CN203373270U - Protection mechanism in glass etching device - Google Patents
Protection mechanism in glass etching device Download PDFInfo
- Publication number
- CN203373270U CN203373270U CN201320441833.2U CN201320441833U CN203373270U CN 203373270 U CN203373270 U CN 203373270U CN 201320441833 U CN201320441833 U CN 201320441833U CN 203373270 U CN203373270 U CN 203373270U
- Authority
- CN
- China
- Prior art keywords
- glass
- protection mechanism
- etching device
- type circle
- glass etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model relates to a protection mechanism in a glass etching device. The protection mechanism comprises an isolation rod and an O-shaped ring arranged on the isolation rod, wherein two thimbles inclining upwards are symmetrically arranged on the surface of the O-shaped ring. The protection mechanism provided by the utility model is suitable for glass etching.
Description
Technical field
The utility model relates to the protection mechanism field in the glass etching device, refers to especially the protection mechanism in a kind of glass etching device.
Background technology
In glass etching, glass is all neatly to be placed in the glass basket to carry out etching.When the size of glass is larger, glass and glass are easy to collide with each other, and cause glass scratch, after etching, produce bad.Traditional way is to place spacer bar 1 between glass and glass, and the structure of spacer bar 1 as shown in Figure 1, is arranged with an O type circle 2 on spacer bar 1, can avoid like this contacting of glass and glass.But, because the Area comparison of O type circle 2 contact glass is large, with the contact site of glass, easily produce the phenomenon of etching inequality.
The utility model content
Technical problem to be solved in the utility model is: the protection mechanism in a kind of glass etching device that can not make the glass etching inequality is provided.
For addressing the above problem, the technical solution adopted in the utility model is: the protection mechanism in the glass etching device, and comprise spacer bar and be arranged on the O type circle on spacer bar, described O type circle surface is symmetrically arranged with two thimbles obliquely.
As a kind of preferred version, described O type circle adopts the PVC material to make.
The beneficial effects of the utility model are: the protection mechanism in above-mentioned glass etching device, because the outside surface at O type circle has been symmetrical arranged two thimbles obliquely, makes the contact area of glass and O type circle reduce, thereby avoids producing the phenomenon of etching inequality.
The accompanying drawing explanation
Fig. 1 is the structural representation of traditional spacer bar.
Fig. 2 is the structural representation of the protection mechanism in glass etching device described in the utility model.
Fig. 3 is that O type circle described in the utility model obtains structural representation.
In Fig. 1: 1, spacer bar, 2, O type circle.
In Fig. 2 and Fig. 3: 1, spacer bar, 2, O type circle, 3, thimble.
Embodiment
Below by specific embodiment, the protection mechanism in glass etching device described in the utility model is described in further detail.
As shown in Figures 2 and 3, the protection mechanism in the glass etching device comprises spacer bar 1 and is arranged on the O type circle 2 on spacer bar 1 that O type circle 2 surfaces are symmetrically arranged with two thimbles 3 obliquely, and O type circle 2 adopts the PVC material to make.
Before glass etching, described protection mechanism is placed between two blocks of glass, two thimbles 3 are conflicted with glassy phase, because the contact area of glass and O type circle 2 reduces, thereby avoid producing the phenomenon of etching inequality.
The above embodiments are principle and the effect thereof of illustrative the invention only, and the embodiment of part utilization, but not for limiting the utility model; It should be pointed out that for the person of ordinary skill of the art, under the prerequisite that does not break away from the utility model creation design, can also make some distortion and improvement, these all belong to protection domain of the present utility model.
Claims (2)
1. the protection mechanism in the glass etching device, comprise spacer bar and be arranged on the O type circle on spacer bar, and it is characterized in that: described O type circle surface is symmetrically arranged with two thimbles obliquely.
2. the protection mechanism in glass etching device according to claim 1 is characterized in that: described O type circle adopts the PVC material to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320441833.2U CN203373270U (en) | 2013-07-24 | 2013-07-24 | Protection mechanism in glass etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320441833.2U CN203373270U (en) | 2013-07-24 | 2013-07-24 | Protection mechanism in glass etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203373270U true CN203373270U (en) | 2014-01-01 |
Family
ID=49835817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320441833.2U Expired - Lifetime CN203373270U (en) | 2013-07-24 | 2013-07-24 | Protection mechanism in glass etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203373270U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103396003A (en) * | 2013-07-24 | 2013-11-20 | 惠晶显示科技（苏州）有限公司 | Protection mechanism in glass etching device |
-
2013
- 2013-07-24 CN CN201320441833.2U patent/CN203373270U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103396003A (en) * | 2013-07-24 | 2013-11-20 | 惠晶显示科技（苏州）有限公司 | Protection mechanism in glass etching device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140101 |