CN203393225U - Chemical vapor deposition furnace - Google Patents
Chemical vapor deposition furnace Download PDFInfo
- Publication number
- CN203393225U CN203393225U CN201320444384.7U CN201320444384U CN203393225U CN 203393225 U CN203393225 U CN 203393225U CN 201320444384 U CN201320444384 U CN 201320444384U CN 203393225 U CN203393225 U CN 203393225U
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- CN
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- Prior art keywords
- vapor deposition
- chemical vapor
- heater
- furnace
- bell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 53
- 230000007246 mechanism Effects 0.000 claims abstract description 51
- 238000001816 cooling Methods 0.000 claims abstract description 21
- 238000009413 insulation Methods 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 7
- 230000033001 locomotion Effects 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims description 2
- 238000005096 rolling process Methods 0.000 claims description 2
- 230000000630 rising effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 4
- 239000013049 sediment Substances 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320444384.7U CN203393225U (en) | 2013-07-24 | 2013-07-24 | Chemical vapor deposition furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320444384.7U CN203393225U (en) | 2013-07-24 | 2013-07-24 | Chemical vapor deposition furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
CN203393225U true CN203393225U (en) | 2014-01-15 |
Family
ID=49904771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201320444384.7U Expired - Lifetime CN203393225U (en) | 2013-07-24 | 2013-07-24 | Chemical vapor deposition furnace |
Country Status (1)
Country | Link |
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CN (1) | CN203393225U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104342631A (en) * | 2013-07-24 | 2015-02-11 | 广东先导稀材股份有限公司 | Chemical vapor deposition furnace |
CN115010134A (en) * | 2022-06-21 | 2022-09-06 | 浙江六方碳素科技有限公司 | Device for preparing silicon carbide sponge by chemical vapor deposition |
-
2013
- 2013-07-24 CN CN201320444384.7U patent/CN203393225U/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104342631A (en) * | 2013-07-24 | 2015-02-11 | 广东先导稀材股份有限公司 | Chemical vapor deposition furnace |
CN104342631B (en) * | 2013-07-24 | 2016-12-07 | 广东先导稀材股份有限公司 | Chemical vapor deposition stove |
CN115010134A (en) * | 2022-06-21 | 2022-09-06 | 浙江六方碳素科技有限公司 | Device for preparing silicon carbide sponge by chemical vapor deposition |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20181122 Address after: 511500 Tellurium Chemical Workshop of Guangdong Pioneer Rare Materials Co., Ltd., Heyun Town, Qingxin District, Qingyuan City, Guangdong Province Patentee after: Guangdong Pioneer Precious Metals Material Co.,Ltd. Address before: 511500 Industrial Zone, wo Yun town, Qingxin County, Qingyuan, Guangdong (beside the fish dam road) Patentee before: FIRST RARE MATERIALS Co.,Ltd. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20200525 Address after: 239000 east of yongyang Road, west of Nanjing Road, north of Anqing road and south of Lu'an road in Langya Economic Development Zone, Langya District, Chuzhou City, Anhui Province Patentee after: Anhui Guangzhi Technology Co.,Ltd. Address before: 511500 Tellurium Chemical Workshop of Guangdong Pioneer Rare Materials Co., Ltd., Heyun Town, Qingxin District, Qingyuan City, Guangdong Province Patentee before: Guangdong Pioneer Precious Metals Material Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: FIRST SEMICONDUCTOR MATERIALS Co.,Ltd. Assignor: Anhui Guangzhi Technology Co.,Ltd. Contract record no.: X2020990000453 Denomination of utility model: Chemical vapor deposition furnace Granted publication date: 20140115 License type: Common License Record date: 20200826 |
|
EE01 | Entry into force of recordation of patent licensing contract | ||
EC01 | Cancellation of recordation of patent licensing contract |
Assignee: FIRST SEMICONDUCTOR MATERIALS Co.,Ltd. Assignor: Anhui Guangzhi Technology Co.,Ltd. Contract record no.: X2020990000453 Date of cancellation: 20220413 |
|
EC01 | Cancellation of recordation of patent licensing contract | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: FIRST SEMICONDUCTOR MATERIALS Co.,Ltd. Assignor: Anhui Guangzhi Technology Co.,Ltd. Contract record no.: X2022980005544 Denomination of utility model: Chemical vapor deposition furnace Granted publication date: 20140115 License type: Common License Record date: 20220520 |
|
EE01 | Entry into force of recordation of patent licensing contract | ||
EC01 | Cancellation of recordation of patent licensing contract |
Assignee: FIRST SEMICONDUCTOR MATERIALS Co.,Ltd. Assignor: Anhui Guangzhi Technology Co.,Ltd. Contract record no.: X2022980005544 Date of cancellation: 20230103 |
|
EC01 | Cancellation of recordation of patent licensing contract | ||
CX01 | Expiry of patent term |
Granted publication date: 20140115 |
|
CX01 | Expiry of patent term |