CN203521164U - High sheet resistance aluminum film - Google Patents
High sheet resistance aluminum film Download PDFInfo
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- CN203521164U CN203521164U CN201320551115.0U CN201320551115U CN203521164U CN 203521164 U CN203521164 U CN 203521164U CN 201320551115 U CN201320551115 U CN 201320551115U CN 203521164 U CN203521164 U CN 203521164U
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- square resistance
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- sheet resistance
- thickened area
- capacitor
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Abstract
The utility model discloses a high sheet resistance aluminum film comprising a base film, a thickening zone and a gradually changed sheet resistance zone. The thickening zone and the gradually changed sheet resistance zone are metal vapor deposition layers arranged on the base film, the thickening zone is arranged on one side of the base film, the gradually changed sheet resistance zone is arranged between the other side of the base film and the thickening zone, and the thickness of the gradually changed sheet resistance zone gradually decreases from the joint of the thickening zone and the gradually changed sheet resistance zone to the other side of the base film. By employing the thickening zone, gold spraying layers of a thin-film capacitor and the contact resistance of a core are reduced, and a relatively large current can be born. By employing the gradually changed sheet resistance zone, the sheet resistance increases gradually, and is adapt to current density distribution of the capacitor, so that the compression strength of the capacitor is improved.
Description
Technical field
The utility model relates to a kind of evaporation structure of metallized film, and high square resistance aluminium film, belongs to capacitor technology field.
Background technology
What the metallized film generally using in the market all adopted is allumen evaporation mode, and the resistance of largest block resistance only has 20 Ω/.Along with having got up extensively of capacitor application, power equipment volume requirement is more and more less, and corresponding also more and more higher to the volume requirement of electric capacity, this just requires the energy storage density of capacitor increasing, and the compressive resistance of capacitor membrane will increase accordingly.
And easily there is atmospheric oxidn corrosion in a large amount of capacitors in manufacturing process, the sheet resistance of metal level is increased, it is extremely serious giving the adverse consequences that the performance of capacitor causes, and atmospheric oxidn corrosion also easily occurs metallized film in storage process.
Summary of the invention
The purpose of this utility model is for the deficiencies in the prior art part, the evaporation structure of a kind of new metallized film of proposition, i.e. high square resistance aluminium film.Under equal electric parameter, the capacitor that the high square resistance aluminium film that uses the utility model to propose rolls into, the capacitor volume rolling than the metalized film with usual manner evaporation is little, and the self-healing ability of capacitor is also strong.
For addressing the above problem, technical solution adopted in the utility model is as follows:
A kind of high square resistance aluminium film, comprise: basement membrane, thickened area, gradual changing square resistance district, described thickened area and described gradual changing square resistance district are the metal steam coating that is positioned at described basement membrane top, and described thickened area is positioned at a side of described basement membrane, described gradual changing square resistance district is positioned between the opposite side and described thickened area of described basement membrane, and the thickness in described gradual changing square resistance district from junction, described thickened area, the opposite side to described basement membrane reduces gradually.Described thickened area has reduced the gilding layer of film capacitor and the contact resistance of fuse, can bear larger electric current.Described gradual changing square resistance district makes its square resistance occur variation from small to large, and adapts with the electric current distribution of capacitor, improves the compressive resistance of capacitor.
As the improvement of technique scheme, described thickened area is metallic zinc evaporation layer.Because of the operation principle of capacitor, thickened area edge capacitor electrode current density is large, and degree of depth corrosion, i.e. electrochemical corrosion easily occur aluminum metal in capacitor long-term work.And metallized film for pure zinc is even if metal level is very thin, also insensitive to electrochemical corrosion.
As the improvement of technique scheme, described gradual changing square resistance district is metallic aluminium evaporation floor.Make the varied in thickness in described gradual changing square resistance district in the course of processing, be easy to control and realize.
As the improvement of technique scheme, the square resistance of described thickened area is (4.5 ± 1) Ω/.For controlling the minimum resistance of described high square resistance aluminium film, to guarantee the fail safe of product application.
As the improvement of technique scheme, from junction, described thickened area, the opposite side to described basement membrane increases the square resistance in described gradual changing square resistance district gradually, and change curve is level and smooth S shape.The square resistance change curve in described gradual changing square resistance district and the electric current distribution of capacitor adapt, thereby can improve the compressive resistance of capacitor; The square resistance change curve of preferred high square resistance aluminium film as shown in Figure 2.
As the improvement of technique scheme, the square resistance maximum in described gradual changing square resistance district is 65 Ω/.For controlling the maximum value of described high square resistance aluminium film, to guarantee the fail safe of product application.
Compared with prior art, implementation result of the present utility model is as follows for the utility model:
The electric current distribution of high square resistance aluminium film described in the utility model and capacitor adapts, and has taken into account the demand of electric current and the voltage of capacitor, has improved the compressive resistance of capacitor, has strengthened the self-healing ability of capacitor, has dwindled the volume of capacitor.
