CN202588708U - Mask - Google Patents
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- Publication number
- CN202588708U CN202588708U CN 201220140068 CN201220140068U CN202588708U CN 202588708 U CN202588708 U CN 202588708U CN 201220140068 CN201220140068 CN 201220140068 CN 201220140068 U CN201220140068 U CN 201220140068U CN 202588708 U CN202588708 U CN 202588708U
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- China
- Prior art keywords
- face
- cover
- zone
- facial mask
- cut line
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
A task of the utility model is to provide a mask which can cover the face of all users and can be reliably and closely adhered to the face of all users so as to improve the cosmetic effect. The mask is formed by impregnating a substrate piece for covering the face shape with cosmetics, and is characterized in that a plurality of pin-shaped incision lines which extend longitudinally along the face and/or extend in a splayed manner from top to bottom are arranged in the region for covering the nose of the user, and a plurality of pin-shaped incision lines which extend longitudinally along the face are arranged in the region for covering the cheek of the user and in the region for covering the part near the corners of mouth of the user.
Description
Technical field
The utility model relates to a kind of at the substrate sheets impregnation cosmetics that form the shape that is used for covering face and the facial mask that constitutes.
Background technology
All the time; Contain the facial mask of cosmetics such as being soaked with toner, emulsion and beautifying liquid owing to can and remain on for a long time on the face in the substrate sheets that forms in that nonwoven etc. is tailored adult's face shape with makeup application; Therefore dressing effect is good, is widely used (patent documentation 1,2).And; In these facial masks, it is important that plane diaphragm and face are fitted tightly, so the profile along nose is provided with otch (patent documentation 1) in being used to cover the zone of nose; Or be provided with otch etc. (patent documentation 2) on wing of nose next door, prevent that facial mask from floating from the surface of face.
But if on facial mask, be provided with long cut line, then when facial mask and face are fitted tightly, what skin exposure from the otch position, existence can not be at this exposed portions applying cosmetic products is bad.
On the other hand; Along with the increase at age cutis laxa partly occurs at both sides, the chin of the corners of the mouth easily, although be the position that need utilize facial mask to nurse especially, because of end user's difference; The concavo-convex of this position differs widely, and is difficult to make facial mask and all users' face to fit tightly.In addition; In order to improve dressing effect; Facial mask and whole face are fitted tightly, but the size of user's face varies with each individual, make so suitably adjust the size of facial mask facial mask can cover reliably to the root on the both sides of user's lower jaw be important.
Thereby, hope a kind of face that can cover all users of exploitation, and can fit tightly reliably with all users' face, improve the facial mask of dressing effect.
Patent documentation 1: TOHKEMY (the open communique of Japanese patent of invention) 2004-262901 communique
Patent documentation 2: practical new case login (Japanese Utility Model Granted publication) No. 3135002 communique of Japan
The utility model content
The problem that the utility model will solve is, a kind of face that can cover all users is provided, and can fit tightly reliably with all users' face, improves the facial mask of dressing effect.
In order to solve above-mentioned problem; The inventor of the utility model studies; The result finds through being used to cover configuration in the zone of nose along the longitudinal extension of face and/or be many stitch shapes (Japanese: cut line ミ シ Application order shape) of splayed extension from the top down at facial mask; In being used to cover the zone of cheek with in the zone that is used to cover corners of the mouth next door, dispose along many stitch shape cut line of the longitudinal extension of face; This external interior configuration in zone that is used to cover chin along the stitch shape cut line of the longitudinal extension of face; Facial mask and all users' face, particularly corners of the mouth both sides and chin portion are fitted tightly and improve dressing effect, accomplish the utility model thus.
Promptly; The facial mask of the utility model is through constituting at the substrate sheets impregnation cosmetics that form the shape that is used for covering face; It is characterized in that; In the zone of the nose that is used to cover the end user, dispose along the longitudinal extension of face and/or be many stitch shape cut line that splayed is extended from the top down, in being used to cover the zone of cheek with in the zone that is used to cover by the corners of the mouth, dispose along many stitch shape cut line of the longitudinal extension of face.
In addition, the facial mask of the utility model is characterised in that, in being used to cover the zone of chin, disposes along the stitch shape cut line of the longitudinal extension of face.
In addition, the facial mask of the utility model is characterised in that, is configured in stitch shape cut line in the zone that is used to cover nose has 72 degree～108 degree with respect to horizontal direction angle of inclination.
In addition; The facial mask of the utility model is characterised in that; Be used to cover in the zone of nose; In being used to cover the zone of nose bridge and nose portion, dispose, in the zone of both sides that are used to cover nose bridge and two dilator narises, dispose and be the stitch shape cut line that splayed is extended from the top of face downwards along the stitch shape cut line of the longitudinal extension of face.
