CN202786638U

CN202786638U - Burnt-out imitation silk borcade velvet

Info

Publication number: CN202786638U
Application number: CN 201220492536
Authority: CN
Inventors: 沈华民; 缪芳芳; 王代强; 贺伟中
Original assignee: SHAOXING COUNTY ZHENQI TEXTILE CO Ltd
Current assignee: SHAOXING COUNTY ZHENQI TEXTILE CO Ltd
Priority date: 2012-09-22
Filing date: 2012-09-22
Publication date: 2013-03-13
Anticipated expiration: 2022-09-22

Abstract

The utility model relates to velvet, in particular to burnt-out imitation silk borcade velvet, and belongs to the field of textile technology. An upper velour layer, a lower velour layer and a bottom fabric layer are weaved in a jacquard mode and knitted in a weft mode and then tidied to form the burnt-out imitation silk borcade velvet, the bottom fabric layer is a plain weave or changeable plain weave fabric, the upper velour layer and the lower velour layer are fixed on weft yarn of the bottom fabric layer in a W or M mode, the upper velour layer and the lower velour layer are vertically arranged on the bottom fabric layer to form a whole piece of velour layer, and the upper velour layer and the lower velour layer are arranged in a point and block mode. A traditional method that part of velour is dissolved after acid and alkali processing is abandoned, and a novel manufacturing process of jacquard weaving, weaving, knitting and tidying of the velour layer and the bottom fabric layer is created. The burnt-out imitation silk borcade velvet is strong in third dimension, full in pattern, and unique in style, and is especially popular with users.

Description

A kind of silk borcade velvet of imitative etching

Technical field

The utility model relates to a kind of velvet, relates in particular to a kind of silk borcade velvet of imitative etching, belongs to textile technology field.

Background technology

Burn-out printing is to be core through terylene, coats respectively or blending woven into fabric with fibers such as cotton, acetic acid, viscose glue, fiber crops.Then according to they character different to absolute acid stability, wintercherry corrosion its acid nonfast fiber of charing (i.e. the fibers such as cotton, acetic acid, viscose glue, fiber crops) keeps its acidproof fiber terylene on above-mentioned fabrics, has so just become translucent decorative pattern.When the seal wintercherry, also can print simultaneously with the crisperding of whitewash as the etching part, or in wintercherry, add acid proof DISPERSE DYES, make the terylene of decorative pattern part painted; Or print first coating as resist printing mill base, over print wintercherry is again being printed at coating and partly to be produced resist printing effect; Or before the etching fabric is dyeed first etching etc. again; Make the colored shape of making rich and varied.

At present; etched-out velvet at production and application; also be to have used to have several raw materials of differential responses to be woven into velvet to acid or alkali; then process by soda acid, a part of velvet fine hair is dissolved, thereby it is strong to form third dimension; the plentiful pattern of flower type; receive praises from customers, but because soda acid pollutes the environment, certainly will will be eliminated by the environmental protection cleaner production.

Summary of the invention

In order to solve the above problems, the purpose of this utility model provides a kind of the processing without soda acid just can produce that to have equally third dimension strong, the silk borcade velvet of a kind of imitative etching of the colored equally plentiful sensation of type.

To achieve the above object, the utility model has adopted following technical scheme: a kind of silk borcade velvet of imitative etching, its structure mainly comprises: upper tapetum, bottom fabric layer, lower tapetum, weft yarn, the silk borcade velvet of described imitative etching is to be put in order after drawing latitude by upper tapetum, lower tapetum and bottom fabric layer jacquard weaving to form.

Above-mentioned bottom fabric layer is plain weave or changes plain cloth.

Above-mentioned upper tapetum, lower tapetum are that the form with " W " or " M " is cemented on the weft yarn of bottom fabric layer; Upper tapetum, lower tapetum stand on and form the monoblock tapetum on the bottom fabric layer.

Above-mentioned upper tapetum, lower tapetum are point-like, the block layout by design.

The beneficial effects of the utility model: the method that after having abandoned traditional technique soda acid and processing a part of velvet fine hair has been dissolved, start the coming of new technique that adopts tapetum and bottom fabric layer jacquard weave, weaves, draws latitude, arrangement.And the imitative etching silk borcade velvet that forms, third dimension is strong, and the flower type is plentiful, and novel in style receives praises from customers.

Description of drawings

Fig. 1 is the section institutional framework schematic diagram of the silk borcade velvet of a kind of imitative etching of the utility model.

Fig. 2 is section and the integral plane effect schematic diagram of the silk borcade velvet of a kind of imitative etching of the utility model.

The upper tapetum of 1-among the figure, 2-bottom fabric layer, tapetum under the 3-, 4-weft yarn.

The specific embodiment

Below in conjunction with accompanying drawing 1-2 the specific embodiment of the present utility model is made a detailed explanation.

Embodiment: a kind of silk borcade velvet of imitative etching, its structure mainly comprises: upper tapetum 1, bottom fabric layer 2, lower tapetum 3, weft yarn 4, the silk borcade velvet of described imitative etching are to be put in order with bottom fabric layer 2 jacquard weavings by upper tapetum 1, lower tapetum 3 to form after drawing latitude.

Described bottom fabric layer 2 is plain weaves or changes plain cloth.

Described upper tapetum 1, lower tapetum 3 are that the form with " W " or " M " is cemented on the weft yarn 4 of bottom fabric layer 2; Upper tapetum 1, lower tapetum 3 stand on and form the monoblock tapetum on the bottom fabric layer 2.

Described upper tapetum 1, lower tapetum 3 are point-like, the block layout by design.Point-like described here, the block layout refer to: required according to the design design, there is colored type zone tapetum to stand upright on the one side of bottom fabric layer 2, stand upright on the another side of bottom fabric layer 2 without flower type zone tapetum, colored type zone is arranged with interregional every forming pattern, so just whole silk borcade velvet that has formed imitative etching without the flower type.

Claims

1. the silk borcade velvet of an imitative etching, its structure mainly comprises: upper tapetum (1), bottom fabric layer (2), lower tapetum (3), weft yarn (4) is characterized in that: the silk borcade velvet of imitative etching is to be put in order with bottom fabric layer (2) jacquard weaving by upper tapetum (1), lower tapetum (3) to form after drawing latitude.

2. the silk borcade velvet of a kind of imitative etching according to claim 1 is characterized in that described bottom fabric layer (2) is plain weave or changes plain cloth.

3. the silk borcade velvet of a kind of imitative etching according to claim 1 is characterized in that described upper tapetum (1), lower tapetum (3) are that form with " W " or " M " is cemented on the weft yarn (4) of bottom fabric layer (2); Upper tapetum (1), lower tapetum (3) stand on the upper monoblock tapetum that forms of bottom fabric layer (2).

4. the silk borcade velvet of a kind of imitative etching according to claim 1 is characterized in that described upper tapetum (1), lower tapetum (3), is point-like, the block layout by design.