CN202576612U - Microtextured device manufactured by laser photoetching assisted electrochemical deposition - Google Patents
Microtextured device manufactured by laser photoetching assisted electrochemical deposition Download PDFInfo
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- CN202576612U CN202576612U CN 201220171657 CN201220171657U CN202576612U CN 202576612 U CN202576612 U CN 202576612U CN 201220171657 CN201220171657 CN 201220171657 CN 201220171657 U CN201220171657 U CN 201220171657U CN 202576612 U CN202576612 U CN 202576612U
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- 238000004070 electrodeposition Methods 0.000 title claims abstract description 21
- 238000001259 photo etching Methods 0.000 title abstract description 7
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 238000001459 lithography Methods 0.000 claims description 14
- 238000013019 agitation Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000010329 laser etching Methods 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 7
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 abstract description 22
- 239000002131 composite material Substances 0.000 abstract description 18
- 239000011248 coating agent Substances 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 13
- 238000005516 engineering process Methods 0.000 abstract description 11
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 10
- 238000004528 spin coating Methods 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract 3
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000003643 water by type Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011246 composite particle Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
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Abstract
A microtextured device manufactured by laser photoetching assisted electrochemical deposition comprises a pulse laser photoetching system and an electrochemical deposition system, wherein the pulse laser photoetching system is formed by connecting a pulse laser module, an optical path transmission module and a three-dimensional moving module in sequence; and the pulse laser module consists of a pulse laser and a controller. The surface of a metal material subjected to spin coating with photoresist in advance is photoetched by adopting a pulse laser photoetching technology; then the photoetched metal material is immersed in a developing liquid to remove the exposed photoresist; the surface of the material is subjected to controllable electro-deposition of a composite coating by adopting an electrochemical deposition technology; finally, the photoresist which is not espoused is removed and a surface composite coating with a regular micro texture on the surface of the metal material is obtained, and thus the maximization of a surface friction performance is realized; and the composite coating is controllable in structure and component and is wide in application range. By combining a laser photo-etching technology with an electrochemical deposition technology, the maximization of the antiwear and friction reducing performance of the material surface is realized.
Description
Technical field
The utility model relates to a kind of device for preparing surface structuration coating, the little texture device of particularly a kind of laser lithography assisted electrochemical deposition preparation.
Technical background
Along with science and technology and development of human society, more and more extremalization of the service condition of tribological material, complicated, this wear resistance to material, antifriction quality etc. have proposed increasingly high requirement.On the basis of traditional tribological material, through the surface engineering technology research and development, surperficial anti-friction wear-resistant coating provides one effectively, also to be scheme and the approach that has vitality for optimization mechanical system tribological property, solution fret wear.
Metal electrodeposition is that effective means---it is that a kind of or several insoluble solid, inert particles, fiber etc. are mingled with formed special list surface layer in the metal deposition layer equably to the preparation composite deposite.Its staple is: through matrix metal (forming even external phase by it) and insoluble solid particulate (being dispersed in the matrix metal discontinuously) that cathodic reduction obtains, this matrix material has the over-all properties of matrix metal and two types of materials of insoluble solid particulate.Adopt electro-deposition method to obtain composite deposit, processing unit is simple, power consumption is few, and does not change the performance and the physical dimension of matrix metal.
At present, utilize the material surface structured techniques to realize that the research of material antifriction antiwear is just at the early-stage.For example,, adopt the YAG nanosecond laser that material surface is carried out texture and handle, realized the better tribological property of texture surface through bionical method.
The utility model content
The purpose of the utility model is to provide the preparation of a kind of laser lithography assisted electrochemical deposition little texture device, solve the intensity that existing overlay coating technology exists low, organize loose, with the problem of matrix bond poor performance.
