CN203477887U - Fluorine gas device - Google Patents

Fluorine gas device Download PDF

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Publication number
CN203477887U
CN203477887U CN201190000797.5U CN201190000797U CN203477887U CN 203477887 U CN203477887 U CN 203477887U CN 201190000797 U CN201190000797 U CN 201190000797U CN 203477887 U CN203477887 U CN 203477887U
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China
Prior art keywords
fluorine
gas equipment
fluorine gas
storage element
equipment according
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Expired - Fee Related
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CN201190000797.5U
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Chinese (zh)
Inventor
田昊真
奥利维耶罗·黛安娜
彼得·M·普雷迪坎特
菲利普·莫雷勒
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Solvay SA
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Solvay SA
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/06—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures for filling with compressed gases
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/08—Mounting arrangements for vessels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/08—Mounting arrangements for vessels
    • F17C13/084—Mounting arrangements for vessels for small-sized storage vessels, e.g. compressed gas cylinders or bottles, disposable gas vessels, vessels adapted for automotive use
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2201/00—Vessel construction, in particular geometry, arrangement or size
    • F17C2201/01—Shape
    • F17C2201/0104—Shape cylindrical
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0602—Wall structures; Special features thereof
    • F17C2203/0607—Coatings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0634—Materials for walls or layers thereof
    • F17C2203/0636—Metals
    • F17C2203/0639—Steels
    • F17C2203/0643—Stainless steels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2203/00—Vessel construction, in particular walls or details thereof
    • F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
    • F17C2203/0634—Materials for walls or layers thereof
    • F17C2203/0636—Metals
    • F17C2203/0648—Alloys or compositions of metals
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0103—Exterior arrangements
    • F17C2205/0107—Frames
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0123—Mounting arrangements characterised by number of vessels
    • F17C2205/013—Two or more vessels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0123—Mounting arrangements characterised by number of vessels
    • F17C2205/013—Two or more vessels
    • F17C2205/0134—Two or more vessels characterised by the presence of fluid connection between vessels
    • F17C2205/0142—Two or more vessels characterised by the presence of fluid connection between vessels bundled in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0153—Details of mounting arrangements
    • F17C2205/0157—Details of mounting arrangements for transport
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323—Valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F17C2221/014—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/03—Mixtures
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0107—Single phase
    • F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/033—Small pressure, e.g. for liquefied gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/035—High pressure (>10 bar)
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/01—Propulsion of the fluid
    • F17C2227/0128—Propulsion of the fluid with pumps or compressors
    • F17C2227/0157—Compressors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2260/00—Purposes of gas storage and gas handling
    • F17C2260/04—Reducing risks and environmental impact
    • F17C2260/044—Avoiding pollution or contamination
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2265/00—Effects achieved by gas storage or gas handling
    • F17C2265/02—Mixing fluids
    • F17C2265/025—Mixing fluids different fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00—Applications
    • F17C2270/05—Applications for industrial use
    • F17C2270/0518—Semiconductors

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Treating Waste Gases (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

The utility model discloses a fluorine gas device. The fluorine gas device comprises a fluorine generation unit 1 and a permanent fluorine storage unit 4, wherein the fluorine generation unit 1 is connected to a fluorine supplying system 2; the fluorine supplying system is provided with a fluorine using point 3; the permanent fluorine storage unit 4 can be connected to the supplying system, and comprises a plurality of hollow bodies 5, and at least one hollow body in the hollow bodies 5 has an internal volume which is equal to or greater than 50 L and is preferably equal to or greater than 100 L.

Description

Fluorine gas equipment
technical field
The present invention requires in the preference of the European Patent Application No. 10177206.9 of submission on September 16th, 2010, for all objects, the full content of this application is combined in to this by reference, and the present invention relates to a kind of fluorine gas equipment and a kind of for supplying the method for fluorine gas.
background technique
Fluorine gas is as molecular fluorine (F 2) with and particularly with inert gas N for example 2or the mixture of Ar is useful, for example, in semiconductor fabrication as clean air for chamber is processed.
