CN202942861U - Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank - Google Patents

Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank Download PDF

Info

Publication number
CN202942861U
CN202942861U CN 201220695901 CN201220695901U CN202942861U CN 202942861 U CN202942861 U CN 202942861U CN 201220695901 CN201220695901 CN 201220695901 CN 201220695901 U CN201220695901 U CN 201220695901U CN 202942861 U CN202942861 U CN 202942861U
Authority
CN
China
Prior art keywords
thionyl chloride
vacuum
reaction tank
chloride reaction
tail gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 201220695901
Other languages
Chinese (zh)
Inventor
胡奎
朱泽文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHONGQING CITY CHUNRUI PHARMACEUTICAL CHEMICAL Co Ltd
Original Assignee
CHONGQING CITY CHUNRUI PHARMACEUTICAL CHEMICAL Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHONGQING CITY CHUNRUI PHARMACEUTICAL CHEMICAL Co Ltd filed Critical CHONGQING CITY CHUNRUI PHARMACEUTICAL CHEMICAL Co Ltd
Priority to CN 201220695901 priority Critical patent/CN202942861U/en
Application granted granted Critical
Publication of CN202942861U publication Critical patent/CN202942861U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

The utility model relates to a vacuum neutralization tail gas treatment device for a thionyl chloride reaction tank, and belongs to the technical field of vacuum tail gas treatment of the thionyl chloride reaction tank. The vacuum neutralization tail gas treatment device for the thionyl chloride reaction tank comprises the thionyl chloride reaction tank and a vacuum pump. The vacuum neutralization tail gas treatment device for the thionyl chloride reaction tank is characterized in that a neutralization tank is connected between the thionyl chloride reaction tank and the vacuum pump; the outlet of the vacuum pump is connected with a vacuum tank through a pipeline; and the neutralization tank is provided with an alkaline water injection pipe opening. According to the utility model, a great amount of water resources are saved; not gas is generated; and the production environment on the spot is improved greatly.

Description

The vacuum and the exhaust gas processing device that are used for the thionyl chloride retort
Technical field
The utility model relates to a kind of vacuum for the thionyl chloride retort and exhaust gas processing device, belongs to the vacuum tail gas processing technology field of thionyl chloride retort.
Background technology
Thionyl chloride retort aborning is mainly take thionyl chloride as raw material, and carrene is as solvent.Because these materials are acid, its temperature rising meeting is converted into raw material and carrene etc. the pernicious gases such as sulfur dioxide, hydrogen chloride and carrene through vavuum pump the time, and entering at last the vacuum pond needs again running water to dilute laggard sewage-farm.Mainly contain following defective in this process: 1, expend a large amount of running water; 2, produce a lot of pernicious gases.
The utility model content
According to above deficiency of the prior art, the technical problems to be solved in the utility model is: a kind of vacuum for the thionyl chloride retort and exhaust gas processing device are provided, have saved running water, reduced environmental pollution.
Vacuum and exhaust gas processing device for the thionyl chloride retort described in the utility model, comprise thionyl chloride retort and vavuum pump, it is characterized in that: be connected with neutralizing tank by pipeline between thionyl chloride retort and vavuum pump, vacuum pump outlet is connected with the vacuum pond by pipeline, is provided with buck and injects the mouth of pipe on neutralizing tank.
In order to facilitate the fluid discharge in neutralizing tank, be connected with outlet pipe section bottom described neutralizing tank, valve is installed on outlet pipe section.
In use, inject the mouth of pipe by buck and inject quantitative buck to neutralizing tank, start vavuum pump, thionyl chloride and carrene will enter neutralizing tank by respective lines, in coming by buck with the acidity of carrene; Enter the vacuum pond by vavuum pump and respective lines at last.
Compared with prior art, the utlity model has following beneficial effect:
1, by the utility model, saved great lot of water resources; 2, without γ-ray emission, greatly improved on-the-spot production environment.
Description of drawings
Fig. 1 is structural representation of the present utility model;
In figure: 1, vavuum pump 2, thionyl chloride retort 3, valve 4, outlet pipe section 5, neutralizing tank 6, buck inject the mouth of pipe 7, vacuum pond.
The specific embodiment
Below in conjunction with accompanying drawing, the utility model is described further:
As shown in Figure 1, the vacuum and the exhaust gas processing device that are used for the thionyl chloride retort, comprise thionyl chloride retort 2 and vavuum pump 1, be connected with neutralizing tank 5 by pipeline between thionyl chloride retort 2 and vavuum pump 1, vavuum pump 1 outlet is connected with vacuum pond 7 by pipeline, be provided with buck and inject the mouth of pipe 6 on neutralizing tank 5, neutralizing tank 5 bottoms are connected with outlet pipe section 4, and valve 3 is installed on outlet pipe section 4.
In use, inject the mouth of pipe 6 by buck and inject quantitative bucks to neutralizing tank 5, start vavuum pump 1, thionyl chloride and carrene will enter neutralizing tank 5 by respective lines, in coming by buck with the acidity of carrene; Enter vacuum pond 7 by vavuum pump 1 and respective lines at last.

