CN202837747U - Light leak detection base plate and light leak detection device - Google Patents
Light leak detection base plate and light leak detection device Download PDFInfo
- Publication number
- CN202837747U CN202837747U CN 201220557945 CN201220557945U CN202837747U CN 202837747 U CN202837747 U CN 202837747U CN 201220557945 CN201220557945 CN 201220557945 CN 201220557945 U CN201220557945 U CN 201220557945U CN 202837747 U CN202837747 U CN 202837747U
- Authority
- CN
- China
- Prior art keywords
- light
- light leak
- leak test
- substrate
- test substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
The utility model relates to a light leak detection base plate and a light leak detection device, in particular to a light leak detection base plate and a light leak detection device for ultraviolet light (UV) mask layer. The light leak detection base plate is used for carrying out light leak detection of an ultraviolet light mask device. The light leak detection base plate comprises a substrate base plate and a photochromic material layer which is formed on the substrate base plate. The light leak detection device comprises a picture collecting unit. The picture collecting unit is used for receiving the picture information on the light leak detection base plate. A design of the light leak detection base plate is adopted on the light leak detection base plate and the light leak detection device, reversible property of colors of the photochromic material layer under the strong ultraviolet radiation is used, light leak area on the UV mask layer can be detected effectively and therefore the design of UV mask layer is adjusted.
Description
Technical field
The utility model relates to the display technique field, particularly a kind of light leak test substrate and light leakage detecting device.
Background technology
At present, the English full name Thin of TFT-LCD(Film Transistor, the Chinese full name: the tft liquid crystal demonstration) array base palte of panel forms certain figure by each layer metal, nonmetal film and is deposited on formation transistor driving liquid crystal rotation on glass, along with social progress and development in science and technology, TFT-LCD has become the main product that current era shows the field, in commercial production, daily life, play vital effect, more and more be subject to people's favor.But the display quality of image of TFT-LCD all is the key factor of restriction TFT-LCD development all the time at present, the reason that affects display quality is a lot, such as raw-material pollution, liquid crystal pollution, PI pollute, the quality of production line clean level etc., these all affect the display quality of TFT-LCD; In addition, liquid crystal display also is subject to the impact of external environment, for example expose under the condition of strong ultraviolet light, display quality also can be affected greatly, this mainly be because, strong ultraviolet light can affect the a-si TFT(amorphous silicon film transistor in the liquid crystal display), make the a-si(amorphous silicon) the irreversible destruction of generation under the outer effect of strong purple light, in addition, strong ultraviolet light also can destroy the liquid crystal material of TFT-LCD viewing area, make other central potpourris of liquid crystal molecule and mixed liquid crystal produce unknown subsidiary reaction, thereby cause serious image retention.The sealed plastic box solidification process of TFT-LCD panel need to use sealed plastic box UV(ultraviolet light in present liquid crystal display manufacture process) curing apparatus, this equipment mainly comprises UV curing apparatus, conveyer, ventilation unit, testing result unit and system control unit; In process of production, be mapped to the viewing area of panel for fear of strong ultraviolet lighting, first the TFT-LCD panel is placed on the base station of light leak test substrate and light leakage detecting device, on the TFT-LCD panel, place again a UVmask layer (ultraviolet light mask equipment), the effect of UVmask layer is that the viewing area with the TFT-LCD panel shelters from, and other zones except sealed plastic box all are blocked; Only the sealed plastic box part all is exposed under the strong ultraviolet light simultaneously.Therefore, the sealed plastic box curing process requires quite high to the precision of UVmask layer design, if the viewing area is exposed to outside the UVmask layer, though sealed plastic box energy completion of cure, but can produce all demonstration problems, if the fully not sudden and violent leakage of sealed plastic box is outside, then can cause sealed plastic box to be solidified not exclusively, might cause the bad problems such as sealed plastic box fracture; These problems can not in time be found, consequence is to cause TFT-LCD panel in enormous quantities quality problems to occur, cause the tremendous economic loss.At present, existing UV solidification equipment can not show directly whether the solidification process Real-Time Monitoring has ultraviolet lighting to be mapped to the viewing area of panel when carrying out the UV curing process, and more impossible to detect which viewing area illuminated; Therefore, producers can only wait for that final products produce, and it is carried out Quality Detection, later examine the design problem of UV mask after finding quality problem again; Such light leakage detecting device uses and the UV solidification process is wasted time and energy and has increased the production cost of TFT-LCD, is unfavorable for the development of TFT-LCD; Be not only ultraviolet curing equipment, other need in the equipment use of precisely exposure at needs, the capital meets above-mentioned Similar Problems, therefore, exposure sources such as the ultraviolet curing device that a kind of light leak test substrate, light leakage detecting device need to be provided and have the light leak test function improve precision to solve, reduce loss.
