CN202595271U - Production device of amorphous silicon thin film - Google Patents
Production device of amorphous silicon thin film Download PDFInfo
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- CN202595271U CN202595271U CN 201220238530 CN201220238530U CN202595271U CN 202595271 U CN202595271 U CN 202595271U CN 201220238530 CN201220238530 CN 201220238530 CN 201220238530 U CN201220238530 U CN 201220238530U CN 202595271 U CN202595271 U CN 202595271U
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- glass substrate
- power supply
- impedance matching
- matching box
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Abstract
The utility model provides a production device of an amorphous silicon thin film. The device comprises a glass substrate, an impedance matcher and a radio-frequency generation power supply, wherein the glass substrate is arranged in a vacuum cavity and the glass substrate is connected with the radio-frequency generation power supply through the impedance matcher. The impedance matcher which resists interference automatically and offsets reflection accesses to the glass substrate which is used for producing solar cells, exciting electrodes of the vacuum cavity are combined to form a load, when radio-frequency power is output, part of imaginary parts affects the power output of the power supply, the impedance of the extensible impedance matcher which is located outside the vacuum cavity can be regulated continuously in accordance with specific conditions of coatings and electrode sizes, and then the required coating evenness is achieved.
Description
Technical field
The utility model belongs to area of solar cell, specifically is a kind of producing device of amorphous silicon membrane.
Background technology
In the upward widely used PECVD of the current industry system, employing is that plate shaped parallel electrodes is come activated plasma, and thin film deposition or etching surface are provided, and these two battery lead plates are respectively earthing pole and are used for the exciting electrode of activated plasma.The electrode mode of excitation is mainly by radio frequency and extremely-high frequency now, and exciting electrode provides plasma exciatiaon power power-supply case to be connected through a radio frequency or extremely-high frequency impedance matching box with one.
The film that this mode is plated, when substrate became very big, uniformity coefficient often had not satisfied variation, particularly when using radio frequency or extremely-high frequency PECVD equipment along with the increase of electrode, the heterogeneity of the film that plates becomes very obvious.Its reason has: when the linear dimension of electrode near with surpass exchanges the free space wavelength that excites electric energy 1/8 the time, phenomenons such as electromagnetic reflection, interference and standing wave become very seriously, make non-uniform electric.Another problem of large-scale PECVD reactor drum is that high-frequency electric field extends to the electrode middle part in the non-uniform change of electrode edge to a certain extent.This is because this phenomenon derives from the finite size of electrode.
Above-mentioned phenomenon causes the heterogeneity of plasma exciatiaon electric field on broad-area electrode surface, makes the rate of decomposition of raw-gas, and just film deposition rate changes with the position of substrate.So when big area deposits, must design exciting electrode to such an extent that have a uniformity requirement that special construction satisfies plasma treatment procedure.
The utility model content
For the plated film problem of non-uniform on the glass substrate that solves existing solar cell, the utility model provides a kind of producing device of amorphous silicon membrane.
The technical scheme that the utility model adopts is: said device comprises glass substrate, impedance matching box and radio frequency generation power supply, and said glass substrate is arranged in the vacuum chamber, and said glass substrate is connected with radio frequency generation power supply through impedance matching box.
Preferably, said glass substrate comprises plasma generation area and edge insulation zone, and said edge insulation zone is coated with insulation layer, and said plasma body zone is connected with impedance matching box through guide line.
Preferably, said glass substrate comprises a plurality of ground-electrodes and a plurality of exciting electrode plate, and ground-electrode and exciting electrode plate are provided with at interval, and said exciting electrode plate is connected with impedance matching box through lead-in wire.
Preferably, said impedance matching box snaps fit onto on the glass substrate through anchor clamps.
The utility model is through inserting the impedance matching box of an Automatic Anti-interference, counteracting reflection function on the glass substrate of making solar cell; The vacuum chamber exciting electrode is combined into a load, when radio-frequency power supply is exported, the power of some imaginary part some effects power supply output always; When inserting electrode with this impedance matching box; Automatically the void of regulating load part not makes that power supply output equates with the real part of load, the imaginary part phase place is opposite, so just eliminates or has weakened reflection and the interference effect on the broad-area electrode; Actual conditions and electrode size according to plated film; Be positioned in the impedance of the outer extensibility impedance matching box of Vakuumkammer, can be by adjustment constantly, to reach required plated film uniformity coefficient.
Description of drawings
Fig. 1 is the structural representation of a kind of embodiment of the utility model;
Fig. 2 is the local structure synoptic diagram of a kind of embodiment of the utility model;
Fig. 3 is the structural representation of many exciting electrodes of a kind of embodiment of the utility model.
In the drawings, 1 glass substrate, 2 guide lines, 3 impedance matching boxs, 4 radio frequency generation power supplys, 11 ground-electrodes, 12 exciting electrode plates, 13 shielded conductors, 121 plasma generation area, 122 insulating regions.
Embodiment
Below in conjunction with accompanying drawing the embodiment that the utility model provides is described in further detail:
Shown in Fig. 1-3; Structural representation for a kind of embodiment of the utility model; This device comprises glass substrate 1, impedance matching box 3 and radio frequency generation power supply 4, and this glass substrate 1 is arranged in the vacuum chamber, and said impedance matching box 3 is connected to the glass substrate 1 that is used to make solar cell through guide line 2; Impedance matching box 3 is to form conjugate match with glass substrate 1, offsets electrode reflective power and interferential effect; Said impedance matching box 3 is connected with radio frequency generation power supply 4, and radio frequency generation power supply 4 is to produce radio-frequency power supply, under the effect of radio-frequency power supply, forms the successive plasma body.The utility model is through inserting the impedance matching box of an Automatic Anti-interference, counteracting reflection function on the glass substrate of making solar cell; The vacuum chamber exciting electrode is combined into a load, when radio-frequency power supply is exported, the power of some imaginary part some effects power supply output always; When inserting electrode with this impedance matching box; Automatically the void of regulating load part not makes that power supply output equates with the real part of load, the imaginary part phase place is opposite, so just eliminates or has weakened reflection and the interference effect on the broad-area electrode; Actual conditions and electrode size according to plated film; Be positioned in the impedance of the outer extensibility impedance matching box of Vakuumkammer, can be by adjustment constantly, to reach required plated film uniformity coefficient.
