CN202785675U - System for preparing trichlorosilane through cold hydrogenation of silicon tetrachloride - Google Patents
System for preparing trichlorosilane through cold hydrogenation of silicon tetrachloride Download PDFInfo
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- CN202785675U CN202785675U CN2012203981458U CN201220398145U CN202785675U CN 202785675 U CN202785675 U CN 202785675U CN 2012203981458 U CN2012203981458 U CN 2012203981458U CN 201220398145 U CN201220398145 U CN 201220398145U CN 202785675 U CN202785675 U CN 202785675U
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Abstract
The utility model discloses a system for preparing trichlorosilane through cold hydrogenation of silicon tetrachloride. The system comprises a hydrogenation reactor and tail gas processing equipment, wherein the hydrogenation reactor enables reaction gas and a reaction material to react to obtain the trichlorosilane, the tail gas processing equipment processes synthesis tail gas from the hydrogenation reactor and comprises a gas filter device, a condensing device and a separation tower which are sequentially connected, and the gas filter device is internally provided with a ceramic filter element. According to the system for preparing trichlorosilane through cold hydrogenation of silicon tetrachloride exemplified by the utility model, the hydrogenation reactor enables reaction gas and the reaction material to react to obtain the trichlorosilane, the tail gas processing equipment processes the synthesis tail gas from the hydrogenation reactor, the ceramic filter element has the excellent characteristics of high temperature resistance and corrosion resistance, the material quality is stable and the gas filter device with the ceramic filter element is adopted, so that the quality of a polycrystalline silicon product is not affected.
Description
Technical field
The utility model relates to the polysilicon preparing technical field, and more specifically, the utility model relates to the system that the cold hydrogenation of a kind of silicon tetrachloride prepares trichlorosilane.
Background technology
China's present stage polysilicon project Technology all belongs to the Siemens process technology more than 85%, in this Technology, a very important link is producing trichlorosilane by coldly hydrogenating silicon tetrachloride.
Produce in the process of polysilicon at improved Siemens, 1 ton of polysilicon of every production has the silicon tetrachloride by product generation of 20t nearly, and one 2000 tons polysilicon factories then produce more than 40000 ton of silicon tetrachloride every year.Silicon tetrachloride is liquid under the normal temperature, unsuitable accumulating.The market capacity of silicon tetrachloride is limited simultaneously, and this has all caused the situation of silicon tetrachloride difficult treatment.Along with the expansion of polysilicon industrialized scale, the processing difficult problem of silicon tetrachloride by product has become the bottleneck of the extensive industrialization of the domestic polysilicon of restriction.After the financial crisis, the polysilicon price significantly glides, and has reduced production costs into the lifeline of polysilicon development.And the utilization by hydrogenation technology, silicon tetrachloride as by-product is converted into raw material trichlorosilane, can realizes the material closed cycle of production of polysilicon, realize the cleaner production of polysilicon, can from reducing production costs to the full extent, be the extensive industrialization solution fundamental issue of polysilicon simultaneously.But domestic production of polysilicon technology is owing to start late, compare with advanced foreign technology and to have certain distance, wherein the most obvious is exactly that the hydrogenation of silicon tetrachloride technological gap is larger, in technology is that all right ripe situation, along with the expansion of Chinese polysilicon industry size, the problem of silicon tetrachloride can be day by day obvious.
The present domestic two kinds of hydrogenation of silicon tetrachloride technology that have, a kind of is hot hydrogenation technology, in the hydrogenation furnace of high temperature, silicon tetrachloride and hydrogen reaction is produced trichlorosilane.There are several larger problems in this technology:
1, spare parts somewhat expensive, maintenance cost is high.
2, exhaust treatment system is complicated, and system is huge.
3, transformation efficiency is not high, and generally all about 20%, and power consumption is high.
4, heating member is raw material of wood-charcoal, and the polysilicon end product quality is had considerable influence.