Summary of the invention
The technical matters that the utility model solves is to detect exactly by the light leak to equipment before exposure, and not accurate and exposure sources such as the high problem of mask plate cost consumption cause exposing.
The purpose of this utility model is achieved through the following technical solutions: a kind of light leak test substrate, described light leak test substrate comprises: underlay substrate and the photochromic material layer that is formed on the described underlay substrate.
Also comprise second substrate, cover on the described photochromic material layer.
Described underlay substrate and described second substrate are fixing by the sealed plastic box bonding of substrate edge region, and the thickness of described sealed plastic box is not less than the thickness of described photochromic material layer.
It is for ultraviolet light mask equipment is carried out light leak test that above-mentioned Ou Guang detects substrate, and the material of described photochromic material layer comprises at least: photochromic spiropyran polymkeric substance, spiral shell-oxazines polymkeric substance, diarylethene photochromic polymer, azobenzene photochromic polymer, phenoxy group naphtho naphthoquinone photochromic polymer, the photochromic multipolymer of fulgenimide, the photochromic multipolymer of thioindigo, dithizone photochromic polymer, dihydro indolizine photochromic polymer, WO
3, MoO
3Or a kind of among the TiO2.
A kind of light leakage detecting device comprises such as each described light leak test substrate in above-mentioned; Described light leakage detecting device comprises the Collecting Pattern unit, and described Collecting Pattern unit is used for obtaining the pattern-information on the described light leak test substrate.
Also comprise the testing result unit, described testing result unit is connected the pattern-information that shows that described Collecting Pattern unit collects with described Collecting Pattern unit.
Described Collecting Pattern unit is camera.
Also comprise UV curing apparatus, be used for sending the ultraviolet light for solidifying sealed plastic box, described ultraviolet lighting is mapped on the ultraviolet light mask equipment to be detected, the ultraviolet lighting that wherein sees through described ultraviolet light mask equipment is mapped on the described light leak test substrate.
Also comprise the ultraviolet light baffle plate, described ultraviolet light baffle plate is arranged on the periphery of described UV curing apparatus, described light leak test substrate and described Collecting Pattern unit.
Also comprise ventilation unit, be positioned on the wall of described ultraviolet light baffle plate, the space that is used for described ultraviolet light baffle plate is enclosed ventilates.
Also comprise conveyer, described conveyer is used for ultraviolet light mask equipment to be detected is sent to the light inlet side of described light leak test substrate.
Also comprise system control unit, with described UV curing apparatus be connected the Collecting Pattern unit and be connected, described system control unit is used for controlling described UV curing apparatus and sends described ultraviolet light, and controls described Collecting Pattern unit and obtain pattern-information on the described light leak test substrate.
The utility model compared with prior art has advantages of following:
1, the utility model adopts the design of light leak test substrate, utilize the color reversibility of photochromic material layer under strong UV-irradiation, can effectively detect exposure sources and whether have the inaccurate regions of exposure, such as the not enough zone of light leak zone or light, and adjust the design of exposure sources with this; After adjusting the exposure sources design according to the light leak situation and replacing with adjustment, the photochromic material layer variable color situation then can not occur owing to reciprocal characteristics, and photochromatic layer can realize recycling.
