CN203433236U - Array substrate and 3D display device - Google Patents
Array substrate and 3D display device Download PDFInfo
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- CN203433236U CN203433236U CN201320541851.8U CN201320541851U CN203433236U CN 203433236 U CN203433236 U CN 203433236U CN 201320541851 U CN201320541851 U CN 201320541851U CN 203433236 U CN203433236 U CN 203433236U
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Abstract
The utility model relates to the technical field of display and discloses an array substrate and a 3D display device. The array substrate comprises a substrate body, a pixel array layer located on the substrate body, and a grating layer used for 3D display and formed by a plurality of light blocking bars arranged at preset intervals, wherein the grating layer is located on the side, away from the substrate body, of the pixel array layer, or the side, facing the pixel array layer, of the substrate body, or the side, away from the pixel array layer, of the substrate body, and the light blocking bars are used for reflection of light shinning towards the pixel array layer through the substrate body. During displaying, light emitted by a backlight source and not penetrating through the grating layer is reflected to the backlight source, due to the fact that the backlight source is usually provided with a light guiding plate enabling diffuse reflection of light to be achieved, light returned to the backlight source is reflected again by the light guiding plate to enable the light to penetrate through the grating layer, and then displaying brightness is improved. The 3D display device comprises the array substrate.
Description
Technical field
The utility model relates to 3D display technique field, particularly relates to a kind of array base palte and 3D display device.
Background technology
The grating bore hole 3D technology of current comparative maturity, its basic structure is to attach one deck grating layer in the upper polaroid outside of display screen, light pixel in display screen being sent by this grating layer is exported to respectively beholder's images of left and right eyes, thereby produces stereoscopic visual effect.The structure of existing bore hole 3D display device as depicted in figs. 1 and 2, display device shown in Fig. 1 comprises the display screen that become by the upper polaroid 1 that is positioned at color membrane substrates 2 tops, the lower polaroid 4 that is positioned at array base palte below and 3 pairs of box-likes of color membrane substrates 2 and array base palte, between color membrane substrates 2 and array base palte 3, is liquid crystal layer 7.Above upper polaroid 1, be provided with grating substrate 5, grating substrate 5 tops are formed with grating layer 6, and grating layer 6 is as parallax baffle, to form images of left and right eyes vision area in the vision area of display device.The structure similar of display device in display device shown in Fig. 2 and Fig. 1, has just been arranged on grating layer 6 between upper polaroid 1 and grating substrate 5, can realize equally bore hole 3D and show.Wherein, grating substrate 5 can be glass or plastics.
In actual application, finding, there is following problem in above-mentioned bore hole 3D display technique:
(1) because increased grating substrate, the transmitance of light is lower, and the brightness of display device is lower, and because of the existence of grating substrate, display device integral thickness increases simultaneously;
(2) grating region need to pixel region contraposition, in preparation technology, the grating substrate and the display screen contraposition laminating difficulty that are formed with grating layer, yields is lower, and on grating and array base palte, pixel aligning accuracy is low simultaneously also will greatly affect the display effect of display device; Needing in addition has special contraposition laminating production process, so cause that display device cost is higher;
(3) grating can block the not saturating display device of a part of light, causes the brightness of whole display device darker.
In order to address the above problem, in another kind of scheme, grating layer 6 directly can be made on color membrane substrates 2, be that grating layer 6 is between color membrane substrates 2 and upper polaroid 1, as shown in Figure 3, the hierarchical structure of the color membrane substrates of the hierarchical structure of the color membrane substrates of display screen below 2 and display screen layer in Fig. 1 and Fig. 2 below 2 is identical.In this scheme, just reduced grating substrate, grating layer 6 has been made between color membrane substrates 2 and upper polaroid 1, can solve like this problem of above-mentioned (1) and (2), but in this kind of structure, the brightness of whole display device still cannot improve.
Utility model content
(1) technical matters that will solve
The technical problems to be solved in the utility model is: the brightness that how to improve 3D display device.
