CN202506651U - Glass substrate cleaning machine - Google Patents
Glass substrate cleaning machine Download PDFInfo
- Publication number
- CN202506651U CN202506651U CN2012200622523U CN201220062252U CN202506651U CN 202506651 U CN202506651 U CN 202506651U CN 2012200622523 U CN2012200622523 U CN 2012200622523U CN 201220062252 U CN201220062252 U CN 201220062252U CN 202506651 U CN202506651 U CN 202506651U
- Authority
- CN
- China
- Prior art keywords
- cell body
- liquid
- hydraulic pressure
- supply unit
- discharge port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 title claims abstract description 20
- 239000011521 glass Substances 0.000 title claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 42
- 230000001105 regulatory effect Effects 0.000 claims abstract description 8
- 239000012535 impurity Substances 0.000 claims abstract description 5
- 238000001914 filtration Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 210000005056 cell body Anatomy 0.000 abstract description 46
- 230000004308 accommodation Effects 0.000 abstract description 16
- 230000006872 improvement Effects 0.000 abstract description 2
- 238000005406 washing Methods 0.000 abstract 2
- 230000003749 cleanliness Effects 0.000 abstract 1
- 230000009471 action Effects 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model relates to a glass substrate cleaning machine belongs to the machinery class, and it contains the hydraulic pressure supply unit, and the washing tank of hydraulic pressure supply unit intercommunication confession holding liquid, the washing tank includes: first cell body and second cell body, first accommodation space is established to first cell body, and the filling opening and the first discharge port of intercommunication first accommodation space are established respectively to first cell body bottom both sides, the second cell body encircles and locates first cell body and establishes the second accommodation space, and the second discharge port of intercommunication second accommodation space is established to second cell body bottom, wherein, the first discharge port of hydraulic pressure supply unit intercommunication, second discharge port and filling opening, and install a first regulating assembly who adjusts liquid flow between first discharge port and hydraulic pressure supply unit, and install the filter equipment who filters the impurity that liquid contains between hydraulic pressure supply unit and filling opening, install the second regulating assembly who adjusts liquid flow between hydraulic pressure supply unit and filter equipment. Practical improvements in reducing the volume and maintaining the cleanliness of the liquid can be achieved.
Description
Technical field
The utility model relates to mechanical, and particularly a kind of glass substrate cleaning machine refers to a kind of glass substrate cleaning machine that reduces volume and keep cleaning liquid especially.
Background technology
Original substrate cleaning machine is used for cleaning base plate and five metals material etc.; Shown in accompanying drawing 1 and accompanying drawing 2; Be original action sketch map and fluid dirt level sketch map; Find out that by knowing among the figure original substrate cleaning machine for the rinse bath 1a that has confession overflow tray on every side is communicated with preparation groove 6a, utilizes hydraulic pressure feeding unit 4a to extract the liquid 5a for preparing groove 6a subsequently, and with in the middle of the liquid 5a injection rinse bath 1a.And can find out by accompanying drawing 2; This designs at the beginning, and liquid 5a belongs to clean state; Along with increase service time, liquid 5a degree of fouling is changed liquid 5a with increasing gradually service time when exceeding feasible value then; Though degree of fouling reduces after changing liquid 5a, the quality of cleaning at each replacing liquid 5a substrate is different.
Above-mentioned original substrate cleaning machine waits to improve for having following point and disappearance really when using:
One, the setting of preparation groove 6a takies too much space, so transportation inconvenience.
Two, change between the liquid 5a, liquid 5a degree of fouling increases progressively gradually at every turn, and the quality that substrate is cleaned is different.
The utility model content
The purpose of the utility model is to provide a kind of glass substrate cleaning machine, solves the setting of the existing preparation groove of original substrate cleaning machine, takies the problem of too much space, transportation inconvenience, reaches the practical improvement that reduces volume and keep cleaning liquid.
For reaching above-mentioned purpose; The utility model comprises the hydraulic pressure feeding unit; The hydraulic pressure feeding unit is communicated with the rinse bath that supplies ccontaining liquid, and rinse bath comprises: first cell body and second cell body, and first cell body is provided with first accommodation space; And the first cell body two bottom sides is established the inlet and first outlet that is communicated with first accommodation space respectively; Second cell body is located on first cell body and establishes second accommodation space, and establishes second outlet that is communicated with second accommodation space bottom second cell body, wherein; The hydraulic pressure feeding unit is communicated with first outlet, second outlet and inlet; And first adjusting part of fluid flow is regulated in installing one between first outlet and hydraulic pressure feeding unit, and installs the filter of filter liquide impurities between hydraulic pressure feeding unit and inlet, and second adjusting part of fluid flow is regulated in installing between hydraulic pressure feeding unit and filter.
The utility model specifically comprises: it comprises a hydraulic pressure feeding unit; This hydraulic pressure feeding unit is communicated with the rinse bath of the ccontaining liquid of a confession; This rinse bath comprises: one first cell body; This first cell body is established one first accommodation space, and this first cell body two bottom sides is established the inlet and first outlet of this first accommodation space of connection respectively; At least one ring is established this first cell body and is established second cell body of one second accommodation space, and second outlet of this second accommodation space of at least one connection is established in this second cell body bottom.
Wherein this hydraulic pressure feeding unit is communicated with this first outlet, this second outlet and this inlet;
Wherein install first adjusting part of this fluid flow of adjusting between this first outlet and this hydraulic pressure feeding unit;
Wherein install the filter of this liquid impurities of filtration between this hydraulic pressure feeding unit and this inlet;
Wherein install second adjusting part of this fluid flow of adjusting between this hydraulic pressure feeding unit and this filter.