2, the utility model adopts the design of Collecting Pattern unit, utilizes camera at any time to the sampling of taking pictures of the light leak test substrate in the solidification process; Simultaneously image information is sent to the testing result unit by system control unit and carries out video picture, producers can be by observing picture, whether the exposure area of answering of in time knowing device to be exposed is irradiated by light, and by observing colour developing pattern, the colour developing position on the light leak test substrate, find the inaccurate zone of concrete exposure, thereby adjust targetedly the design of exposure sources, the acceptance rate of improving product and display quality.
Description of drawings
The utility model is described in further detail below in conjunction with drawings and Examples.
Fig. 1 is the structural representation of embodiment one in the utility model;
Fig. 2 is the structural representation of embodiment two in the utility model.
Embodiment
Embodiment one:
Referring to shown in Figure 1, be a kind of light leak test substrate that the present embodiment provides, described light leak test substrate comprises: underlay substrate 1 and the photochromic material layer 2 that is formed on the described underlay substrate.
Above-mentioned light leak test substrate with photochromic material layer 2 has the function of the precision that can the detect ultraviolet light mask equipment light leak as whether, its use-pattern can for: to ultraviolet light mask equipment, when for example the UVmask layer in the ultraviolet light polymerization equipment carries out light leak test, described light leak test substrate is placed described UVmask layer below, preferably place be used to the position of placing panel to be solidified, ultraviolet light is by the top irradiation of UVmask layer, because the photochromic characteristic of photochromic material, to form pattern on the light leak test substrate, by checking this pattern, whether precisely can detect the UVmask layer, as whether producing light leakage phenomena.
Preferably, for making light leak test substrate one-piece construction more smooth, firm, can second substrate 3 be set at described underlay substrate in the present embodiment, cover on the described photochromic material layer.
Underlay substrate described in the present embodiment and described second substrate are fixing with its alignment bonding to the technique of box with vacuum by the sealed plastic box 4 of substrate edge region, and the thickness of described sealed plastic box is not less than the thickness of described photochromic material layer.
Preferably one of them is made by glass material, quartz material or transparent polymer material for underlay substrate described in the present embodiment and second substrate; Described transparent polymer material such as polyethylene terephthalate (PET), polycarbonate (PC), polymethylmethacrylate (PMMA), polyetheretherketone (PEEK), Polyethylene Naphthalate (PEN), poly-succinic ethene (PES), polypropylene oxide (PPO) etc.; Require to possess the ultraviolet light high permeability for underlay substrate, and do not interact with photochromic material, can resist the high intensity ultraviolet irradiation.
Above-mentioned light leak test substrate can be used for ultraviolet light mask equipment is carried out light leak test, and the material of the layer of photochromic material described in the present embodiment comprises at least: a kind of among photochromic spiropyran polymkeric substance, spiral shell-oxazines polymkeric substance, diarylethene photochromic polymer, azobenzene photochromic polymer, phenoxy group naphtho naphthoquinone photochromic polymer, the photochromic multipolymer of fulgenimide, the photochromic multipolymer of thioindigo, dithizone photochromic polymer, dihydro indolizine photochromic polymer, WO3, MoO3 or the TiO2.Can make the ultraviolet wavelength scope of described photochromic material layer colour developing between 300-500nm.