File WO2006/067364-A1(is corresponding with US2006/0130929) in a kind of method that highly purified fluorine is delivered to a processing system, disclosed a kind of on-the-spot formula fluorine generator, it is to the fluorine of provision of purified in a fixing storage element, and from this fixing storage element, this highly purified fluorine is supplied in processing system.In order providing to this fluorine generator, to provide support, also with a relatively low pressure (being typically less than 35psig), for example, in a transportable gas storage container (, many assembly parties), to provide highly purified fluorine.This transportable gas storage container is optionally connected on this fixing storage element, and this fixing storage element can maintain a desirable level as the value that makes the fluorine in this storage element requiring.
summary of the invention
Have now found that a kind of fluorine gas equipment, this fluorine gas equipment allows the stable and economic fluorine by requiring value to be fed to one and uses point, simultaneous minimization and F 2the relevant security risk of existence.
Therefore the present invention relates to a kind of fluorine gas equipment, and this fluorine gas equipment comprises a fluorine generation unit 1, and this fluorine generation unit is connected in a fluorine supply system 2, and this fluorine supply system has a fluorine and uses point 3; And the unit 4 that can be connected to a permanent storage fluorine in described supply system, the unit of wherein said storage fluorine comprises a plurality of hollow bodies 5, and wherein at least one in these hollow bodies has and be equal to or greater than 50 liters, be preferably equal to or greater than the internal volume of 100 liters.
Preferably, at least one in these hollow bodies has the internal volume that is equal to or greater than 100 liters.
Preferably, this fluorine storage element comprises 4 to 25 hollow bodies.
Preferably, this fluorine storage element comprises 5 to 8 hollow bodies.
Preferably, this fluorine storage element is configured to comprise or comprise the fluorine gas under 25 to 75psig pressure.
Preferably, this fluorine storage element is configured to comprise or comprise the fluorine gas under 35 to 65psig pressure.
Preferably, this fluorine storage element is configured to comprise or comprise the fluorine gas under 40 to 60psig pressure.
Preferably, this fluorine storage element is directly connected to fluorine supply line.
Preferably, this fluorine gas equipment is configured to using some place to send the fluorine gas being mainly comprised of molecular fluorine.
Preferably, this fluorine gas equipment is configured to using some place to send fluorine gas.
Preferably, the inert gas in this fluorine gas is selected from nitrogen and argon gas.
Preferably, this fluorine gas equipment also comprises mixer (12).
Preferably, this mixer (12) is static mixer.
Preferably, this mixer (12) is configured to reception from the fluorine of this fluorine generation unit (1) and receives the inert gas from inert gas supply line (13).
Preferably, this fluorine generation unit comprises electrolytic cell, and this electrolytic cell is for producing molecular fluorine by the electrolytical electrolysis of melting.
Preferably, the electrolyte of this melting is the electrolyte of the melting containing KF and HF.
Preferably, this fluorine storage element is within the space (8) that is included in sealing.
Preferably, this fluorine storage element is mounted on slider.
Preferably, the space of this sealing (8) comprise fluorine inductor, and this fluorine inductor is configured to trigger the space of this sealing and being connected of fluorine destroying system (9).
Preferably, the space of this sealing (8) comprise fluorine inductor, and this fluorine inductor is configured to trigger the space of this sealing and being connected of scrubber.
Preferably, this fluorine destroying system is configured to destroy and is included in 1 or 2 fluorine in hollow body.
Preferably, the molecular fluorine being stored in this fluorine storage element is 0.1 to 1 with the ratio of this fluorine gas equipment molecular fluorine every day yielding capacity.
Preferably, the molecular fluorine being stored in this fluorine storage element is 0.1 to 0.25 with the ratio of this fluorine gas equipment molecular fluorine every day yielding capacity.
Preferably, this use point is connected to semiconductor manufacturing facility.
Preferably, this use point is connected to the semiconductor manufacturing facility of manufacturing photovoltaic devices or flat panel display.
Preferably, this fluorine storage element is configured to comprise or comprises under 35 to 65psig pressure
Fluorine gas, and wherein each hollow body has the internal volume of 500 to 3000 liters.
Accompanying drawing explanation
Fig. 1 is according to the schematic diagram of a fluorine gas equipment of the present invention, and this fluorine gas equipment is connected in a fluorine supply system and on a fluorine gas storage element, and this fluorine gas storage element has (providing an example) 6 hollow bodies.
