CN203030396U - Device and system for purifying gases - Google Patents

Device and system for purifying gases Download PDF

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Publication number
CN203030396U
CN203030396U CN2012207420077U CN201220742007U CN203030396U CN 203030396 U CN203030396 U CN 203030396U CN 2012207420077 U CN2012207420077 U CN 2012207420077U CN 201220742007 U CN201220742007 U CN 201220742007U CN 203030396 U CN203030396 U CN 203030396U
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utmost point
collector
ionization
repeller
ionization utmost
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章燕
冉宏宇
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Suzhou Bei'ang Technology Co Ltd
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Suzhou Bei'ang Technology Co Ltd
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Priority to PCT/CN2013/086897 priority patent/WO2014101576A1/en
Priority to US14/411,437 priority patent/US20150174587A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/02Plant or installations having external electricity supply
    • B03C3/04Plant or installations having external electricity supply dry type
    • B03C3/08Plant or installations having external electricity supply dry type characterised by presence of stationary flat electrodes arranged with their flat surfaces parallel to the gas stream
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34Constructional details or accessories or operation thereof
    • B03C3/40Electrode constructions
    • B03C3/41Ionising-electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34Constructional details or accessories or operation thereof
    • B03C3/40Electrode constructions
    • B03C3/45Collecting-electrodes
    • B03C3/47Collecting-electrodes flat, e.g. plates, discs, gratings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C2201/00Details of magnetic or electrostatic separation
    • B03C2201/06Ionising electrode being a needle
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C2201/00Details of magnetic or electrostatic separation
    • B03C2201/14Details of magnetic or electrostatic separation the gas being moved electro-kinetically

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Abstract

The utility model provides a device and a system for purifying gases. The device comprises a gas purification unit which comprises at least one ionization electrode, at least one repulsion electrode and at least one collector. The at least one repulsion electrode is provided with potential identical in direction with potential of the at least one collector, and the at least one collector is provided with zero potential or potential opposite in direction with the potential of the at least one ionization electrode. The at least one repulsion electrode is used for pushing electrified gas particles ionized by the at least one ionization electrode to the at least one collector. According to the device and the system for purifying gases, electrified gas particles are pushed to the collectors through the repulsion electrodes with the potential identical with the potential of the ionization electrodes in direction, so that a part of the electrified gas particles with original moving directions deviated from the collectors are pushed to the collector to be absorbed. By means of a tri-electrode structure, the adsorption capacity towards particles of dust is improved, and the gas purification efficiency is further improved.

Description

A kind of gas cleaning plant and system
Technical field
The utility model relates to plasma field, especially relates to a kind of gas cleaning plant and system.
Background technology
Gas purification mainly refers to remove the impurity such as dust in the gas.See also Fig. 1, in the prior art, the device of a kind of gas purification commonly used adopts the structure of two-stage electrode, this structure comprises the collector 102 of the ionization utmost point 101 and ground connection, when this installs when in running order, increase piezoelectricity at the ionization utmost point and make the dust granule and other impurity particle that pass through charged, after this charged dust and other impurity particle are adsorbed by the collector of zero potential or band opposite potential, have finished the gas cleaning process.But, in the course of work of this device, the dust that a part is charged and the direction of motion of other impurity particle can depart from collector or miss in the middle of collector, and flee from the air, can cause the efficient of collector absorption dust and other impurity particle to reduce like this, the cleaning efficiency that is purifier reduces, and makes dust and other impurity particle flee from the air and be deposited on indoor furniture or the floor and continues to pollute.
The utility model content
The technical problem that the utility model solves is to provide a kind of gas cleaning plant and system, can realize improving the adsorption capacity to dust and other impurity particle, further improves gas cleaning efficient.
For this reason, the technical scheme of the utility model technical solution problem is:
The utility model provides a kind of gas cleaning plant, and described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point, at least one repeller and at least one collector;
Wherein, described at least one repeller have with described at least one ionization utmost point the electromotive force of charged gesture equidirectional, described at least one collector have zero potential or with the rightabout electromotive force of described at least one ionization utmost point charged gesture of institute; Described at least one repeller is used for the charged gas particles after described at least one ionization utmost point ionization is pushed to described at least one collector.
Preferably, described gas purification units comprises a collector, at least one ionization utmost point and at least one repeller.
Preferably, described gas purification units comprises a collector, an ionization utmost point and a repeller; Wherein, a described collector, a described repeller and a described ionization utmost point are parallel to each other, a described collector and a described repeller over against.
Preferably, described gas purification units comprise be parallel to each other and over against two collectors, at least one ionization utmost point and at least one repeller, each repeller in described at least one repeller over against and be parallel to each other.
Preferably, described gas purification units comprise be parallel to each other and over against two collectors, an ionization utmost point and a repeller.
Preferably, described gas purification units comprises at least three collectors, at least two ionization utmost points and at least two repellers, described at least three collectors are arranged in the outside of described at least one ionization utmost point with circular arc, and at least two repellers are arranged in parallel between at least three collectors.
Preferably, it is characterized in that described device comprises a plurality of gas purification units, series connection and/or in parallel mutually between described a plurality of gas purification units.