The Discoloration mechanism of the layer of photochromic material described in the present embodiment is that the kind by its photochromic material that mixes determines, the Discoloration mechanism of common photochromic material can be divided into heterolytic fission and the homolysis of chain, proton translocation tautomerism, cis-trans isomerism reaction, redox reaction, pericyclic reaction etc.; Take spiral shell-oxazines material layer as example, after being subjected to ultraviolet excitation, it can become blueness, and its Discoloration mechanism depends on spiral shell-oxazines photochromic compound; Under strong UV-irradiation, photochromic material spiral shell-oxazines Spirooxazine(SO) spiral shell C-O key generation heterolytic fission in the molecule, cause molecular structures and electron configuration generation isomerization and rearrangement, two ring systems by the former sub-connection of spiral shell C become copline by quadrature, form a large conjugated system photomerocyanine(PMC), at visible region absorption peak is arranged, under the effect of visible light or heat, ring closure reaction occurs and gets back to SO in PMC, consist of a typical chromic systems, this process is reversible.Spiral shell-oxazines photochromic material can become clearly blueness by water white transparency under strong UV-irradiation, then blueness can be taken off gradually when ultraviolet light no longer shines, simultaneously, the depth of color can change along with the variation of ultraviolet ray intensity, and ultraviolet light light is stronger, and then colour developing is darker.
The utility model adopts the design of light leak test substrate, utilizes the color reversibility of photochromic material layer under strong UV-irradiation, can effectively detect the UVmask layer and whether have the light leak zone, and adjust the design of UVmask layer with this; When the UVmask layer had light leakage phenomena, the photochromic material layer variable color situation can occur at opposite position; During UV mask after adjusting UV mask design according to the light leak situation and replacing with adjustment, the photochromic material layer then the variable color situation can not occur; Photochromatic layer only presents the variable color attitude under ultraviolet lighting, when removing UV-irradiation, then the photochromatic layer color can be taken off gradually, and like this, photochromatic layer then can realize recycling.
As a kind of preferred implementation, the manufacturing process of the substrate of light leak test described in the present embodiment is as follows:
For example: take the organism diarylethene as the photochromic material layer, take the glass material of 0.7t as underlay substrate and second substrate;
1, with 2 of the underlay substrates of 0.7t, clean up, and oven dry, underlay substrate and second substrate be of a size of 1100mm * 1300mm(mainly cooperate the 5th generation the liquid crystal panel production line);
2, with ODF technique (liquid crystal dripping process) diarylethene solution is instiled on underlay substrate;
3, apply sealed plastic box at second substrate, be mixed with glass fiber(glass fibre in the sealed plastic box), 50 microns of this sealed plastic box sizes can play supporting case thick.Simultaneously, inciting somebody to action up and down with vacuum to the technique of box, two substrates forms the light leak test substrate to box.
Again for example: take inorganics transition metal oxide WO3 as the photochromic material layer, the quartz plate take 2 thickness as 2mm is underlay substrate and second substrate, underlay substrate and second substrate be of a size of 2200 * 2500(cooperate the 8th generation the liquid crystal panel production line);
1, is coated to above the underlay substrate with the sol solutions of spin coating proceeding with WO3;
2, under 160 ℃ to applying the quartz substrate base plate heating of WO3, treated that its white drying solidifies;
3, apply sealed plastic box at second substrate, be mixed with glass fiber(glass fibre in the sealed plastic box), 50 microns of this sealed plastic box sizes can play supporting case thick.Simultaneously, inciting somebody to action up and down with vacuum to the technique of box, two substrates forms the light leak test substrate to box.
Embodiment two:
Light leakage detecting device in the present embodiment is the light leakage detecting device of the light leak test substrate described in a kind of embodiment of comprising; Disclosed technology contents is not repeated in this description among the embodiment one, and embodiment one disclosed content also belongs to the disclosed content of the present embodiment.
Referring to shown in Figure 2, a kind of light leakage detecting device that provides for the present embodiment, this light leakage detecting device comprises light leak test substrate 11 and Collecting Pattern unit 12, described light leak test substrate 11 is as described in the last embodiment, and described Collecting Pattern unit 12 is used for obtaining the pattern-information on the described light leak test substrate.
Described Collecting Pattern unit 12 preferably can have for camera etc. the equipment of image production function, and it gets off the Collecting Pattern that forms on the light leak test substrate for comparison and the inspection of pattern, to judge ultraviolet light mask equipment whether light leakage phenomena is arranged.
