CN203281549U - Cleaning tank - Google Patents
Cleaning tank Download PDFInfo
- Publication number
- CN203281549U CN203281549U CN2013202597501U CN201320259750U CN203281549U CN 203281549 U CN203281549 U CN 203281549U CN 2013202597501 U CN2013202597501 U CN 2013202597501U CN 201320259750 U CN201320259750 U CN 201320259750U CN 203281549 U CN203281549 U CN 203281549U
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- CN
- China
- Prior art keywords
- rinse bath
- interior
- diapire
- sidewall
- groove lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model provides a cleaning tank which comprises an inner cleaning tank. The inner cleaning tank is provided with a bottom wall and four side walls connected to the bottom wall. The inner cleaning tank further comprises a filtering screen and a tank cover capable of being opened and closed automatically. The tank cover is arranged opposite to the bottom wall and arranged on the side walls. The tank cover, the bottom wall and the side walls form a closed containing space in a surrounding mode. One end, close to the tank cover, of at least one of the side walls is provided with an opening. The opening is covered by the filtering screen. By the adoption of the cleaning tank, fallen pollutants can be effectively prevented from falling into the cleaning tank again and causing secondary pollution to chips, and the occurrence rate of related badness is reduced.
Description
Technical field
The utility model relates to the ic manufacturing technology field, particularly a kind of rinse bath.
Background technology
In the semiconductor integrated circuit manufacture process, wafer in cmp (CMP) board after polishing, continue through a series of cleaning step, remove the pollution of residual lapping liquid, chemical grinding liquid and abrasive particles of in polishing process wafer surface, in order to guarantee the quality in wafer following process manufacture process.Usually, the wafer after CMP is put into a rinse bath, use cleaning fluid to add hyperacoustic cleaning method and will remain in pollutant removal on wafer.
As shown in Figure 1, be used for to clean the rinse bath 100 of the wafer after CMP, comprise outer rinse bath 101 and interior rinse bath 102, described interior rinse bath 102 is positioned in described outer rinse bath 101, and described interior rinse bath 102 and outer rinse bath 101 are upper shed.Wherein, the upper edge hole of outer rinse bath 101 will be provided with whirligig 103 higher than the upper edge hole of interior rinse bath 102 on the sidewall of the bottom of interior rinse bath 102, be provided with ultrasonic vibrator 104 on the diapire of interior rinse bath 102.Fill mobile cleaning fluid in interior rinse bath 102, cleaning fluid upwards flows from the diapire injection of interior rinse bath 102, and after cleaning fluid was full of interior rinse bath 102, cleaning fluid can overflow from the upper edge hole of interior rinse bath 102 and enter in outer rinse bath 101.In interior rinse bath 102, the flow direction of cleaning fluid is for from the bottom up.
in the time will cleaning wafer, to put into wafer on the whirligig 103 of rinse bath 102 from the upper shed of interior rinse bath 102, whirligig 103 can drive wafer and rotate in cleaning fluid, ultrasonic vibrator 104 produces ultrasonic wave in cleaning fluid simultaneously, the pollutant that is attached on wafer is disposed, pollutant after removing can be sneaked in cleaning fluid, because the flow direction of the cleaning fluid in interior rinse bath 102 is from the bottom up, therefore sneaking into the cleaning fluid that the pollutant in cleaning fluid can be flowed takes interior rinse bath 102 out of and enters in outer rinse bath 101, avoided stream wafer to be caused secondary pollution interior rinse bath 102 is interior.But, because the upper edge hole at described interior rinse bath 102 is zigzag, at pollutant during from the interior rinse bath 102 interior outflow of outside rinse bath 101, can be subject to interior 102 stopping of upper edge hole of rinse bath and attached thereto, after being attached to the pollutant arrival to a certain degree of interior rinse bath 102 upper edge holes, there will be and come off and again fall in interior rinse bath 102, can cause again the secondary pollution to wafer, thereby cause the bad of wafer.
The utility model content
The purpose of this utility model is to provide a kind of rinse bath, with the pollutant of the interior rinse bath that the solves rinse bath of the prior art rear problem that wafer is caused secondary pollution that drops, reduce therefore to wafer cause relevant bad, thereby reach the purpose of raising yield.
For solving the problems of the technologies described above, the utility model provides a kind of rinse bath, comprises an interior rinse bath, and described interior rinse bath has a diapire and is connected in four sidewalls on described diapire, and described interior rinse bath also comprises:
One screen pack; And
The groove lid of one automatic switch, described groove lid is oppositely arranged and is positioned on described sidewall with described diapire, and described groove lid and described diapire and sidewall surround the spatial accommodation of a sealing;
Wherein, at least one described sidewall is provided with an opening on the end near the groove lid, and described opening is covered by described screen pack.
Optionally, the material of described screen pack is acrylic resin.
Optionally, described screen pack comprises inner filter screen and the outer filter that weaves successively to groove from groove, and described inner filter screen is formed by the inner fiber braiding, and described outer filter is formed by the outer layer fiber braiding.