Embodiment
" fluorine gas " is understood to refer to particularly molecular fluorine (F 2) with and particularly with the multiple mixture of inert gas.Inert gas can be selected from for example argon gas and nitrogen.A kind of preferred fluorine gas by or mainly by F 2form.
" permanent fluorine storage element " is interpreted as referring to particularly a kind of fluorine storage element being integrated in this fluorine equipment.For example, this fluorine storage element can be ，Gai unit, a kind of transportable unit be permanently present in this fluorine supply system in the neighbourhood in, run through the operation of this fluorine equipment.Preferably, this fluorine storage element can be ，Gai unit, a kind of transportable unit be permanently present in this fluorine supply system in the neighbourhood in, run through the operation of this fluorine equipment.Therefore,, in the running of fluorine equipment, this permanent fluorine storage element is the near zone that is permanently present in fluorine supply system; However, in fluorine equipment does not have the time of operation, this permanent fluorine storage element can separate with fluorine equipment, because it can be connected in this supply system, and therefore, it is knock-down when fluorine equipment does not have operation.Likely necessary in the situation that, (if while for example there is the problem with corresponding hollow body) closes a corresponding valve of this permanent fluorine supply system or corresponding a plurality of valves, and disconnects the one or more of these hollow bodies and do not interrupt the operation of this fluorine equipment.Therefore, this permanent fluorine storage element allows a continuous equipment operation, even in the situation that one or more faults of these hollow bodies.
Preferably, this permanent fluorine storage element be designed to comprise with respect to be stored in the fluorine gas in this equipment gross weight more than 90wt%, more preferably more than 95wt%, the fluorine gas of 100wt% most preferably from about.Therefore, unessential other storage tank.
" fluorine supply system " is understood to refer to particularly an element, and this element can comprise fluorine and it can be sent to this use point from this fluorine generation unit by fluorine.The possible parts of fluorine supply system include but not limited to: supply line, compressor, mixer and knock out drum.
" attachable " is interpreted as referring to particularly that this permanent fluorine storage element is equipped as on parts that can be connected to this fluorine supply system.Preferably, this permanent fluorine storage element is equipped with to such an extent that can be connected on a fluorine supply line.One preferred aspect, this fluorine storage element in service that runs through this fluorine equipment is connected on parts of this fluorine supply system, particularly on a fluorine supply line.Another preferred aspect, this fluorine storage element is directly connected on parts of this fluorine supply system.
For connect on parts this fluorine storage element, that be connected to this fluorine supply system, applicable equipment comprises a manifold 6, this manifold is connected on each hollow body 5 of this fluorine storage element and preferably in each pipeline, has a cut-off valve 7 by a pipeline, to allow to isolate individually each hollow body, and described manifold is further connected on parts of this fluorine supply system.
In the device in accordance with the invention, its a plurality of parts (suppose that these parts contact with gas, for example as, if appropriate, a plurality of hollow bodies, a plurality of valve and the many pipelines for inflating and/or exitting) be applicable to making with the material of resistance to molecular fluorine or be coated with this material.The example of this type of material comprises: monel metal metal, stainless steel, copper, and preferably, nickel.
In the device in accordance with the invention, this fluorine storage element preferably includes from 4 to 25 hollow bodies, more preferably from 5 to 8 hollow bodies.These hollow bodies preferably have substantially the same shape and size.Independent hollow body preferably have no more than these hollow bodies each average external volume ± 5% deviation; Preferably, each hollow body has roughly the same internal volume.The hollow body of columniform shape is preferred.
These hollow bodies of fluorine storage element can compatibly be fixed together by a suitable framework.The geometrical shape of concrete framework comprises: the geometrical shape of leg-of-mutton, foursquare and rectangle.
Preferably, these hollow bodies have the opening of the inlet/outlet of a single combination separately, by this opening F 2be fed in this hollow body and extracted out from this hollow body.
In fluorine gas equipment according to the present invention, this fluorine storage element can comprise or comprise the fluorine gas under the pressure in 25psig at least generally.Frequently, this pressure is to be equal to or greater than 35psig, is preferably equal to or greater than 40psig.In fluorine gas equipment according to the present invention, this fluorine storage element can comprise or comprise generally in maximum 400psig, conventionally be less than or equal to the fluorine gas under the pressure of 75psig.Often, this pressure is to be equal to or less than 65psig, and is preferably equal to or less than 60psig.This fluorine storage element preferably can comprise or comprise in the fluorine gas from 25 to 75psig, and more preferably, this fluorine storage element can comprise or comprise in from 35 to 65psig, the especially preferred fluorine gas from 40 to 60psig.