As described in Figure 2, preferably, described light leakage detecting device also UV curing apparatus 7, be used for bearing substrate base station 5, be used to the periphery to block the ultraviolet light baffle plate 6 of ultraviolet light, is connected with Collecting Pattern unit 12 and output detections result's testing result unit 8, and control the system control unit 9 that each several part moves;
(order can adjust according to actual needs) is provided with UVmask layer 10, light leak test substrate 11 and Collecting Pattern unit 12 described UVmask layers and the light leak test substrate is stacked setting from the bottom to top successively on described base station.
Base station described in the present embodiment can be a plane platform that is erected on the ultraviolet light baffle inner wall, the part that stacks UVmask layer light leak test substrate in this plane platform correspondence adopts the high glass material of penetrability to make, also can adopt the material of other high-transmittances to make, the structure of the UVmask layer base station in the present embodiment belongs to the state of the art, no longer too much gives unnecessary details herein.
The unit of Collecting Pattern described in the present embodiment is used for obtaining the pattern-information on the described light leak test substrate.Described Collecting Pattern unit comprises that a correspondence is arranged on the camera 14 of light leak test substrate top, and this camera is connected with described apparatus main body inwall by connecting link 15; Be connected with data line on this camera; Described camera is electrically connected with described testing result unit by system control unit.
The utility model adopts the design of Collecting Pattern unit, utilizes camera at any time to the sampling of taking pictures of the light leak test substrate in the solidification process; Simultaneously image information is sent to the testing result unit by system control unit and carries out video picture, producers can be by observing picture, in time know the concrete irradiation area of ultraviolet light, by observing colour developing pattern, the colour developing position on the light leak test substrate, compare with due colour developing pattern under accurate radiation situation and colour developing position, find difference, be concrete light leak zone or the not enough zone of light, thereby precisely adjust targetedly the design of UV mask, the acceptance rate of improving product and display quality.
UV curing apparatus in the present embodiment mainly comprises UV fluorescent tube, lampshade, transformer, capacitor; This device is installed in described base station below, and is corresponding with described UVmask layer, test panel and light leak test substrate position, and the strong ultraviolet light of this UV curing apparatus emission shines from bottom to top, with this UVmask layer is carried out the UV-irradiation operation; UV curing apparatus described in the present embodiment can be sent the ultraviolet light for detection of light leak, and described ultraviolet lighting is mapped on the UVmask layer to be detected, and the ultraviolet lighting that wherein sees through described UVmask layer is mapped on the described light leak test substrate; Described UV curing apparatus is connected with described system control unit by electric wire, and controls its work by system control unit.
The baffle plate of ultraviolet light described in the present embodiment is packed each parts of light leakage detecting device in it, and UV curing apparatus especially is because UV curing apparatus can be launched high-intensity ultraviolet light; Therefore, leak for avoiding light, people or the deposits yields high temperature of outside are scalded, need to establish the ultraviolet light baffle plate at the UV-irradiation place more.The baffle plate of ultraviolet light described in the present embodiment is arranged on the periphery of described UV curing apparatus, described light leak test substrate and described Collecting Pattern unit, above-mentioned each device of whole encirclement.
The unit of testing result described in the present embodiment is connected the pattern-information that shows that described Collecting Pattern unit collects with described Collecting Pattern unit; And described pattern-information and pre-stored standard information compared, export the light leak test result according to result relatively.Belong to the state of the art about the model of testing result unit in the present embodiment, specification etc., no longer too much give unnecessary details herein.
Ventilation unit described in the present embodiment (belong to prior art, do not show among the figure) is positioned on the wall of described ultraviolet light baffle plate, and the space that is used for described ultraviolet light baffle plate is enclosed ventilates.
Conveyer described in the present embodiment (belong to prior art, show among the figure) is for the light inlet side that UVmask layer to be detected is sent to described light leak test substrate.
