CN202725584U - Thermal field device cleaning workbench - Google Patents
Thermal field device cleaning workbench Download PDFInfo
- Publication number
- CN202725584U CN202725584U CN 201220278815 CN201220278815U CN202725584U CN 202725584 U CN202725584 U CN 202725584U CN 201220278815 CN201220278815 CN 201220278815 CN 201220278815 U CN201220278815 U CN 201220278815U CN 202725584 U CN202725584 U CN 202725584U
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- field device
- thermal field
- device cleaning
- exhausting
- air
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Abstract
The utility model discloses a thermal field device cleaning workbench. A workbench panel is provided with a plurality of apertures, a filtering screen is installed below the workbench panel, and air draft filtering equipment is installed below the filtering screen. Compared with the common cleaning workbench in the prior art, the thermal field device cleaning workbench disclosed by the utility model has the advantages of better cleaning quality, and more convenient and standard process operation. Dust particles generated in the thermal field device cleaning process are subjected to secondary filtering to be effectively recovered and processed, so that convenience is brought for creating a good working environment for workers, and the health of the workers can be effectively prevented from being damaged by dust.
Description
Technical field
The utility model relates to a kind of operation post, particularly relates to a kind of thermal field device cleaning operation platform that can effectively collect dust granules and purify air.
Background technology
What the thermal field material overwhelming majority of the kyropoulos growing sapphire that adopts at present adopted is the tungsten hard material; most what adopt is graphite material with the thermal field material of the silicon single crystal of CZ method growth; in thermal field material when cleaning, can produce a large amount of heavy metal dusts particles or the graphite dust particle swims in the air when the staff carries out; this is healthy unfavorable to the staff's; can make it easily suffer from respiratory infection diseases (such as tracheitis, prop asthma, pulmonary heart disease etc.); in addition, the heavy metal dusts particle is bonded on the human epidermal and also may causes skin disease.
According to " operation place occupational health supervision and management temporary provisions ", the artificial lens industry has been implemented a series of precautionary measures and management method for operating personnel at present, but clean technologies are not improved, actively do not make advanced (closure yet, mechanization, automation) the cleaning operation platform, to such an extent as to do not have basic solution or largely reduce the healthy hidden danger that dust brings the staff, be unfavorable for building simultaneously good working environment yet.
The utility model content
The purpose of this utility model is to overcome the deficiency of prior art, and a kind of thermal field device cleaning operation platform is provided, the dust granules problem that has produced when it has therefrom solved the thermal field device cleaned.
The technical scheme that its technical problem that solves the utility model adopts is: a kind of thermal field device cleaning operation platform, and its operation post panel is provided with a plurality of apertures, and a screen pack is installed in this operation post panel below, and an exhausting filter plant is installed in this screen pack below.
Described exhausting filter plant comprises exhausting cover and the filter bag of air exhauster, air draft pipe, both ends open, the border that the top end opening of exhausting cover wraps up described screen pack, the be tightly connected air inlet of air exhauster of the bottom end opening of exhausting cover, the air outlet of air exhauster connects air draft pipe, and filter bag is installed on the end of air draft pipe.
Described exhausting cover is the rounding bench-type structure of hollow.
Described operation post panel is supported by a support, this support comprises a brace table and some feets, described operation post panel is placed in the top of brace table, the inside of this brace table is provided with step groove penetrating about in the of, described screen pack is placed on the table top of this step groove, the be tightly connected bottom end opening of this step groove of the top end opening of described exhausting cover.
The hole diameter of described operation post panel is 8-12mm, and as a kind of preferred, the hole diameter of described operation post panel is 10mm.
The beneficial effects of the utility model are: common cleaning operation platform is more advanced compared to existing technology, and cleaning quality is better, and technological operation is easier, standard more; Can the dust granules that produce in the thermal field device cleaning course effectively be reclaimed and process, for the staff builds a good working environment, prevent that effectively staff's health from suffering dust harzard.
Below in conjunction with drawings and Examples the utility model is described in further detail; But a kind of thermal field device cleaning operation platform of the present utility model is not limited to embodiment.
Description of drawings
Fig. 1 is generalized section of the present utility model.
The specific embodiment
Embodiment, see also shown in Figure 1, a kind of thermal field device cleaning operation platform of the present utility model, its operation post panel 1 adopts the thick corrosion resistant plate of 2mm, and to be distributed with a plurality of up and down penetrating and diameters be that 8-12mm(preferably adopts 10mm) aperture 11, the below of this operation post panel 1 corresponding its each aperture 11 is equipped with one deck 4 purpose screen packs 2, and this screen pack 2 is specially nylon material, has been used for permanent wind and filtration.These screen pack 2 belows are equipped with an exhausting filter plant.