Preferably, arbitrary collector is the projection of circular arc in the face of the one side of the described ionization utmost point in the described collector.
Preferably, the radius of curvature of the projection of described circular arc is at least greater than 20 times of the radius of curvature of the described ionization utmost point.
Preferably, the surface of any repeller in the described repeller has the projection of at least one circular arc.
Preferably, the array be made up of a filament or many filaments of the described ionization utmost point constitutes.
Preferably, the surface of described filament scribbles the oxidation catalyst coating or the low coating of energy is overflowed on the surface, to reduce ozone.
Preferably, an end of the described ionization utmost point is that the surface of tip-like or the described ionization utmost point is zigzag.
Preferably, the described ionization utmost point back to a side of described collector scribble insulating coating or placement have with the described ionization utmost point the conflict utmost point of the identical electromotive force of charged gesture direction.
Preferably, the electric-field intensity of described ionization utmost point generation is greater than 10 5V/m.
Preferably, the very solid or hollow-core construction of described collector and/or described repulsion.
Preferably, the described ionization utmost point, described collector and described repeller are smooth surface.
The utility model also provides a kind of gas purge system, it is characterized in that described gas purge system comprises: supply voltage, at least one detector, control module, measuring circuit, electric arc trigger electrode and as any described gas cleaning plant of claim 1 to 17;
Supply voltage is used for the ionization utmost point, collector and the repeller power supply to described gas cleaning plant;
Described at least one detector is for the air velocity at the ionization utmost point place of measuring described gas cleaning plant and dust concentration and the ozone concentration at environmental index and described gas cleaning plant place;
Described measuring circuit is used for measuring the electric current of the ionization utmost point that flows through described gas cleaning plant;
Described electric arc trigger electrode be used for described at least one detector measurement to environmental index when changing, prior to the ionization utmost point and collector arc discharge;
Described control module is for the electric current of the ionization utmost point that flows through described gas cleaning plant that measures according to measuring circuit, and described at least one detector measurement air velocity, environmental index, dust concentration and the ozone concentration that arrive, control the ionization utmost point of supply voltage in the described gas cleaning plant, the power supply value of collector and repeller.
By technique scheme as can be known, gas cleaning plant in the utility model comprises at least one ionization utmost point, at least one repeller and at least one collector, wherein, collector have zero potential or with the rightabout electromotive force of the charged gesture of ionization utmost point institute, therefore collector can adsorb the charged gas particles of ionization utmost point ionization, and by have with the ionization utmost point the repeller of charged gesture equidirectional electromotive force charged gas particles pushed reclaim collector, the charged gas particles that makes a part of direction of motion originally depart from collector is pushed to be adsorbed to collector, therefore, the utility model has improved adsorption capacity to dust and other impurity particle by three electrode structure, has further improved gas cleaning efficient.
Description of drawings
Fig. 1 is gas cleaning plant of the prior art;
The longitdinal cross-section diagram of the specific embodiment of the gas cleaning plant that Fig. 2 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 3 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 4 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 5 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 6 provides for the utility model;
The longitdinal cross-section diagram of a kind of collector that Fig. 7 provides for the utility model;
The longitdinal cross-section diagram of a kind of repeller that Fig. 8 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 9 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Figure 10 provides for the utility model;
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Figure 11 provides for the utility model.
The specific embodiment
The gas cleaning plant that embodiment of the present utility model provides has adopted three-electrode structure, and the charged gas particles that the direction of motion can be departed from collector pushes and reclaims collector.
The utility model provides a kind of specific embodiment of gas cleaning plant, and among this embodiment, described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point, at least one repeller and at least one collector.Wherein, described at least one repeller have with described at least one ionization utmost point the electromotive force of charged gesture equidirectional, described at least one collector have zero potential or with the rightabout electromotive force of described at least one ionization utmost point charged gesture of institute; Described at least one repeller is used for the charged gas particles after described at least one ionization utmost point ionization is pushed to described at least one collector.Here, each collector, each ionization utmost point and each repeller can be parallel to each other.
By technique scheme as can be known, gas cleaning plant among this embodiment comprises at least one ionization utmost point, at least one repeller and at least one collector, wherein, collector have zero potential or with the rightabout electromotive force of the charged gesture of ionization utmost point institute, therefore collector can adsorb the charged gas particles of ionization utmost point ionization, and by have with the ionization utmost point the repeller of charged gesture equidirectional electromotive force charged gas particles pushed reclaim collector, make a part originally the direction of motion depart from that the charged gas particles of collector is pushed adsorbs to collector, thereby realized improving the adsorption capacity to dust and other impurity particle, further improved gas cleaning efficient.
Here, described gas can be air, and at this moment, gas cleaning plant is used for air is purified.
Here, the gas communication in the gas cleaning plant can be passed through fans drive, and the gas communication direction advanced by the ionization utmost point, by collector, and repeller and bleeder.Perhaps; gas communication in the gas cleaning plant is not by any mechanical displacement means; but obtaining momentum by electric field force acceleration air particles, gas communication produces afterwards; its gas communication direction is consistent with the direction of electric field force effect; entered by ionization extreme direction; by collector, repeller and eluting gas purifier.