(2) technical scheme
In order to solve the problems of the technologies described above, the utility model provides a kind of array base palte, comprise: underlay substrate and be positioned at the pel array layer on described underlay substrate, also comprise: the grating layer showing for 3D being formed by some the shield bars that are separated with preset distance, described grating layer is positioned at described pel array layer and deviates from described underlay substrate one side, or described grating layer is positioned at described underlay substrate towards described pel array one side, or described grating layer is positioned at described underlay substrate and deviates from described pel array one side, described shield bars is for by by the light reflection of pel array layer described in described underlay substrate directive.
Wherein, described pel array layer comprises pixel electrode layer and is positioned at the oriented layer that described pixel electrode layer deviates from described underlay substrate one side, and described grating layer is positioned at described pel array layer to deviate from described underlay substrate one side and be specially: described grating layer is between described pixel electrode layer and oriented layer.
Wherein, described grating layer is positioned at described underlay substrate and deviates from described pel array layer one side, described shield bars comprises: light shield layer and reflector layer, described light shield layer between underlay substrate and described reflector layer, and the projection of described reflector layer on described underlay substrate by described light shield layer, the projection on described underlay substrate covers.
Wherein, described shield bars is made by reflectorized material.
Wherein, also comprise: be positioned at the polaroid that described shield bars deviates from described pel array layer one side.
Wherein, also comprise: be positioned at the polaroid that described underlay substrate deviates from described pel array layer one side, described grating layer is positioned at described underlay substrate to deviate from described pel array layer one side and be specially: described grating layer is positioned at the side that described polaroid deviates from described pel array layer.
Wherein, described shield bars comprises: light shield layer and reflector layer, described light shield layer between described polaroid and described reflector layer, and the projection of described reflector layer on described underlay substrate by described light shield layer, the projection on described underlay substrate covers.
The utility model also provides a kind of 3D display device, comprises the array base palte described in above-mentioned any one.
(3) beneficial effect
In the utility model, grating layer is arranged on to pel array layer and deviates from described underlay substrate one side, or described underlay substrate is towards described pel array one side, or described underlay substrate deviates from described pel array one side, and the shield bars of grating layer can be by the light reflection of underlay substrate directive pel array layer.When showing, light that backlight sends and the grating layer that do not see through is reflected back toward backlight, because backlight has the irreflexive light guide plate of the light of making conventionally, light guide plate by the light that is reflected back backlight again secondary reflection make light transmission grating layer, thereby improve display brightness.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of bore hole 3D display device of the prior art;
Fig. 2 is the structural representation of another kind of bore hole 3D display device of the prior art;
Fig. 3 is the structural representation of another bore hole 3D display device of the prior art;
Fig. 4 is the structural representation of a kind of array base palte of the utility model embodiment;
Fig. 5 is the structural representation of the another kind of array base palte of the utility model embodiment;
Fig. 6 is the structural representation of another array base palte of the utility model embodiment;
Fig. 7 is the structural representation of another array base palte of the utility model embodiment;
Fig. 8 is the structural representation of another array base palte of the utility model embodiment;
Fig. 9 is the structural representation of another array base palte of the utility model embodiment;
Figure 10 is the structural representation of another array base palte of the utility model embodiment;
Figure 11 is that in Figure 10, array base palte forms 3D displaying principle figure after 3D display device;
Figure 12 is the structural representation of another array base palte of the utility model embodiment;
Figure 13 is the display device structure schematic diagram that comprises array base palte in Fig. 5.
Embodiment
Array base palte of the present utility model comprises: underlay substrate and be positioned at the pel array layer on described underlay substrate, in order to make can be reflected onto backlight for seeing through the light of grating layer when showing, again by backlight reflection, made the light transmission grating layer after reflection, thereby raising display brightness, also comprise: the grating layer showing for 3D being formed by some the shield bars that are separated with preset distance, described grating layer is positioned at described pel array layer and deviates from described underlay substrate one side, or described grating layer is positioned at described underlay substrate towards described pel array one side, or described grating layer is positioned at described underlay substrate and deviates from described pel array one side, described shield bars is for by by the light reflection of pel array layer described in described underlay substrate directive.Grating layer is exported to respectively beholder's images of left and right eyes for the light that display screen pixel is sent, thereby produces 3D visual effect, realizes bore hole 3D and shows.Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used for illustrating the utility model, but are not used for limiting scope of the present utility model.