See also Fig. 2; This glass substrate 1 comprises a plurality of ground-electrodes 11 and a plurality of exciting electrode plates 12; Ground-electrode 11 is provided with exciting electrode plate 12 at interval, is connected with shielded conductor 13 on the said exciting electrode plate 12, and shielded conductor 13 is connected with impedance matching box 3 through guide line 2.The size of ground-electrode 11 than the size of exciting electrode more greatly, the distance apart that general big and exciting electrode are of a size of between ground-electrode 11 and the exciting electrode plate 12 is big or small; Each exciting electrode plate has just been formed the separate separately body that excites like this, no longer receives the different of each strength of electric field each other and disturbs; Formed the steady operation of multi-electrode list chamber.
The exciting electrode plate 12 of the utility model mainly is to make the exciting electrode battery even, forms big area deposition function; Guide line 2 mainly is the function that connects external impedance adaptation 3; Impedance matching box 3 is to form conjugate match with exciting electrode plate 12, offsets electrode reflective power and interferential effect.Radio frequency generation power supply 4 is to produce radio-frequency power supply, under the effect of radio-frequency power supply, forms the successive plasma body; The output impedance of radio-frequency power supply is identical with the intrinsic impedance of output cable usually, promptly 50 ohm.The impedance of apparatus of load can be expressed as Z=R+jX.In the formula, R is the real component of loaded impedance, is generally several ohm; X is the imaginary component of loaded impedance, and is more with negative, and promptly capacitive load is more.The natural impedance of load and cable is complementary, just need adds matching network, make the output rating of power supply all be added in the load.Therefore adaptation 3 is exactly to regulate this imaginary part part, make the real part of power supply equate that with the load real part imaginary part of symbol is opposite, and no reflection events power or reflective power is very little.
As shown in Figure 3, this battery lead plate is made up of plasma generation area 121 and insulating regions 122; When having plasma to produce, have only plasma generation area 121 just to have plasma to produce, and produce uniform plasma; And at insulating regions 122 because by having been done a layer insulating, so the no plasma generation of this layer, and should the zone and the external world belong to isolated area, so do not have the photoglow generation; Thereby can not influence the homogeneity at edge.This device is done one deck insulating oxide through counter electrode plate around exciting electrode and is handled, and is an insulation limit around making; Owing to link to each other with the external world around the battery lead plate, when radio frequency power output is arranged, can cause with the external world radio-frequency drive takes place, thereby disturb the ununiformity of fringe field; After introducing the insulation limit, the battery lead plate current-carrying part reduces, and increase is isolated from the outside; Thereby can improve the edge benefit problem of large-area coating film.
In this specification sheets, the utility model is described with reference to its certain embodiments.But, still can make various modifications and conversion obviously and not deviate from the spirit and the scope of the utility model.Therefore, specification sheets and accompanying drawing are regarded in an illustrative, rather than a restrictive.
Claims (4)
1. the producing device of an amorphous silicon membrane; It is characterized in that; Said device comprises glass substrate, impedance matching box and radio frequency generation power supply, and said glass substrate is arranged in the vacuum chamber, and said glass substrate is connected with radio frequency generation power supply through impedance matching box.
2. device according to claim 1 is characterized in that, said glass substrate comprises plasma generation area and edge insulation zone, and said edge insulation zone is coated with insulation layer, and said plasma body zone is connected with impedance matching box through guide line.
3. device according to claim 1 is characterized in that, said glass substrate comprises a plurality of ground-electrodes and a plurality of exciting electrode plate, and ground-electrode and exciting electrode plate are provided with at interval, and said exciting electrode plate is connected with impedance matching box through lead-in wire.
4. device according to claim 1 is characterized in that said impedance matching box snaps fit onto on the glass substrate through anchor clamps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220238530 CN202595271U (en) | 2012-05-25 | 2012-05-25 | Production device of amorphous silicon thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220238530 CN202595271U (en) | 2012-05-25 | 2012-05-25 | Production device of amorphous silicon thin film |
Publications (1)
| Publication Number | Publication Date |
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| CN202595271U true CN202595271U (en) | 2012-12-12 |
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| CN 201220238530 Expired - Fee Related CN202595271U (en) | 2012-05-25 | 2012-05-25 | Production device of amorphous silicon thin film |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9518323B2 (en) | 2013-06-28 | 2016-12-13 | Xiamen Tianma Micro-Electronics Co., Ltd. | Methods, equipment and systems for measuring radio frequency crosstalk |
| CN109957786A (en) * | 2018-11-16 | 2019-07-02 | 黄剑鸣 | A kind of vapor phase growing apparatus making HIT silion cell |
-
2012
- 2012-05-25 CN CN 201220238530 patent/CN202595271U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9518323B2 (en) | 2013-06-28 | 2016-12-13 | Xiamen Tianma Micro-Electronics Co., Ltd. | Methods, equipment and systems for measuring radio frequency crosstalk |
| CN109957786A (en) * | 2018-11-16 | 2019-07-02 | 黄剑鸣 | A kind of vapor phase growing apparatus making HIT silion cell |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121212 Termination date: 20150525 |
|
| EXPY | Termination of patent right or utility model |