Here, the ionization utmost point add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of ionization electrode potential equidirectional, electric potential direction refers to the positive and negative direction of electromotive force.Ionization extremely can be made by in tungsten, carbon tungsten, nitrogen tungsten, molybdenum, stainless steel, nickel metal and nickel metal alloy, thermo-electric metal and thermocouple metal, rare metal and rare metal alloy, refractory metal and the refractory metal alloy one or more.One end of the ionization utmost point can be tip-like, and perhaps the surface of the ionization utmost point is zigzag.In general, the ionization utmost point the easiest realization on technology of tip-like, and jagged ionization utmost point fastness is higher.
Especially, described each ionization extremely can be made of the array that an one metal wire or many filaments are formed, and when the ionization utmost point was made up of many filaments, these many filaments can be parallel to each other.The ionization utmost point that filament is made can produce electric-field intensity relatively uniformly, and more stable, easily it is controlled.And the ionization utmost point that filament is made is owing to the relation of material, and the easier coating of coating various materials on its surface realizes more function.For example, the surface of the ionization utmost point that can make at filament scribble oxidation catalyst coating or surface overflow can be low material, under the high pressure effect, produces the plasma accessory substance of while to reduce the ionization utmost point, as ozone.For example, the surface of the ionization utmost point that can make at filament scribbles the oxidation catalyst coating, such as gold, so that the charge density of the ion of ionization utmost point ionization is higher, has improved the ionizing efficiency of the ionization utmost point.Can also extremely coat some oxidation catalyst coatings in the surface in the ionization that filament is made, for example manganese dioxide, silver etc. reduce the composition of oxygen, thereby reduce the ozone that generates because of the ionization of the ionization utmost point.In addition, the radius of curvature of the ionization utmost point that filament is made is very little usually, so collector has reduced the generation of back side electric arc in the face of the ratio of the radius of curvature of the radius of curvature of the one side of the ionization utmost point and the ionization utmost point is bigger.And filament can adopt the high material of some intensity, and for example tungsten, stainless steel etc. satisfy the requirement of intensity, prolong its service life.
Repeller and/or collector can be solid, also can be hollow, when repeller or collect when very hollow, can reduce the weight of repeller or collector, are convenient to transportation, and have saved material and cost.When repeller or collect when very solid, increased mechanical strength, prolonged service life.
Collector is generally the platy structure that has circular protrusions, for example, and rectangular slab or cylindrical plate.
Because the gas cleaning plant that provides of the utility model uses under the high voltage electric field environment, so the intensifying ring in the utility model, collector and ionization is smooth surface extremely usually, do not have most advanced and sophisticated flaw, to prevent the generation of electric arc.
In the utility model, for prevent invalid ion-conductance from, can the ionization utmost point back to a side of collector scribble the electrolyte coating or the ionization utmost point back to one of collector be sidelong put have with the ionization utmost point the conflict utmost point of the identical electromotive force of charged gesture direction.
In the above-described embodiments, gas cleaning plant comprises at least one ionization utmost point, at least one collector and at least one repeller.In fact, the quantity of these three kinds of electrodes and position each other relation has multiple combining form, and the difference according to the number of collector is illustrated respectively below.
Illustrate that at first gas cleaning plant that the utility model provides includes only the situation of a collector.
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 2 provides for the utility model, among this embodiment, with collect very rectangular slab shape and each ionization very a filament be the example explanation, in other embodiments, the concrete structure of collector and the ionization utmost point and composition all do not add restriction.Described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point 201, collector 202 and at least one repeller 203.Wherein, described at least one repeller 203 has the electromotive force with 201 charged gesture equidirectionals of described at least one ionization utmost point, a described collector 202 have zero potential or with 201 rightabout electromotive forces of charged gesture of described at least one ionization utmost point, described at least one repeller 203 is used for the charged gas particles after described at least one the ionization utmost point 201 ionization is pushed to a described collector 202.
Here, the electric potential direction of each ionization utmost point is identical, and each ionization utmost point add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional, electric potential direction refers to the positive and negative direction of electromotive force.For example, if each ionization utmost point all have a positive direction electromotive force, then collector has zero potential or negative direction electromotive force, each repeller all has the positive direction electromotive force.
Among this embodiment, described at least one repeller 203 is in order to push to a described collector 202 with the charged gas particles after at least one the ionization utmost point 201 ionization better, each ionization utmost point in each repeller in described at least one repeller 203 and described at least one ionization utmost point 201 is positioned at the same side of collector 202, i.e. a side of top in the collector among Fig. 2 202.And in other embodiments, repeller also can not be positioned at the same side of collector 202 with the ionization utmost point, for example, partly or entirely repeller can be arranged in the following side of collector 202, and the charged gas particles (generally for a small amount of) that this moment, this repeller also can be positioned at a side of collector 202 bottoms pushes to collector 201.
Among this embodiment, each ionization at least one ionization utmost point 201 extremely can be all parallel in the face of the edge line of the one side of the described ionization utmost point with a described collector 202, that is to say, in the gas cleaning plant shown in Fig. 2, each ionization extremely can be all and the right side edge line parallel of collector 202.
Especially, the gas purification units among this embodiment can include only a collector, an ionization utmost point and a repeller.Wherein, a described collector, a described repeller and a described ionization utmost point are parallel to each other.At this moment, collector can be between the ionization utmost point and repeller, and perhaps collector is over against repeller.
