CN203653684U - Vacuum coater for coating crystal wafer - Google Patents

Vacuum coater for coating crystal wafer Download PDF

Info

Publication number
CN203653684U
CN203653684U CN201320873393.8U CN201320873393U CN203653684U CN 203653684 U CN203653684 U CN 203653684U CN 201320873393 U CN201320873393 U CN 201320873393U CN 203653684 U CN203653684 U CN 203653684U
Authority
CN
China
Prior art keywords
evaporation
crystal wafer
molybdenum
molybdenum boat
chassis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201320873393.8U
Other languages
Chinese (zh)
Inventor
郭军平
温海
窦会会
候应彬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHAANXI HUAXING ELECTRONIC GROUP CO Ltd
Original Assignee
SHAANXI HUAXING ELECTRONIC GROUP CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHAANXI HUAXING ELECTRONIC GROUP CO Ltd filed Critical SHAANXI HUAXING ELECTRONIC GROUP CO Ltd
Priority to CN201320873393.8U priority Critical patent/CN203653684U/en
Application granted granted Critical
Publication of CN203653684U publication Critical patent/CN203653684U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The utility model relates to a vacuum coater for coating a crystal wafer. The vacuum coater comprises a chassis and a hood cover, wherein a vacuum chamber is formed in the hood cover; a workpiece rotating stand mechanism is arranged in the vacuum chamber; a crystal wafer coating station is arranged at the top of the workpiece rotating stand mechanism; a crystal wafer fixture is arranged on the workpiece rotating stand mechanism; an evaporation coating mechanism matched with the crystal wafer coating station is arranged above the chassis in the workpiece rotating stand mechanism; the evaporation coating mechanism comprises at least one evaporation molybdenum boat which is arranged side by side and is fixed on the chassis through an evaporation fixture; each evaporation molybdenum boat comprises two connecting molybdenum rods fixed on the evaporation fixture; and a movable molybdenum boat is horizontally arranged between the two connecting molybdenum rods. The evaporation molybdenum boat is provided with the movable molybdenum boats, so that one movable molybdenum boat is fixedly used for only containing one evaporation coating material. Thus, when the evaporation coating material required before and after are inconsistent, one movable molybdenum boat can be replaced with the other movable molybdenum boat, so that the evaporation coating efficiency is improved. As a result, the phenomenon of unqualified quality of a coating film due to incomplete cleaning is avoided.

