CN203012466U - High vacuum multi-target magnetron sputtering film-plating machine - Google Patents
High vacuum multi-target magnetron sputtering film-plating machine Download PDFInfo
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- CN203012466U CN203012466U CN2012206615491U CN201220661549U CN203012466U CN 203012466 U CN203012466 U CN 203012466U CN 2012206615491 U CN2012206615491 U CN 2012206615491U CN 201220661549 U CN201220661549 U CN 201220661549U CN 203012466 U CN203012466 U CN 203012466U
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- magnetron sputtering
- siemens
- high vacuum
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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Abstract
The utility model relates to a high vacuum multi-target magnetron sputtering film-plating machine. The high vacuum multi-target magnetron sputtering film-plating machine comprises an acquisition monitoring computer, wherein the acquisition monitoring computer is connected with a Siemens S7-300 series 315PLC host machine through the Ethernet, the Siemens S7-300 series 315PLC host machine is connected with cryopump sets through an RS 232 serial port, and the Siemens S7-300 series 315PLC host machine is further connected with sub-stations through a PROFIBUS-DP field bus. The high vacuum multi-target magnetron sputtering film-plating machine mainly solves technical problems of reduced reliability, reduced interference resistance capability, increased system instability, greatly restricted information acquisition quantity and complex and difficult information sharing caused by employing a PLC main machine system to control the high vacuum multi-target magnetron sputtering film-plating machine, and can realize real-time high speed communication between a main station and the sub-stations, realizes information exchange and accomplishes functions of information acquisition and monitoring. The high vacuum multi-target magnetron sputtering film-plating machine is advantaged in that the high vacuum multi-target magnetron sputtering film-plating machine simplifies wiring design, realizes information exchange of large capacity, is convenient to control and improves system reliability.
Description
Technical field
The utility model relates to a kind of high-vacuum multi-target magnetic control sputtering coating machine, and particularly the PROFIBUS-DP fieldbus is in the application structure of high-vacuum multi-target magnetic control sputtering coating machine.
Background technology
At present, the most PLC host computer systems that adopt of domestic high-vacuum multi-target magnetic control sputtering coating machine are controlled, equipment element used all will be received on the PLC main frame one by one by very long wire, caused so a large amount of wire harness access hosts, reliability reduces, antijamming capability descends has increased the instability of system, and the amount of information acquisition simultaneously also is subject to restriction to a great extent, loaded down with trivial detailsly is difficult for sharing of the information that realizes.
The utility model content
The purpose of this utility model is to provide a kind of high-vacuum multi-target magnetic control sputtering coating machine, it mainly solves the high-vacuum multi-target magnetic control sputtering coating machine that an existing PLC host computer system that adopts is controlled, reliability reduces, antijamming capability descends has increased the instability of system, the amount of information acquisition simultaneously also is subject to restriction to a great extent, the loaded down with trivial details technical matters such as sharing of the information that realizes that is difficult for, it makes between master station and follow station can the real time high-speed communication, realize message exchange, complete the effect of information acquisition and monitoring function; Simplify the cabling design, realize large capacity information exchange, control freely, improve the reliability of system.
For achieving the above object, the utility model is to realize like this.
a kind of high-vacuum multi-target magnetic control sputtering coating machine, it is characterized in that: it comprises the acquisition monitoring computing machine, this acquisition monitoring computing machine connects Siemens S7-300 series 315PLC main frame by Ethernet, and this S7-300 series 315PLC main frame connects the cryopump unit by the RS232 serial ports, this S7-300 series 315PLC main frame is by also connecting respectively Siemens distribution I/O module group ET200M as slave station by the PROFIBUS-DP fieldbus, hot and cold water unit S7-200 system, shielding power supply ASCENT, the sputtering chamber door is opened and is closed frequency converter MM420, inclination angle motor frequency conversion device MM420, the hot and cold water water circulating pump frequency converter MM420 of system, shielding power supply and cryopump cooling circulating water pump frequency converter MM420, rotary drum drives servomotor controller F5, rotary drum angular encoder OCD1, inclination angle angular encoder OCD2, blomelicalbloodgasandelectrolrteanalyzers M300, residual gas analyzer RGA and titanium sublimation pump system.