Optionally, the wire diameter of described inner fiber is greater than the wire diameter of described outer layer fiber.
Optionally, the count of described inner fiber is higher than the count of described outer layer fiber.
Optionally, each described sidewall is provided with described opening on the end near the groove lid, and a plurality of described openings are connected to form a closed-loop.
Optionally, described interior rinse bath also comprises a control cylinder, and described control cylinder is connected with described groove lid.
Optionally, described rinse bath also comprises an outer rinse bath, and described outer rinse bath comprises a uncovered cell body, and described interior rinse bath is arranged in described outer rinse bath.
Optionally, described interior rinse bath also comprises:
Be arranged at the ultrasonic vibrator on described diapire; And
Be arranged at the whirligig on described sidewall.
Optionally, be provided with inlet on the diapire of described interior rinse bath, the described sidewall of described interior rinse bath is provided with liquid outlet.
Rinse bath provided by the utility model, comprise an interior rinse bath, and described interior rinse bath has a diapire and is connected in a plurality of sidewalls on described diapire, and described interior rinse bath also comprises: a screen pack; And the groove lid of an automatic switch, described groove lid is oppositely arranged and is positioned on described sidewall with described diapire, and described groove lid and described diapire and sidewall surround the spatial accommodation of a sealing; Wherein, at least one described sidewall is provided with an opening on the end near the groove lid, and described opening is covered by described screen pack.Because described sidewall is provided with opening on the end near the groove lid, and described opening is covered by described screen pack, therefore in described groove lid surrounds the spatial accommodation of a sealing with described diapire and sidewall, cleaning fluid can only be from excessive outside interior rinse bath by screen pack ability, pollutant in cleaning fluid will be filtered net and holds back and be adsorbed on screen pack like this, avoided pollutant to come off again falling into rinse bath and caused secondary pollution to wafer, having reduced the incidence of relevant defect therewith.
Description of drawings
Fig. 1 is the structural representation of rinse bath in prior art;
Fig. 2 is the structural representation of the rinse bath of the utility model one embodiment;
Fig. 3 is the structural representation of interior rinse bath of the rinse bath of the utility model one embodiment.
The specific embodiment
Below in conjunction with the drawings and specific embodiments, the rinse bath that the utility model proposes is described in further detail.According to the following describes and claims, advantage of the present utility model and feature will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of aid illustration the utility model embodiment lucidly.
As shown in Figure 2, the rinse bath 200 of the utility model one embodiment comprises an interior rinse bath 201 and an outer rinse bath 202, and described outer rinse bath 202 comprises a uncovered cell body, and described interior rinse bath 201 is arranged at described outer rinse bath interior 202.
As shown in Figure 3, interior rinse bath 201 shown in comprises a diapire 2011, is connected in the groove lid 2014 of four sidewalls 2012, a screen pack 2013 and an automatic switch on described diapire 2011.Wherein, described groove lid 2014 is oppositely arranged with described diapire 2011, and is placed on described sidewall 2012, and described groove lid 2014 surrounds a spatial accommodation that seals with described diapire 2011 and sidewall 2012, is used for holding cleaning fluid.At least one described sidewall 2012 is provided with an opening 2015 on the end near groove lid 2014, described opening 2015 is covered by described screen pack 2013.Preferably, each described sidewall 2012 is provided with described opening 2015 on the end near groove lid 2014, and a plurality of described openings 2015 are connected to form a closed-loop.
Continuation is with reference to figure 3, and described interior rinse bath 201 also comprises a control cylinder 2016, and described control cylinder 2016 is connected with described groove lid 2014, is used for controlling the switch of described groove lid 2014.Also be provided with ultrasonic vibrator 2017 on the diapire 2011 of described interior rinse bath 201, the cleaning fluid that is used in interior rinse bath 201 produces the ultrasonic cleaning ripple; Also be provided with whirligig 2018 on the sidewall 2012 of described interior rinse bath 201, be used for carrying wafer 300 to be washed, and drive wafer 300 rotations to be washed, to strengthen cleaning performance.When having wafer to be measured to clean, described control cylinder 2016 is controlled described groove lid 2014 and is opened, manipulator is put into wafer to be measured on whirligig 2018, described control cylinder 2016 is controlled described groove lid 2014 and is closed, after complete etc. wafer cleaning to be measured, described control cylinder 2016 is controlled described groove lid 2014 and is opened, and manipulator takes out wafer again.
Continuation is with reference to figure 2, be provided with the feed tube 2019 of cleaning fluid on the diapire 2011 of interior rinse bath 201, in the cleaning process to wafer to be measured, feed tube 2019 continues to the interior injection cleaning fluid of described interior rinse bath 201, and covers an end of 2014 at close the groove of a sidewall 2012 and be provided with the drain pipe 2020 of cleaning fluid.As seen, flow direction at interior rinse bath 201 cleaning liquid insides is from the bottom up, therefore the flow direction that also can follow cleaning fluid of the pollutant in cleaning fluid moves from the bottom up, when groove lid 2014 is closed, the cleaning fluid screen pack 2013 on opening 2015 of must flowing through, the pollutant in cleaning fluid when flowing through screen pack 2013, can be filtered net 2013 and adsorb, avoided the pollutant in the cleaning fluid to return in cleaning fluid, and wafer has been caused secondary pollution.
