of incident light and realize the screening of blue light.

Description

一种用于塑性变形加工的金属玻璃薄膜微器件A metallic glass thin film microdevice for plastic deformation processing

技术领域 technical field

本实用新型涉及微纳米制备技术,特别涉及一种用于塑性变形加工的金属玻璃薄膜微器件。 The utility model relates to micro-nano preparation technology, in particular to a metallic glass film micro-device used for plastic deformation processing.

背景技术 Background technique

传统的半导体加工工艺是在微电子集成工艺上发展起来的,加工微型零件主要使用硅材料,但由于硅片的低机械强度,已经越来越不能满足现代微光学与微系统中零件的功能要求。针对金属材料,利用LIGA技术加工的微型零件,虽然拥有良好的深宽比,但是由于技术限制很难应用于倾斜面以及微细精密加工,同时其中利用的同步辐射光源费用昂贵,限制了该技术的应用范围。非晶态合金(俗称金属玻璃)是组成原子排列不成周期性和对称性的一种新型合金材料,由于其特殊的微观结构,使得他们具有优越的力学、物理、化学及磁性能,特别适合微器件的制备,但由于大块非晶态合金制备困难,缺乏优异的延展性,无法广泛应用。因此非晶态合金薄膜的研究应运而生,它既继承了非晶态合金的优点,如高强度、高硬度、耐磨损、耐腐蚀,同时又可以在小尺度上规避大块非晶合金延展性差的缺点,因此具有广泛的应用前景。然而,目前大多数非晶态薄膜过冷液相区较窄,造成稳定度不高,而且玻璃转变温度大都在250°C以上,针对以上缺点与限制,我们设计制备了镧基金属玻璃薄膜。 The traditional semiconductor processing technology is developed on the basis of microelectronics integration technology. The processing of micro parts mainly uses silicon materials, but due to the low mechanical strength of silicon wafers, it is increasingly unable to meet the functional requirements of parts in modern micro optics and micro systems. . For metal materials, micro parts processed by LIGA technology have a good aspect ratio, but due to technical limitations, it is difficult to apply to inclined surfaces and micro-precision processing. At the same time, the synchrotron radiation source used in it is expensive, which limits the application of this technology. application range. Amorphous alloys (commonly known as metallic glasses) are a new type of alloy material whose constituent atoms are not arranged periodically and symmetrically. Due to their special microstructure, they have superior mechanical, physical, chemical and magnetic properties, and are especially suitable for microstructures. However, due to the difficulty in preparing bulk amorphous alloys and the lack of excellent ductility, they cannot be widely used. Therefore, the study of amorphous alloy thin films emerged as the times require, which not only inherits the advantages of amorphous alloys, such as high strength, high hardness, wear resistance, and corrosion resistance, but also can avoid bulk amorphous alloys on a small scale. The disadvantage of poor ductility, so it has a wide range of application prospects. However, at present, most amorphous films have a narrow supercooled liquid phase region, resulting in low stability, and most of the glass transition temperatures are above 250°C. In view of the above shortcomings and limitations, we designed and prepared lanthanum-based metallic glass films.

本项目设计制备的镧基金属玻璃薄膜具备极低的玻璃转变温度(最低可以达到140°C),配比简单,热塑性优异,平整度高,粗糙度小,同时具有很强的耐腐蚀能力,稳定度高,在净成形方面拥有独到的优势,是微系统与微加工成型中理想的结构材料,我们利用自行设计的该系金属薄膜成功制备了亚波长尺寸的微器件。 The lanthanum-based metallic glass film designed and prepared in this project has an extremely low glass transition temperature (the lowest can reach 140°C), simple proportioning, excellent thermoplasticity, high flatness, small roughness, and strong corrosion resistance. It has high stability and has unique advantages in net shape. It is an ideal structural material in microsystems and micromachining. We have successfully prepared sub-wavelength microdevices by using this series of metal films designed by ourselves.

