CN202839624U - Photoresistor - Google Patents

Photoresistor Download PDF

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Publication number
CN202839624U
CN202839624U CN 201220497248 CN201220497248U CN202839624U CN 202839624 U CN202839624 U CN 202839624U CN 201220497248 CN201220497248 CN 201220497248 CN 201220497248 U CN201220497248 U CN 201220497248U CN 202839624 U CN202839624 U CN 202839624U
Authority
CN
China
Prior art keywords
photosensitive layer
photo resistance
utility
layer
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 201220497248
Other languages
Chinese (zh)
Inventor
郑晓东
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huainan Normal University
Original Assignee
Huainan Normal University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huainan Normal University filed Critical Huainan Normal University
Priority to CN 201220497248 priority Critical patent/CN202839624U/en
Application granted granted Critical
Publication of CN202839624U publication Critical patent/CN202839624U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses a photoresistor, which is formed by a transparent protection layer, a photosensitive layer, a base and electrodes, wherein the upper end of the base is provided with an arc surface, the photosensitive layer is arranged on the upper end of the base and attached to the surface of the base, the photosensitive layer is connected with the electrodes, and the transparent protection layer is plated on the surface of the photosensitive layer. The photoresistor can effectively receive diverging light, thereby increasing the sensitivity of the photoresistor; and can effectively prevent the sensitivity from decreasing due to moisture or accumulated dust, through arranging the transparent protection layer.

Description

A kind of photo resistance
Technical field
The utility model relates to a kind of electronic component, particularly a kind of photo resistance.
Background technology
Photo resistance is very common a kind of electronic component; its resistance value changes according to the variation of illumination; according to its characteristic; through being usually used in making light-operated switch; common photo resistance remains to be increased for the susceptibility of diverging light; and photo resistance tends to because photosensitive layer makes moist or dust accretions and cause the reduction in useful life; therefore; the utility model provides a kind of photo resistance can effectively receive divergent rays; thereby improved the sensitivity of photo resistance; and by protective clear layer is set, can effectively prevents the problem that photo resistance descends because of the sensitivity of making moist or the accumulation of dust causes, thereby increase useful life.
The utility model content
The purpose of this utility model is, provides a kind of photo resistance can effectively receive divergent rays, thereby has improved the sensitivity of photo resistance, and can effectively prevent the problem that photo resistance descends because of the sensitivity of making moist or the accumulation of dust causes.
The purpose of this utility model can be achieved through the following technical solutions:
A kind of photo resistance is characterized in that, comprises protective clear layer, photosensitive layer, pedestal and electrode, curved of described pedestal upper end, and photosensitive layer is located at the pedestal upper end and is fitted with base-plates surface, the photosensitive layer connecting electrode, described protective clear layer is plated on the photosensitive layer surface.
The manufacturing material of the photosensitive layer of a kind of photo resistance that the utility model provides can be sulfide, selenides, tellurides of metal etc.
Description of drawings
Fig. 1 is the structural representation of a kind of photo resistance of the utility model one execution mode.
Number in the figure: 1, protective clear layer; 2, photosensitive layer; 3, pedestal; 4, right lead-in wire; 5, left lead-in wire.
Embodiment
Below in conjunction with accompanying drawing the utility model is described in further detail.
As shown in Figure 1; a kind of photo resistance; comprise protective clear layer 1, photosensitive layer 2, pedestal 3 and electrode; curved of described pedestal 3 upper ends; photosensitive layer 2 is located at pedestal 3 upper ends and fit in pedestal 3 surfaces; photosensitive layer 2 connecting electrodes, electrode is drawn by left lead-in wire 5 and right lead-in wire 4, and described protective clear layer 1 is plated on photosensitive layer 2 surfaces.
To sum up; a kind of photo resistance that the utility model provides is by the arcwall face design of its pedestal; can effectively receive divergent rays; thereby improved the sensitivity of this photo resistance; and by protective clear layer is set, both photosensitive layer was protected, do not affected again the reception of light; thereby effectively prevent the problem that photo resistance descends because of the sensitivity of making moist or the accumulation of dust causes, and increased useful life.
Above-described only is execution mode of the present utility model, for the person of ordinary skill of the art, under the prerequisite that does not break away from the utility model creation design, can also make some distortion and improvement, and these all belong to protection range of the present utility model.

Claims (1)

1. a photo resistance is characterized in that, comprises protective clear layer, photosensitive layer, pedestal and electrode; curved of described pedestal upper end; photosensitive layer is located at the pedestal upper end and is fitted with base-plates surface, the photosensitive layer connecting electrode, and described protective clear layer is plated on the photosensitive layer surface.
CN 201220497248 2012-09-27 2012-09-27 Photoresistor Expired - Fee Related CN202839624U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220497248 CN202839624U (en) 2012-09-27 2012-09-27 Photoresistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220497248 CN202839624U (en) 2012-09-27 2012-09-27 Photoresistor

Publications (1)

Publication Number Publication Date
CN202839624U true CN202839624U (en) 2013-03-27

Family

ID=47951261

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201220497248 Expired - Fee Related CN202839624U (en) 2012-09-27 2012-09-27 Photoresistor

Country Status (1)

Country Link
CN (1) CN202839624U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020107418A1 (en) * 2018-11-26 2020-06-04 郑娜薇 Optical flow sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020107418A1 (en) * 2018-11-26 2020-06-04 郑娜薇 Optical flow sensor

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130327

Termination date: 20130927