The array base palte that the present embodiment provides as shown in Figure 4, the transparency carrier of underlay substrate 100(glass substrate or quartz material) and be positioned at the pel array layer 200 of underlay substrate 100 tops comprise:, also comprise: the grating layer being formed by some the shield bars that are separated with preset distance that is positioned at underlay substrate 100 belows.
In the present embodiment, shield bars comprises: light shield layer 410 and reflector layer 420, light shield layer 410 is between underlay substrate 100 and described reflector layer 420.Owing to will reaching better 3D display view angle, the width of shield bars and spacing are all set in advance, and in order not affect 3D display view angle, by light shield layer 410, the projection on underlay substrate 100 covers in the projection on underlay substrate 100 of reflector layer 420.
Preferably, light shield layer 410 is formed directly into the lower surface of underlay substrate 100, reflector layer 420 is formed on the lower surface of light shield layer 410.Can not need grating substrate like this, increase the transmitance of light.While directly forming, adopt composition technique (generally including the techniques such as photoresist coating, exposure, development, etching, photoresist lift off) that light shield layer 410 is formed on to underlay substrate 100 lower surfaces, reflector layer 420 is formed on to the lower surface of light shield layer 410, with respect to attaching process, improved the aligning accuracy of sub-pix in grating layer and pel array layer 200.
The step of making this array base palte comprises: on the surface of underlay substrate 100 1 sides, form pel array layer 200, form the figure of the grating layer being arranged in by some the shield bars that are separated with preset distance at described underlay substrate opposite side.Specifically comprise:
The surface of underlay substrate 100 1 sides (being upper surface in figure) forms pel array layer 200;
On the surface of underlay substrate 100 opposite sides (being lower surface in figure), form opaque light screening material film, this material can adopt light tight black resin;
By composition technique, form the figure of the light shield layer 410 of shield bars;
Continuing to form reflectorized material film, can be metal material;
By composition technique, form the figure of the reflector layer 420 of shield bars, and the projection on underlay substrate 100 covers by light shield layer 410 to make the projection of reflector layer 420 on underlay substrate 100.
In the present embodiment, form light shield layer 410 and reflector layer 420 and also can form by a composition technique, on the surface of underlay substrate 100 opposite sides, form successively opaque light screening material film and reflectorized material film; By composition technique, form the light shield layer 410 of shield bars and the figure of reflector layer 420.In addition, in the present embodiment, the order that the surface at underlay substrate 100 is formed to pel array layer 200 and grating layer does not limit.
In the present embodiment, grating layer is produced on to the below of underlay substrate 100, when 3D shows, reflector layer 420 in grating layer can be reflected back backlight by the light not seeing through at grating layer, light guide plate diffuse reflection in backlight again, make irreflexive light can pass through grating layer, thus the brightness that has increased display device.
For liquid crystal indicator, underlay substrate 100 belows also need lower polaroid, and therefore, on the basis of embodiment 1, the array base palte of the present embodiment also comprises and is formed on the polaroid that shield bars deviates from pel array layer one side.As shown in Figure 5, polaroid 300 is formed on the below of reflector layer 420.During making, in embodiment 1, make on process base and below reflector layer 420, directly to form polaroid 300.As long as guarantee, before making polaroid 300, form reflector layer 420.
Certainly, as shown in Figure 6, polaroid 300 also can be formed between the light shield layer 410 and underlay substrate 100 of shield bars, is about to the lower surface that light shield layer 410 is formed directly into polaroid 300, and reflector layer 420 is formed on the lower surface of light shield layer 410.
During making, comprise step:
The surface of underlay substrate 100 1 sides (being upper surface in figure) forms pel array layer 200;
On the surface of underlay substrate 100 opposite sides (being lower surface in figure), form polaroid 300;
Lower surface at polaroid 300 forms opaque light screening material film, can be black resin material;
By composition technique, form the figure of the light shield layer 410 of shield bars;
Forming reflectorized material film, can be metal material;
By composition technique, form the figure of the reflector layer 420 of shield bars, and the projection on underlay substrate 100 covers by light shield layer 410 to make the projection of reflector layer 420 on underlay substrate 100.