实用新型内容 Utility model content

 本实用新型的目的是克服现有技术的不足,提供一种用于塑性变形加工的金属玻璃薄膜微器件。 The purpose of this utility model is to overcome the deficiencies of the prior art and provide a metal glass thin film micro-device for plastic deformation processing.

 本实用新型解决其技术问题所采用的技术方案如下: The technical solution adopted by the utility model to solve its technical problems is as follows:

一种用于塑性变形加工的金属玻璃薄膜微器件,在镧基金属玻璃薄膜上获得的具有偏振不敏感特性的二维亚波长透射光栅滤波片,光栅单元为凸起正方形阵列,高度200nm,正方形阵列周期240nm,正方形边长120nm,该滤光片具有对入射光偏振不敏感特性,可以提高入射光的透射率,实现对蓝光的筛选。 A metallic glass thin film micro-device for plastic deformation processing, a two-dimensional sub-wavelength transmission grating filter with polarization insensitivity obtained on a lanthanum-based metallic glass thin film, the grating unit is a raised square array, with a height of 200nm, square The array period is 240nm, and the square side length is 120nm. The filter is insensitive to the polarization of incident light, which can improve the transmittance of incident light and realize the screening of blue light.

本实用新型具有的有益效果是:本实用新型公开了一种玻璃转变温度低,平整度高,粗糙度小,热塑性好,净成形能力优越和耐腐蚀的三元镧基金属玻璃薄膜,并成功制备了偏振不敏感特性的二维亚波长透射光栅滤波片和简单一维光栅,该三元镧基薄膜的优异性能使得其在纳米压印和精密微纳器件的制造中具有广泛的应用前景。 The beneficial effects of the utility model are: the utility model discloses a ternary lanthanum-based metal glass film with low glass transition temperature, high flatness, small roughness, good thermoplasticity, excellent net shape ability and corrosion resistance, and has successfully A polarization-insensitive two-dimensional subwavelength transmission grating filter and a simple one-dimensional grating were prepared. The excellent performance of the ternary lanthanum-based film makes it have a wide application prospect in the manufacture of nanoimprinting and precision micro-nano devices.

附图说明 Description of drawings

图1是La53Co15Al32薄膜的XRD图; Figure 1 is the XRD pattern of La 53 Co 15 Al 32 film;

图2是La53Co15Al32薄膜的DSC图; Fig. 2 is the DSC figure of La 53 Co 15 Al 32 film;

图3是La53Co15Al32薄膜的力学性能图; Fig. 3 is the mechanical performance figure of La 53 Co 15 Al 32 film;

图4是La53Co15Al32薄膜的AFM图; Fig. 4 is the AFM figure of La 53 Co 15 Al 32 film;

图5是微器件制备流程图; Fig. 5 is a flow chart of micro-device preparation;

图6是光栅单元为凸起正方形,周期240nm,边长120nm的具有偏振不敏感特性的二维亚波长透射光栅滤波片图; Fig. 6 is a diagram of a two-dimensional sub-wavelength transmission grating filter with a polarization-insensitive characteristic with a grating unit of a raised square, a period of 240 nm, and a side length of 120 nm;

图7是线宽150nm,周期300nm,深200nm的一维简单线光栅图。 Figure 7 is a one-dimensional simple line grating diagram with a line width of 150nm, a period of 300nm, and a depth of 200nm.

