CN202943944U - SiO2 antireflective film for solar photovoltaic glass - Google Patents
SiO2 antireflective film for solar photovoltaic glass Download PDFInfo
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- CN202943944U CN202943944U CN 201220686888 CN201220686888U CN202943944U CN 202943944 U CN202943944 U CN 202943944U CN 201220686888 CN201220686888 CN 201220686888 CN 201220686888 U CN201220686888 U CN 201220686888U CN 202943944 U CN202943944 U CN 202943944U
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Abstract
The utility model discloses a SiO2 antireflective film for solar photovoltaic glass, and belongs to the technical field of new energy materials. The SiO2 antireflective film with the porosity which is sequentially increased from inside to outside is provided by adjusting the content of a pore forming agent in a film coating liquid in each layer. The antireflective film for the solar photovoltaic glass prepared by the utility model has good adhesion and fastness with a glass substrate, and has broad permeability, high stable transmittance and excellent antireflection effects.
Description
Technical field
The utility model belongs to energy new material technology field, particularly a kind of SiO for solar energy photovoltaic glass
2Anti-reflection film.
Background technology
Along with the shortage increasingly of fossil energy and a series of societies and the environmental problem that causes thus, the energy and environmental problem are 21 century one of the important topics that will face of human kind sustainable development, and countries in the world are attached great importance to the exploitation of regenerative resource and application.Having general, harmless, huge, permanent solar energy is that the main renewable alternative energy has obtained huge development.As the indispensable material of main helioplant solar cell and flat-plate solar collector, the production of solar energy photovoltaic glass, processing and application are increasingly extensive.Although photovoltaic glass is not the core of battery, is undertaking and preventing that external force and external environment condition to the important function of solar cell precise part injury, being therefore equally also the important component part of photovoltaic industrial chain.
In the photovoltaic field, increase the luminous flux that sees through glass, just can obtain higher transformation efficiency.Increase by 5% if the solar energy glass transmitance is found in research, the efficient of plate solar collector will improve 6-10%, and the photoelectric transformation efficiency of photovoltaic solar cell will improve 3-6%.Improve the light transmittance of glass, several approach can be arranged: one, reduce thickness of glass.Solar energy glass is generally 3.2 mm or 4 mm now, and is very thin.Reducing thickness can produce a very large impact glass stiffness and intensity again.In addition, reduce 1mm thickness and also can only improve transmitance 0.33%.Two, improve manufacturing level, reduce the objectionable impurities content such as iron, reduce glass to Optical Absorption.The iron content of solar energy glass is generally lower than 0.012% now, and glass itself is little to Optical Absorption, further reduces iron content to the impact of light absorption and little.Three, manage to reduce the reflectivity of glass.Reflectivity reduces, and has namely increased transmitance from another angle.In sum, for present solar energy glass, realize that by anti-reflection higher light transmittance is best selection.
Realize that by anti-reflection higher light transmittance is exactly that evaporation one deck refractive index is less than the low-index layer of base material on base material, and the thickness of this low-index layer is 1/4 wavelength rete, is referred to as anti-reflection film.At present, be usually used in antireflecting Coating Materials and mainly contain MgF
2, ZnS, TiO
2, Ta
2O
5, SiO
2And Si
3N
4Deng for simple glass, desirable anti-reflection film refractive index is 1.22-1.23.But present desirable can in glass filmogen on glass, also not have the material of this refractive index just.Immediate MgF
2Refractive index also 1.38.Realize that namely anti-reflection present stage is also theoretic feasible completely.And for monofilm, even refractive index reaches 1.22-1.23, antireflective effect is also not satisfactory, and this just needs the design multi-layered antireflection coating.
The utility model content
The purpose of this utility model is the refractive index that the anti-reflection film material of preparation porous reduces film, and further improves the visible light transmissivity of film by the design multi-layered antireflection coating.
The utility model provides a kind of SiO for solar energy photovoltaic glass
2Anti-reflection film arranges SiO on substrate of glass
2Anti-reflection film is characterized in that: this anti-reflection film is multilayer SiO
2Anti-reflection film wherein, begins SiO from inside to outside from the anti-reflection film of being close to that one deck of substrate of glass
2The porosity of anti-reflection film increases successively.
Above-mentioned SiO for solar energy photovoltaic glass
2The multilayer SiO of anti-reflection film
2Anti-reflection film can be 2 layers or 3 layers.