Another hydrogenation technology is cold hydrogenation technology, also is the technology that present most domestic producer adopts.This technology is take nickel salt or granular nickel as catalyst, at first catalyst is mixed activating with silica flour, and then blanking is to reactor.Control certain temperature, pressure, so that H
2With SiCl
4Mixed gas and silica flour contact with boiling state in reactor and carry out hydrogenation, the part converting silicon tetrachloride is trichlorosilane, and its product kind is purified and separated through after the dedusting, isolated trichlorosilane is product, and silicon tetrachloride makes its iterative cycles conversion reclaim after separating.Its reaction equation is:
3SiCl
4＋Si＋2H
2＝4SiHCl
3
The defective that this technology exists is as follows:
1, used catalyst is nickel salt or granular nickel, and is expensive, causes production cost high.
2, catalyst needs high-temperature activation with after silica flour mixes, and energy consumption is high, causes production cost high.
3, silicon tetrachloride and hydrogen mixed gas heating unit are unreasonable, and temperature is lower, cause transformation efficiency low.
4, cloth envelop collector is adopted in dedusting, and non-refractory is fragile, and it is high to change the frequency, and the maintenance difficulty is large.
The utility model content
The utility model one of is intended to solve the problems of the technologies described above at least to a certain extent or provides at least a kind of useful commerce to select.
For this reason, a purpose of the present utility model is to propose the system that a kind of energy consumption is low, transformation efficiency the is high cold hydrogenation of silicon tetrachloride prepares trichlorosilane.
Cold hydrogenation prepares the system of trichlorosilane according to the silicon tetrachloride of the utility model example, described system comprises hydrogenation reactor and tail gas treatment device, described hydrogenation reactor makes reactant gases and reaction mass reaction obtain trichlorosilane, described tail gas treatment device will be processed from the synthesis tail gas of described hydrogenation reactor, described tail gas treatment device comprises the gas-filtering device that connects successively, condensing works and knockout tower, wherein, be provided with ceramic element in the described gas-filtering device, described gas-filtering device flows to described condensing works after being used for filtering from the synthesis tail gas of described hydrogenation reactor, synthesis tail gas after described condensing works is used for filtering is separated into liquid chlorosilane and the hydrogen of gaseous state, described knockout tower carries out separating-purifying with the chlorosilane of liquid state, obtains trichlorosilane and the high boiling material that is rich in silicon tetrachloride.
Cold hydrogenation prepares the system of trichlorosilane according to the silicon tetrachloride of the utility model example, make reactant gases and reaction mass reaction obtain trichlorosilane by hydrogenation reactor, to process from the synthesis tail gas of hydrogenation reactor by tail gas treatment device, owing to adopt the gas-filtering device that is provided with ceramic element, and that ceramic element has is high temperature resistant, therefore corrosion resistant good characteristic, and stable material quality can not impact the polysilicon product quality.
In addition, cold hydrogenation prepares the system of trichlorosilane according to the silicon tetrachloride of the above-mentioned example of the utility model, can also have following additional technical characterictic:
Described system also comprises: pressurizing device, mixing tank, preheating oven, the gaseous hydrogen that described pressurizing device is connected discharging in the described condensing works with the air outlet of described condensing works carries out pressure treatment, the inlet mouth of mixing tank respectively with the air outlet of described pressurizing device be connected the leakage fluid dram of knockout tower and be connected to mix with gaseous hydrogen from the process pressure treatment of described pressurizing device from the high boiling material that is rich in silicon tetrachloride of described knockout tower, obtain mixed gas and offer described preheating oven, described preheating oven links to each other described mixed gas to be carried out preheating and offers described hydrogenation reactor with the venting port of described mixing tank and the inlet mouth of described hydrogenation reactor respectively.
Described system also comprises drying oven, and described drying oven links to each other that with the opening for feed of described hydrogenation reactor described reaction mass is mixed and be dry.
Described condensing works comprises first-stage condenser, secondary condenser and the three grades of condensers that connect successively.