具体实施方式 Detailed ways

步骤1:将纯度为99.9%的La,纯度为99.95%的Co和纯度为99.95%的Al按La100-x-yCoxAly,其中x为La元素的原子百分数,y为Co元素的原子百分数,5≤x≤35,5≤y≤35,25≤x+ y≤50,在锆吸附的氩气电弧中电弧熔炼四次以上,获得混合均匀的合金块体,之后将合金块体通过铜模浇铸制备2英寸的原始靶,最后利用线切割得到符合镀膜要求的靶材; Step 1: Put La with a purity of 99.9%, Co with a purity of 99.95%, and Al with a purity of 99.95% as La 100-xy Co x Al y, where x is the atomic percentage of the La element, and y is the atomic percentage of the Co element , 5≤x≤35, 5≤y≤35, 25≤x+y≤50, arc melting more than four times in the zirconium-adsorbed argon arc to obtain a uniformly mixed alloy block, and then pass the alloy block through a copper mold Prepare a 2-inch original target by casting, and finally use wire cutting to obtain a target that meets the coating requirements;

步骤2:采用直流溅射的方法将步骤1获得的靶材和基底放入真空度良好的操作室中获得致密度良好的镧基金属玻璃薄膜; Step 2: Put the target material and substrate obtained in Step 1 into a well-vacuum operating chamber by DC sputtering to obtain a dense lanthanum-based metallic glass film;

步骤3:用X射线衍射表征所得样品的结构; Step 3: Characterize the structure of the obtained sample by X-ray diffraction;

步骤4:用差式扫描热量法获得热学参数; Step 4: obtain thermal parameters by differential scanning calorimetry;

步骤5:采用力学性能试验机测试所得材料的力学性能; Step 5: using a mechanical property testing machine to test the mechanical properties of the obtained material;

步骤6:采用原子力显微镜测试薄膜的表面粗糙度; Step 6: using an atomic force microscope to test the surface roughness of the film;

步骤7:用ZYGO干涉仪测量薄膜表面的平整度; Step 7: Measure the flatness of the film surface with a ZYGO interferometer;

步骤8:利用聚焦离子束(FIB)技术在单晶硅上加工获得所需微器件的反结构,以此作为模具; Step 8: Use focused ion beam (FIB) technology to process on single crystal silicon to obtain the reverse structure of the required micro-device as a mold;

步骤9:将已制备好的硅模具和La-Co-Al金属玻璃薄膜样品上下放置在压印机机腔内,设置压力和加热温度,进行热压并保温保压3分钟后撤温撤压,待样品冷却后,将模具和样品分开; Step 9: Place the prepared silicon mold and La-Co-Al metallic glass film sample up and down in the cavity of the imprinting machine, set the pressure and heating temperature, carry out hot pressing and hold the heat for 3 minutes, then remove the temperature and pressure , after the sample is cooled, separate the mold from the sample;

步骤10:在无水乙醇中对制备的样品进行超声清洗,最后获得与模具结构相反的所需的镧基金属玻璃薄膜微器件。 Step 10: Ultrasonic cleaning is performed on the prepared sample in absolute ethanol, and finally the desired lanthanum-based metallic glass thin film micro-device with the structure opposite to the mold is obtained.

实施例1Example 1

该实施例采用磁控溅射的方法制备膜厚200nm厚的La53Co15Al32金属玻璃薄膜,并用该薄膜制备了光栅单元为凸起正方形,周期240nm,边长120nm的具有偏振不敏感特性的二维亚波长透射光栅滤波片。 In this example, a 200nm thick La 53 Co 15 Al 32 metallic glass film was prepared by magnetron sputtering, and the film was used to prepare a grating unit with a raised square, a period of 240nm, and a side length of 120nm with polarization insensitivity. Two-dimensional subwavelength transmission grating filter.

步骤1:将纯度为99.9%的La,纯度为99.95%的Co和纯度为99.95%的Al按La53Co15Al32配比在锆吸附的氩气电弧中电弧熔炼五次,获得混合均匀的合金块体,之后将合金块体通过铜模浇铸制备2英寸的原始靶,最后利用线切割得到符合镀膜要求的靶材; Step 1: La with a purity of 99.9%, Co with a purity of 99.95%, and Al with a purity of 99.95% are arc-melted five times in an argon arc adsorbed by zirconium according to the ratio of La 53 Co 15 Al 32 to obtain a well-mixed Alloy block, and then cast the alloy block through a copper mold to prepare a 2-inch original target, and finally use wire cutting to obtain a target that meets the coating requirements;