In addition, the facial mask of the utility model is characterised in that, the zone that is used to cover corners of the mouth next door is the ellipse that the major axis along continuous straight runs extends.
In addition, the facial mask of the utility model is characterised in that, is configured in the 5mm that is spaced apart between many cut line in the zone that is used to cover corners of the mouth next door.
The facial mask of the utility model can utilize the zone that is configured in the nose that is used to cover the end user, be used to cover the zone of two cheeks and be used to cover many stitch shape cut line in the zone of corners of the mouth both sides; Width along face stretches, and therefore can fit tightly with all users' face.Particularly, utilize the stitch shape cut line be arranged on corners of the mouth both sides, can adjust the position of facial mask,, also can stretch facial mask and make facial mask cover root reliably to lower jaw even therefore end user's face is bigger through the stretching facial mask at the lower jaw two ends.
Because cut line is the stitch shape; Even so the width stretching film of an edge face makes diaphragm and face fit tightly, big opening can not occur on one side, skin can not expose yet; Therefore there is not the position of uncoated, can cosmetics be coated in whole on the face reliably.
In addition, the facial mask of the utility model can be torn this facial mask along cut line through in being used to cover the zone of chin, disposing along the stitch shape cut line of the longitudinal extension of face, overlaps through tearing about making, and can suitably adjust the size of facial mask.Thus, even end user's face is less, the periphery of facial mask can not float yet, and can fit tightly with face.
Description of drawings
Fig. 1 is the front view of facial mask.
Fig. 2 is the figure that expression is configured in the angle of inclination of the stitch shape cut line in the zone that is used to cover nose.
Fig. 3 is the figure of the user mode of expression facial mask.
The specific embodiment
Below, with reference to the embodiment of accompanying drawing detailed description the utility model.
As shown in Figure 1, the facial mask of the utility model is at substrate sheets (2) the impregnation cosmetics that form the shape that is used for covering face and the facial mask (1) that constitutes.
In the zone of nose bridge that is used to cover nose (5a) and nose portion (5c), dispose along the stitch shape cut line of the longitudinal extension of face, in the zone of the both sides that are used to cover nose bridge (5b, 5b) and two dilator narises (5d, 5d), dispose the stitch shape cut line that is the splayed extension from the top of face downwards.Through the cut line (9) of above-mentioned this stitch shape is set in the zone that is used to cover nose (5); Can be along the zone that is used to cover nose (5) of the width stretching film of face; When applying facial mask on the face; Diaphragm both sides special and nose bridge are fitted tightly, and the both sides of this nose bridge are floated diaphragm and are difficult for fitting tightly with face.In addition, because cut line is the stitch shape, so the length of the notch portion of each cut line is shorter, skin can not expose from cut line.Therefore, can utilize whole face of membrane covered, not have the uncoated position, can cosmetics be coated in whole on the face reliably.
As shown in Figure 2, the stitch shape cut line (9) that is configured in the zone (5) that is used to cover nose preferably has the angle of inclination that 72 degree～108 are spent with respect to horizontal direction.Through with above-mentioned such angle of inclination slit configuration line (9), can be easy to make the shape of facial mask and nose to fit tightly, all faces are applied dressing effect preferably.
As shown in Figure 1, the cut line of nose bottom (13) is made up of following part, that is: the otch of semicircle shape, and its lower ends downward side along nose portion (5c) is outstanding; The otch of linearity, extend the lower end of upper edge dilator naris (5d) in the horizontal direction at its two ends from the otch of this semicircle shape.This cut line is used for open nostril, and the shape of this cut line is not limited to the shape shown in the figure.
In the zone that is used to cover two cheeks (6,6) be used to cover in the zone (7,7) of corners of the mouth both sides and dispose along many stitch shape cut line (10,11) of the longitudinal extension of face.Through configuration pin shape cut line by this way, the part of heaving of facial mask and cheek is fitted tightly, and facial mask and the cutis laxa that is created in corners of the mouth both sides are partly fitted tightly.Particularly; Can utilize the stitch shape cut line that is arranged on corners of the mouth both sides,, facial mask is expanded out in the position at lower jaw two ends to the left and right and adjust the position of facial mask at the lower jaw two ends through the stretching facial mask; Therefore, also can stretch facial mask and make facial mask cover root to lower jaw even end user's face is bigger.
Therefore, the zone that is preferred for covering corners of the mouth next door is the ellipse that the major axis along continuous straight runs extends.Through forming such shape, can keep the intensity of facial mask, and the facial mask that can fully stretch along the width of face.
The interval that preferably will be configured between many cut line (10,11) in zone (6,6) that is used to cover two cheeks and the zone (7,7) that is used to cover corners of the mouth both sides is made as 5mm.Through setting otch with such interval, can keep the intensity of facial mask fully, even along the width stretching film of face, diaphragm can not torn yet, and can fit tightly with face.