Described gas-filtering device comprises the upper cover that connects successively from top to bottom, vertical tube part and lower cover, wherein, the top of described gas-filtering device is provided with for the air outlet of discharging the gas after filtering and bottom and is provided with for the slag-drip opening of discharging waste residue, the bottom of described vertical tube part is provided with for the inlet mouth that imports gas to be filtered in described straight tube, and the top of described inlet mouth is provided with filter house, described filter house comprises the floral disc that is provided with through hole and is located at ceramic element in the described through hole, described gas-filtering device also comprises: heat exchange jacket, described heat exchange jacket is located at the outside of described vertical tube part, and the bottom of described heat exchange jacket is provided with the heat transferring medium import and top is provided with the heat transferring medium outlet.
Described through hole is a plurality of, and described a plurality of through holes are equipped with described ceramic element along the radial and axial even distribution of described floral disc in each described through hole.
The number of described through hole and described ceramic element is configured to flow rate control with described gas at 0.01～0.2m/s.
Described ceramic element is fixed on the described floral disc by fastening piece, described fastening piece comprises set collar and gland, described set collar be welded on the described floral disc and the endoporus of described set collar corresponding with described through hole, described gland snaps onto the top of described ceramic element and is connected that with described set collar described ceramic element is fixed in the described through hole.
Described ceramic element is the aluminum oxide filter core.
The filtering accuracy of described aluminum oxide filter core is 800～1500 orders.
Also be provided with air inlet endless tube and traverse baffle in the described vertical tube part, described air inlet endless tube is connected with described inlet mouth, and described traverse baffle is between described ceramic element and described air inlet endless tube.
Be interval with equably a plurality of outlets on the described air inlet endless tube, and described traverse baffle has a plurality ofly, described a plurality of traverse baffles rise and evenly distribute on the circumferential direction of described vertical tube part along the spiral inner wall of described vertical tube part.
Described vertical tube part is provided with access hole, and described access hole is positioned at the top of described filter house.
Described air outlet is located at the top of described upper cover and the bottom that described slag-drip opening is located at described lower cover.
Additional aspect of the present utility model and advantage in the following description part provide, and part will become obviously from the following description, or recognize by practice of the present utility model.
Description of drawings
Above-mentioned and/or additional aspect of the present utility model and advantage are from obviously and easily understanding becoming the description of example in conjunction with following accompanying drawing, wherein:
Fig. 1 is the system schematic that cold hydrogenation prepares trichlorosilane according to the silicon tetrachloride of an example of the present utility model;
Fig. 2 is according to gases used filter apparatus configuration synoptic diagram in the example of the present utility model;
Fig. 3 is according to gases used filtration unit ceramic element distribution schematic diagram in the example of the present utility model;
Fig. 4 is according to gases used filtration unit ceramic element fastening piece synoptic diagram in the example of the present utility model.
Embodiment
The below describes example of the present utility model in detail, and the example of described example is shown in the drawings, and wherein identical or similar label represents identical or similar element or the element with identical or similar functions from start to finish.Be exemplary below by the example that is described with reference to the drawings, be intended to for explaining the utility model, and can not be interpreted as restriction of the present utility model.
In description of the present utility model, it will be appreciated that, term " " center "; " vertically "; " laterally "; " length "; " width "; " thickness ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end " " interior ", " outward ", " clockwise ", orientation or the position relationship of indications such as " counterclockwise " are based on orientation shown in the drawings or position relationship, only be for convenience of description the utility model and simplified characterization, rather than device or the element of indication or hint indication must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as restriction of the present utility model.
In addition, term " first ", " second " only are used for describing purpose, and can not be interpreted as indication or hint relative importance or the implicit quantity that indicates indicated technical characterictic.Thus, one or more these features can be expressed or impliedly be comprised to the feature that is limited with " first ", " second ".In description of the present utility model, the implication of " a plurality of " is two or more, unless clear and definite concrete restriction is arranged in addition.