Above-mentioned SiO for solar energy photovoltaic glass
2The preparation method of anti-reflection film comprises the steps:
⑴ glass cleaning
At first substrate of glass is cleaned up;
⑵ SiO
2The preparation of sol filming liquid
With analytically pure ethyl orthosilicate, deionized water, absolute ethyl alcohol, concentrated hydrochloric acid (20 ~ 30) by volume: (200 ~ 300): 1: mix (6 ~ 15), stir on magnetic stirring apparatus, the pore former that adds again different content, described pore former is polyethylene glycol, continue to stir, last ageing forms the different SiO of pore-forming agent content
2Sol filming liquid;
⑶ rete is coated with
The substrate of glass that step ⑴ is obtained is placed in carries out rotary plating on sol evenning machine, use the coating liquid of different content pore former to be coated with multilayer SiO on substrate of glass
2Film, wherein, the content that begins pore former coating liquid used from inside to outside from being close to that one deck of substrate of glass increases successively, at first every preparation one deck wants dry the processing, be placed in again heat treatment in chamber type electric resistance furnace, namely be raised to soak a period of time with certain heating rate, then cooling naturally.
In step (1), glass cleaning can adopt following methods: first adopt the mixed solution of ammoniacal liquor, hydrogen peroxide and deionized water to boil processing, wherein, the volume ratio of described ammoniacal liquor, hydrogen peroxide, deionized water is 1: (1 ~ 4): (3 ~ 8), boiling time are 5 ~ 20 min; Adopt the mixed solution of hydrochloric acid, hydrogen peroxide and deionized water to boil processing, described hydrochloric acid, hydrogen peroxide, deionized volume ratio are 1: (1 ~ 3) again: (4 ~ 10), boiling time is 5 ~ 20 min, rinses well with deionized water at last.
In said method, adding the front magnetic agitation time of pore former is 2 ~ 8 h, and adding the time of continuing to stir after pore former is 0.5 ~ 2 h, and digestion time is 10 ~ 30h.
In said method, described pore former is one or more in polyethylene glycol-200, PEG-4000, polyethylene glycol-600, PEG-6000, Polyethylene glycol-2000, PEG-6000 0, PEG-400, and the content of the polyethylene glycol that adds is 2.5 ~ 30 g/L.
In said method, that one deck of substrate of glass SiO is close in the rotary plating preparation
2Adopt the even glue program of one-level during film, prepare follow-up SiO
2Adopt the even glue program of secondary during film, the even glue program of described one-level rotating speed is 500 ~ 1000 rod/min, and the time is 5 ~ 20 s; The even glue program of secondary rotating speed is 1000 ~ 4000 rod/min, and the time is 15 ~ 45 s.
In said method, the drying after described even glue film forming is treated at 60 ~ 180 ℃ of baking oven inner drying 10 ~ 30 min.
In said method, the described plating film number of plies is 2 ~ 3 layers.
In said method, described heat treated heating rate is 1 ~ 20 ℃, and heat treatment temperature is 500 ~ 600 ℃, and temperature retention time is 0.5 ~ 3 h.
The beneficial effects of the utility model are:
Adopt sol-gal process, take ethyl orthosilicate as presoma, employing hydrochloric acid is catalyst, adds the pore former of different content, prepares SiO
2Coating liquid.Adopt spin coating method to be coated with at glass surface and be covered with the two-layer three-layer thin-film that arrives, be close to one deck of glass for adopting the lower SiO of pore former content
2Coating liquid is prepared from, and prepares follow-up SiO
2Film adopts the SiO of higher pore former content successively
2Coating liquid is prepared from.Thereby prepare by the content of adjusting pore former in every one deck coating liquid the SiO that the porosity increases from inside to outside successively
2Anti-reflection film.Anti-reflection film and associativity and the firmness of substrate of glass for solar energy photovoltaic glass of the present utility model is good, and broad transmitance is arranged, and stablizes light transmittance high, and antireflective effect is good.
Adopt sol-gal process, take polyethylene glycol as pore creating material, the porous anti-reflection film of preparation can reduce refractive index, obviously improves the transmitance of visible light.
By the design multilayer film, the porosity of 1 to 2 layer or 1 to 3 layer is increased gradually, can further improve the transmitance of anti-reflection film, visible light transmissivity can reach 99.1%.
Description of drawings
Fig. 1 is the SiO for solar energy photovoltaic glass of the present utility model
2The anti-reflection film schematic diagram;
Number in the figure:
The 1-glass basis; 2-ground floor anti-reflection film; 3-second layer anti-reflection film; The 3rd layer of anti-reflection film of 4-.
The specific embodiment
Adopt sol-gal process, ethyl orthosilicate, deionized water, absolute ethyl alcohol are raw material, and hydrochloric acid is catalyst, and polyethylene glycol is perforating agent, the SiO that the preparation porosity increases successively
2Film.
The utility model will be further described below in conjunction with embodiment, so that those skilled in the art can better understand the utility model and being implemented, but illustrated embodiment is not as to restriction of the present utility model.