In other embodiments, each ionization utmost point also can be positioned at the top of collector 201, and each repeller is positioned at the left and right sides of the ionization utmost point, and the charged gas particles after the ionization of the ionization utmost point is pushed to collector 201.
Next gas cleaning plant that illustrates that the utility model provides comprises the situation of two collectors.
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 3 provides for the utility model, among this embodiment, with collect very rectangular slab shape and each ionization very a filament be the example explanation, in other embodiments, the concrete structure of collector and the ionization utmost point does not all add restriction.Described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point 301, two collectors 302 and at least one repeller 303.Wherein, described at least one repeller 303 has the electromotive force with 301 charged gesture equidirectionals of described at least one ionization utmost point, described two collectors 302 have zero potential or with 301 rightabout electromotive forces of charged gesture of described at least one ionization utmost point, described at least one repeller 303 is used for the charged gas particles after described at least one the ionization utmost point 301 ionization is pushed to described two collectors 302.Wherein, each repeller at least one repeller 303 over against, and be parallel to each other.When the size of each repeller all equated, when overlooking described gas cleaning plant, each repeller overlapped.Each repeller can be between described two collectors 302.
Here, each ionization utmost point add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional, electric potential direction refers to the positive and negative direction of electromotive force.For example, if each ionization utmost point all have a positive direction electromotive force, then two collectors all have zero potential or negative direction electromotive force, each repeller all has the positive direction electromotive force.
Among this embodiment, two collectors be parallel to each other and over against.Described at least one repeller 303 is in order to push to described two collectors 302 with the charged gas particles after at least one the ionization utmost point 301 ionization better, each ionization utmost point in each repeller in described at least one repeller 303 and described at least one ionization utmost point 301 is positioned at the opposition side of the center line of any collector, and described center line is perpendicular to the collection surface of collector.Particularly, each repeller can be positioned at the center line left side of collector 302, and this moment, each ionization utmost point was positioned at the center line right side of collector 303.And in other embodiments, repeller also can not be positioned at the opposition side of collector 302 with the ionization utmost point, or, partly or entirely repeller can be arranged in collector 302 tops or a following side, and the charged gas particles (generally for a small amount of) that this moment, this repeller also can be positioned at collector 302 tops or a following side pushes to collector 302.
Among this embodiment, each ionization at least one ionization utmost point 301 extremely can be all parallel in the face of the edge line of the one side of the described ionization utmost point with described two collectors 302, that is to say, in the gas cleaning plant shown in Fig. 3, each ionization extremely can be all and the right side edge line parallel of collector 302.
By two collectors, increase the adsorption area of collector among this embodiment, improved the adsorption capacity to dust and other impurity particle, further improved gas cleaning efficient.
Especially, the gas purification units among this embodiment can include only two collectors, an ionization utmost point and a repeller.Specifically be illustrated by the following examples.
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 4 provides for the utility model, among this embodiment, with collect very rectangular slab shape and ionization very a filament be the example explanation, in other embodiments, the concrete structure of collector and the ionization utmost point and composition all do not add restriction.Described device comprises a gas purification units, and described gas purification units comprises an ionization utmost point 401, two collectors 402 and a repeller 403.Wherein, the electromotive force of a described repeller 403 and 401 charged gesture equidirectionals of a described ionization utmost point, all being with the positive direction electromotive force with both among this embodiment is example.Then described two collectors 402 have the negative direction electromotive force, and a described repeller 403 is used for the charged gas particles after the described ionization utmost point 401 ionization is pushed to described two collectors 402.
Here, the ionization utmost point 401 can be with the electromotive force of positive direction on the impurity particle bands such as dust after adding high-tension electricity.
Among this embodiment, two collectors be parallel to each other and over against.A described repeller 403 and a described ionization utmost point 401 are positioned at the opposition side of the center line of two collectors 402, particularly, described repeller can be positioned at the left side of the center line of collector 402, and this moment, the described ionization utmost point was positioned at the right side of the center line of collector 402.The ionization utmost point 401 is parallel in the face of the edge line of the one side of the ionization utmost point with two collectors 402, that is to say, and in the gas cleaning plant shown in Fig. 4, the right side edge line parallel of the ionization utmost point 401 and collector 402.
Illustrate that at last gas cleaning plant that the utility model provides comprises the situation of at least three collectors.
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 5 provides for the utility model, among this embodiment, with collect very rectangular slab shape and each ionization very a filament be the example explanation, in other embodiments, the concrete structure of collector and the ionization utmost point and composition all do not add restriction.Described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point 501, at least three collectors 502 and at least one repeller 503.Wherein, described at least one repeller 503 has the electromotive force with 501 charged gesture equidirectionals of described at least one ionization utmost point, described at least three collectors 502 have zero potential or with 501 rightabout electromotive forces of charged gesture of described at least one ionization utmost point, described at least one repeller 503 is used for the charged gas particles after described at least one the ionization utmost point 501 ionization is pushed to described at least three collectors 502.
Here, each ionization utmost point add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional, electric potential direction refers to the positive and negative direction of electromotive force.For example, if each ionization utmost point all have a positive direction electromotive force, then each collector all has zero potential or negative direction electromotive force, each repeller all has the positive direction electromotive force.
