CN203590583U - Granular material plasma processing apparatus - Google Patents
Granular material plasma processing apparatus Download PDFInfo
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- CN203590583U CN203590583U CN201320752924.8U CN201320752924U CN203590583U CN 203590583 U CN203590583 U CN 203590583U CN 201320752924 U CN201320752924 U CN 201320752924U CN 203590583 U CN203590583 U CN 203590583U
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- granular material
- rotary drum
- plasma processing
- reactor chamber
- processing apparatus
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- 239000008187 granular material Substances 0.000 title claims abstract description 40
- 238000009413 insulation Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 18
- 238000003756 stirring Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 7
- 230000005684 electric field Effects 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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Abstract
he utility model relates to a granular material plasma processing apparatus. The apparatus comprises a reactor chamber shell, a rotary drum, a rod electrode and a power supply. The rotary drum and the rod electrode are arranged in the reactor chamber shell. The reactor chamber shell is a conductive shell. The reactor chamber shell and the rod electrode are connected to an anode and a cathode of the power supply respectively. One end portion of the rotary drum is provided with an end cap. The rod electrode is fixed at a center of the end cap. At least one baffle is arranged on an inner wall of the rotary drum along an axial direction. The apparatus adopts the rotary-drum plasma processing granular material; the reactor chamber shell and the rod electrode are used to discharge so as to generate the plasma; and the rotary drum is rotated continuously and at least one baffle used for stirring is arranged in the rotary drum so that the material is stirred continuously and the granular material is not easy to accumulate and cover; the granular material is tumbled in the rotary drum so that each surface of the granular material is exposed in the plasma by turns and each surface of the granular material is sufficiently processed; and a processing effect is good.
Description
Technical field
The utility model belongs to plasma processing apparatus, is specifically related to a kind of granular material plasma processing apparatus.
Background technology
Material surface modifying treatment technology is one of current material preparation technology of generally using, it is under certain external condition, material exterior materials and material surface generation physics or chemical reaction, thereby material surface state changed or produce new element and new group at material surface, finally meeting the needs of practical application.
But, the fast development of modern industry is had higher requirement to material wear-resistant wiping, wearing and tearing and the performance such as anticorrosive, meanwhile, also more and more higher to the requirement of environmental protection, thus effectively promote to be called as the development of the material plasma process for modifying surface of green production process.Under vacuum, apply high-frequency electric field to reacting gas environment, gas ionizes and produces plasma under the excitation of high-frequency electric field, and the temperature of the plasma that high-frequency electric field excitation produces, close to room temperature, therefore claims again low temperature plasma.
Yet, under normal pressure, for graininess or granular material, the characteristic with accumulation, when adopting plate electrode plasma treatment material, often easily piles up, and cause graininess or granular material not to be exposed to completely in the middle of plasma, therefore, need a kind of effectively material handling badly, can when processing, stir the device of material again, just can reach effective treatment effect.
Utility model content
In order to solve the above-mentioned problems in the prior art, provide a kind of granular material plasma processing apparatus.
The technical scheme that the utility model adopts is: comprise reactor chamber housing, rotary drum, bar electrode and power supply, above-mentioned rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, above-mentioned reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of above-mentioned power supply, one end of above-mentioned rotary drum is provided with end cap, described bar electrode is fixed on above-mentioned end cap center, and above-mentioned drum inner wall is also provided with at least one baffle plate vertically.
Preferably, above-mentioned drum inner wall is provided with four baffle plates vertically, above-mentioned four baffle plates at above-mentioned drum inner wall along circumference spaced set.
Preferably, above-mentioned bar electrode adopts conducting circular cylinder electrode.
Preferably, above-mentioned conducting circular cylinder electrode adopts metallic conduction cylinder electrode.
Preferably, above-mentioned rotary drum is netted cylindrical structural, and above-mentioned rotary drum rotates along central axis.
Preferably, on above-mentioned bar electrode, at least two paddles are also installed.
Preferably, above-mentioned paddle adopts insulation oar.
Adopt the beneficial effect of the technical program to be: a kind of granular material plasma processing apparatus, comprise reactor chamber housing, rotary drum, bar electrode and power supply, described rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of above-mentioned power supply, one end of described rotary drum is provided with end cap, described bar electrode is fixed on above-mentioned end cap center, and described drum inner wall is also provided with at least one baffle plate vertically.The utility model adopts rotary drum plasma treatment granular material, utilize reactor chamber housing and bar electrode discharge generation plasma, and rotary drum constantly rotates, in rotary drum, be provided with at least one baffle plate for stirring, can play the effect of continuous stirring material, making granular material be not easy to pile up covers, granular material is ceaselessly rolling in rotary drum, can each face of granular material be taken turns to be exposed in plasma, each face of surface of granular material is all processed fully, be the utlity model has excellent treatment effect.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is the structural representation of the utility model embodiment 1;
Fig. 2 is the structural representation of the utility model embodiment 2;
Fig. 3 is the structural representation of the utility model embodiment 3;
In figure, 1. reactor chamber housing 2. bar electrode 3. power supply 4. baffle plate 5. rotary drum 6. paddles.
Embodiment
Below in conjunction with accompanying drawing, describe specific embodiment of the utility model in detail.