步骤2:将步骤1获得的靶材和石英玻璃基底放入真空室中,在5×10-4Pa -6×10-4Pa的真空度中,通过低压电离氩气以及在靶阴极表面引入磁场,利用直流磁控溅射,以60W的功率,(20+/- 0.5)nm/s的沉积速率,溅射10s,获得200um的镧基金属玻璃薄膜; Step 2: Put the target and quartz glass substrate obtained in step 1 into a vacuum chamber, and in a vacuum of 5×10 -4 Pa to 6×10 -4 Pa, ionize argon gas at a low pressure and introduce Magnetic field, using DC magnetron sputtering, with a power of 60W and a deposition rate of (20+/- 0.5)nm/s, sputtering for 10s to obtain a 200um lanthanum-based metallic glass film;

步骤3:用X射线衍射表征所得样品的结构,图1为该样品的X射线衍射图,说明该薄膜样品为非晶合金结构; Step 3: Characterize the structure of the obtained sample by X-ray diffraction, and Figure 1 is the X-ray diffraction pattern of the sample, indicating that the film sample is an amorphous alloy structure;

步骤4:用差式扫描热量法获得热学参数,图2为该样品的DSC图; Step 4: Obtain thermal parameters by differential scanning calorimetry, and Figure 2 is the DSC diagram of the sample;

步骤5:采用力学性能试验机测试所得材料的力学性能如图3; Step 5: Use a mechanical performance testing machine to test the mechanical properties of the obtained material as shown in Figure 3;

步骤6:用AFM测量薄膜样品的粗糙度,图4为该样品的AFM图,粗糙度小于1个纳米,只有0.3nm; Step 6: Use AFM to measure the roughness of the film sample. Figure 4 is the AFM image of the sample. The roughness is less than 1 nanometer, only 0.3nm;

步骤7:用ZYGO干涉仪测量薄膜表面的平整度,小于2个光圈,平整度很高。 Step 7: Use a ZYGO interferometer to measure the flatness of the film surface. If it is less than 2 apertures, the flatness is very high.

步骤8:利用聚焦离子束(FIB)技术在单晶硅上加工光栅单元为凹陷正方形,深度200nm,周期240nm,边长120nm的正方形阵列,以此作为模具; Step 8: Use focused ion beam (FIB) technology to process the grating unit on the single crystal silicon into a concave square array with a depth of 200nm, a period of 240nm, and a side length of 120nm as a mold;

步骤9:将已制备好的硅模具和La-Co-Al金属玻璃薄膜样品上下放置在压印机机腔内,设置压力300N和温度240°C,进行热压并保温保压3分钟后撤温撤压,待样品冷却后,将模具和样品分开; Step 9: Place the prepared silicon mold and La-Co-Al metallic glass film sample up and down in the cavity of the imprinting machine, set the pressure to 300N and the temperature to 240°C, perform hot pressing and heat preservation and pressure for 3 minutes before withdrawing After the temperature is removed and the pressure is removed, the mold and the sample are separated after the sample is cooled;

步骤10:在无水乙醇中对制备的样品进行超声清洗,最后在镧基金属玻璃薄膜上获得光栅单元为凸起正方形,周期240nm,边长120nm的具有偏振不敏感特性的二维亚波长透射光栅滤波片。微器件的制备流程如图5所示。 Step 10: Clean the prepared sample ultrasonically in absolute ethanol, and finally obtain a polarization-insensitive two-dimensional sub-wavelength transmission grating unit on the lanthanum-based metallic glass film, which is a raised square, with a period of 240 nm and a side length of 120 nm. Raster filter. The fabrication process of the micro-device is shown in Fig. 5.