Described high-vacuum multi-target magnetic control sputtering coating machine is characterized in that: this S7-300 series 315PLC main frame also connects the UPS uninterrupted power source by the RS232 serial ports.
Described high-vacuum multi-target magnetic control sputtering coating machine is characterized in that: the logical DELL computing machine that adopts of described acquisition monitoring computing machine.
Described high-vacuum multi-target magnetic control sputtering coating machine is characterized in that: described Siemens distribution I/O module group ET200M installs switching value input/output module, analog input and output module and communication module as slave station.
Described high-vacuum multi-target magnetic control sputtering coating machine, it is characterized in that: this switching input module connects switch, button, travel switch or flow switch, switching value output module connects solenoid valve, contactor, relay or pilot lamp, analog input module connecting resistance rule, ionization gauge, pressure transducer, mass-flow gas meter or water flow sensor, analog output module connects mass-flow gas meter, power pressure regulator or water flow sensor.
PROFIBUS-DP fieldbus in the utility model is specially adapted to the exchanges data of the Rapid Circulation between I/O equipment that Programmable Logic Controller and field level disperse and has response time and high noise immunity fast.The field apparatus that whole mechanical floor connects comprises digital quantity, analog input/output, frequency converter, servomotor, scrambler, ET200M distributed I/O; The speed of the serial whole control system PROFIBUS-DP network of ET200M (IM153-2) guarantees to be not less than 1.2MBit/S, and the I/O of distribution has with the same reaction capacity of main CPU system expansion module by this network.
PROFIBUS-DP controls with tradition and controls the advantage that has of comparing:
1. PROFIBUS-DP is a kind of high speed, and low-cost communication is specifically designed to the device level control system and disperses communicating by letter of I/O.Use PROFIBUS-DP can replace 24VDC or the transmission of 4-20MA signal.
2. replace wire expensive between PLC and distribution I/O device.
3. at a high speed, the output data required time of the input data of transmission 1 kilobyte and 1 kilobyte is less than 2 MS.
4. have strong instrument, reduce configuration and installation and maintenance expense.
5. most manufacturers can provide this communication function.
6. product more widely: PLC is arranged, distributed I/O, servo controller, scrambler, magnetic control power supply, frequency converter, RGA etc.
7. allow periodicity and acyclic data transmission.
By above-mentioned advantage, the utlity model has following useful technique effect:
1, the utility model has been simplified a large amount of wire harness, has reduced cost, has reduced the interference between wire harness, has strengthened the reliability of system.
2, carry out a large amount of message exchanges between the applied subset energy of coating machine and main frame, main frame can effectively be monitored running status and the parameter of subset, the useful information that can not transmit by subset I/O interface has been transmitted in the PROFIBUS-DP communication, the information transmission is limited to, and is not easy sharing of the information that realizes.
3, PROFIBUS-DP mode bus is easy to realize that the malfunction of each subset passes to main frame, easily analyzes the reason that breaks down, and knows that reason just can easy to doly solve.
4, the coating machine system extension is convenient, the maintenance of the upgrading of equipment, transformation and equipment after being convenient to.
Description of drawings
Fig. 1 is structural representation of the present utility model.
Embodiment
See also Fig. 1, the utility model discloses a kind of high-vacuum multi-target magnetic control sputtering coating machine.as shown in the figure: it comprises acquisition monitoring computing machine 1, this acquisition monitoring computing machine 1 connects Siemens S7-300 series 315PLC main frame 2 by Ethernet, this S7-300 series 315PLC main frame 2 connects cryopump unit 4 by the RS232 serial ports, 5, this S7-300 series 315PLC main frame 2 is by also connecting respectively Siemens distribution I/O module group ET200M 6 as slave station by the PROFIBUS-DP fieldbus, 7, 8, hot and cold water unit S7-200 system 9, 10, shielding power supply ASCENT 11, 12, 13, 14, 15, 16, the sputtering chamber door is opened and is closed frequency converter MM420 17, inclination angle motor frequency conversion device MM420 18, the hot and cold water water circulating pump frequency converter MM420 of system 19, 20, shielding power supply and cryopump cooling circulating water pump frequency converter MM420 21, 22, rotary drum drives servomotor controller F5 23, rotary drum angular encoder OCD1 24, inclination angle angular encoder OCD2 25, blomelicalbloodgasandelectrolrteanalyzers M300 26, residual gas analyzer RGA 27 and titanium sublimation pump system 28.