As shown in Figure 1, a kind of granular material plasma processing apparatus, comprise reactor chamber housing 1, rotary drum 5, bar electrode 2 and power supply 3, bar electrode 2 adopts metallic conduction electrode, rotary drum 5 is netted cylindrical structural, plasma can be contacted more fully with granule materials, one end of rotary drum 5 is provided with an end cap, bar electrode is fixed on end cap center, bar electrode 2 is fixed on the center of above-mentioned end cap, bar electrode 2 adopts metallic conduction cylinder electrode, at described drum inner wall, be also provided with vertically a baffle plate 4, rotary drum 5 and bar electrode 2 are all located in reactor chamber housing 1, reactor chamber housing 1 and described bar electrode 2 are electrically connected to respectively the both positive and negative polarity of described power supply 3 by wire, when power connection, between reactor chamber housing 1 and bar electrode 2, just discharge, produce plasma, rotary drum 5 rotates simultaneously, granular material is constantly rolling in rotary drum 5, owing to being provided with vertically the baffle plate of at least one its stirring action at described drum inner wall, when rotated granule materials is stirred, make each face of granular material take turns to be exposed in plasma, each face of surface of granular material is all processed fully.
As described in Figure 2, all the other are identical with embodiment 1, difference is, at drum inner wall, be provided with vertically four baffle plates 4, above-mentioned four baffle plates 4 at above-mentioned drum inner wall along circumference spaced set, baffle plate has played the effect of a stirring in the present embodiment, can better make each surface of processed granular material be exposed in plasma.
As shown in Figure 3, all the other are identical with embodiment 2, and difference is, at least two paddles 6 are installed on bar electrode 2, at least two paddles 6 are installed on bar electrode 2, the present embodiment adopts 6 paddles, is provided with 6 paddles 6 on bar electrode 2, and paddle 6 adopts insulation oar, for stirring particles shape material, play good peptizaiton, can better make each surface of processed granular material be exposed in plasma, granular material can be fully stirred.
The beneficial effects of the utility model are: a kind of granular material plasma processing apparatus, comprise reactor chamber housing, rotary drum, bar electrode and power supply, described rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of above-mentioned power supply, one end of described rotary drum is provided with end cap, described bar electrode is fixed on above-mentioned end cap center, and described drum inner wall is also provided with at least one baffle plate vertically.The utility model adopts rotary drum plasma treatment granular material, utilize reactor chamber housing and bar electrode discharge generation plasma, and rotary drum constantly rotates, in rotary drum, be provided with at least one baffle plate for stirring, can play the effect of continuous stirring material, making granular material be not easy to pile up covers, granular material is ceaselessly rolling in rotary drum, can each face of granular material be taken turns to be exposed in plasma, each face of surface of granular material is all processed fully, be the utlity model has excellent treatment effect.
Above-described is only preferred implementation of the present utility model; it should be pointed out that for the person of ordinary skill of the art, do not departing under the prerequisite of the utility model creation design; can also make some distortion and improvement, these all belong to protection range of the present utility model.
Claims (7)
1. a granular material plasma processing apparatus, comprise reactor chamber housing, rotary drum, bar electrode and power supply, it is characterized in that, described rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, and described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of described power supply, and an end of described rotary drum is provided with end cap, described bar electrode is fixed on described end cap center, and described drum inner wall is also provided with at least one baffle plate vertically.
2. granular material plasma processing apparatus according to claim 1, is characterized in that, described drum inner wall is provided with four baffle plates vertically, described four baffle plates at described drum inner wall along circumference spaced set.
3. granular material plasma processing apparatus according to claim 1, is characterized in that, described bar electrode adopts conducting circular cylinder electrode.
4. granular material plasma processing apparatus according to claim 3, is characterized in that, described conducting circular cylinder electrode adopts metallic conduction cylinder electrode.
5. granular material plasma processing apparatus according to claim 1, is characterized in that, described rotary drum is netted cylindrical structural, and described rotary drum rotates along central axis.
6. granular material plasma processing apparatus according to claim 1, is characterized in that, at least two paddles are also installed on described bar electrode.
7. granular material plasma processing apparatus according to claim 6, is characterized in that, described paddle adopts insulation oar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320752924.8U CN203590583U (en) | 2013-11-26 | 2013-11-26 | Granular material plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320752924.8U CN203590583U (en) | 2013-11-26 | 2013-11-26 | Granular material plasma processing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203590583U true CN203590583U (en) | 2014-05-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320752924.8U Expired - Lifetime CN203590583U (en) | 2013-11-26 | 2013-11-26 | Granular material plasma processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203590583U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103596351A (en) * | 2013-11-26 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma processing device for granular materials |
| CN103646843A (en) * | 2013-11-26 | 2014-03-19 | 苏州市奥普斯等离子体科技有限公司 | Particle material surface plasma processing device |
-
2013
- 2013-11-26 CN CN201320752924.8U patent/CN203590583U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103596351A (en) * | 2013-11-26 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma processing device for granular materials |
| CN103646843A (en) * | 2013-11-26 | 2014-03-19 | 苏州市奥普斯等离子体科技有限公司 | Particle material surface plasma processing device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20161214 Address after: 518000 Guangdong city of Shenzhen province Luohu District Lake Street No. 118 Shennan East Road, Heping Road, the world financial center tower B Bao - Ping Street 0623 Patentee after: SHENZHEN OPS PLAMSMA TECHNOLOGY CO.,LTD. Address before: Taishan road Suzhou City, Jiangsu province 215011 Suzhou high tech Industrial Development Zone No. 2 (Canton Science Park) Patentee before: SUZHOU OPS PLASMA TECHNOLOGY Co.,Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20140507 |
|
| CX01 | Expiry of patent term |