The advantage of the utility model is:
One, inlet more can be located at the sidewall of first cell body a little more than the bottom, can avoid direct impulse to be deposited in the dirt of bottom by this.
Two, second cell body is because of being located on around first cell body, and temperature exchange mechanism capable of using makes liquid can keep uniform temperature.
Three, the second cell body ring design of establishing more can effectively reduce the overall volume of rinse bath.
Four, filter can effectively filter dirt, though therefore in the early stage in the liquid degree of fouling increase progressively in time, after a period of time, degree of fouling can be controlled in the permissible range, can effectively keep the quality that substrate cleans.
Description of drawings
Fig. 1 is original action sketch map.
Fig. 2 is original liquid dirt degree sketch map.
Fig. 3 is the three-dimensional combination figure of the utility model preferred embodiment.
Fig. 4 is the generalized section of the utility model preferred embodiment.
Fig. 5 is the action sketch map figure of the utility model preferred embodiment.
Fig. 6 is the liquid dirt degree sketch map of the utility model preferred embodiment.
The specific embodiment
Shown in accompanying drawing 3 to accompanying drawing 5; Three-dimensional combination figure, generalized section and action sketch map for the utility model preferred embodiment; Find out a kind of glass substrate cleaning machine of the utility model by knowing among the figure; It comprises a hydraulic pressure feeding unit 4; This hydraulic pressure feeding unit 4 is communicated with the rinse bath 1 of the ccontaining liquid 5 of a confession, and this rinse bath 1 comprises: one first cell body 11 and at least one second cell body 12, and this first cell body 11 is established one first accommodation space 110; And these first cell body, 11 two bottom sides are established the inlet 111 and first outlet 112 of this first accommodation space 110 of connection respectively; This second cell body 12 is located on this first cell body 11 and establishes one second accommodation space 120, and these second cell body, 12 bottoms establish second outlet 121 of this second accommodation space 120 of at least one connection, wherein; This hydraulic pressure feeding unit 4 is communicated with this first outlet 112, this second outlet 121 and this inlet 111; And first adjusting part 21 of these liquid 5 flows is regulated in 4 installings of this first outlet 112 and this hydraulic pressure feeding unit one, and the filter 3 of this hydraulic pressure feeding unit 4 and 111 installings of this inlet, one these liquid 5 impurities of filtration, and second adjusting part 22 of these liquid 5 flows is regulated in 3 installings of this hydraulic pressure feeding unit 4 and this filter one.
Shown in accompanying drawing 4 to accompanying drawing 6, be generalized section, action sketch map and the liquid dirt degree sketch map of the utility model preferred embodiment, find out by knowing among the figure; Example extracts the liquid 5 of first cell bodies 11 and second cell body 12 with hydraulic pressure feeding unit 4, and hydraulic pressure feeding unit 4 is pumping, subsequently via the dirt of filter 3 filter liquides 5; 3 of hydraulic pressure feeding unit 4 and filters can be provided with second adjusting part 22 with the flow through flow of filter 3 and hand-hole 111 of adjusting, and the liquid 5 after the filtration injects first cell body 11 via inlet 111, wherein; Inlet 111 more can be located at the sidewall of first cell body 11 a little more than the bottom, can avoid direct impulse to be deposited in the dirt of bottom by this, at hydraulic pressure feeding unit 4 and 112 of first outlets first adjusting part 21 is set; First adjusting part 21 can be controlled the discharge capacity of first outlet 112 by switch motion, and because first outlet 112 is arranged at first cell body, 11 bottoms, therefore can get rid of the dirt that is deposited in first cell body, 11 bottoms by liquid 5 pressure; And when closing first adjusting part 21, then can increase the upwards flow of flushing of liquid 5, liquid 5 behind cleaning base plate by surpassing first cell body, 11 wall overflows to second cell body 12 that is located on first cell body, 11 peripheries; Second cell body 12 possesses the liquid 5 that can ccontainingly overflow, and second cell body 12 is because of being located on around first cell body 11 temperature exchange mechanism capable of using; Make liquid 5 can keep uniform temperature; Encircle the design of establishing by second cell body 12 in addition, more can effectively reduce the overall volume of rinse bath 1, reach liquid 5 preparations and avoid the too high function of temperature difference; And at least one second outlet 121 of second cell body, 12 bottom tools; Can the dirt that be deposited in second cell body 12 be discharged by liquid 5 pressure, add that filter 3 can effectively filter dirt, therefore by finding out in the accompanying drawing 6; Though degree of fouling is increasing progressively at the beginning in time in the liquid 5 in the early stage; But after a period of time, degree of fouling can be controlled in the feasible value, can effectively keep the quality that substrate cleans.
Claims (5)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200622523U CN202506651U (en) | 2012-02-24 | 2012-02-24 | Glass substrate cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200622523U CN202506651U (en) | 2012-02-24 | 2012-02-24 | Glass substrate cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202506651U true CN202506651U (en) | 2012-10-31 |
Family
ID=47059157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200622523U Expired - Fee Related CN202506651U (en) | 2012-02-24 | 2012-02-24 | Glass substrate cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202506651U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI701754B (en) * | 2018-11-23 | 2020-08-11 | 南亞科技股份有限公司 | Wafer cleaning apparatus and method of cleaning wafer |
-
2012
- 2012-02-24 CN CN2012200622523U patent/CN202506651U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI701754B (en) * | 2018-11-23 | 2020-08-11 | 南亞科技股份有限公司 | Wafer cleaning apparatus and method of cleaning wafer |
| US11037805B2 (en) | 2018-11-23 | 2021-06-15 | Nanya Technology Corporation | Wafer cleaning apparatus and method of cleaning wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121031 Termination date: 20140224 |