In the utility model, S7-300 series 315PLC main frame 2 also connects UPS uninterrupted power source 3 by the RS232 serial ports; the main high-vacuum multi-target magnetic control sputtering coating machine control system of giving of UPS uninterrupted power source 3 provides uninterrupted power source, even the system of making is in the situation that the civil power outage also can protect this system normally to move.The parameter information of UPS uninterrupted power source 3 is realized message exchange and power data collection by RS232 serial communication protocol and Siemens 315PLC main frame 2.
The logical DELL computing machine that adopts of acquisition monitoring computing machine described in the utility model.The high-vacuum multi-target magnetic control sputtering coating machine adopt the DELL computing machine be acquisition monitoring computing machine 1 by Ethernet and the 2 real time high-speed communications of the serial 315PLC main frame of Siemens S7-300, realize message exchange, complete the function of information acquisition and monitoring.S7-300 series is Siemens's Medium PLC, modular organization, powerful, instruction is abundant, can conveniently complete add, subtract, multiplication and division computing and 16 or 32 fixed points and floating-point operation, have the various functions such as communication, diagnosis, control location, PID control, frequency measurement.
In the utility model cryopump unit CTI 4,5 be two for this reason system the vacuum pump of high vacuum is provided, owing to not possessing PROFIBUS communication protocol, so can only adopt RS232 serial communication protocol and Siemens 315PLC main frame 2 to realize message exchange, function control and the collection of cryopump parameter information.
In the utility model, Siemens's distribution I/O module group ET200M 6,7,8 realizes the real time data exchange as slave station by PROFIBUS-DP fieldbus and Siemens 315PLC main frame 2, slave station can be installed the switching value input/output module, analog input and output module and communication module etc.Switching input module can connect switch, button, travel switch, flow switch etc.Switching value output module can connect solenoid valve, contactor, relay, pilot lamp etc.The analog input module can connecting resistance rule, ionization gauge, pressure transducer, mass-flow gas meter, water flow sensor etc.Analog output module can connect mass-flow gas meter, power pressure regulator, water flow sensor etc.
Hot and cold water unit S7-200 system the 9, the 10th in the utility model uses Siemens S7-200 as sub-control system, controls the normal operation of hot and cold water unit.As the slave station of Siemens 315PLC main frame 2, realize controlling the function of function and real time data exchange by PROFIBUS-DP fieldbus and Siemens 315PLC main frame 2.
Shielding power supply ASCENT 11-16 in the utility model is high-power DC power supply, has high-level efficiency, and is high-accuracy.Have higher deposition, technological flexibility preferably can be stable on transient curve, and faster the arc reaction time, configurable arc response parameter can realize higher process efficiency and accurate technology controlling and process.Control and the real time data exchange data acquisition etc. by PROFIBUS-DP fieldbus and Siemens 315PLC main frame 2 practical functions.
Sputtering chamber door in the utility model is opened and is closed frequency converter MM420 17, inclination angle motor frequency conversion device MM420 18, the hot and cold water water circulating pump frequency converter MM420 of system 19,20, shielding power supply and cryopump cooling circulating water pump frequency converter MM420 the 21, the 22nd, the frequency converter of Siemens MM420 series, realize Siemens 315PLC main frame 2PROFIBUS-DP field bus communication function by the PROFIBUS template is installed, realize frequency converter is controlled with real time data exchanging as slave station.
Rotary drum in the utility model drives servomotor controller F5 23, rotary drum angular encoder OCD1 24, inclination angle angular encoder OCD2 25, blomelicalbloodgasandelectrolrteanalyzers M300 26, residual gas analyzer RGA 27 and titanium sublimation pump system 28 realize the PROFIBUS-DP field bus communication as slave station and Siemens 315PLC main frame 2, realization is controlled and real time data exchange, information acquisition etc. slave station.
The above is only preferred embodiment of the present utility model, is not to limit practical range of the present utility model.Be that all equivalences of doing according to the content of the utility model claim change and modify, all should be technology category of the present utility model.
