CN203243506U - 一种基于双麦克的语音混响消减装置 - Google Patents
一种基于双麦克的语音混响消减装置 Download PDFInfo
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- CN203243506U CN203243506U CN 201220683959 CN201220683959U CN203243506U CN 203243506 U CN203243506 U CN 203243506U CN 201220683959 CN201220683959 CN 201220683959 CN 201220683959 U CN201220683959 U CN 201220683959U CN 203243506 U CN203243506 U CN 203243506U
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103067821A (zh) * | 2012-12-12 | 2013-04-24 | 歌尔声学股份有限公司 | 一种基于双麦克的语音混响消减方法和装置 |
CN106842237A (zh) * | 2017-01-18 | 2017-06-13 | 南京理工大学 | 快速任意形状方向图主瓣保形自适应波束形成方法 |
CN112740324A (zh) * | 2018-09-18 | 2021-04-30 | 华为技术有限公司 | 用于使虚拟3d音频适应现实房间的设备和方法 |
CN113823315A (zh) * | 2021-09-30 | 2021-12-21 | 深圳万兴软件有限公司 | 降风噪方法、装置、双麦克风设备及存储介质 |
CN116033314A (zh) * | 2023-02-15 | 2023-04-28 | 南昌航天广信科技有限责任公司 | 一种音频自动增益补偿方法、系统、计算机及存储介质 |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103067821A (zh) * | 2012-12-12 | 2013-04-24 | 歌尔声学股份有限公司 | 一种基于双麦克的语音混响消减方法和装置 |
WO2014089914A1 (zh) * | 2012-12-12 | 2014-06-19 | 歌尔声学股份有限公司 | 一种基于双麦克的语音混响消减方法和装置 |
CN103067821B (zh) * | 2012-12-12 | 2015-03-11 | 歌尔声学股份有限公司 | 一种基于双麦克的语音混响消减方法和装置 |
CN106842237A (zh) * | 2017-01-18 | 2017-06-13 | 南京理工大学 | 快速任意形状方向图主瓣保形自适应波束形成方法 |
CN112740324A (zh) * | 2018-09-18 | 2021-04-30 | 华为技术有限公司 | 用于使虚拟3d音频适应现实房间的设备和方法 |
CN113823315A (zh) * | 2021-09-30 | 2021-12-21 | 深圳万兴软件有限公司 | 降风噪方法、装置、双麦克风设备及存储介质 |
CN113823315B (zh) * | 2021-09-30 | 2024-02-13 | 深圳万兴软件有限公司 | 降风噪方法、装置、双麦克风设备及存储介质 |
CN116033314A (zh) * | 2023-02-15 | 2023-04-28 | 南昌航天广信科技有限责任公司 | 一种音频自动增益补偿方法、系统、计算机及存储介质 |
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Address after: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee after: Goertek Inc. Address before: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee before: Goertek Inc. |
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Effective date of registration: 20200803 Address after: 266104 room 103, 396 Songling Road, Laoshan District, Qingdao, Shandong Province Patentee after: Goer Microelectronics Co.,Ltd. Address before: 261031 Dongfang Road, Weifang high tech Industrial Development Zone, Shandong, China, No. 268 Patentee before: GOERTEK Inc. |
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Granted publication date: 20131016 |