The little texture device of laser lithography assisted electrochemical deposition preparation of the utility model; Comprise pulse laser etching system and electrochemical depositer, described laser lithography system is linked in sequence by pulse laser module, optic path module and three-dimensional mobile module successively; Described pulse laser module is made up of pulsed laser and unit, and unit is connected with pulsed laser, and pulsed laser output arrives total reflective mirror; The output rating of unit is regulated in zero-sum peak power scope continuously; Pulsed laser adopts argon fluoride, and the wavelength that argon fluoride produces is the ultraviolet cold laser of 193nm, repetition rate 50HZ, mean power 6W, pulsewidth 17ns; Described optic path module is linked in sequence by total reflective mirror, beam expanding lens, beam splitter and optical gate successively, and the light beam of paying of optical gate exports three-dimensional platform to; Described electrochemical depositer mainly by computingmachine, electrochemical workstation, positive electrode, negative electrode, beaker, magnetic agitation heating unit, connect to form; Computingmachine is connected with electrochemical workstation; The positive electrode of electrochemical workstation is connected with negative electrode with positive electrode respectively with the output terminal of negative electrode; Positive electrode and negative electrode are inserted in the beaker, and beaker places the magnetic agitation heating unit, and the magnetic force rotor is arranged in beaker.
Described three-dimensional mobile module comprises three-dimensional mobile platform, stepper-motor and computingmachine, and three-dimensional mobile platform, stepper-motor and computingmachine are linked in sequence successively.
Beneficial effect: have different depths through regulating mean power, the switching of optical gate and the conditions such as spin coating thickness of photoresist material of laser, can on the photoresist material of material surface, preparing, a photoresist material array structure of different live widths.Then can prepare the overlay coating that has little texture through galvanic deposit, the existence of this structure can effectively improve the tribological property of sliding surface.Under DRY SLIDING, little texture can store abrasive dust or the microparticle that produces in the process of friction and wear, thereby reduces friction and reduce wearing and tearing.And under the lubricant medium condition, the little texture that distributes on the sliding surface can form the hydrodynamic lubrication film, has good antifriction antiwear effect.Controllable component.Through regulating the required solution formula of composite deposite galvanic deposit; Positive and negative current density in the deposition process, burst length etc.; The composite deposite that can effectively prepare structure, controllable component; Thereby reduce the coating internal stress, effectively suppress the expansion of rubbing crack and spread the intensity and the plasticity_resistant deformation performance of raising coating.In addition, because the composite particles that adds is different,, can prepare the composite deposite that has property such as wear resistant composite plating, self-lubricating coating etc. in the electrodeposition process like diamond, graphite etc.; And, be the method for reverse pulse owing to what on electrodeposition technology, use, so the micro-nano texture of preparing is fairly regular.Material surface laser lithography technology is coupled with electrochemical deposition technique, thereby forms the composite deposite with regular texture at material surface.This can make the excellent properties of excellent properties and composite deposite of textured surface superimposed, the anti-wear and wear-resistant performance of raising material surface further.Simultaneously, the bonding force of composite deposite and matrix is increased, effectively improve coming off of coating in the friction process.Applied range.Pulse laser has the advantages that photon energy is big, wavelength is short, can carry out accurate laser lithography to any material; Simultaneously, electrochemical deposition also can prepare the composite deposite of multiple different structure, different metal content.Solved the intensity that existing overlay coating technology exists low, organize loose, with the problem of matrix bond poor performance, reach the purpose of the utility model.
Advantage: controllable structure.The structure of composite deposite, controllable component.Applied range.In conjunction with laser lithography processing technology and electrochemical deposition technique, the technological effective integration of the antifriction antiwear antifriction of surface structuration is technological and composite deposite, collaborative coupling realize the maximization of material surface anti-wear and wear-resistant performance.
Description of drawings
Fig. 1 pulse laser etching system device conceptual scheme.
Fig. 2 pulse laser etching system device synoptic diagram.
Fig. 3 electrochemical depositer synoptic diagram.
Fig. 4 sample surfaces structurizing coating prepares Principle of Process figure.
Among the figure, 1, the pulse laser module; 2, optic path module; 3, three-dimensional mobile module; 5, computingmachine; 6, electrochemical workstation; 7, magnetic agitation heating unit; 8, iron stand; 9, anode; 10, negative electrode; 11, waters; 12, electric depositing solution; 13, magnetic force rotor; 14, beaker; 1-1, unit; 1-2, pulsed laser; 2-1, speculum; 2-2, beam expanding lens; 2-3, beam splitter; The 2-4 optical gate; 4, sample; 3-1; Three-dimensional platform; 3-2, stepper-motor; 3-3, computingmachine.
