CN203375799U - Vertical type low-temperature cabinet capable of preventing cooling capacity from leaking - Google Patents
Vertical type low-temperature cabinet capable of preventing cooling capacity from leaking Download PDFInfo
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- CN203375799U CN203375799U CN201320283770.2U CN201320283770U CN203375799U CN 203375799 U CN203375799 U CN 203375799U CN 201320283770 U CN201320283770 U CN 201320283770U CN 203375799 U CN203375799 U CN 203375799U
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- extruding part
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- sealing strip
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- cold
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201320283770.2U CN203375799U (en) | 2013-05-22 | 2013-05-22 | Vertical type low-temperature cabinet capable of preventing cooling capacity from leaking |
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CN201320283770.2U CN203375799U (en) | 2013-05-22 | 2013-05-22 | Vertical type low-temperature cabinet capable of preventing cooling capacity from leaking |
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CN203375799U true CN203375799U (en) | 2014-01-01 |
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CN201320283770.2U Expired - Lifetime CN203375799U (en) | 2013-05-22 | 2013-05-22 | Vertical type low-temperature cabinet capable of preventing cooling capacity from leaking |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115537511A (en) * | 2022-10-22 | 2022-12-30 | 海安华诚新材料有限公司 | High-efficiency low-energy-consumption oriented silicon steel plate decarburization annealing device |
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2013
- 2013-05-22 CN CN201320283770.2U patent/CN203375799U/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115537511A (en) * | 2022-10-22 | 2022-12-30 | 海安华诚新材料有限公司 | High-efficiency low-energy-consumption oriented silicon steel plate decarburization annealing device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 266102 Haier Industrial Park, 1 Haier Road, Laoshan District, Qingdao, Shandong. Co-patentee after: QINGDAO HAIER BIOMEDICAL Co.,Ltd. Patentee after: HAIER Group Corp. Address before: 266102 Haier Industrial Park, 1 Haier Road, Laoshan District, Qingdao, Shandong. Co-patentee before: HAIER MEDICAL AND LABORATORY PRODUCTS Co.,Ltd. Patentee before: HAIER Group Corp. |
|
CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190125 Address after: 266555 Haier Industrial Park, Qingdao Economic Development Zone, Shandong Province Patentee after: QINGDAO HAIER BIOMEDICAL Co.,Ltd. Address before: 266102 Haier Industrial Park, 1 Haier Road, Laoshan District, Qingdao, Shandong. Co-patentee before: QINGDAO HAIER BIOMEDICAL Co.,Ltd. Patentee before: HAIER Group Corp. |
|
TR01 | Transfer of patent right | ||
CX01 | Expiry of patent term |
Granted publication date: 20140101 |
|
CX01 | Expiry of patent term |