由图1~图4可知该实施例1获得了膜厚200nm的镧基金属玻璃薄膜,并在镧基金属玻璃薄膜上获得了具有偏振不敏感特性的二维亚波长透射光栅滤波片(图6)。该实施例获得的镧系金属玻璃薄膜的性能如表1所示。该配比的镧基金属玻璃薄膜玻璃转变温度较低,弹性模量大,适用于对结构稳定性要求高、不易形变的凸起二维复杂阵列光栅滤波片的材料,根据表面等离子体效应,我们设计了周期240nm、膜厚200nm和阵列形状为二维凸起方块阵列,当光与我们薄膜表面亚波长结构相互作用时,实现了对入射波矢和表面共振波矢的比配,在这种相互耦合过程中,由于表面等离子基元的受限性和非辐射性,阻止能量沿金属表面传导衰减,区域等离子波的震荡激发增强,因此提高了滤波片的透射率,同时由于周期结构的对称性,避免了入射光偏振性的影响。我们还可以通过调整光栅周期大小和膜厚实现对入射光的不同频率滤波。 It can be seen from Figures 1 to 4 that in Example 1, a lanthanum-based metallic glass film with a film thickness of 200nm was obtained, and a two-dimensional sub-wavelength transmission grating filter with polarization insensitivity was obtained on the lanthanum-based metallic glass film (Figure 6 ). The properties of the lanthanide metal glass film obtained in this embodiment are shown in Table 1. The glass transition temperature of the lanthanum-based metal glass film with this ratio is low and the elastic modulus is large, which is suitable for the material of the convex two-dimensional complex array grating filter that requires high structural stability and is not easily deformed. According to the surface plasmon effect, We designed a period of 240nm, a film thickness of 200nm, and an array shape of two-dimensional convex square arrays. When the light interacts with the sub-wavelength structure on the surface of our film, the matching of the incident wave vector and the surface resonance wave vector is realized. Here In this mutual coupling process, due to the confinement and non-radiation of the surface plasmon element, the energy is prevented from attenuating along the metal surface, and the oscillation excitation of the regional plasmon wave is enhanced, thus improving the transmittance of the filter. At the same time, due to the periodic structure Symmetry avoids the influence of the polarization of incident light. We can also filter the incident light at different frequencies by adjusting the period size and film thickness of the grating.

表 1  La53Co15Al32薄膜性能 Table 1 Properties of La 53 Co 15 Al 32 thin films

   

 实施例2 Example 2

该实施例采用磁控溅射的方法制备膜厚200nm的La72Co18Al10金属玻璃薄膜,利用该薄膜制作一维光栅。 In this embodiment, a La 72 Co 18 Al 10 metallic glass thin film with a film thickness of 200 nm is prepared by magnetron sputtering, and a one-dimensional grating is fabricated by using the thin film.

步骤1:将纯度为99.9%的La,纯度为99.95%的Co和纯度为99.95%的Al按La72Co18Al10配比在锆吸附的氩气电弧中电弧熔炼五次,获得混合均匀的合金块体,之后将合金块体通过铜模浇铸制备2英寸的原始靶,最后利用线切割得到符合镀膜要求的靶材; Step 1: La with a purity of 99.9%, Co with a purity of 99.95%, and Al with a purity of 99.95% are arc-melted five times in an argon arc adsorbed by zirconium according to the ratio of La 72 Co 18 Al 10 to obtain a well-mixed Alloy block, and then cast the alloy block through a copper mold to prepare a 2-inch original target, and finally use wire cutting to obtain a target that meets the coating requirements;

步骤2:将步骤1获得的靶材和石英玻璃基底放入真空室中,在5×10-4Pa -6×10-4Pa的真空度中,通过低压电离氩气以及在靶阴极表面引入磁场,利用直流磁控溅射,以60W的功率,(20+/- 0.5)nm/s的沉积速率,溅射10s,获得200nm的镧基金属玻璃薄膜样品; Step 2: Put the target and quartz glass substrate obtained in step 1 into a vacuum chamber, and in a vacuum of 5×10 -4 Pa to 6×10 -4 Pa, ionize argon gas at a low pressure and introduce Magnetic field, using DC magnetron sputtering, with a power of 60W and a deposition rate of (20+/- 0.5)nm/s, sputtering for 10s to obtain a 200nm lanthanum-based metallic glass film sample;