In the present embodiment, form light shield layer 410 and reflector layer 420 and also can form by a composition technique, the lower surface at polaroid 300 forms opaque light screening material film and reflectorized material film successively; By composition technique, form the light shield layer 410 of shield bars and the figure of reflector layer 420.In addition, in the present embodiment, the surface formation pel array layer 200 at underlay substrate 100 and the order of grating layer are not limited.
The present embodiment has similar beneficial effect with embodiment 1, repeats no more herein.
The array base palte of the present embodiment as shown in Figure 7, the transparency carrier of underlay substrate 100(glass substrate or quartz material) and be positioned at the pel array layer 200 of underlay substrate 100 tops comprise:, also comprise: the grating layer being formed by some shield bars 400 ＇ that are separated with preset distance that is positioned at underlay substrate 100 belows.
In the present embodiment, shield bars 400 ＇ are made by reflectorized material.Preferably, shield bars 400 ＇ are formed directly into the lower surface of underlay substrate 100, can need grating substrate like this, increased the transmitance of light.While directly forming, adopt composition technique (generally including the techniques such as photoresist coating, exposure, development, etching, photoresist lift off) that shield bars 400 ＇ are formed on to underlay substrate 100 lower surfaces, with respect to attaching process, improved the aligning accuracy of sub-pix in grating layer and pel array layer 200.
The step of making this array base palte comprises: on the surface of underlay substrate 100 1 sides, form pel array layer 200, form the figure of the grating layer being arranged in by some the shield bars that are separated with preset distance at described underlay substrate opposite side.Specifically comprise:
The surface of underlay substrate 100 1 sides (being upper surface in figure) forms pel array layer 200;
On the surface of underlay substrate 100 opposite sides (being lower surface in figure), form reflectorized material film, this material can be metal material;
By composition technique, form the figure of shield bars 400 ＇;
In the present embodiment, the order that the surface at underlay substrate 100 is formed to pel array layer 200 and grating layer does not limit.
In the present embodiment, directly with reflectorized material, make shield bars 400 ＇, not only reached the beneficial effect of the raising display device brightness of embodiment 1, and relative embodiment 1, saved manufacture craft, reduced cost.
For liquid crystal indicator, underlay substrate 100 belows also need lower polaroid, and therefore, on the basis of embodiment 3, the array base palte of the present embodiment also comprises and is formed on the polaroid that shield bars 400 ＇ deviate from pel array layer one side.As shown in Figure 8, polaroid 300 is formed on the below of shield bars 400 ＇.During making, in embodiment 3, make on process base and below shield bars 400 ＇, directly to form polaroid 300.As long as guarantee, before making polaroid 300, form shield bars 400 ＇.
Certainly, as shown in Figure 9, polaroid 300 also can be formed between shield bars 400 ＇ and underlay substrate 100, is about to the lower surface that shield bars 400 ＇ are formed directly into polaroid 300.
During making, comprise step:
The surface of underlay substrate 100 1 sides (being upper surface in figure) forms pel array layer 200;
On the surface of underlay substrate 100 opposite sides (being lower surface in figure), form polaroid 300;
Lower surface at polaroid 300 forms reflectorized material film, can be metal material;
By composition technique, form the figure of shield bars 400 ＇.
In the present embodiment, the surface formation pel array layer 200 at underlay substrate 100 and the order of grating layer are not limited.
The present embodiment has similar beneficial effect with embodiment 3, repeats no more herein.
The transparency carrier of underlay substrate 100(glass substrate or quartz material) and be positioned at the pel array layer 200 of underlay substrate 100 tops the array base palte of the present embodiment as shown in figure 10, comprising:.Also comprise: the grating layer being formed by some shield bars 400 ＇ that are separated with preset distance between underlay substrate 100 and pel array layer 200.In the present embodiment, pel array layer 200 comprises each layer (comprising: grid, gate insulation layer, active layer, source-drain layer), pixel electrode layer, passivation layer and the oriented layer etc. of the thin film transistor (TFT) forming on underlay substrate 100.