In the utility model, unless clear and definite regulation and restriction are arranged in addition, broad understanding should be done in the terms such as term " installation ", " linking to each other ", " connection ", " fixing ", for example, can be to be fixedly connected with, and also can be to removably connect, or connect integratedly; Can be mechanical connection, also can be to be electrically connected; Can be directly to link to each other, also can indirectly link to each other by intermediary, can be the connection of two element internals.For the ordinary skill in the art, can understand as the case may be the concrete meaning of above-mentioned term in the utility model.
In the utility model, unless clear and definite regulation and restriction are arranged in addition, First Characteristic Second Characteristic it " on " or D score can comprise that the first and second features directly contact, can comprise that also the first and second features are not directly contacts but by the other feature contact between them.And, First Characteristic Second Characteristic " on ", " top " and " above " comprise First Characteristic directly over Second Characteristic and oblique upper, or only represent that the First Characteristic level height is higher than Second Characteristic.First Characteristic Second Characteristic " under ", " below " and " below " comprise First Characteristic directly over Second Characteristic and oblique upper, or only represent that the First Characteristic level height is less than Second Characteristic.
The below at first describes the system that according to the silicon tetrachloride of the utility model example cold hydrogenation prepares trichlorosilane with reference to the accompanying drawings.
As shown in Figure 1, the system that cold hydrogenation prepares trichlorosilane according to the silicon tetrachloride of the utility model example comprises: hydrogenation reactor 10 and tail gas treatment device.
Be provided with ceramic element in the gas-filtering device 20, gas-filtering device 20 flows to condensing works 30 after being used for filtering from the synthesis tail gas of hydrogenation reactor 10, synthesis tail gas after condensing works 30 is used for filtering is separated into liquid chlorosilane and the hydrogen of gaseous state, knockout tower 40 carries out separating-purifying with the chlorosilane of liquid state, obtains trichlorosilane and the high boiling material that is rich in silicon tetrachloride.
Thus, cold hydrogenation prepares the system of trichlorosilane according to the silicon tetrachloride of the utility model example, make reactant gases and reaction mass reaction obtain trichlorosilane by hydrogenation reactor, to process from the synthesis tail gas of hydrogenation reactor by tail gas treatment device, owing to adopt the gas-filtering device be provided with ceramic element, and that ceramic element has is high temperature resistant, corrosion resistant good characteristic, and stable material quality, therefore can not impact the polysilicon product quality.
In one example, described system also comprises: pressurizing device 80, mixing tank 50 and preheating oven 60.
The gaseous hydrogen that pressurizing device 80 is connected with the air outlet of condensing works 30 so that condensing works 30 is discharged carries out pressure treatment, the inlet mouth of mixing tank 50 be connected with the leakage fluid dram are connected with knockout tower in the air outlet of pressurizing device 80 respectively with future self-separation tower 40 the high boiling material that is rich in silicon tetrachloride mix with gaseous hydrogen from the process pressure treatment of pressurizing device 80, obtain mixed gas and offer preheating oven 60, preheating oven 60 links to each other described mixed gas to be carried out preheating and offers hydrogenation reactor 10 with the venting port of mixing tank 50 and the inlet mouth of hydrogenation reactor 10 respectively.Thus, can be before hydrogenation mixing and the preheating of realization response gas, to mixed gas by Multi-stage heating to 450～550 ℃ and then carry out hydrogenation, guaranteed that temperature of reaction is higher, thereby helped to improve transformation efficiency, in addition, the mixing tank 50 in the future high boiling material that is rich in silicon tetrachloride of self-separation tower 40 mixes with hydrogen from the gaseous state of condensing works 30, take full advantage of the rear tail gas of reaction, realize recycle, saved cost.