步骤3:用X射线衍射表征所得样品的结构; Step 3: Characterize the structure of the obtained sample by X-ray diffraction;

步骤4:用差式扫描热量法获得热学参数; Step 4: obtain thermal parameters by differential scanning calorimetry;

步骤5:采用力学性能试验机测试所得材料的力学性能; Step 5: using a mechanical property testing machine to test the mechanical properties of the obtained material;

步骤6:用AFM测量薄膜样品的粗糙度; Step 6: Measure the roughness of the film sample with AFM;

步骤7:用ZYGO干涉仪测量薄膜表面的平整度; Step 7: Measure the flatness of the film surface with a ZYGO interferometer;

步骤8:利用聚焦离子束(FIB)技术在单晶硅上加工一个周期300nm,深200nm的线光栅模具; Step 8: Process a line grating mold with a period of 300nm and a depth of 200nm on single crystal silicon by using focused ion beam (FIB) technology;

步骤9:将已制备好的硅模具和La-Co-Al金属玻璃薄膜样品上下放置在压印机机腔内,设置压力160N和温度150°C,进行热压并保温保压3分钟后撤温撤压,待样品冷却后,将模具和样品分开; Step 9: Place the prepared silicon mold and La-Co-Al metallic glass film sample up and down in the cavity of the imprinting machine, set the pressure at 160N and the temperature at 150°C, perform hot pressing and heat preservation and pressure for 3 minutes before withdrawing After the temperature is removed and the pressure is removed, the mold and the sample are separated after the sample is cooled;

步骤10:在无水乙醇中对制备的样品进行超声清洗,最后在镧基金属玻璃薄膜上获得周期300nm的一维简单光栅(图7)。 Step 10: Ultrasonic cleaning was performed on the prepared sample in absolute ethanol, and finally a one-dimensional simple grating with a period of 300 nm was obtained on the lanthanum-based metal glass film (Figure 7).

该实施例2获得了膜厚200nm的镧基金属玻璃薄膜并用其加工获得线宽150nm,周期300nm,深200nm的一维简单线光栅。该实施例获得的镧系金属玻璃薄膜的性能如表2所示。该配比的镧系金属玻璃薄膜玻璃转变温度非常低,弹性模量较低,适用于对刚度要求相对较低的结构简单微器件的快速加工。 In Example 2, a lanthanum-based metallic glass film with a film thickness of 200 nm was obtained and processed to obtain a one-dimensional simple line grating with a line width of 150 nm, a period of 300 nm, and a depth of 200 nm. The performance of the lanthanide metal glass film obtained in this embodiment is shown in Table 2. The glass transition temperature of the lanthanide metal glass thin film with the ratio is very low, and the elastic modulus is low, and is suitable for rapid processing of simple micro-devices with relatively low rigidity requirements.

表 2  La72Co18Al10薄膜性能 Table 2 Properties of La 72 Co 18 Al 10 thin films

   

Claims (1)