As preferred embodiment, above-mentioned exhausting filter plant comprise bore be 450mm, power be 2.2KW three-phase type air exhauster 4, air draft pipe 5, iron sheet is made and the exhausting of both ends open cover 3 and model are that F6, efficient are 85% filter bag 6; Exhausting cover 3 is the inverted round stage structure of hollow, the border of the top end opening parcel screen pack 2 of this exhausting cover 3, the be tightly connected air inlet of air exhauster 4 of the bottom end opening of exhausting cover 3, the air outlet of air exhauster 4 connects air draft pipe 5, and filter bag 6 is installed on the end of air draft pipe 5.
As preferred embodiment, above-mentioned operation post panel 1 is supported by a support 7, this support 7 comprises a brace table 71 and some feets 72, operation post panel 1 is placed in the top of this brace table 71, the inside of brace table 71 is provided with step groove penetrating about in the of one 73, screen pack 2 is placed on the table top of this step groove 73, the be tightly connected bottom end opening of this step groove 73 of the top end opening of exhausting cover 3.
A kind of thermal field device cleaning operation platform of the present utility model, when the staff carries out cleaning to the thermal field device on this cleaning operation platform, open air exhauster 4, the dust granules that produces enters screen pack 2 through the aperture 11 of cleaning operation deck plate first, carry out the first time filters at these screen pack 2 places, the dust granules that granularity is less falls in the exhausting cover 3, and under the effect of air exhauster 4, enter air draft pipe 5, filter bag 6 finally by air draft pipe 5 ends carries out secondary filter, this filter bag 6 can grade of filtration be the particulate of 1-5 μ m, after filter bag 6 processing, the air (as shown by arrows in FIG.) of producing by boasting from air draft pipe 5 ends is clean air.
The dust granules that produces in the thermal field device cleaning course is behind secondary filter, can effectively be collected and be processed, thereby be not easy to float in the air, be conducive to for the staff builds a good operating environment, and the healthy harm that suffers dust granules that can well the prevention work personnel.
Above-described embodiment only is used for further specifying a kind of thermal field device cleaning operation platform of the present utility model; but the utility model is not limited to embodiment; every foundation technical spirit of the present utility model all falls in the protection domain of technical solutions of the utility model any simple modification, equivalent variations and modification that above embodiment does.
Claims (5)
1. thermal field device cleaning operation platform, it is characterized in that: its operation post panel is provided with a plurality of apertures, and a screen pack is installed in this operation post panel below, and an exhausting filter plant is installed in this screen pack below.
2. thermal field device cleaning operation platform according to claim 1, it is characterized in that: described exhausting filter plant comprises exhausting cover and the filter bag of air exhauster, air draft pipe, both ends open, the border that the top end opening of exhausting cover wraps up described screen pack, the be tightly connected air inlet of air exhauster of the bottom end opening of exhausting cover, the air outlet of air exhauster connects air draft pipe, and filter bag is installed on the end of air draft pipe.
3. thermal field device cleaning operation platform according to claim 2, it is characterized in that: described exhausting cover is the rounding bench-type structure of hollow.
4. thermal field device cleaning operation platform according to claim 2, it is characterized in that: described operation post panel is supported by a support, this support comprises a brace table and some feets, described operation post panel is placed in the top of brace table, the inside of this brace table is provided with step groove penetrating about in the of, described screen pack is placed on the table top of this step groove, the be tightly connected bottom end opening of this step groove of the top end opening of described exhausting cover.
5. thermal field device cleaning operation platform according to claim 1, it is characterized in that: the hole diameter of described operation post panel is 8-12mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220278815 CN202725584U (en) | 2012-06-13 | 2012-06-13 | Thermal field device cleaning workbench |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220278815 CN202725584U (en) | 2012-06-13 | 2012-06-13 | Thermal field device cleaning workbench |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202725584U true CN202725584U (en) | 2013-02-13 |
Family
ID=47651334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220278815 Expired - Fee Related CN202725584U (en) | 2012-06-13 | 2012-06-13 | Thermal field device cleaning workbench |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202725584U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105057282A (en) * | 2015-08-30 | 2015-11-18 | 明光万佳联众电子有限公司 | Air blowback machine |
-
2012
- 2012-06-13 CN CN 201220278815 patent/CN202725584U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105057282A (en) * | 2015-08-30 | 2015-11-18 | 明光万佳联众电子有限公司 | Air blowback machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SHIHEZI XINLEI PHOTOELECTRIC TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: FUJIAN XINJING PRECISION CORUNDUM TECHNOLOGY CO., LTD. Effective date: 20140919 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 364000 LONGYAN, FUJIAN PROVINCE TO: 832000 SHIHEZI, XINJIANG UYGUR AUTONOMOUS REGION |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20140919 Address after: 832000, room 37, No. four East 3-43 North Road, Shihezi, the Xinjiang Uygur Autonomous Region Patentee after: SHIHEZI XINLEI ELECTROMECHANICAL TECHNOLOGY CO., LTD. Address before: 364000. FA1-1 and FA1-2 plots of Liancheng Industrial Park, Liancheng County, Fujian, Longyan Patentee before: Fujian Xinjin Precision Corundum Technology Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130213 Termination date: 20200613 |