Among this embodiment, each collector, each repeller are parallel to each other, and described at least three collectors 502 are arranged in the outside of described at least one ionization utmost point with circular arc.Here, arrange the center that a circular arc can pass through all collectors that refers to circular arc.Simultaneously, the ionization utmost point is in the inside of this circular arc.Described at least one repeller 503 is in order to push to described at least three collectors 502 with the charged gas particles after at least one the ionization utmost point 501 ionization better, and each repeller is positioned at the outside of each ionization utmost point with respect to each collector.And in other embodiments, each collector also can be arranged in the outside of described at least one ionization utmost point with other shapes, partly or entirely repeller can be arranged in top or a following side of collector 502 arbitrary collectors, and the charged gas particles (generally for a small amount of) that this moment, this repeller also can be positioned at this collector top or a following side pushes to collector 502.
Among this embodiment, each ionization at least one ionization utmost point 501 extremely can be all parallel in the face of the edge line of the one side of the described ionization utmost point with described two collectors 502, that is to say, in the gas cleaning plant shown in Fig. 5, each ionization extremely can be all and the right side edge line parallel of collector 502.
By at least three collectors, increase the adsorption area of collector among this embodiment, improved the adsorption capacity to dust and other impurity particle, further improved gas cleaning efficient.
The longitdinal cross-section diagram of another specific embodiment of the gas cleaning plant that Fig. 6 provides for the utility model, among this embodiment, with collect very rectangular slab shape and each ionization very a filament be the example explanation, in other embodiments, the concrete structure of collector and the ionization utmost point and composition all do not add restriction.Described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point 601, at least three collectors 602 and at least two repellers 603.Wherein, described at least two repellers 603 have the electromotive force with 601 charged gesture equidirectionals of described at least one ionization utmost point, described at least three collectors 602 have zero potential or with 601 rightabout electromotive forces of charged gesture of described at least one ionization utmost point, described at least two repellers 603 are used for the charged gas particles after described at least one the ionization utmost point 601 ionization is pushed to described at least three collectors 602.
Here, each ionization utmost point add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional, electric potential direction refers to the positive and negative direction of electromotive force.For example, if each ionization utmost point all have a positive direction electromotive force, then each collector all has zero potential or negative direction electromotive force, each repeller all has the positive direction electromotive force.
Among this embodiment, each collector, each repeller are parallel to each other.Described at least three collectors 602 are arranged in the outside of described at least one ionization utmost point with circular arc, and at least two repellers are arranged in parallel between at least three collectors.The number of repeller is that the number of collector subtracts one, simultaneously, has and have only a repeller between two adjacent collectors.
Among this embodiment, each ionization at least one ionization utmost point 601 extremely can be all parallel in the face of the edge line of the one side of the described ionization utmost point with described two collectors 602, that is to say, in the gas cleaning plant shown in Fig. 6, each ionization extremely can be all and the right side edge line parallel of collector 602.
Among the embodiment of the present utility model, the quantity of these three kinds of electrodes of the ionization utmost point, collector and repeller and the relation of position each other have multiple combining form, not only comprise the situation in above-described embodiment, also comprised the equivalent transformation of having done according to the concrete structure in above-described embodiment.
In embodiment of the present utility model, preferably, collector is in the face of the radius of curvature of the one side of the ionization utmost point radius of curvature greater than the ionization utmost point.The ionization utmost point adopts the conductor of minor radius or semiconductor to constitute, and makes the ionization utmost point more be easy to generate high electric field and high-intensity argon-arc plasma field in the part.
In order further to optimize collector structures, the arbitrary collector in the utility model can be the projection of circular arc in the one side in the face of the ionization utmost point.Fig. 7 is that the one side of a collector is the longitdinal cross-section diagram of circular arc projection.Here, the projection of circular arc refers to the diameter R of projection greater than the projection of the circular arc of the thickness H of collector.When collector is the projection of circular arc in the face of the one side of the ionization utmost point, can make motion form turbulent flow at collector in the face of near the charged gas particles the one side of the ionization utmost point, thereby thereby make more charged gas particles flow to the efficient that collector has increased collector absorption.Secondly, the projection of this circular arc can also further increase collector in the face of the radius of curvature of the one side of the ionization utmost point, make collector face the radius of curvature of radius of curvature and the ionization utmost point of one side of the ionization utmost point than bigger, preferably, the radius of curvature of the projection of circular arc is at least greater than 20 times of the radius of curvature of the ionization utmost point.And bigger radius of curvature is than the generation that has reduced back side electric arc.In addition, the projection of circular arc has also increased the fineness on collector surface, has reduced the generation of electric arc.
In order further to optimize the structure of repeller, the surface of the arbitrary repeller in the utility model can have the projection of at least one circular arc.The projection of this circular arc can repeller in the face of the one side of collector, repeller back to the one side of collector or be parallel to the lip-deep optional position of collector.The longitdinal cross-section diagram of Fig. 8 a plurality of circular arc projections for repeller has.The two sides of repeller has two circular arc projections respectively, at the mid portion of repeller two laterally zygomorphic circular arc projections is arranged.