Description

For the vacuum plating unit of crystal wafer plated film
Technical field
The utility model relates to a kind of evaporating vacuum plating unit, particularly a kind of vacuum plating unit for crystal wafer plated film.
Background technology
At present, for giving the vacuum plating unit of crystal wafer plated film, the method that mainly adopts evaporating is placed directly in by the material of needs plating the surface that heating sublimation on order boat is plating to crystal wafer and forms rete.But existing vacuum plating unit uses inconvenient, especially, in the time of conversion materials more, often to spend long time and clear up, reduce greatly working efficiency.
Summary of the invention
Technical problem to be solved in the utility model is for the deficiencies in the prior art, provides a kind of reasonable in design, uses the simply vacuum plating unit for crystal wafer plated film.
Technical problem to be solved in the utility model is to realize by following technical scheme, the utility model is a kind of vacuum plating unit for crystal wafer plated film, comprise the chassis being located on worktable, on chassis, be covered with cover cap, cover cap is connected with the lifting gear being located on worktable, in cover cap, form vacuum chamber, below chassis, be provided with the unit that vacuumizes being connected with vacuum chamber, be characterized in: in vacuum chamber, be provided with workpiece rotating frame mechanism, the top of workpiece rotating frame mechanism is provided with crystal wafer plated film station, in the workpiece rotating frame mechanism of crystal wafer plated film station periphery, be provided with crystal wafer fixture, above the in-house chassis of workpiece rotating frame, be provided with the evaporation mechanism coordinating with crystal wafer plated film station, described evaporation mechanism comprises at least one the evaporation molybdenum boat being arranged side by side, evaporation molybdenum boat is fixed on chassis by evaporating jig, evaporation molybdenum boat comprises two connection molybdenum rods that are fixed on evaporating jig, between two connection molybdenum rods, be provided with horizontally disposed movable molybdenum boat.
Technical problem to be solved in the utility model can also further realize by following technical scheme, and the end of described connection molybdenum rod is provided with the slot of arranged transversely, and the both sides of movable molybdenum boat are inserted in slot.
Technical problem to be solved in the utility model can also further realize by following technical scheme, on the chassis below evaporation molybdenum boat, is provided with residue collecting board.
Technical problem to be solved in the utility model can also further realize by following technical scheme, between evaporation molybdenum boat and crystal wafer fixture, is provided with butterfly.
Compared with prior art, the evaporation molybdenum boat of the utility model vacuum plating unit is provided with movable molybdenum boat, so movable molybdenum boat is fixed and is only put a kind of deposition material, in the time that front and back need deposition material inconsistent, can change another movable molybdenum boat, improve like this evaporation efficiency, do not needed molybdenum boat to clear up again and then use, stopped cleaning and totally do not caused the underproof phenomenon of coating quality.
Accompanying drawing explanation
Fig. 1 is main TV structure schematic diagram of the present utility model.
Fig. 2 is that the A-A of Fig. 1 is to structural representation.
Embodiment
Referring to accompanying drawing, further describe concrete technical scheme of the present utility model, so that those skilled in the art understands the utility model further, and do not form the restriction to its right.
With reference to accompanying drawing 1 and Fig. 2, a kind of vacuum plating unit for crystal wafer plated film, comprise the chassis 2 being located on worktable 1, on chassis 2, be covered with cover cap 4, on cover cap 4, can be provided with view port, cover cap 4 is connected with the lifting gear 8 being located on worktable 1, and lifting gear 8 is the lifting gear 8 that in prior art, conventional use can realize lifting, as cylinder or hydraulic ram.Cover cap 4 can be mentioned or cover on chassis 2 by lifting gear 8.The interior formation vacuum chamber of cover cap 4 is provided with the vacuum pumping pump being connected with vacuum chamber, for vacuum chamber is vacuumized below chassis 2.In vacuum chamber, be provided with workpiece rotating frame mechanism 3, workpiece rotating frame mechanism 3 comprises annular base setting up and down and fixture support seat, between annular base and fixture support seat, connects by some root posts.The top of workpiece rotating frame mechanism 3 is provided with crystal wafer plated film station, in the workpiece rotating frame mechanism 3 of crystal wafer plated film station periphery, be provided with crystal wafer fixture 5, above chassis 2 in workpiece rotating frame mechanism 3, be provided with the evaporation mechanism 7 coordinating with crystal wafer plated film station, described evaporation mechanism 7 comprises at least one the evaporation molybdenum boat being arranged side by side, evaporation molybdenum boat presss from both sides 10 tools by evaporation and is fixed on chassis 2, evaporation molybdenum boat comprises that being fixed on evaporation presss from both sides two connection molybdenum rods 9 on 10 tools, is provided with horizontally disposed movable molybdenum boat 12 between two connection molybdenum rods 9.
When evaporation, crystal wafer is placed on crystal wafer fixture 5, deposition material, as on nickel or the silver-colored movable molybdenum boat 12 that is placed on evaporation molybdenum boat, is inserted movable molybdenum boat 12 to be connected in molybdenum rod 9; Cover cover cap 4, start vacuum pumping pump, under vacuum state, the evaporation molybdenum boat of deposition material is placed in heating, deposition material is distilled and be plating on the crystal wafer of crystal wafer plated film station.
The end of described connection molybdenum rod 9 is provided with the slot of arranged transversely, and the both sides of movable molybdenum boat 12 are inserted in slot.So conveniently movable molybdenum boat 12 is taken off and changed.
On chassis 2 below evaporation molybdenum boat, be provided with residue collecting board 11, the residue that evaporation falls drops on residue collecting board 11, changes residue collecting board 11 at every turn, can keep the clean of chassis 2, reduces workman's workload.Between evaporation molybdenum boat and crystal wafer fixture 5, be provided with butterfly 6.Butterfly 6 is used for blocking initial stage evaporation impurity, has served as initial stage evaporation, and butterfly rotation is left, and does not keep off evaporation molybdenum boat.