The SiO that is used for solar energy photovoltaic glass of the present embodiment
2Anti-reflection film is provided with two-layer SiO on substrate of glass
2Anti-reflection film wherein, begins SiO from inside to outside from the anti-reflection film of being close to that one deck of substrate of glass
2The porosity of anti-reflection film increases successively.
Above-mentioned SiO for solar energy photovoltaic glass
2The preparation method of anti-reflection film, step is as follows:
⑴ glass cleaning
At first the substrate of glass that chooses is cleaned, first adopt the mixed solution of ammoniacal liquor, hydrogen peroxide and deionized water to boil processing, wherein, ammoniacal liquor, hydrogen peroxide and deionized water volume ratio are 1: 2: 5, boil 10 min; Adopt the mixed solution of hydrochloric acid, hydrogen peroxide and deionized water to boil processing, wherein, hydrochloric acid, hydrogen peroxide and deionized water volume ratio are 1: 1: 6, boil 10 min again; Rinse well with deionized water at last.
⑵ colloidal sol preparation
With analytically pure ethyl orthosilicate, deionized water, absolute ethyl alcohol, concentrated hydrochloric acid 25: 250: 1 by volume: 7 mixed, stir 4h on magnetic stirring apparatus, the polyethylene glycol-600 that adds respectively again 2.5 g/L, 5 g/L, continue to stir 1 h, last ageing 24 h, thus configure three kinds of coating liquids that contain different quality polyethylene glycol-600.
⑶ rete is coated with
The substrate of glass that step ⑴ is obtained is placed in carries out rotary plating on sol evenning machine, (the ground floor SiO of substrate of glass is close in preparation to rotary plating
2During film) first adopt the even glue program of one-level, then adopt the even glue program of secondary (preparation second layer SiO
2During film).The even glue program of one-level adopts rotating speed 800 rod/min, times 10 s, and the even glue program of secondary adopts rotating speed 2000 rod/min, times 30 s.First spin coating polyethylene glycol-600 content is the coating liquid of 2.5 g/L, complete vacuum oven 30 min that are placed on 150 ℃ of spin coating, be placed in again in chamber type electric resistance furnace, programming rate with 3 ℃/min rises to 500 ℃ of insulation 1 h, naturally cool to room temperature, spin coating polyethylene glycol-600 content is the coating liquid of 5 g/L again, complete vacuum oven 30 min that are placed on 150 ℃ of spin coating, be placed in again in chamber type electric resistance furnace, programming rate with 3 ℃/min rises to 500 ℃ of insulation 1 h, naturally cools to room temperature.
Prepared anti-reflection film and the associativity of substrate of glass and firmness are good, and broad transmitance is arranged, and stablize light transmittance high, and visible light transmissivity reaches 98.5%.
Embodiment 2
The SiO that is used for solar energy photovoltaic glass of the present embodiment
2Anti-reflection film is provided with three layers of SiO on substrate of glass
2Anti-reflection film (as shown in Figure 1) wherein, begins SiO from inside to outside from the anti-reflection film of being close to that one deck of substrate of glass
2The porosity of anti-reflection film increases successively.
Above-mentioned SiO for solar energy photovoltaic glass
2The preparation method of anti-reflection film, step is as follows:
⑴ glass cleaning
At first the glass substrate that chooses is cleaned, first adopt the mixed solution of ammoniacal liquor, hydrogen peroxide and deionized water to boil processing, wherein, the volume ratio of ammoniacal liquor, hydrogen peroxide and deionized water is 1: 2: 5, boils 20 min, then adopts the mixed solution of hydrochloric acid, hydrogen peroxide and deionized water to boil processing, wherein, the volume ratio of hydrochloric acid, hydrogen peroxide and deionized water is 1: 1: 6, boils and processes 20 min, rinses well with deionized water at last.
⑵ colloidal sol preparation
With analytically pure ethyl orthosilicate, deionized water, absolute ethyl alcohol, concentrated hydrochloric acid 25: 250: 1 by volume: 7 mixed, on magnetic stirring apparatus during stirred for several 4, the polyethylene glycol-200 that adds respectively again 5 g/L, 10 g/L, 20 g/L, continue to stir 1 h, last ageing 24 h, thus configure three kinds of coating liquids that contain different quality polyethylene glycol-200.