System control unit described in the present embodiment can be used to control each component working of light leakage detecting device, the normal operation of the parts such as major control UV curing apparatus, Collecting Pattern unit, testing result unit, ventilation unit and conveyer; System control unit described in the present embodiment and described UV curing apparatus be connected the Collecting Pattern unit and be connected, described system control unit is used for controlling described UV curing apparatus and sends described ultraviolet light, and controls described Collecting Pattern unit and obtain pattern-information on the described light leak test substrate.
Belong to the state of the art about the structure of the present embodiment medium ultraviolet baffle plate, UV curing apparatus, testing result unit, ventilation unit, conveyer and system control unit, model, specification etc. in the present embodiment, no longer too much give unnecessary details herein.
The light leak test substrate that provides in the present embodiment can be applied in the ultraviolet curing device, for example: before ultraviolet curing device is cured processing to the display panel with sealed plastic box to be solidified, first described light leak test substrate is positioned over the position of display panel to be solidified, after UV-irradiation shows the colour developing pattern, the pattern that will develop the color is compared with due accurate pattern, or other test modes, the position of error identifying, be light leak position or the not enough position of light of UVmask layer, so that the UVmask layer is adjusted, use it for again real solidification process after adjusting, can improve and solidify the precision of processing, and enhance productivity;
The described light leakage detecting device that provides in the present embodiment can also be used as ultraviolet curing device, as described in Figure 2, described ultraviolet curing device also comprises panel 13 to be solidified, panel 13 to be solidified is placed between described UVmask layer 10 and the described light leak test substrate 11, not only can realize like this treating curing panel 13 and carry out the ultraviolet curing processing, can also realize solidifying in the process that panel 13 is cured or afterwards the precision of UVmask layer 10 being detected the purpose that also namely solidification effect is detected treating.
Panel to be solidified 13 described in the present embodiment can be the TFT-LCD panel.
Claims (12)
1. a light leak test substrate comprises: underlay substrate and the photochromic material layer that is formed on the described underlay substrate.
2. light leak test substrate according to claim 1 is characterized in that, also comprises second substrate, covers on the described photochromic material layer.
3. light leak test substrate according to claim 2 is characterized in that, described underlay substrate and described second substrate are fixing by the sealed plastic box bonding of substrate edge region, and the thickness of described sealed plastic box is not less than the thickness of described photochromic material layer.
4. light leak test substrate according to claim 1 is characterized in that, described light leak test substrate is for ultraviolet light mask equipment is carried out light leak test; The material of described photochromic material layer comprises at least: photochromic spiropyran polymkeric substance, spiral shell-oxazines polymkeric substance, diarylethene photochromic polymer, azobenzene photochromic polymer, phenoxy group naphtho naphthoquinone photochromic polymer, the photochromic multipolymer of fulgenimide, the photochromic multipolymer of thioindigo, dithizone photochromic polymer, dihydro indolizine photochromic polymer, WO
3, MoO
3Or a kind of among the TiO2.
5. a light leakage detecting device comprises such as each described light leak test substrate of claim 1 ~ 4; It is characterized in that, described light leakage detecting device comprises the Collecting Pattern unit, and described Collecting Pattern unit is used for obtaining the pattern-information on the described light leak test substrate.
6. light leakage detecting device according to claim 5 is characterized in that, also comprises the testing result unit, and described testing result unit is connected the pattern-information that shows that described Collecting Pattern unit collects with described Collecting Pattern unit.
7. light leakage detecting device according to claim 5 is characterized in that, described Collecting Pattern unit is camera.
8. light leakage detecting device according to claim 5, it is characterized in that, also comprise UV curing apparatus, be used for sending the ultraviolet light for solidifying sealed plastic box, described ultraviolet lighting is mapped on the ultraviolet light mask equipment to be detected, and the ultraviolet lighting that wherein sees through described ultraviolet light mask equipment is mapped on the described light leak test substrate.
