CN202494795U - Band-pass filter - Google Patents

Band-pass filter Download PDF

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Publication number
CN202494795U
CN202494795U CN2012200718511U CN201220071851U CN202494795U CN 202494795 U CN202494795 U CN 202494795U CN 2012200718511 U CN2012200718511 U CN 2012200718511U CN 201220071851 U CN201220071851 U CN 201220071851U CN 202494795 U CN202494795 U CN 202494795U
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CN
China
Prior art keywords
pass
pass film
wave
film system
short
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2012200718511U
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Chinese (zh)
Inventor
王喜昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU DINGWANG TECHNOLOGY Co Ltd
Original Assignee
SUZHOU DINGWANG TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUZHOU DINGWANG TECHNOLOGY Co Ltd filed Critical SUZHOU DINGWANG TECHNOLOGY Co Ltd
Priority to CN2012200718511U priority Critical patent/CN202494795U/en
Application granted granted Critical
Publication of CN202494795U publication Critical patent/CN202494795U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses a band-pass filter. The band-pass filter comprises a light-emitting substrate; a long-wave-pass film system is coated on an upper surface of the light-emitting substrate; a short-wave-pass film system is coated on an lower surface of the light-emitting substrate; the front cutoff wavelength of the long-wave-pass film system is larger than that of the short-wave-pass film system; and the front cutoff wavelength of the long-wave-pass film system is smaller than the rear cutoff wavelength of the short-wave-pass film system. The long-wave-pass film system is coated on the upper surface the light-emitting substrate and the short-wave-pass film system is coated on the lower surface; a filter with narrower band pass can be formed through lamination of the long-wave-pass film system and the short-wave-pass film system; the thickness required by the long-wave-pass film system and the short-wave-pass film system for performing coating is quite small, so by adopting the above lamination method, coating can be directly performed on the light-emitting substrate with small thickness to form the filter with narrower band pass with no grinding-thinning processing on the light-emitting substrate required. Therefore, product percent of pass of the filter can be effectively improved and production cost of enterprises can be reduced.

Description

A kind of bandpass filter
Technical field
The utility model relates to optical technical field, particularly a kind of bandpass filter.
Background technology
Bandpass filter is a kind ofly can from complex light, isolate the monochromatic optical device of a certain wave band, and it is widely used in various opto-electronics field.Bandpass filter is processed through plating dielectric metal film on the printing opacity substrate, and its light that utilizes the interference effect of dielectric metal film from incident light, to choose specific band makes it pass through optical filter.Needs according to the different application field; Different bandpass filters often need have the logical wave band of different bands; So just need on a side surface of printing opacity substrate, plate the dielectric metal film system of different-thickness, the dielectric metal film system that the logical narrow more optical filter of band often need plate on the printing opacity substrate is thick more.
In order to guarantee the quality of plated film, the dielectric metal film system that plating thickness is thicker often need adopt the thicker printing opacity substrate of thickness.And in the actual use of optical filter, often require the thinner thickness of optical filter, for the thickness that makes optical filter satisfies request for utilization; The method that people use always in actual production process is with printing opacity substrate wear down behind the plated film; And in the process of printing opacity substrate wear down,, therefore produce a large amount of waste products through regular meeting because the printing opacity substrate is broken easily; Thereby cause raw-material a large amount of waste, the production cost of enterprise is increased.
The utility model content
To the deficiency of above-mentioned prior art, the purpose of the utility model provides the bandpass filter that a kind of available thin printing opacity substrate is processed.
For solving the problems of the technologies described above, the utility model adopts following technical scheme:
A kind of bandpass filter; Comprise the printing opacity substrate; The upper surface of said printing opacity substrate is coated with long-pass film system; The lower surface of said printing opacity substrate is coated with short-pass film system, the preceding cutoff wavelength that the preceding cutoff wavelength that said long-pass film is greater than said short-pass film is, the back cutoff wavelength that the preceding cutoff wavelength that said long-pass film is less than said short-pass film is.
Preferably, the plated film that said long-pass film is, the short-pass film is is Ta 2O 5Film.
Preferably, said printing opacity substrate is an optical glass substrate.
Technique scheme has following beneficial effect: this bandpass filter is coated with long-pass film system at the upper surface of printing opacity substrate; Lower surface is coated with short-pass film system; Can form the logical narrower filter plate of a band through long-pass film system with the stack that the short-pass film is; Because long-pass film system, short-pass film system need the thinner thickness of plated film, therefore adopt the directly logical narrower filter plate of plated film formation band on the printing opacity substrate of thinner thickness of this method, and need not printing opacity substrate and then wear down are handled; Can effectively improve the product percent of pass of optical filter like this, reduce the production cost of enterprise.
Description of drawings
Fig. 1 is the structural representation of the utility model embodiment.
Fig. 2 is the principle of work synoptic diagram of the utility model embodiment.
Embodiment
Describe in detail below in conjunction with the preferred embodiment of accompanying drawing to the utility model.
As shown in Figure 1, this bandpass filter comprises a printing opacity substrate 1, and it is 2 that the upper surface of printing opacity substrate 1 is coated with the long-pass film, and it is 3 that the lower surface of printing opacity substrate 1 is coated with the short-pass film.The long-pass film is 2 preceding cutoff wavelength λ 1 greater than the short-pass film is 2 preceding cutoff wavelength λ 2 but less than the back cutoff wavelength λ 3 of short-pass film system.Above-mentioned long-pass film is 2, the short-pass film is that 3 plated film is Ta 2O 5Film, printing opacity substrate 1 is an optical glass substrate.
The production technology of this bandpass filter, it comprises the steps: at first to adopt coating machine is 2 at the upper surface plating long-pass film of printing opacity substrate 1, is 3 at the lower surface plating short-pass film of printing opacity substrate 1.This long-pass film is the preceding cutoff wavelength that 2 preceding cutoff wavelength λ 1 is this bandpass filter, and this short-pass film is 3 back cutoff wavelength λ 3, and the short-pass film is that 3 preceding cutoff wavelength λ 2 is 2 preceding cutoff wavelength λ 1 less than the long-pass film.
As shown in Figure 2; The long-pass film of this bandpass filter upper surface is that 2 preceding cutoff wavelength is λ 1; The short-pass film is that 3 preceding cutoff wavelength is that λ 2, back cutoff wavelength are λ 3; Like this through the long-pass film be 2 with the short-pass film be that 3 stack can form that a band is logical be the filter plate of λ 1 to λ 3, be for 3 with respect to the short-pass film, the band of this optical filter leads to narrower.This shows, in actual production process, be that 2 preceding cutoff wavelength λ 1, short-pass film are that 3 preceding cutoff wavelength is that λ 2, back cutoff wavelength are that λ 3 just can obtain the optical filter that various bands lead to as long as control the long-pass film well.
For existing optical filter production technology; Because the long-pass film is 2, the short-pass film is 3 to need the thinner thickness of plated film, therefore direct plated film on the printing opacity substrate of thinner thickness so just need not printing opacity substrate and then wear down processing; Thereby can effectively improve the product percent of pass of optical filter; And adopt this technology, need that the long-pass film is 2, the short-pass film be 3 must thickness also less than the thickness of original technology plated film, can effectively reduce the production cost of enterprise.
More than a kind of bandpass filter that the utility model embodiment is provided carried out detailed introduction; For one of ordinary skill in the art; According to the thought of the utility model embodiment, the part that on embodiment and range of application, all can change, in sum; This description should not be construed as the restriction to the utility model, and all any changes of being made according to the utility model design philosophy are all within the protection domain of the utility model.