Embodiment
Below in conjunction with accompanying drawing the embodiment of the utility model is done further description:
The little texture device of laser lithography assisted electrochemical deposition preparation of the utility model mainly is made up of pulse laser etching system and electrochemical depositer, and described laser lithography system is linked in sequence by pulse laser module, optic path module and three-dimensional mobile module successively; Described pulse laser module is made up of pulsed laser and unit, and unit is connected with pulsed laser, and pulsed laser output arrives total reflective mirror; The output rating of unit is regulated in zero-sum peak power scope continuously; Pulsed laser adopts argon fluoride ArF, and the wavelength that argon fluoride ArF produces is the ultraviolet cold laser of 193nm, repetition rate 50HZ, mean power 6W, pulsewidth 17ns; Described optic path module is linked in sequence by total reflective mirror, beam expanding lens, beam splitter and optical gate successively, and the light beam of paying of optical gate exports three-dimensional platform to; The effect of total reflective mirror is to change beam direction as required; The effect of beam expanding lens is that the laser beam diameter is amplified so that obtain bigger interference region at sample surfaces; The effect of beam splitter is that laser beam is divided into some; The effect of optical gate is the number that can control the laser beam that passes through in real time.
Described three-dimensional mobile module comprises three-dimensional mobile platform, stepper-motor and computingmachine, and three-dimensional mobile platform, stepper-motor and computingmachine are linked in sequence successively, drives moving of three-dimensional platform through computer-controlled stepper motor, thereby realizes moving of part.
Described electrochemical depositer mainly by computingmachine 5, electrochemical workstation 6, positive electrode 9, negative electrode 10, beaker 14, magnetic agitation heating unit 7, connect to form.Computingmachine 5 is connected with electrochemical workstation 6; The positive electrode 9 of electrochemical workstation 6 is connected with negative electrode 10 with positive electrode 9 respectively with the output terminal of negative electrode 10; Positive electrode 9 is inserted in the beaker 14 with negative electrode 10; Beaker 14 places magnetic agitation heating unit 7, and magnetic force rotor 13 is arranged in beaker 14.
In Fig. 1, pulse laser etching system device mainly comprises three parts: pulse laser module 1, optic path module 2, three-dimensional mobile module 3.Laser power can adopt unit in zero-sum peak power scope, to regulate continuously.Laser beam by pulsed laser output forms interference fringe through the optic path module on the sample surfaces on the mobile platform, this module is connected in sequence by total reflective mirror, beam expanding lens, beam splitter, optical gate.Three-dimensional mobile platform, stepper-motor, computingmachine connect successively, drive moving of three-dimensional platform through computer-controlled stepper motor, thereby realize moving of part.
In Fig. 2, pulse laser etching system device at first, is set up laser lithography system device as shown in Figure 2, opens pulsed laser 1-2, adopts unit 1-1 to regulate the mean power of laser.Laser beam carries out primary event through speculum 2-1, is transferred to beam expanding lens 2-2 then, can lasing beam diameter be adjusted to suitable size through the distance of regulating two eyeglasses in the beam expanding lens.Laser beam behind the expansion bundle is dispersed into several light beams behind beam splitter 2-3, on sample 4, form interference fringe.The opening, close of optical gate 2-4 can be controlled the number of laser optical path after the beam splitting.Sample 4 is fixed on the three-dimensional platform 3-1, to realize movement of sample.The mobile of sample table drives through computingmachine 3-3 control step motor 3-2.At last, realize photoetching through the mean power of adjusting laser and the switching of optical gate.
In Fig. 3, electrochemical depositer at first, is set up electrochemical depositer, and plating piece is a negative electrode 10, and platinum plate or plating bath master metal are anode 9, are separated by between the two poles of the earth about 4cm, is suspended on the iron stand 8 relatively and immerses in the plating bath 12, and plating bath holds with beaker 14.Then the electric wire on the electrochemical workstation 6 is connected with anode and cathode, green line connects negative electrode 10, and red line connects anode 9, and white is reference electrode, also can be connected on the anode 9.Then, open magnetic agitation heating unit 7, set the temperature in waters 11 and the rotating speed (stirring velocity) of magnetic force rotor 13, adopt the special software of electrochemical workstation on the computingmachine 5 to regulate each galvanic deposit parameter.After all are ready, just can begin galvanic deposit.