In the present embodiment, shield bars 400 ＇ are made by reflectorized material.Preferably, shield bars 400 ＇ are formed directly into the upper surface of underlay substrate 100.While directly forming, adopt composition technique (generally including the techniques such as photoresist coating, exposure, development, etching, photoresist lift off) that shield bars 400 ＇ are formed on to underlay substrate 100 upper surfaces, with respect to attaching process, improved the aligning accuracy of sub-pix in grating layer and pel array layer 200.
As shown in Figure 11 and following formula (1)～(4), in order to keep the distance h of grating layer and color membrane substrates to make beholder see picture clearly in suitable viewing distance s, between going back between shield bars 400 ＇ of grating layer and pel array layer 200, be separated with dottle pin layer 900, to increase h.From formula (3), the number of pixels that per inch has on array base palte (Pixels per inch, while PPI) reaching enough large (as: more than 2000), be that Subp diminishes, the thickness that also can not need especially to increase dottle pin layer or increase gate insulation layer passivation layer in pel array layer 200 also can be seen picture clearly in suitable viewing distance.
Wherein, P is pitch, and Subp is sub-pix size, and l is interpupillary distance, h be grating from the distance of color membrane substrates, s is viewing distance.
The step of making this array base palte comprises:
In underlay substrate 100 1 sides, form the figure of the grating layer being arranged in by some shield bars 400 ＇ that are separated with preset distance.Specifically comprise:
On the surface of underlay substrate 100 1 sides (being upper surface in figure), form reflectorized material film, this material can be metal material;
By composition technique, form the figure of shield bars 400 ＇.
A side at grating layer away from substrate substrate 100 forms pel array layer 200.
Certainly can also before forming pel array layer 200, on grating layer, form dottle pin layer 900.
In the present embodiment, grating layer is produced between underlay substrate 100 and pixel electrode layer 200, when 3D shows, shield bars 400 ＇ in grating layer can be reflected back backlight by the light not seeing through at grating layer, light guide plate diffuse reflection in backlight again, make irreflexive light can pass through grating layer, thus the brightness that has increased display device.
The transparency carrier of underlay substrate 100(glass substrate or quartz material) and be positioned at the pel array layer of underlay substrate 100 tops the array base palte of the present embodiment as shown in figure 12, comprising:.In the present embodiment, pel array layer comprises each layer (comprising: grid, gate insulation layer, active layer, source-drain layer), pixel electrode layer 201, passivation layer and the oriented layer 202 etc. of the thin film transistor (TFT) forming on underlay substrate 100.Also comprise: the grating layer being formed by some shield bars 400 ＇ that are separated with preset distance between pixel electrode layer 201 and oriented layer 202.
In the present embodiment, shield bars 400 ＇ are made by reflectorized material.Preferably, shield bars 400 ＇ are directly produced on to the top of pixel electrode layer 201.While directly forming, adopt composition technique (generally including the techniques such as photoresist coating, exposure, development, etching, photoresist lift off) shield bars 400 ＇ to be formed on to the top of pixel electrode layer 201, with respect to attaching process, improved the aligning accuracy of grating layer and pel array layer.
In order to keep the distance of grating layer and color membrane substrates to make beholder see picture clearly in suitable viewing distance, between going back between shield bars 400 ＇ of grating layer and oriented layer 202, be separated with dottle pin layer 900.Identical with principle in embodiment 3, when the number of pixels that per inch has on array base palte (Pixels per inch, PPI) reaches enough large, in the situation that not needing dottle pin layer 900, also can in suitable viewing distance, see picture clearly.
The step of making this array base palte comprises:
The figure of the pixel electrode layer 201 in a side formation pel array layer of underlay substrate 100.
In a side of pixel electrode layer 201 away from substrate substrates 100, form the figure of the grating layer showing for 3D being arranged in by some the shield bars that are separated with preset distance.Specifically comprise:
On the surface of pixel electrode layer 201 1 sides (being top in figure), form reflectorized material film, this material can be metal material;
By composition technique, form the figure of shield bars 400 ＇.
A side (grating layer top) at grating layer away from substrate substrate 100 forms oriented layer 202.