Preferably, at least one in these hollow bodies has the internal volume that is equal to or greater than 50l.Although one or more in these hollow bodies can have the volume that is less than 50 liters, for practical purpose, this reservoir volume is too little.More preferably, at least one in these hollow bodies has the internal volume that is equal to or greater than 100 liters.Still more preferably, these hollow bodies have the internal volume that is equal to or greater than 100 liters separately.Especially preferably, these hollow bodies have the internal volume that is equal to or greater than 500 liters separately.Most preferably, these hollow bodies have separately and are equal to or greater than 1000 liters (1000 liters=1m 3) internal volume.
Preferably, these hollow bodies have the internal volume that is equal to or less than 5000 liters separately, are more preferably equal to or less than the internal volume of 3000 liters.
Result is, the preferred scope of these hollow bodies internal volume is separately from 100 to 5000 liters, more preferably from 100 to 3000 liters, and most preferably from 500 to 3000 liters, and especially preferably from 1000 to 3000 liters.
Preferably this fluorine storage element can comprise or comprise the fluorine gas under 25psig pressure at least generally, and these hollow bodies have the internal volume that is equal to or greater than 100 liters separately.Still more preferably this fluorine storage element can comprise or comprise the fluorine gas under 35psig pressure at least generally, and these hollow bodies have the internal volume that is equal to or greater than 500 liters separately.
Preferably this fluorine storage element can comprise or comprise generally in 400psig at the most, be generally equal to or be less than the fluorine gas under 75psig pressure, and these hollow bodies internal volume is separately to be equal to or less than 3000 liters.
Most preferred fluorine storage element can comprise or comprise in the fluorine gas from 35 to 65psig pressure, and these hollow bodies have the internal volume of 500 to 3000 liters separately.
These hollow bodies that should be understood that this fluorine storage element can comprise or comprise the fluorine gas under above-mentioned pressure generally.Particularly preferably that these hollow bodies comprise the fluorine under above-mentioned pressure.
In fluorine gas equipment according to the present invention, be stored in the molecular fluorine (F in fluorine storage element 2) and this fluorine gas equipment molecular fluorine every day (F 2) ratio of yielding capacity is from 0.1 to 1 generally, preferably from 0.1 to 0.25.
In fluorine gas equipment according to the present invention, this fluorine generation unit comprises that one for producing the electrolytic cell of molecular fluorine by the electrolysis of fused electrolyte (fused electrolyte that preferably contains KF and HF) generally.
In fluorine gas equipment according to the present invention, this fluorine storage element is preferably mounted on a slider.
In fluorine gas equipment according to the present invention, use point can be connected on an other manufacturing equipment, a chemical device for example, or particularly used fluorine for equipment of surface-treated.This use point is often connected on the MEMS of a device fabrication, is preferably connected on a semiconductor manufacturing facility the especially manufacture of preferred light electrical part or flat panel display.
In a preferred embodiment of fluorine gas equipment according to the present invention, within this fluorine storage element is included in the space 8 of a sealing.Especially preferably, within this fluorine storage element is included in the space 8 of a sealing, and this fluorine storage element is mounted on a slider.In the spatial overall of this sealing, comprise a fluorine inductor, this fluorine inductor can trigger the space of this sealing and being connected of a kind of fluorine destroying system 9.Compatibly, the space of this sealing is connected on this fluorine destroying system by the aspiration line 10 being connected on a fan 11, and this fan is exercisable to gas is transported to from the space of this sealing to this fluorine destroying system.
This fluorine destroying system is a scrubber preferably.This scrubber compatibly comprises a kind of alkaline solution (for example a kind of KOH solution) of water and optionally, a kind of reducing agent (for example, as sodium thiosulfate or potassium thiosulfate).
Generally, this fluorine destroying system can be destroyed and be included in 1 or 2 fluorine in hollow body.Preferably, this fluorine destroying system can be destroyed and be included in approximately 1 fluorine in hollow body.