Circular arc projection on the two sides of repeller refers to that the diameter of projection is greater than the projection of the circular arc of the thickness of repeller.
The repeller of structure shown in Figure 8 can make that near the charged particle of the motion projection of circular arc is capable to become eddy current, reclaims collector thereby make repeller more charged particle can be pushed, and increases the adsorption efficiency of collector.In addition, the projection of circular arc has also increased the fineness on repeller surface, has reduced the generation of electric arc.
The raised structures of above-mentioned circular arc can be realized by technologies such as aluminium extruded or the processing of embarking on journey.
In the specific embodiment that above-mentioned the utility model provides, included only a gas purification units, in fact, the gas cleaning plant that the utility model provides can comprise a plurality of gas purification units, series connection and/or in parallel mutually between these a plurality of gas purification units.Describe below by three embodiment.Here need to prove, below among three embodiment, each gas purification units is the example explanation with gas purification units shown in Figure 4, and the utility model does not limit the concrete structure of each gas purification units, that is to say that any gas purification units among following three embodiment can provide for the utility model, perhaps any one gas purification units of obtaining according to its fractal transform such as grade.
The utility model also provides another specific embodiment of gas cleaning plant, and Fig. 9 is the longitdinal cross-section diagram of gas cleaning plant among this embodiment.In this gas cleaning plant, comprise gas purification units 901 and gas purification units 902, gas purification units 901 and gas purification units 902 are gas purification units shown in Figure 4.And series connection mutually between gas purification units 901 and the gas purification units 902.Collector, repeller that 902 series connection of gas purification units 901 and gas purification units refer in collector, repeller and the gas purification units 902 in the gas purification units 901 are parallel to each other, and gas purification units 902 be positioned at gas purification units 901 under.And, among this embodiment, because the structure of gas purification units 901 and gas purification units 902 is identical, therefore the ionization utmost point of gas purification units 902 be positioned at gas purification units 901 the ionization utmost point under, two collectors of gas purification units 902 all be positioned at gas purification units 901 two collectors under, the repeller of gas purification units 902 be positioned at gas purification units 901 repeller under.
Here, gas purification units 901 and gas purification units 902 are identical two gas purification units, therefore only introduce the concrete structure of gas purification units 901.
Gas purification units 901 comprises: has the ionization utmost point 401 of positive potential, has two collectors 402 of the negative potential opposite with ionization electrode potential direction, and the repeller 403 that has the positive potential identical with ionization electrode potential direction.Repeller 403 is used for the charged gas particles after 401 ionization of the ionization utmost point is pushed to described two collectors 402.
The ionization utmost point 401 add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional.
Two collectors be parallel to each other and over against.A described repeller 403 and a described ionization utmost point 401 are positioned at the opposition side of two collectors 402, particularly, each repeller is positioned at the left side of collector 402, and each ionization utmost point is positioned at the right side of collector 403, that is to say that collector 402 is between the ionization utmost point 401 and repeller 403.The ionization utmost point 401 is parallel in the face of the edge line of the one side of the ionization utmost point with two collectors 402, that is to say the right side edge line parallel of the ionization utmost point 401 and collector 402.
In other embodiments, gas cleaning plant can comprise the gas purification units of plural mutual series connection.And the concrete structure of gas purification units and composition do not add restriction yet.
The utility model also provides another specific embodiment of gas cleaning plant, and Figure 10 is the longitdinal cross-section diagram of gas cleaning plant among this embodiment.
This gas cleaning plant comprises gas purification units 1001 and gas purification units 1002, gas purification units 801 and gas purification units 802 are gas purification units shown in Figure 4, and parallel with one another between gas purification units 1001 and the gas purification units 1002.Here, collector, repeller between gas purification units 1001 and the gas purification units 1002 in collector, repeller and the gas purification units 1002 that refers in the gas purification units 1001 in parallel are parallel to each other, and gas purification units 1001 is positioned at the left side of gas purification units 1002.And, among this embodiment, because the structure of gas purification units 1001 and gas purification units 1002 is identical, therefore the collector above the gas purification units 1001 and the collector above the gas purification units 1002 are positioned at same plane, collector below collector below the gas purification units 1001 and the gas purification units 1002 is positioned at same plane, and the repeller of gas purification units 1001 repellers and gas purification units 1002 is positioned at same plane.And the repeller that the ionization utmost point of gas purification units 1001 is positioned at gas purification units 1002 back to a side of the ionization utmost point of gas purification units 1002.
Here, gas purification units 1001 and gas purification units 1002 are identical two gas purification units, therefore only introduce the concrete structure of gas purification units 1001.
Gas purification units 1001 comprises: has the ionization utmost point 401 of positive potential, has two collectors 402 of the negative potential opposite with ionization electrode potential direction, and the repeller 403 that has the positive potential identical with ionization electrode potential direction.Repeller 403 is used for the charged gas particles after 401 ionization of the ionization utmost point is pushed to described two collectors 402.
The ionization utmost point 401 add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional.