Further, in one example, described system also comprises drying oven 70, and drying oven 70 links to each other that with the opening for feed of hydrogenation reactor 10 described reaction mass is mixed and be dry.Thus, mixing that can the realization response material, reaction mass can also be dewatered, the control hydrogen flow rate is 0.05～0.4m/s in the dehydration, drying temperature rises to 150 ℃ from 50 ℃, be controlled to be 4～8h time of drying, in low temperature dewatering, also can carry out low-temperature activation to mixture, thereby improve speed of reaction.
In one example, condensing works 30 comprises first-stage condenser 31, secondary condenser 32 and the three grades of condensers 33 that connect successively.Thus, by the setting of multi-stage condensing device, the synthesis tail gas after filtering can be separated into liquid chlorosilane and the hydrogen of gaseous state fully.
Below in conjunction with Fig. 2-Fig. 4 gas-filtering device used in the said system is described.
As shown in Figure 2, preferably, this gas-filtering device 20 can comprise: the upper cover 210, vertical tube part 220, lower cover 230 and the heat exchange jacket 240 that connect successively from top to bottom.
Wherein, the top of gas-filtering device 20 is provided with for the air outlet 211 of discharging the gas after filtering and bottom and is provided with for the slag-drip opening 231 of discharging waste residue, the bottom of vertical tube part 220 is provided with for the inlet mouth 221 that imports gas to be filtered in described straight tube, and the top of inlet mouth 221 is provided with filter house, filter house comprises the floral disc 222 that is provided with through hole and is located at ceramic element 223 in the through hole, heat exchange jacket 240 is located at the outside of vertical tube part 220, and the bottom of heat exchange jacket 240 is provided with heat transferring medium import 241 and top is provided with heat transferring medium outlet 242.
Thus, according to the above-mentioned gas filtration unit, owing to adopted ceramic element 223, so that gas-filtering device has is high temperature resistant, corrosion resistant good characteristic, and stable material quality can not impact the polysilicon product quality; Ceramic element 223 can produce the filter core of different accuracy, and ceramic element 223 moulding be simple according to the requirement of filtering accuracy, and scale operation is easy, and is cheap; The gas-filtering device outside is provided with heat exchange jacket 240, can guarantee filtration temperature, effectively prevents the condensation of gas, can prevent effectively that also portion temperature is too high, causes the damage of built-in fastening piece.
Further contemplate cost and mass production problem, in one example, preferably, ceramic element 223 is the aluminum oxide filter core.Thus, the ceramic element 223 of this material both can satisfy high temperature resistant, corrosion resistant requirement, and easily scale operation, can further reduce production costs.
In one example, as shown in Figure 3, through hole is a plurality of, and a plurality of through holes are equipped with ceramic element 223 along the radial and axial even distribution of floral disc 222 in each through hole.Thus, by a plurality of through holes are set, can will filter the duct separately, arrange that according to the size of heat interchanging area and floral disc 222 ceramic element 223 reaches filter effect, avoiding the duct obstruction occurring filtering is whole out of use situation, improves the practicality of filtration unit.
Consider the problem of gas volume and filtration area, in one example, the number of through hole and ceramic element 223 is configured to flow rate control with described gas at 0.01～0.2m/s.Thus, gas is filtered more fully.
In one example, as shown in Figure 4, ceramic element 223 is fixed on the floral disc 222 by fastening piece, described fastening piece comprises set collar 2241 and gland 2242, set collar 2241 be welded on the floral disc 222 and the endoporus of set collar 2241 corresponding with through hole, gland 2242 snaps onto the top of ceramic element 223 and is connected that with set collar 2241 ceramic element 223 is fixed in the through hole.Thus, ceramic element 223 can be fixed on the floral disc 222, and fixed form is reasonable, conveniently dismantles, reduction maintenance difficulty is installed.
In one example, the filtering accuracy of described aluminum oxide filter core is 800～1500 orders.Thus, can filter out as required the larger dust of order number.