Claims (5)
1. high-vacuum multi-target magnetic control sputtering coating machine, it is characterized in that: it comprises acquisition monitoring computing machine (1), this acquisition monitoring computing machine (1) connects Siemens S7-300 series 315PLC main frame (2) by Ethernet, and this S7-300 series 315PLC main frame (2) connects cryopump unit (4,5) by the RS232 serial ports, this S7-300 series 315PLC main frame (2) is by also connecting respectively Siemens distribution I/O module group ET200M(6 as slave station by the PROFIBUS-DP fieldbus, 7, 8), hot and cold water unit S7-200 system (9, 10), shielding power supply ASCENT(11, 12, 13, 14, 15, 16), the sputtering chamber door is opened and is closed frequency converter MM420(17), inclination angle motor frequency conversion device MM420(18), the hot and cold water water circulating pump frequency converter MM420(19 of system, 20), shielding power supply and cryopump cooling circulating water pump frequency converter MM420(21, 22), rotary drum drives servomotor controller F5(23), rotary drum angular encoder OCD1(24), inclination angle angular encoder OCD2(25), blomelicalbloodgasandelectrolrteanalyzers M300(26), residual gas analyzer RGA(27) and titanium sublimation pump system (28).
2. high-vacuum multi-target magnetic control sputtering coating machine according to claim 1 is characterized in that: this S7-300 series 315PLC main frame (2) also connects UPS uninterrupted power source (3) by the RS232 serial ports.
3. high-vacuum multi-target magnetic control sputtering coating machine according to claim 1 and 2, is characterized in that: the logical DELL of employing of described acquisition monitoring computing machine computing machine.
4. high-vacuum multi-target magnetic control sputtering coating machine according to claim 1 and 2, is characterized in that: described Siemens distribution I/O module group ET200M(6,7,8) as slave station, switching value input/output module, analog input and output module and communication module are installed.
5. high-vacuum multi-target magnetic control sputtering coating machine according to claim 4, it is characterized in that: this switching input module connects switch, button, travel switch or flow switch, switching value output module connects solenoid valve, contactor, relay or pilot lamp, analog input module connecting resistance rule, ionization gauge, pressure transducer, mass-flow gas meter or water flow sensor, analog output module connects mass-flow gas meter, power pressure regulator or water flow sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012206615491U CN203012466U (en) | 2012-12-05 | 2012-12-05 | High vacuum multi-target magnetron sputtering film-plating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012206615491U CN203012466U (en) | 2012-12-05 | 2012-12-05 | High vacuum multi-target magnetron sputtering film-plating machine |
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| Publication Number | Publication Date |
|---|---|
| CN203012466U true CN203012466U (en) | 2013-06-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012206615491U Expired - Lifetime CN203012466U (en) | 2012-12-05 | 2012-12-05 | High vacuum multi-target magnetron sputtering film-plating machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104749975A (en) * | 2015-01-30 | 2015-07-01 | 深圳达实智能股份有限公司 | Automatic identifying system and method for power supply configuration of glass coating process |
-
2012
- 2012-12-05 CN CN2012206615491U patent/CN203012466U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104749975A (en) * | 2015-01-30 | 2015-07-01 | 深圳达实智能股份有限公司 | Automatic identifying system and method for power supply configuration of glass coating process |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: BEIJING MIKROUNA MECH. TECH. CO., LIMITED CHINA NU Free format text: FORMER OWNER: BEIJING MIKROUNA MECH. TECH. CO., LIMITED Effective date: 20140108 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20140108 Address after: 201315 4A factory building, 1388 Cambridge East Road, Shanghai, Pudong New Area Patentee after: SHANGHAI MIKROUNA MECH. TECH Co.,Ltd. Patentee after: BEIJING MIKROUNA MECH TECH Co.,Ltd. Patentee after: CNNC BAOTOU NUCLEAR FUEL Co.,Ltd. Address before: 201315 4A factory building, 1388 Cambridge East Road, Shanghai, Pudong New Area Patentee before: SHANGHAI MIKROUNA MECH. TECH Co.,Ltd. Patentee before: BEIJING MIKROUNA MECH TECH Co.,Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20130619 |
|
| CX01 | Expiry of patent term |