In other embodiments, fluorine gas equipment according to the present invention further comprises a mixer 12, a preferred static mixer, described mixer preferably can receive from the fluorine in fluorine generation unit 1 and receive the inert gas from an inert gas supply line 13, as preferred argon gas and/or nitrogen.
The invention still further relates to a kind ofly for supplying the method for fluorine gas, the method comprises to be used according to fluorine gas equipment of the present invention to use a some supply fluorine gas to one.
Fig. 1 shows the preferred fluorine equipment of an illustrative of the present invention.
Fluorine generation unit 1 is connected in fluorine supply system 2, and this fluorine supply system comprises a fluorine supply line, and this fluorine supply line is connected to and uses on point 3, and this use point is connected on a semiconductor manufacturing facility.In an optional embodiment, a pressure control circuit 14, by being fed to the fluorine pressure adjustment of using point, reduces, generally to a desirable value.An optional embodiment, this fluorine supply line is connected on a mixer 12, and this mixer is further connected on inert gas supply line 13, and an other fluorine supply line is connected to this mixer 12 to use on point 3.This fluorine supply system 2 is further connected on fluorine storage element 4 by manifold 6, and this manifold is connected to by a pipeline on each hollow body 5 of this fluorine storage element and preferably at each F 2-storage-container place has a cut-off valve 7.This fluorine storage element is comprised in the space 8 of sealing, and the space of this sealing comprises a fluorine inductor, and this fluorine inductor can trigger the space of this sealing and being connected of this fluorine destroying system 9.The space of this sealing is connected on this fluorine destroying system by the aspiration line 10 being connected on a fan 11, and this fan is exercisable to gas is transported to from the space of this sealing to fluorine destroying system 9.
If any, be combined in by reference this patent, patent application, and the afoul degree of the disclosure content in publication and the application's explanation may make a term unclear to it, this explanation should be preferential.
Example
According in the base case of Fig. 1 a fluorine equipment (there is no the supply of mixer and inert gas), in a fluorine generation unit 1, by the HF electrolysis in the KFx2HF electrolyte in melting, produce the F of about 415kg/ day 2.By fluorine supply system 2 by this F 2be sent to and use point 3, at this, use the some F of place 2be supplied to and use F 2a clean flat panel display manufacturing apparatus for chamber.Once using the requirement of point, just supply F 2.
By adaptive F 2f in generation unit 2production come and by fluorine supply system 2 and F 2fluorine pressure in storage element 4 maintains 3.5 bar gauge pressures.F 2storage element 4 comprises the container of 6 identical columniform shapes, and the inner volume that these containers have is separately 1.3m 3.By pressure control circuit 14, will use the fluorine pressure at point 3 places further to reduce to 1.5 bar gauge pressures.
In normal running, these cut-off valves 7 are open, and at F 2storage element 4 and use the pressure difference between point 3 that a buffering is provided, sort buffer allows sent a kind of of fluorine stream to control stably, even for using, locates or at the variable consumption patterns of the production interrupt procedure of fluorine generation unit.
Sewing while occurring in one of these hollow bodies, by a fluorine detector in the space of this sealing, fluorine is detected, and start fan 11 so that the gas that this is comprised to fluorine is transported to fluorine destroying system 9 from the space of this sealing by aspiration line 10, this fluorine destroying system is the scrubber that comprises a kind of water-based KOH solution.This scrubber can be processed the F of 15kg 2.
According to the present invention, fluorine equipment and the method according to this invention allow stable, safety and economic fluorine gas supply, especially for semiconductor application, and as clean in chamber and etching.Particularly, this fluorine stocking system and optional fluorine destroying system are efficiently, thereby have allowed the stability of supply of equipment and high Security.

Claims (26)

1. a fluorine gas equipment, comprises fluorine generation unit (1), it is characterized in that: this fluorine generation unit is connected to fluorine supply system (2), and this fluorine supply system has the use point (3) of fluorine; And the permanent fluorine storage element (4) that is configured to be connected to described supply system, wherein said fluorine storage element comprise a plurality of hollow bodies (5) and wherein at least one in these hollow bodies there is the internal volume that is equal to or greater than 50 liters.