In one example, also be provided with air inlet endless tube 225 and traverse baffle 226 in the vertical tube part 220, air inlet endless tube 225 is connected with inlet mouth 221, and traverse baffle 226 is between ceramic element 226 and air inlet endless tube 225.Further, in one example, be interval with equably a plurality of air outlets 2251 on the air inlet endless tube 225, and traverse baffle 226 has a plurality ofly, a plurality of traverse baffles 226 rise and evenly distribute on the circumferential direction of vertical tube part 220 along the spiral inner wall of vertical tube part 220.Thus, air inlet endless tube 225 and traverse baffle 226 can guarantee effectively that air inlet is even, reach to promote the uniform purpose of filter element filtering, and simultaneously, the dust in the air-flow can part sedimentation under traverse baffle 226 effect, reaches the effect that alleviated the filter core load.
Advantageously, in one example, vertical tube part 220 is provided with access hole 227, and access hole 227 is positioned at the top of described filter house.Thus, by access hole 227 is set, can conveniently carry out trouble shooting, not need detaching equipment.
In one example, air outlet 211 is located at the top of upper cover 210 and the bottom that slag-drip opening 231 is located at lower cover 230.Thus, can so that the deslagging of filtration unit, save the process of detaching equipment.
In the description of this specification sheets, the description of reference term " embodiment ", " some embodiment ", " example ", " concrete example " or " some examples " etc. means to be contained at least one example of the present utility model or the example in conjunction with specific features, structure, material or the characteristics of this example or example description.In this manual, the schematic statement of above-mentioned term not necessarily referred to identical example or example.And the specific features of description, structure, material or characteristics can be with suitable mode combinations in any one or more examples or example.
Although illustrated and described example of the present utility model, those having ordinary skill in the art will appreciate that: can carry out multiple variation, modification, replacement and modification to these examples in the situation that does not break away from principle of the present utility model and aim, scope of the present utility model is limited by claim and equivalent thereof.
Claims (14)
1. the cold hydrogenation of silicon tetrachloride prepares the system of trichlorosilane, it is characterized in that, described system comprises hydrogenation reactor and tail gas treatment device, described hydrogenation reactor makes reactant gases and reaction mass reaction obtain trichlorosilane, described tail gas treatment device will be processed from the synthesis tail gas of described hydrogenation reactor, described tail gas treatment device comprises gas-filtering device, condensing works and the knockout tower that connects successively
Wherein, be provided with ceramic element in the described gas-filtering device, described gas-filtering device flows to described condensing works after being used for filtering from the synthesis tail gas of described hydrogenation reactor,
Synthesis tail gas after described condensing works is used for filtering is separated into liquid chlorosilane and the hydrogen of gaseous state,
Described knockout tower carries out separating-purifying with the chlorosilane of liquid state, obtains trichlorosilane and the high boiling material that is rich in silicon tetrachloride.
2. the cold hydrogenation of silicon tetrachloride according to claim 1 prepares the system of trichlorosilane, it is characterized in that described system also comprises: pressurizing device, mixing tank, preheating oven,
Wherein, the gaseous hydrogen that described pressurizing device is connected discharging in the described condensing works with the air outlet of described condensing works carries out pressure treatment, the inlet mouth of mixing tank respectively with the air outlet of described pressurizing device be connected the leakage fluid dram of knockout tower and be connected to mix with gaseous hydrogen from the process pressure treatment of described pressurizing device from the high boiling material that is rich in silicon tetrachloride of described knockout tower, obtain mixed gas and offer described preheating oven
Described preheating oven links to each other described mixed gas to be carried out preheating and offers described hydrogenation reactor with the venting port of described mixing tank and the inlet mouth of described hydrogenation reactor respectively.
3. the cold hydrogenation of silicon tetrachloride according to claim 2 prepares the system of trichlorosilane, it is characterized in that described system also comprises drying oven, and described drying oven links to each other that with the opening for feed of described hydrogenation reactor described reaction mass is mixed and be dry.