Claims (2)

1. vacuum and exhaust gas processing device that is used for the thionyl chloride retort, comprise thionyl chloride retort (2) and vavuum pump (1), it is characterized in that: be connected with neutralizing tank (5) by pipeline between thionyl chloride retort (2) and vavuum pump (1), vavuum pump (1) outlet is connected with vacuum pond (7) by pipeline, is provided with buck and injects the mouth of pipe (6) on neutralizing tank (5).
2. vacuum and exhaust gas processing device for the thionyl chloride retort according to claim 1, is characterized in that: be connected with outlet pipe section (4) bottom described neutralizing tank (5), valve (3) is installed on outlet pipe section (4).
CN 201220695901 2012-12-10 2012-12-10 Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank Expired - Fee Related CN202942861U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220695901 CN202942861U (en) 2012-12-10 2012-12-10 Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220695901 CN202942861U (en) 2012-12-10 2012-12-10 Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank

Publications (1)

Publication Number Publication Date
CN202942861U true CN202942861U (en) 2013-05-22

Family

ID=48418577

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201220695901 Expired - Fee Related CN202942861U (en) 2012-12-10 2012-12-10 Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank

Country Status (1)

Country Link
CN (1) CN202942861U (en)

Similar Documents

Publication Publication Date Title
CN201988343U (en) Ammonia gas and air Venturi mixer
CN202924978U (en) Methane purifying and generation control device
CN203990290U (en) A kind of plastic cement taste removal equipment
CN202942861U (en) Vacuum neutralization tail gas treatment device for thionyl chloride reaction tank
CN203342642U (en) Fermentation exhaust-gas treatment device
CN204147736U (en) The spray recovery system of tail gas
CN203625363U (en) Positive pressure protection device for methane tank
CN204672110U (en) A kind of stainless steel annealing pickling line pickling waste gas pre-treating device
CN203816486U (en) Tail gas treatment device for producing nitrobenzenesulfonyl chloride
CN203754444U (en) Sewage purification treatment device
CN203610029U (en) Acid mist purification device
CN204125232U (en) A kind of anerobic sowage process methane recycling system
CN202666662U (en) Waste gas absorption device
CN205677787U (en) The vacuum flush system that a kind of efficient energy-saving safe is controlled
CN203829985U (en) Sulfuric acid feeding device in acidification reaction
CN204939219U (en) A kind of acidification hydrolization sludge treatment equipment
CN104474873A (en) Acidic tail gas absorbing tank
CN205095631U (en) Desulfuration purification tower
CN203658228U (en) Experimental system for trace impurity supplementary for high-temperature high-pressure experiments
CN202945059U (en) Vacuum tail gas treatment device for thionyl chloride reaction tank
CN204380646U (en) Valine deamination still
CN202762291U (en) Sulfuric tail gas purifying device based on ammonia process of desulfurization
CN203620482U (en) Waste gas collecting and treating system suitable for waste water treatment station
CN203323589U (en) Device for recycling condensate water produced in chinlon production process
CN203123782U (en) Recovering device for synthesizing vinyl acetate reaction tail gas by biomass ethylene method

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
DD01 Delivery of document by public notice
DD01 Delivery of document by public notice

Addressee: Zhang Xuanqiang

Document name: Patent termination notice

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130522

Termination date: 20211210