Claims (4)

1. the vacuum plating unit for crystal wafer plated film, comprise the chassis being located on worktable, on chassis, be covered with cover cap, cover cap is connected with the lifting gear being located on worktable, in cover cap, form vacuum chamber, below chassis, be provided with the unit that vacuumizes being connected with vacuum chamber, it is characterized in that: in vacuum chamber, be provided with workpiece rotating frame mechanism, the top of workpiece rotating frame mechanism is provided with crystal wafer plated film station, in the workpiece rotating frame mechanism of crystal wafer plated film station periphery, be provided with crystal wafer fixture, above the in-house chassis of workpiece rotating frame, be provided with the evaporation mechanism coordinating with crystal wafer plated film station, described evaporation mechanism comprises at least one the evaporation molybdenum boat being arranged side by side, evaporation molybdenum boat is fixed on chassis by evaporating jig, evaporation molybdenum boat comprises two connection molybdenum rods that are fixed on evaporating jig, between two connection molybdenum rods, be provided with horizontally disposed movable molybdenum boat.
2. the vacuum plating unit for crystal wafer plated film according to claim 1, is characterized in that: the end of described connection molybdenum rod is provided with the slot of arranged transversely, and the both sides of movable molybdenum boat are inserted in slot.
3. the vacuum plating unit for crystal wafer plated film according to claim 1, is characterized in that: on the chassis below evaporation molybdenum boat, be provided with residue collecting board.
4. the vacuum plating unit for crystal wafer plated film according to claim 1, is characterized in that: between evaporation molybdenum boat and crystal wafer fixture, be provided with butterfly.
CN201320873393.8U 2013-12-28 2013-12-28 Vacuum coater for coating crystal wafer Expired - Fee Related CN203653684U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201320873393.8U CN203653684U (en) 2013-12-28 2013-12-28 Vacuum coater for coating crystal wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201320873393.8U CN203653684U (en) 2013-12-28 2013-12-28 Vacuum coater for coating crystal wafer

Publications (1)

Publication Number Publication Date
CN203653684U true CN203653684U (en) 2014-06-18

Family

ID=50920096

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201320873393.8U Expired - Fee Related CN203653684U (en) 2013-12-28 2013-12-28 Vacuum coater for coating crystal wafer

Country Status (1)

Country Link
CN (1) CN203653684U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761057A (en) * 2017-12-01 2018-03-06 常德金德新材料科技股份有限公司 A kind of fixture of coating machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761057A (en) * 2017-12-01 2018-03-06 常德金德新材料科技股份有限公司 A kind of fixture of coating machine
CN107761057B (en) * 2017-12-01 2019-03-15 常德金德新材料科技股份有限公司 A kind of fixture of coating machine

Similar Documents

Publication Publication Date Title
CN205271800U (en) Multi -functional hot spraying anchor clamps
CN204414766U (en) A kind of silicon chip screen printing mechanism
CN203653684U (en) Vacuum coater for coating crystal wafer
CN209774869U (en) Wire cutting device for forming filter screen
CN206870568U (en) A kind of silkscreen system applied to a variety of bottle-type and with taper adjustment
CN210967444U (en) Servo hot melt adhesive hot press that performance is stable
CN203509639U (en) Pressure-measurable composite clamp
CN206811414U (en) A kind of erecting device of motor shaft
CN204281321U (en) A kind of for shifting Graphene time remove the device of growing substrate
CN209175355U (en) Isolator process equipment
CN203650330U (en) Multifunctional clamp
CN204741618U (en) Clear away device of impurity on circuit board
CN205343574U (en) Metal sheet kiss -coating device
CN203109671U (en) Transverse compressing positioner
CN203820170U (en) Vacuum aluminum plated aluminum wire welding and rolling device
CN104708552A (en) Artware processing equipment
CN216838120U (en) Annular thin sheet piece heat treatment tool with high applicability
CN220296877U (en) Stirring device for ceramic grinding wheel production
CN220780898U (en) Full-surface spraying device for hardware backboard
CN203002889U (en) Device for processing large-size chain ring hook
CN212656031U (en) Edge trimming device of silk screen setting machine
CN204037039U (en) For the conveying auxiliary equipment of surface of the work water transfer printing
CN105415015A (en) Galvanized steel sheet size processing structure
CN210524981U (en) Tool for disassembling and assembling tool turret of coupling threading machine
CN217070168U (en) Nitrogen-filled deaerating plant for pretreatment of hot rolling equipment

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140618

Termination date: 20151228

EXPY Termination of patent right or utility model