2. fluorine gas equipment according to claim 1, wherein at least one in these hollow bodies has the internal volume that is equal to or greater than 100 liters.
3. fluorine gas equipment according to claim 1, wherein this fluorine storage element comprises 4 to 25 hollow bodies.
4. fluorine gas equipment according to claim 1, wherein this fluorine storage element comprises 5 to 8 hollow bodies.
5. according to the fluorine gas equipment described in any one in claim 1 to 4, wherein this fluorine storage element is configured to comprise or comprise the fluorine gas under 25 to 75psig pressure.
6. fluorine gas equipment according to claim 5, wherein this fluorine storage element is configured to comprise or comprise the fluorine gas under 35 to 65psig pressure.
7. fluorine gas equipment according to claim 5, wherein this fluorine storage element is configured to comprise or comprise the fluorine gas under 40 to 60psig pressure.
8. according to the fluorine gas equipment described in any one in claim 1 to 4, wherein this fluorine storage element is directly connected to fluorine supply line.
9. according to the fluorine gas equipment described in any one in claim 1 to 4, this fluorine gas equipment is configured to using some place to send the fluorine gas being mainly comprised of molecular fluorine.
10. according to the fluorine gas equipment described in any one in claim 1 to 4, this fluorine gas equipment is configured to using some place to send fluorine gas.
11. fluorine gas equipment according to claim 10, wherein the inert gas in this fluorine gas is selected from nitrogen and argon gas.
12. fluorine gas equipment according to claim 10, this fluorine gas equipment also comprises mixer (12).
13. fluorine gas equipment according to claim 12, wherein this mixer (12) is static mixer.
14. fluorine gas equipment according to claim 12, wherein this mixer (12) is configured to reception from the fluorine of this fluorine generation unit (1) and receives the inert gas from inert gas supply line (13).
15. according to the fluorine gas equipment described in any one in claim 1 to 4, and wherein this fluorine generation unit comprises electrolytic cell, and this electrolytic cell is for producing molecular fluorine by the electrolytical electrolysis of melting.
16. fluorine gas equipment according to claim 15, wherein the electrolyte of this melting is the electrolyte of the melting containing KF and HF.
17. according to the fluorine gas equipment described in any one in claim 1 to 4, and wherein this fluorine storage element is within the space (8) that is included in sealing.
18. fluorine gas equipment according to claim 17, wherein this fluorine storage element is mounted on slider.
19. fluorine gas equipment according to claim 17, wherein the space of this sealing (8) comprise fluorine inductor, this fluorine inductor is configured to trigger the space of this sealing and being connected of fluorine destroying system (9).
20. fluorine gas equipment according to claim 17, wherein the space of this sealing (8) comprise fluorine inductor, this fluorine inductor is configured to trigger the space of this sealing and being connected of scrubber.
21. fluorine gas equipment according to claim 19, wherein this fluorine destroying system is configured to destroy and is included in 1 or 2 fluorine in hollow body.
22. fluorine gas equipment according to claim 21, the molecular fluorine being stored in this fluorine storage element is 0.1 to 1 with the ratio of this fluorine gas equipment molecular fluorine every day yielding capacity.
23. fluorine gas equipment according to claim 21, the molecular fluorine being stored in this fluorine storage element is 0.1 to 0.25 with the ratio of this fluorine gas equipment molecular fluorine every day yielding capacity.
24. according to the fluorine gas equipment described in any one in claim 1 to 4, and wherein this use point is connected to semiconductor manufacturing facility.
25. according to the fluorine gas equipment described in any one in claim 1 to 4, and wherein this use point is connected to the semiconductor manufacturing facility of manufacturing photovoltaic devices or flat panel display.
26. according to the fluorine gas equipment described in any one in claim 1 to 4, and wherein this fluorine storage storage unit is configured to comprise or comprise the fluorine gas under 35 to 65psig pressure, and wherein each hollow body has the internal volume of 500 to 3000 liters.
CN201190000797.5U 2010-09-16 2011-08-22 Fluorine gas device Expired - Fee Related CN203477887U (en)

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CN107337180B (en) * 2017-07-10 2019-08-23 洛阳森蓝化工材料科技有限公司 A kind of filler and its preparation method and application purifying fluorine gas

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WO2012034825A3 (en) 2012-05-10
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