Accompanying drawing explanation
Fig. 1 is high square resistance aluminium membrane structure schematic diagram described in the utility model;
Fig. 2 is the square resistance change curve of high square resistance aluminium film described in the utility model.
Embodiment
Content of the present utility model is described below in conjunction with specific embodiments.
As shown in Figure 1, be high square resistance aluminium membrane structure schematic diagram described in the utility model.High square resistance aluminium film described in the utility model, comprise: basement membrane 1, thickened area 2, gradual changing square resistance district 3, described thickened area 2 and described gradual changing square resistance district 3 are the metal steam coating that is positioned at described basement membrane 1 top, and described thickened area 2 is positioned at a side of described basement membrane 1, between described gradual changing square resistance district 3 opposite sides at described basement membrane 1 and described thickened area 2, and the thickness in described gradual changing square resistance district 3 from 2 junctions, described thickened area, the opposite side to described basement membrane 1 reduces gradually.The quality in described thickened area 2 and described gradual changing square resistance district 3 can be allumen evaporation floor conventional in prior art, can be also the conductive metal films such as metallic zinc evaporation layer or metallic aluminium evaporation layer.
Preferably, described thickened area 2 is metallic zinc evaporation layer.Described gradual changing square resistance district 3 is metallic aluminium evaporation floor.And the square resistance of described thickened area 2 is (4.5 ± 1) Ω/.From 2 junctions, described thickened area, the opposite side to described basement membrane 1 increases the square resistance in described gradual changing square resistance district 3 gradually, and change curve is level and smooth S shape.The square resistance maximum in described gradual changing square resistance district 3 is 65 Ω/.
The electric current distribution of high square resistance aluminium film provided by the utility model and capacitor adapts, and has taken into account the demand of electric current and the voltage of capacitor, has improved the compressive resistance of capacitor, has strengthened the self-healing ability of capacitor, has dwindled the volume of capacitor.The square resistance change curve of high square resistance aluminium film provided by the utility model, as shown in Figure 2.
Above content is the detailed description of in conjunction with specific embodiments the utility model being done, and can not assert that the concrete enforcement of the utility model only limits to these explanations.For the utility model person of ordinary skill in the field, without departing from the concept of the premise utility, can also make some simple deduction or replace, all should be considered as belonging to the scope of the utility model protection.
Claims (6)
1. a high square resistance aluminium film, it is characterized in that: comprise basement membrane (1), thickened area (2), gradual changing square resistance district (3), described thickened area (2) and described gradual changing square resistance district (3) are the metal steam coating that is positioned at described basement membrane (1) top, and described thickened area (2) are positioned at a side of described basement membrane (1), described gradual changing square resistance district (3) is positioned between the opposite side and described thickened area (2) of described basement membrane (1), and the thickness in described gradual changing square resistance district (3) from junction, described thickened area (2), the opposite side to described basement membrane (1) reduces gradually.
2. high square resistance aluminium film as claimed in claim 1, is characterized in that: described thickened area (2) are metallic zinc evaporation layer.
3. high square resistance aluminium film as claimed in claim 1, is characterized in that: described gradual changing square resistance district (3) is metallic aluminium evaporation floor.
4. high square resistance aluminium film as claimed in claim 1 or 2, is characterized in that: the square resistance of described thickened area (2) is (4.5 ± 1) Ω/.
5. the high square resistance aluminium film as described in claim 1 or 3, is characterized in that: from junction, described thickened area (2), the opposite side to described basement membrane (1) increases the square resistance in described gradual changing square resistance district (3) gradually, and change curve is level and smooth S shape.
6. high square resistance aluminium film as claimed in claim 5, is characterized in that: the square resistance maximum in described gradual changing square resistance district (3) is 65 Ω/.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320551115.0U CN203521164U (en) | 2013-09-06 | 2013-09-06 | High sheet resistance aluminum film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320551115.0U CN203521164U (en) | 2013-09-06 | 2013-09-06 | High sheet resistance aluminum film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203521164U true CN203521164U (en) | 2014-04-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320551115.0U Expired - Fee Related CN203521164U (en) | 2013-09-06 | 2013-09-06 | High sheet resistance aluminum film |
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| Country | Link |
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| CN (1) | CN203521164U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103456492A (en) * | 2013-09-06 | 2013-12-18 | 安徽赛福电子有限公司 | High-sheet-resistance aluminum membrane |
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2013
- 2013-09-06 CN CN201320551115.0U patent/CN203521164U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103456492A (en) * | 2013-09-06 | 2013-12-18 | 安徽赛福电子有限公司 | High-sheet-resistance aluminum membrane |
| CN103456492B (en) * | 2013-09-06 | 2016-10-19 | 安徽赛福电子有限公司 | High-sheet-resistancaluminum aluminum membrane |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140402 Termination date: 20160906 |