Two collectors be parallel to each other and over against.A described repeller 403 and a described ionization utmost point 401 are positioned at the opposition side of two collectors 402, particularly, each repeller is positioned at the left side of collector 402, and each ionization utmost point is positioned at the right side of collector 403, that is to say that collector 402 is between the ionization utmost point 401 and repeller 403.The ionization utmost point 401 is parallel in the face of the edge line of the one side of the ionization utmost point with two collectors 402, that is to say the right side edge line parallel of the ionization utmost point 401 and collector 402.
In other embodiments, gas cleaning plant can comprise plural gas purification units parallel with one another.And the concrete structure of gas purification units and composition do not add restriction yet.
The utility model also provides another specific embodiment of gas cleaning plant, and Figure 11 is the longitdinal cross-section diagram of gas cleaning plant among this embodiment.This gas cleaning plant comprises gas purification units 1101, gas purification units 1102 and gas purification units 1103, and gas purification units 1101, gas purification units 1102 and gas purification units 1103 are gas purification units shown in Figure 4.And, series connection mutually between gas purification units 1102 and the gas purification units 1103, the circuit after this series connection is in parallel with gas cleaning plant 1101.The concrete structure of gas purification units 1101, gas purification units 1102 and gas purification units 1103 is identical, therefore only introduces the concrete structure of gas purification units 1101 here.
Gas purification units 1101 comprises: has the ionization utmost point 401 of positive potential, has two collectors 402 of the negative potential opposite with ionization electrode potential direction, and the repeller 403 that has the positive potential identical with ionization electrode potential direction.Repeller 403 is used for the charged gas particles after 401 ionization of the ionization utmost point is pushed to described two collectors 402.
The ionization utmost point 401 add behind the high-tension electricity can with on the impurity particle bands such as dust with the electromotive force of each ionization electrode potential equidirectional.
Two collectors be parallel to each other and over against.A described repeller 403 and a described ionization utmost point 401 are positioned at the opposition side of two collectors 402, particularly, each repeller is positioned at the left side of collector 402, and each ionization utmost point is positioned at the right side of collector 403, that is to say that collector 402 is between the ionization utmost point 401 and repeller 403.The ionization utmost point 401 is parallel in the face of the edge line of the one side of the ionization utmost point with two collectors 402, that is to say the right side edge line parallel of the ionization utmost point 401 and collector 402.
In other embodiments, gas cleaning plant can comprise mutual series connection and the gas purification units in parallel more than three.And the concrete structure of gas purification units and composition do not add restriction yet.
The utility model also provides a kind of specific embodiment of gas purge system, and described gas purge system comprises: the arbitrary specific embodiment in the gas cleaning plant that supply voltage, preposition detector, rearmounted detector, control module, measuring circuit, electric arc trigger electrode and the utility model provide.
Supply voltage is used for the ionization utmost point, collector and the repeller power supply to described gas cleaning plant.
Described at least one detector is used for measuring the ionization utmost point place of described gas cleaning plant, air velocity and environmental index near the ionization just extremely, and dust concentration and the ozone concentration at described gas cleaning plant place.Environmental index comprises temperature, humidity etc.
Described measuring circuit is used for measuring the electric current of the ionization utmost point that flows through described gas cleaning plant.Here, measuring circuit can be real-time measurement.And measuring circuit realizes can adopting fixed value resistance to the current measurement of the ionization utmost point, current converter, perhaps Hall effect device.
Described electric arc trigger electrode be used for described at least one detector measurement to environmental index when changing, prior to the ionization utmost point and collector arc discharge, thereby realize reducing voltage or the restriction electric current comes the protective gas purifier.
Described control module is for the electric current of the ionization utmost point that flows through described gas cleaning plant that measures according to measuring circuit, and described at least one detector measurement air velocity, environmental index, dust concentration and the ozone concentration that arrive, control the ionization utmost point of supply voltage in the described gas cleaning plant, the power supply value of collector and repeller.
Preferably, control module control supply voltage makes at regular intervals and the ionization utmost point is heated to above 300 degrees centigrade to remove oxide and other impurity the extremely logical certain electric current of ionization.And control module can be when the ozone concentration that detects by rearmounted detector be higher than setting, and the temperature of the rising ionization utmost point and collector is with the accelerate ozone decomposition rate.
The above only is preferred embodiment of the present utility model; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the utility model principle; can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.

Claims (18)

1. a gas cleaning plant is characterized in that, described device comprises a gas purification units, and described gas purification units comprises at least one ionization utmost point, at least one repeller and at least one collector;
Wherein, described at least one repeller have with described at least one ionization utmost point the electromotive force of charged gesture equidirectional, described at least one collector have zero potential or with the rightabout electromotive force of described at least one ionization utmost point charged gesture of institute; Described at least one repeller is used for the charged gas particles after described at least one ionization utmost point ionization is pushed to described at least one collector.
2. device according to claim 1 is characterized in that, described gas purification units comprises a collector, at least one ionization utmost point and at least one repeller.
3. device according to claim 2 is characterized in that, described gas purification units comprises a collector, an ionization utmost point and a repeller; Wherein, a described collector, a described repeller and a described ionization utmost point are parallel to each other, a described collector and a described repeller over against.
4. device according to claim 1, it is characterized in that, described gas purification units comprise be parallel to each other and over against two collectors, at least one ionization utmost point and at least one repeller, each repeller in described at least one repeller over against and be parallel to each other.