4. the cold hydrogenation of silicon tetrachloride according to claim 1 prepares the system of trichlorosilane, it is characterized in that, described condensing works comprises first-stage condenser, secondary condenser and the three grades of condensers that connect successively.
5. the cold hydrogenation of silicon tetrachloride according to claim 1 prepares the system of trichlorosilane, it is characterized in that, described gas-filtering device comprises upper cover, vertical tube part and the lower cover that connects successively from top to bottom, wherein,
The top of described gas-filtering device is provided with for the air outlet of discharging the gas after filtering and bottom and is provided with for the slag-drip opening of discharging waste residue,
The bottom of described vertical tube part is provided with for the inlet mouth that imports gas to be filtered in described straight tube, and the top of described inlet mouth is provided with filter house, and described filter house comprises the floral disc that is provided with through hole and be located at ceramic element in the described through hole,
Described gas-filtering device also comprises:
Heat exchange jacket, described heat exchange jacket is located at the outside of described vertical tube part, and the bottom of described heat exchange jacket is provided with the heat transferring medium import and top is provided with the heat transferring medium outlet.
6. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, described through hole is a plurality of, and described a plurality of through holes are equipped with described ceramic element along the radial and axial even distribution of described floral disc in each described through hole.
7. the cold hydrogenation of silicon tetrachloride according to claim 6 prepares the system of trichlorosilane, it is characterized in that, the number of described through hole and described ceramic element is configured to flow rate control with described gas at 0.01～0.2m/s.
8. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, described ceramic element is fixed on the described floral disc by fastening piece, described fastening piece comprises set collar and gland, described set collar be welded on the described floral disc and the endoporus of described set collar corresponding with described through hole, described gland snaps onto the top of described ceramic element and is connected that with described set collar described ceramic element is fixed in the described through hole.
9. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, described ceramic element is the aluminum oxide filter core.
10. the cold hydrogenation of silicon tetrachloride according to claim 9 prepares the system of trichlorosilane, it is characterized in that, the filtering accuracy of described aluminum oxide filter core is 800～1500 orders.
11. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, also be provided with air inlet endless tube and traverse baffle in the described vertical tube part, described air inlet endless tube is connected with described inlet mouth, and described traverse baffle is between described ceramic element and described air inlet endless tube.
12. the cold hydrogenation of silicon tetrachloride according to claim 11 prepares the system of trichlorosilane, it is characterized in that, be interval with equably a plurality of outlets on the described air inlet endless tube, and described traverse baffle has a plurality of, and described a plurality of traverse baffles rise and evenly distribution on the circumferential direction of described vertical tube part along the spiral inner wall of described vertical tube part.
13. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, described vertical tube part is provided with access hole, and described access hole is positioned at the top of described filter house.
14. the cold hydrogenation of silicon tetrachloride according to claim 5 prepares the system of trichlorosilane, it is characterized in that, described air outlet is located at the top of described upper cover and the bottom that described slag-drip opening is located at described lower cover.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012203981458U CN202785675U (en) | 2012-08-10 | 2012-08-10 | System for preparing trichlorosilane through cold hydrogenation of silicon tetrachloride |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102815705A (en) * | 2012-08-10 | 2012-12-12 | 中国恩菲工程技术有限公司 | System and method for preparing trichlorosilane through silicon tetrachloride cold hydrogenation |
| CN106861562A (en) * | 2017-03-25 | 2017-06-20 | 上海复榆新材料科技有限公司 | A kind of reaction unit for preparing Si hydrophobic Y zeolite adsorbents high |
-
2012
- 2012-08-10 CN CN2012203981458U patent/CN202785675U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102815705A (en) * | 2012-08-10 | 2012-12-12 | 中国恩菲工程技术有限公司 | System and method for preparing trichlorosilane through silicon tetrachloride cold hydrogenation |
| CN106861562A (en) * | 2017-03-25 | 2017-06-20 | 上海复榆新材料科技有限公司 | A kind of reaction unit for preparing Si hydrophobic Y zeolite adsorbents high |
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