⑶ rete is coated with
The substrate of glass that step ⑴ is obtained is placed in carries out rotary plating on sol evenning machine, that one deck of substrate of glass SiO is close in preparation
2Adopt the even glue program of one-level during film, preparation second layer SiO
2Film and the 3rd layer of SiO
2Adopt the even glue program of secondary, the even glue program of one-level rotating speed 800 rod/min, times 10 s, the even glue program of secondary rotating speed 2000 rod/min, times 30 s during film.First spin coating polyethylene glycol-200 content is the coating liquid of 5 g/L, complete vacuum oven 30 min that are placed on 150 ℃ of spin coating, be placed in again in chamber type electric resistance furnace, programming rate with 3 ℃/min rises to 500 ℃ of insulation 1 h, naturally cool to room temperature, spin coating polyethylene glycol-200 content is the coating liquid of 10 g/L again, complete vacuum oven 30 min that are placed on 150 ℃ of spin coating, be placed in again in chamber type electric resistance furnace, programming rate with 3 ℃/min rises to 500 ℃ of insulation 1 h, naturally cools to room temperature.Then spin coating polyethylene glycol-200 content is the coating liquid of 20 g/L, and complete vacuum oven 30 min that are placed on 150 ℃ of spin coating, then be placed in chamber type electric resistance furnace rise to 500 ℃ of insulation 1 h with the programming rate of 3 ℃/min, naturally cool to room temperature.Thereby prepare the SiO that the porosity increases from inside to outside successively
2Film.
Prepared anti-reflection film and the associativity of substrate of glass and firmness are good, and broad transmitance is arranged, and stablize light transmittance high, and visible light transmissivity reaches 99.1%.
As seen from the above-described embodiment, prepared anti-reflection film and the associativity of substrate of glass and firmness are good, and broad transmitance is arranged, and stablize light transmittance high, can improve the service efficiency of sunshine, can further promote the development of solar energy photovoltaic glass.
The above; it is only the better specific embodiment of the utility model; but protection domain of the present utility model is not limited to this; anyly be familiar with those skilled in the art in the technical scope that the utility model discloses; the variation that can expect easily or replacement are within all should being encompassed in protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with the protection domain of claim.
Claims (2)
1. SiO who is used for solar energy photovoltaic glass
2Anti-reflection film arranges SiO on substrate of glass
2Anti-reflection film is characterized in that: this anti-reflection film is multilayer SiO
2Anti-reflection film wherein, begins SiO from inside to outside from the anti-reflection film of being close to that one deck of substrate of glass
2The porosity of anti-reflection film increases successively.
2. anti-reflection film according to claim 1, is characterized in that: multilayer SiO
2Anti-reflection film is 2 layers or 3 layers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220686888 CN202943944U (en) | 2012-12-11 | 2012-12-11 | SiO2 antireflective film for solar photovoltaic glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220686888 CN202943944U (en) | 2012-12-11 | 2012-12-11 | SiO2 antireflective film for solar photovoltaic glass |
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| Publication Number | Publication Date |
|---|---|
| CN202943944U true CN202943944U (en) | 2013-05-22 |
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ID=48419657
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220686888 Expired - Fee Related CN202943944U (en) | 2012-12-11 | 2012-12-11 | SiO2 antireflective film for solar photovoltaic glass |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102964067A (en) * | 2012-12-11 | 2013-03-13 | 天津耀皮工程玻璃有限公司 | SiO2 antireflection film for solar photovoltaic glass and preparation method thereof |
| CN106564228A (en) * | 2016-10-27 | 2017-04-19 | 广东星弛光电科技有限公司 | Preparation method of anti-reflection, anti-scratching and fingerprint-proof mobile phone glass view-window protective screen |
| CN110698078A (en) * | 2019-08-29 | 2020-01-17 | 信义光伏产业(安徽)控股有限公司 | Coated glass and manufacturing method thereof |
| CN114436543A (en) * | 2022-01-07 | 2022-05-06 | 常州亚玛顿股份有限公司 | Coated glass for photovoltaic module and preparation method thereof |
-
2012
- 2012-12-11 CN CN 201220686888 patent/CN202943944U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102964067A (en) * | 2012-12-11 | 2013-03-13 | 天津耀皮工程玻璃有限公司 | SiO2 antireflection film for solar photovoltaic glass and preparation method thereof |
| CN102964067B (en) * | 2012-12-11 | 2016-01-06 | 天津耀皮工程玻璃有限公司 | For the SiO of solar energy photovoltaic glass 2anti-reflection film and preparation method thereof |
| CN106564228A (en) * | 2016-10-27 | 2017-04-19 | 广东星弛光电科技有限公司 | Preparation method of anti-reflection, anti-scratching and fingerprint-proof mobile phone glass view-window protective screen |
| CN110698078A (en) * | 2019-08-29 | 2020-01-17 | 信义光伏产业(安徽)控股有限公司 | Coated glass and manufacturing method thereof |
| CN114436543A (en) * | 2022-01-07 | 2022-05-06 | 常州亚玛顿股份有限公司 | Coated glass for photovoltaic module and preparation method thereof |
| CN114436543B (en) * | 2022-01-07 | 2023-06-02 | 常州亚玛顿股份有限公司 | Coated glass for photovoltaic module and preparation method thereof |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130522 Termination date: 20201211 |
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| CF01 | Termination of patent right due to non-payment of annual fee |