9. light leakage detecting device according to claim 8 is characterized in that, also comprises the ultraviolet light baffle plate, and described ultraviolet light baffle plate is arranged on the periphery of described UV curing apparatus, described light leak test substrate and described Collecting Pattern unit.
10. light leakage detecting device according to claim 9 is characterized in that, also comprises ventilation unit, is positioned on the wall of described ultraviolet light baffle plate, and the space that is used for described ultraviolet light baffle plate is enclosed ventilates.
11. light leakage detecting device according to claim 5 is characterized in that, also comprises conveyer, described conveyer is used for ultraviolet light mask equipment to be detected is sent to the light inlet side of described light leak test substrate.
12. light leakage detecting device according to claim 8, it is characterized in that, also comprise system control unit, with described UV curing apparatus be connected the Collecting Pattern unit and be connected, described system control unit is used for controlling described UV curing apparatus and sends described ultraviolet light, and controls described Collecting Pattern unit and obtain pattern-information on the described light leak test substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220557945 CN202837747U (en) | 2012-10-26 | 2012-10-26 | Light leak detection base plate and light leak detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220557945 CN202837747U (en) | 2012-10-26 | 2012-10-26 | Light leak detection base plate and light leak detection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202837747U true CN202837747U (en) | 2013-03-27 |
Family
ID=47949414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220557945 Expired - Lifetime CN202837747U (en) | 2012-10-26 | 2012-10-26 | Light leak detection base plate and light leak detection device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202837747U (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103383468A (en) * | 2013-06-28 | 2013-11-06 | 京东方科技集团股份有限公司 | Detecting system and method of seal agent coating equipment and seal agent coating machine |
| CN103713472A (en) * | 2013-12-18 | 2014-04-09 | 合肥京东方光电科技有限公司 | System for automatically installing mask |
| CN104267532A (en) * | 2014-10-21 | 2015-01-07 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN104460059A (en) * | 2014-11-27 | 2015-03-25 | 苏州博众精工科技有限公司 | LCD light leakage detection mechanism |
| WO2016045431A1 (en) * | 2014-09-28 | 2016-03-31 | 京东方科技集团股份有限公司 | Array substrate, display panel, display apparatus, and method for repairing display panel |
| CN108153061A (en) * | 2018-01-04 | 2018-06-12 | 京东方科技集团股份有限公司 | Light orientation detection unit, light alignment method and device |
| CN108346149A (en) * | 2018-03-02 | 2018-07-31 | 北京郁金香伙伴科技有限公司 | image detection, processing method, device and terminal |
| WO2019024547A1 (en) * | 2017-08-02 | 2019-02-07 | 京东方科技集团股份有限公司 | Positive photoresist composition, via hole formation method, display substrate, and display device |
| CN113092493A (en) * | 2021-02-25 | 2021-07-09 | 深圳市智微智能软件开发有限公司 | Steel mesh detection system and method |
-
2012
- 2012-10-26 CN CN 201220557945 patent/CN202837747U/en not_active Expired - Lifetime
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014205942A1 (en) * | 2013-06-28 | 2014-12-31 | 京东方科技集团股份有限公司 | Sealing agent coating device, and detection system and detection method of same |
| CN103383468A (en) * | 2013-06-28 | 2013-11-06 | 京东方科技集团股份有限公司 | Detecting system and method of seal agent coating equipment and seal agent coating machine |
| CN103383468B (en) * | 2013-06-28 | 2016-07-06 | 京东方科技集团股份有限公司 | The detection system of sealed plastic box coating apparatus and detection method, sealed plastic box coating machine |
| CN103713472A (en) * | 2013-12-18 | 2014-04-09 | 合肥京东方光电科技有限公司 | System for automatically installing mask |