Certainly can also before forming grating layer, on pixel electrode layer 201, form dottle pin layer 900.
In the present embodiment, grating layer is produced between the pixel electrode layer 201 and oriented layer 202 of pel array layer, when 3D shows, shield bars 400 ＇ in grating layer can be reflected back backlight by the light not seeing through at grating layer, light guide plate diffuse reflection in backlight again, make irreflexive light can pass through grating layer, thus the brightness that has increased display device.
The present embodiment provides a kind of 3D display device, comprises that above-described embodiment 1～embodiment 6 is at the array base palte described in any one.As shown in figure 13, it is the 3D display device that comprises a kind of array base palte in embodiment 2, array base palte below is backlight 700, and top is to be also provided with polaroid 600 on color membrane substrates 500(color membrane substrates 500), between array base palte and color membrane substrates 600, be liquid crystal layer 800.
This 3D display device can be: any product or parts with Presentation Function such as liquid crystal panel, mobile phone, panel computer, televisor, display, notebook computer, digital album (digital photo frame), navigating instrument.
The above is only preferred implementation of the present utility model; should be understood that; for those skilled in the art; do not departing under the prerequisite of the utility model know-why; can also make some improvement and replacement, these improvement and replacement also should be considered as protection domain of the present utility model.
Claims (8)
1. an array base palte, comprise: underlay substrate and be positioned at the pel array layer on described underlay substrate, it is characterized in that, also comprise: the grating layer showing for 3D being formed by some the shield bars that are separated with preset distance, described grating layer is positioned at described pel array layer and deviates from described underlay substrate one side, or described grating layer is positioned at described underlay substrate towards described pel array one side, or described grating layer is positioned at described underlay substrate and deviates from described pel array one side, described shield bars is for by by the light reflection of pel array layer described in described underlay substrate directive.
2. array base palte as claimed in claim 1, it is characterized in that, described pel array layer comprises pixel electrode layer and is positioned at the oriented layer that described pixel electrode layer deviates from described underlay substrate one side, and described grating layer is positioned at described pel array layer to deviate from described underlay substrate one side and be specially: described grating layer is between described pixel electrode layer and oriented layer.
3. array base palte as claimed in claim 1, it is characterized in that, described grating layer is positioned at described underlay substrate and deviates from described pel array layer one side, described shield bars comprises: light shield layer and reflector layer, described light shield layer between underlay substrate and described reflector layer, and the projection of described reflector layer on described underlay substrate by described light shield layer, the projection on described underlay substrate covers.
4. array base palte as claimed in claim 1, is characterized in that, described shield bars is made by reflectorized material.
5. the array base palte as described in any one in claim 1～4, is characterized in that, also comprises: be positioned at the polaroid that described shield bars deviates from described pel array layer one side.
6. array base palte as claimed in claim 1, it is characterized in that, also comprise: be positioned at the polaroid that described underlay substrate deviates from described pel array layer one side, described grating layer is positioned at described underlay substrate to deviate from described pel array layer one side and be specially: described grating layer is positioned at the side that described polaroid deviates from described pel array layer.
7. array base palte as claimed in claim 6, it is characterized in that, described shield bars comprises: light shield layer and reflector layer, described light shield layer between described polaroid and described reflector layer, and the projection of described reflector layer on described underlay substrate by described light shield layer, the projection on described underlay substrate covers.
8. a 3D display device, is characterized in that, comprises the array base palte as described in any one in claim 1～7.
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| CN201320541851.8U CN203433236U (en) | 2013-09-02 | 2013-09-02 | Array substrate and 3D display device |
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| CN201320541851.8U CN203433236U (en) | 2013-09-02 | 2013-09-02 | Array substrate and 3D display device |
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| CN103454807A (en) * | 2013-09-02 | 2013-12-18 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof and 3D (three-dimensional) display device |
| CN104656306A (en) * | 2015-03-23 | 2015-05-27 | 京东方科技集团股份有限公司 | Substrate provided with black matrix, manufacturing method of substrate and display device |
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| CN108957830A (en) * | 2018-07-06 | 2018-12-07 | 京东方科技集团股份有限公司 | The control method of display device and display device, display equipment |
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