Claims (3)

1. bandpass filter; Comprise the printing opacity substrate; It is characterized in that: the upper surface of said printing opacity substrate is coated with long-pass film system; The lower surface of said printing opacity substrate is coated with short-pass film system, the preceding cutoff wavelength that the preceding cutoff wavelength that said long-pass film is greater than said short-pass film is, the back cutoff wavelength that the preceding cutoff wavelength that said long-pass film is less than said short-pass film is.
2. a kind of bandpass filter according to claim 1 is characterized in that: said long-pass film is, the plated film of short-pass film system is Ta 2O 5Film.
3. a kind of bandpass filter according to claim 1 is characterized in that: said printing opacity substrate is an optical glass substrate.
CN2012200718511U 2012-02-29 2012-02-29 Band-pass filter Expired - Fee Related CN202494795U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012200718511U CN202494795U (en) 2012-02-29 2012-02-29 Band-pass filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012200718511U CN202494795U (en) 2012-02-29 2012-02-29 Band-pass filter

Publications (1)

Publication Number Publication Date
CN202494795U true CN202494795U (en) 2012-10-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012200718511U Expired - Fee Related CN202494795U (en) 2012-02-29 2012-02-29 Band-pass filter

Country Status (1)

Country Link
CN (1) CN202494795U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102590916A (en) * 2012-02-29 2012-07-18 苏州鼎旺科技有限公司 Band-pass optical filter and production technology thereof
CN103364975A (en) * 2013-01-17 2013-10-23 苏州多谱激光科技有限公司 Combined adjustable filter
CN111564117A (en) * 2019-02-13 2020-08-21 光宝光电(常州)有限公司 Display device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102590916A (en) * 2012-02-29 2012-07-18 苏州鼎旺科技有限公司 Band-pass optical filter and production technology thereof
CN103364975A (en) * 2013-01-17 2013-10-23 苏州多谱激光科技有限公司 Combined adjustable filter
CN111564117A (en) * 2019-02-13 2020-08-21 光宝光电(常州)有限公司 Display device

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C14 Grant of patent or utility model
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DD01 Delivery of document by public notice

Addressee: Suzhou Dingwang Technology Co., Ltd.

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20121017

Termination date: 20160229

CF01 Termination of patent right due to non-payment of annual fee