In order to improve the absorption property of screen pack, the material selection of described screen pack has the polyacrylic resin material of stronger adsorption capacity and outstanding chemical compatibility.Preferably, described screen pack comprises inner filter screen and the outer filter that weaves successively to groove from groove, described inner filter screen is formed by the inner fiber braiding, described outer filter is formed by the outer layer fiber braiding, the wire diameter of described inner fiber is greater than the wire diameter of described outer layer fiber, the count of described inner fiber, higher than the count of described outer layer fiber, forms by the screen pack with three-dimensional filter effect that has gradient in groove to groove with this.
In sum, addition has an opening on an end of the close groove lid of the sidewall of interior rinse bath, and with the described opening of screen pack, when cleaning fluid excessive outside interior rinse bath the time from screen pack, pollutant in cleaning fluid will be filtered net and hold back and be adsorbed on screen pack, avoided pollutant to come off again falling into rinse bath and caused secondary pollution to wafer, having reduced the incidence of relevant defect therewith.
Foregoing description is only the description to the utility model preferred embodiment; it is not any restriction to the utility model scope; any change, modification that the those of ordinary skill in the utility model field is done according to above-mentioned disclosure, all belong to the protection domain of claims.
Claims (10)
1. a rinse bath, comprise an interior rinse bath, and described interior rinse bath has a diapire and is connected in four sidewalls on described diapire, it is characterized in that, described interior rinse bath also comprises:
One screen pack; And
The groove lid of one automatic switch, described groove lid is oppositely arranged and is positioned on described sidewall with described diapire, and described groove lid and described diapire and sidewall surround the spatial accommodation of a sealing;
Wherein, at least one described sidewall is provided with an opening on the end near the groove lid, and described opening is covered by described screen pack.
2. rinse bath as claimed in claim 1, is characterized in that, the material of described screen pack is acrylic resin.
3. rinse bath as claimed in claim 2, is characterized in that, described screen pack comprise from groove to groove inner filter screen and the outer filter of braiding successively, described inner filter screen is formed by the inner fiber braiding, described outer filter is formed by the outer layer fiber braiding.
4. rinse bath as claimed in claim 3, is characterized in that, the wire diameter of described inner fiber is greater than the wire diameter of described outer layer fiber.
5., as rinse bath as described in claim 3 or 4, it is characterized in that, the count of described inner fiber is higher than the count of described outer layer fiber.
6. rinse bath as claimed in claim 1, is characterized in that, each described sidewall is provided with described opening on the end near the groove lid, and a plurality of described openings are connected to form a closed-loop.
7. rinse bath as claimed in claim 1, is characterized in that, described interior rinse bath also comprises a control cylinder, and described control cylinder is connected with described groove lid.
8. rinse bath as claimed in claim 1, is characterized in that, also comprise an outer rinse bath, described outer rinse bath comprises a uncovered cell body, and described interior rinse bath is arranged in described outer rinse bath.
9. rinse bath as claimed in claim 8, is characterized in that, described interior rinse bath also comprises:
Be arranged at the ultrasonic vibrator on described diapire; And
Be arranged at the whirligig on described sidewall.
10. rinse bath as claimed in claim 9, is characterized in that, the diapire of described interior rinse bath is provided with inlet, and the described sidewall of described interior rinse bath is provided with liquid outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013202597501U CN203281549U (en) | 2013-05-14 | 2013-05-14 | Cleaning tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013202597501U CN203281549U (en) | 2013-05-14 | 2013-05-14 | Cleaning tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203281549U true CN203281549U (en) | 2013-11-13 |
Family
ID=49537923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013202597501U Expired - Fee Related CN203281549U (en) | 2013-05-14 | 2013-05-14 | Cleaning tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203281549U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104289470A (en) * | 2014-09-30 | 2015-01-21 | 张家港市圣美隆羊绒制品有限公司 | Sweeper type ultrasonic cleaner for spinning spindle |
| CN104289471A (en) * | 2014-09-30 | 2015-01-21 | 张家港市圣美隆羊绒制品有限公司 | Impeller type ultrasonic cleaner for textile spindles |
-
2013
- 2013-05-14 CN CN2013202597501U patent/CN203281549U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104289470A (en) * | 2014-09-30 | 2015-01-21 | 张家港市圣美隆羊绒制品有限公司 | Sweeper type ultrasonic cleaner for spinning spindle |
| CN104289471A (en) * | 2014-09-30 | 2015-01-21 | 张家港市圣美隆羊绒制品有限公司 | Impeller type ultrasonic cleaner for textile spindles |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131113 Termination date: 20190514 |