1.一种用于塑性变形加工的金属玻璃薄膜微器件,其特征在于,在镧基金属玻璃薄膜上获得的具有偏振不敏感特性的二维亚波长透射光栅滤波片,光栅单元为凸起正方形阵列,高度200nm,正方形阵列周期240nm,正方形边长120nm,该滤光片具有对入射光偏振不敏感特性,可以提高入射光的透射率,实现对蓝光的筛选。 1. A metallic glass film micro-device for plastic deformation processing, characterized in that the two-dimensional sub-wavelength transmission grating filter with polarization insensitivity obtained on the lanthanum-based metallic glass film, the grating unit is a raised square The array has a height of 200nm, a square array period of 240nm, and a square side length of 120nm. The filter is insensitive to the polarization of incident light, which can increase the transmittance of incident light and realize the screening of blue light.
CN201420043016.6U 2014-01-23 2014-01-23 Metallic glass thin film micro device for plastic deformation processing Expired - Fee Related CN203732747U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420043016.6U CN203732747U (en) 2014-01-23 2014-01-23 Metallic glass thin film micro device for plastic deformation processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201420043016.6U CN203732747U (en) 2014-01-23 2014-01-23 Metallic glass thin film micro device for plastic deformation processing

Publications (1)

Publication Number Publication Date
CN203732747U true CN203732747U (en) 2014-07-23

Family

ID=51202809

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201420043016.6U Expired - Fee Related CN203732747U (en) 2014-01-23 2014-01-23 Metallic glass thin film micro device for plastic deformation processing

Country Status (1)

Country Link
CN (1) CN203732747U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110794499A (en) * 2019-10-31 2020-02-14 歌尔股份有限公司 Light filter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110794499A (en) * 2019-10-31 2020-02-14 歌尔股份有限公司 Light filter
WO2021082053A1 (en) * 2019-10-31 2021-05-06 潍坊歌尔微电子有限公司 Optical filter

Similar Documents

Publication Publication Date Title
CN103805920A (en) Metallic glass film for plastic deformation processing and preparation method of micro-component of metallic glass film
Miyazaki et al. Thin film shape memory alloys: fundamentals and device applications
Pan et al. Hot embossing of micro-lens array on bulk metallic glass
CN102925869B (en) Method for preparing amorphous/nanometer crystal multilayer-structure film
TW200819546A (en) In-air micro and nanoimprint of bulk metallic glasses and a method for making the same
CN102925870A (en) Preparation method of Zr-Cu-Ni-Al-Si metal amorphous film material
Suzuki Practical applications of thin films nanostructured by shadowing growth
CN105372728B (en) One-dimensional, two-dimentional or three-dimensional manometer gap array with Raman-enhancing matter and preparation method thereof
Zhou et al. Development of polycrystalline Ni–P mold by heat treatment for glass microgroove forming
Asgar et al. A comprehensive review of micro/nano precision glass molding molds and their fabrication methods
CN106591787A (en) Preparation method for patterned film with gradually changed thickness
Bechtold et al. Fabrication and characterization of freestanding NiTi based thin film materials for shape memory micro-actuator applications
CN203732747U (en) Metallic glass thin film micro device for plastic deformation processing
Zhang et al. Epitaxial patterning of thin-films: conventional lithographies and beyond
CN106744657B (en) A kind of preparation method of three-dimensional GeSn micro/nano-scale cantilever design
CN101202144B (en) A kind of method for preparing Fe-Mn-Si magnetic shape memory alloy film
CN108417475B (en) Preparation method of metal nanostructure array based on interface induced growth
CN103305801B (en) TiNi-based SMA (shape memory alloy) multilayer thin film and preparation method thereof
Chen et al. Replication of nano/micro-scale features using bulk metallic glass mold prepared by femtosecond laser and imprint processes
Dong et al. Effect of different substrate temperatures on microstru-cture and residual stress of Ti films
Xu et al. Robust and reproducible fabrication of large area aluminum (Al) micro/nanorods arrays by superplastic nanomolding at room temperature
Sun et al. Hierarchical macro to nano press molding of optical glasses by using metallic glasses
HJ A TiNiCu thin film micropump made by magnetron co-sputtered method
WO2019223109A1 (en) Flexible nanoimprint template and manufacturing method therefor
Zamponi et al. Structuring of sputtered superelastic NiTi thin films by photolithography and etching

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140723

Termination date: 20170123

CF01 Termination of patent right due to non-payment of annual fee