5. device according to claim 4 is characterized in that, described gas purification units comprise be parallel to each other and over against two collectors, an ionization utmost point and a repeller.
6. device according to claim 1, it is characterized in that, described gas purification units comprises at least three collectors, at least two ionization utmost points and at least two repellers, described at least three collectors are arranged in the outside of described at least one ionization utmost point with circular arc, and at least two repellers are arranged in parallel between at least three collectors.
7. according to any described gas cleaning plant of claim 1 to 6, it is characterized in that described device comprises a plurality of gas purification units, series connection and/or in parallel mutually between described a plurality of gas purification units.
8. according to any described gas cleaning plant of claim 1 to 6, it is characterized in that arbitrary collector is the projection of circular arc in the face of the one side of the described ionization utmost point in the described collector.
9. gas cleaning plant according to claim 8 is characterized in that, the radius of curvature of the projection of described circular arc is at least greater than 20 times of the radius of curvature of the described ionization utmost point.
10. according to any described gas cleaning plant of claim 1 to 6, it is characterized in that the surface of any repeller in the described repeller has the projection of at least one circular arc.
11., it is characterized in that the array that the described ionization utmost point is made up of a filament or many filaments constitutes according to any described gas cleaning plant of claim 1 to 6.
12. gas cleaning plant according to claim 11 is characterized in that, the surface of described filament scribbles the oxidation catalyst coating or the low coating of energy is overflowed on the surface, to reduce ozone.
13., it is characterized in that an end of the described ionization utmost point is that the surface of tip-like or the described ionization utmost point is zigzag according to any described gas cleaning plant of claim 1 to 6.
14. according to any described gas cleaning plant of claim 1 to 6, it is characterized in that, the described ionization utmost point back to a side of described collector scribble insulating coating or placement have with the described ionization utmost point the conflict utmost point of the identical electromotive force of charged gesture direction.
15., it is characterized in that the electric-field intensity that the described ionization utmost point produces is greater than 10 according to any described gas cleaning plant of claim 1 to 6 5V/m.
16., it is characterized in that the very solid or hollow-core construction of described collector and/or described repulsion according to any described gas cleaning plant of claim 1 to 6.
17. according to any described gas cleaning plant of claim 1 to 6, it is characterized in that the described ionization utmost point, described collector and described repeller are smooth surface.
18. a gas purge system is characterized in that, described gas purge system comprises: supply voltage, at least one detector, control module, measuring circuit, electric arc trigger electrode and as any described gas cleaning plant of claim 1 to 17;
Supply voltage is used for the ionization utmost point, collector and the repeller power supply to described gas cleaning plant;
Described at least one detector is for the air velocity at the ionization utmost point place of measuring described gas cleaning plant and dust concentration and the ozone concentration at environmental index and described gas cleaning plant place;
Described measuring circuit is used for measuring the electric current of the ionization utmost point that flows through described gas cleaning plant;
Described electric arc trigger electrode be used for described at least one detector measurement to environmental index when changing, prior to the ionization utmost point and collector arc discharge;
Described control module is for the electric current of the ionization utmost point that flows through described gas cleaning plant that measures according to measuring circuit, and described at least one detector measurement air velocity, environmental index, dust concentration and the ozone concentration that arrive, control the ionization utmost point of supply voltage in the described gas cleaning plant, the power supply value of collector and repeller.
CN2012207420077U 2012-12-28 2012-12-28 Device and system for purifying gases Ceased CN203030396U (en)

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CN2012207420077U CN203030396U (en) 2012-12-28 2012-12-28 Device and system for purifying gases
PCT/CN2013/086897 WO2014101576A1 (en) 2012-12-28 2013-11-11 Gas purification device and system, and ionic wind purifier
US14/411,437 US20150174587A1 (en) 2012-12-28 2013-11-11 Gas Purification Device and System, And Ionic Wind Purifier

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014101576A1 (en) * 2012-12-28 2014-07-03 苏州贝昂科技有限公司 Gas purification device and system, and ionic wind purifier
CN105396693A (en) * 2015-12-02 2016-03-16 邹栋 High-efficiency electrostatic air purifier
CN105396695A (en) * 2015-12-02 2016-03-16 邹栋 Electrostatic air purifying device
CN105413864A (en) * 2015-12-02 2016-03-23 邹栋 Intelligent air purifier
CN105562205A (en) * 2015-12-02 2016-05-11 邹栋 Air purification device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014101576A1 (en) * 2012-12-28 2014-07-03 苏州贝昂科技有限公司 Gas purification device and system, and ionic wind purifier
CN105396693A (en) * 2015-12-02 2016-03-16 邹栋 High-efficiency electrostatic air purifier
CN105396695A (en) * 2015-12-02 2016-03-16 邹栋 Electrostatic air purifying device
CN105413864A (en) * 2015-12-02 2016-03-23 邹栋 Intelligent air purifier
CN105562205A (en) * 2015-12-02 2016-05-11 邹栋 Air purification device
CN105396693B (en) * 2015-12-02 2017-05-24 上海净梧新材料科技有限公司 High-efficiency electrostatic air purifier
CN105396695B (en) * 2015-12-02 2017-05-31 宁波远志立方能源科技有限公司 Electrostatic air cleaning device

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