In Fig. 4, the surface structuration composite deposite prepares process, Fig. 4 (a) be in sample 4 surperficial spin coatings the sample after the photoresist material; The interference fringe that Fig. 4 (b) is produced on photoresist material for the laser multiple-beam interference; Fig. 4 (c) is the sample after cleaning through developing solution; Fig. 4 (d) has the composite deposite of photoresist material for the surface that obtains behind the electrochemical deposition; Fig. 4 (e) is for removing the composite deposite that has surperficial micro-nano texture after the unexposed photoresist material.
Claims (2)
1. a laser lithography assisted electrochemical deposition prepares little texture device; It is characterized in that: device comprises pulse laser etching system and electrochemical depositer, and described laser lithography system is linked in sequence by pulse laser module, optic path module and three-dimensional mobile module successively; Described pulse laser module is made up of pulsed laser and unit, and unit is connected with pulsed laser, and pulsed laser output arrives total reflective mirror; The output rating of unit is regulated in zero-sum peak power scope continuously; Pulsed laser adopts argon fluoride, and the wavelength that argon fluoride produces is the ultraviolet cold laser of 193nm, repetition rate 50HZ, mean power 6W, pulsewidth 17ns; Described optic path module is linked in sequence by total reflective mirror, beam expanding lens, beam splitter and optical gate successively, and the light beam of paying of optical gate exports three-dimensional platform to; Described electrochemical depositer mainly by computingmachine, electrochemical workstation, positive electrode, negative electrode, beaker, magnetic agitation heating unit, connect to form; Computingmachine is connected with electrochemical workstation; The positive electrode of electrochemical workstation is connected with negative electrode with positive electrode respectively with the output terminal of negative electrode; Positive electrode and negative electrode are inserted in the beaker, and beaker places the magnetic agitation heating unit, and the magnetic force rotor is arranged in beaker.
2. the little texture device of laser lithography assisted electrochemical deposition preparation according to claim 1; It is characterized in that: described three-dimensional mobile module comprises three-dimensional mobile platform, stepper-motor and computingmachine, and three-dimensional mobile platform, stepper-motor and computingmachine are linked in sequence successively.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201220171657 CN202576612U (en) | 2012-04-23 | 2012-04-23 | Microtextured device manufactured by laser photoetching assisted electrochemical deposition |
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| CN 201220171657 CN202576612U (en) | 2012-04-23 | 2012-04-23 | Microtextured device manufactured by laser photoetching assisted electrochemical deposition |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103572341A (en) * | 2013-09-23 | 2014-02-12 | 江苏大学 | Electrochemical composite decomposition manufacturing method and device of laser light tube electrode |
| CN109550953A (en) * | 2018-12-06 | 2019-04-02 | 山东大学 | A kind of method that laser lithography-electrospray deposition prepares micro- texture |
| CN110032042A (en) * | 2015-12-21 | 2019-07-19 | Az电子材料卢森堡有限公司 | Negative photoresist composition and its application method for laser ablation |
| CN113737237A (en) * | 2021-08-17 | 2021-12-03 | 江苏大学 | Method and device for preparing gradient coating by laser-assisted electrodeposition |
-
2012
- 2012-04-23 CN CN 201220171657 patent/CN202576612U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103572341A (en) * | 2013-09-23 | 2014-02-12 | 江苏大学 | Electrochemical composite decomposition manufacturing method and device of laser light tube electrode |
| WO2015039427A1 (en) * | 2013-09-23 | 2015-03-26 | 江苏大学 | Electrochemical composite deposition machining method and apparatus using laser light tube as electrode |
| GB2537487A (en) * | 2013-09-23 | 2016-10-19 | Univ Jiangsu | Electrochemical composite deposition machining method and apparatus using laser light tube as electrode |
| GB2537487B (en) * | 2013-09-23 | 2019-05-01 | Univ Jiangsu | Electrochemical composite deposition machining method and apparatus using laser light tube as electrode |
| CN110032042A (en) * | 2015-12-21 | 2019-07-19 | Az电子材料卢森堡有限公司 | Negative photoresist composition and its application method for laser ablation |
| CN109550953A (en) * | 2018-12-06 | 2019-04-02 | 山东大学 | A kind of method that laser lithography-electrospray deposition prepares micro- texture |
| CN113737237A (en) * | 2021-08-17 | 2021-12-03 | 江苏大学 | Method and device for preparing gradient coating by laser-assisted electrodeposition |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121205 Termination date: 20150423 |
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