| US9880434B2 (en) | 2014-09-28 | 2018-01-30 | Boe Technology Group Co., Ltd. | Array substrate, display panel, display device and method of repairing display panel |
| WO2016045431A1 (en) * | 2014-09-28 | 2016-03-31 | 京东方科技集团股份有限公司 | Array substrate, display panel, display apparatus, and method for repairing display panel |
| CN104267532A (en) * | 2014-10-21 | 2015-01-07 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN104460059A (en) * | 2014-11-27 | 2015-03-25 | 苏州博众精工科技有限公司 | LCD light leakage detection mechanism |
| CN104460059B (en) * | 2014-11-27 | 2017-03-29 | 苏州博众精工科技有限公司 | A kind of LCD light leak tests mechanism |
| WO2019024547A1 (en) * | 2017-08-02 | 2019-02-07 | 京东方科技集团股份有限公司 | Positive photoresist composition, via hole formation method, display substrate, and display device |
| US11526077B2 (en) | 2017-08-02 | 2022-12-13 | Beijing Boe Technology Development Co., Ltd. | Positive photoresist composition, via-forming method, display substrate and display device |
| CN108153061A (en) * | 2018-01-04 | 2018-06-12 | 京东方科技集团股份有限公司 | Light orientation detection unit, light alignment method and device |
| CN108153061B (en) * | 2018-01-04 | 2020-12-01 | 京东方科技集团股份有限公司 | Optical alignment detection unit, optical alignment method and device |
| CN108346149A (en) * | 2018-03-02 | 2018-07-31 | 北京郁金香伙伴科技有限公司 | image detection, processing method, device and terminal |
| CN108346149B (en) * | 2018-03-02 | 2021-03-12 | 北京郁金香伙伴科技有限公司 | Image detection and processing method and device and terminal |
| CN113092493A (en) * | 2021-02-25 | 2021-07-09 | 深圳市智微智能软件开发有限公司 | Steel mesh detection system and method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN202837747U (en) | Light leak detection base plate and light leak detection device | |
| CN102636904B (en) | Color filter and production method thereof as well as liquid crystal panel | |
| CN203982043U (en) | Ultraviolet shadow shield and sealed plastic box ultra-violet curing device | |
| CN104808377B (en) | The method for showing alignment mark position, array base palte and preparation method thereof | |
| US20150092142A1 (en) | Liquid crystal display device and manufacturing method thereof | |
| CN102799018A (en) | Liquid crystal display panel and manufacturing method thereof | |
| CN203299492U (en) | Colored-film substrate, display panel and display device | |
| CN100424560C (en) | Liquid crystal display device and manufacturing method thereof | |
| CN103777406A (en) | Method for solidifying frame adhesives in liquid crystal panel manufacturing and liquid crystal panel | |
| CN102436094B (en) | Liquid crystal display device and manufacturing method thereof | |
| CN104777665A (en) | Method for manufacturing black matrix | |
| CN105739166A (en) | Liquid crystal display module and liquid crystal display device | |
| CN106909023A (en) | A kind of mask plate and its manufacture method | |
| WO2013004053A1 (en) | Device, method, sample table and light source device for making pre-tilt angle of liquid crystal panel | |
| CN201611423U (en) | Masking device | |
| CN114355659B (en) | Manufacturing method of optical display device based on array substrate structure | |
| CN105807475A (en) | Color film substrate, preparing method of color film substrate, display panel and display device | |
| EP3200015B1 (en) | Array substrate, display panel, display apparatus, and method for repairing display panel | |
| US20050140915A1 (en) | Liquid crystal display device having column spacers and method of fabricating the same | |
| CN206292499U (en) | A kind of liquid crystal display device | |
| CN101221334B (en) | Transmission type liquid crystal display device and method for fabricating the same | |
| CN203786440U (en) | Mask plate | |
| CN208654494U (en) | A kind of liquid crystal display device | |
| US20090215346A1 (en) | Method for Fabricating Micro Pixel Liquid Crystal Display | |
| CN106733543B (en) | Ultraviolet curing machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130327 |