The cut line (10,11) that is configured in zone (6,6) that is used to cover two cheeks and the zone (7,7) that is used to cover corners of the mouth both sides is the stitch shape; Even therefore facial mask and face fit tightly; Big opening can not appear; Skin can not expose, thus there is not the part of uncoated, can be at whole on the face with makeup application.
In the zone that is used to cover chin (8), be provided with along the cut line (12) of the stitch shape of the longitudinal extension of face.Like this,, can tear the facial mask at chin place to the left and right along cut line through in being used to cover the zone of chin, disposing along the stitch shape cut line of the longitudinal extension of face, through with about tear and overlap, can adjust the size of facial mask.Thus, even end user's face is less, the periphery of facial mask can not float yet, and can fit tightly with face.Fig. 3 representes to utilize the facial mask of the chin portion that cut line (12) tears overlapping and make use-case with face fits tightly.
Facial mask (1) is being respectively equipped with oval-shaped peristome (3,4) with the corresponding position of eyes with the corresponding position of mouth, but the shape of these peristomes is not particularly limited, and can select to adopt suitable shapes.
Description of reference numerals
1, facial mask; 2, substrate sheets; 3, peristome (with the corresponding position of eyes); 4, peristome (with the corresponding position of mouth); 5, be used to cover the zone of nose; 5a, nose bridge; The sidepiece of 5b, nose bridge; 5c, nose portion; 5d, dilator naris; 6, be used to cover the zone of cheek; 7, be used to cover the zone on corners of the mouth next door; 8, be used to cover the part of chin; 9, stitch shape cut line (nose); 10, stitch shape cut line (cheek portion); 11, stitch shape cut line (corners of the mouth next door portion); 12, stitch shape cut line (chin portion); 13, cut line (nose bottom).
Claims (6)
1. facial mask, this facial mask is characterized in that through constituting at the substrate sheets impregnation cosmetics that form the shape that is used for covering face,
In the zone of the nose that is used to cover the end user; Dispose along the longitudinal extension of face and/or be many stitch shape cut line that splayed is extended from the top down, in being used to cover the zone of cheek with in the zone that is used to cover by the corners of the mouth, dispose along many stitch shape cut line of the longitudinal extension of face.
2. facial mask according to claim 1 is characterized in that,
In being used to cover the zone of chin, dispose along the stitch shape cut line of the longitudinal extension of face.
3. facial mask according to claim 1 and 2 is characterized in that,
Be configured in stitch shape cut line in the zone that is used to cover nose and have the angle of inclination of 72 degree～108 degree with respect to horizontal direction.
4. facial mask according to claim 1 and 2 is characterized in that,
Be used to cover in the zone of nose; In being used to cover the zone of nose bridge and nose portion, dispose along the stitch shape cut line of the longitudinal extension of face; In the zone of both sides that are used to cover nose bridge and two dilator narises, dispose and be the stitch shape cut line that splayed is extended from the top of face downwards.
5. facial mask according to claim 1 and 2 is characterized in that,
The zone that is used to cover corners of the mouth next door is the ellipse that the major axis along continuous straight runs extends.
6. facial mask according to claim 1 and 2 is characterized in that,
Be configured in the 5mm that is spaced apart between many cut line in the zone that is used to cover corners of the mouth next door.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220140068 CN202588708U (en) | 2012-03-31 | 2012-03-31 | Mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220140068 CN202588708U (en) | 2012-03-31 | 2012-03-31 | Mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202588708U true CN202588708U (en) | 2012-12-12 |
Family
ID=47306302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220140068 Expired - Lifetime CN202588708U (en) | 2012-03-31 | 2012-03-31 | Mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202588708U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104544909A (en) * | 2013-10-17 | 2015-04-29 | 林宇岳 | Facial mask fitting to face outline |
| CN107224405A (en) * | 2016-02-25 | 2017-10-03 | 赵红英 | A kind of modified anti-wrinkle face mask |
| CN109788836A (en) * | 2017-05-29 | 2019-05-21 | 孙哲龙 | Facial mask |
-
2012
- 2012-03-31 CN CN 201220140068 patent/CN202588708U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104544909A (en) * | 2013-10-17 | 2015-04-29 | 林宇岳 | Facial mask fitting to face outline |
| CN107224405A (en) * | 2016-02-25 | 2017-10-03 | 赵红英 | A kind of modified anti-wrinkle face mask |
| CN109788836A (en) * | 2017-05-29 | 2019-05-21 | 孙哲龙 | Facial mask |
| CN109788836B (en) * | 2017-05-29 | 2021-10-22 | 孙哲龙 | Face pack |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20121212 |
|
| CX01 | Expiry of patent term |