CN202486496U - Novel aperture diaphragm with high energy utilization ratio - Google Patents
Novel aperture diaphragm with high energy utilization ratio Download PDFInfo
- Publication number
- CN202486496U CN202486496U CN2012200135359U CN201220013535U CN202486496U CN 202486496 U CN202486496 U CN 202486496U CN 2012200135359 U CN2012200135359 U CN 2012200135359U CN 201220013535 U CN201220013535 U CN 201220013535U CN 202486496 U CN202486496 U CN 202486496U
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- diaphragm
- aperture
- energy utilization
- aperture diaphragm
- main part
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Abstract
The utility model discloses a novel aperture diaphragm with a high energy utilization ratio. The novel aperture diaphragm comprises a diaphragm plate with a strip-shaped diaphragm hole formed thereon, the main body part of the diaphragm hole is rectangular, and ports at two ends of the diaphragm hole are semicircular. The novel aperture diaphragm has a reasonable design; the system resolution power is increased in the scanning direction; owing to the compensation of scanning motion, the phenomenon that the edge of a static image in the scanning direction is scraggly is eliminated, and the edge returns to be smooth; and therefore, the system imaging quality can not be lowered while the system energy utilization efficiency is greatly improved, and the purpose of improving the productivity is achieved.
Description
Technical field
The utility model belongs to semiconductor printed-wiring board (PWB) laser direct-writing exposure image equipment technical field, is specifically related to a kind of non-mask write through photo-etching machine and uses aperture diaphragm.
Background technology
Diaphragm in the litho machine projecting light path is one of vitals of litho machine, and its effect is the aperture angle of some imaging beam on the axes, selects the extra-axial object point imaging beam, the resolution of regulating system and the efficiency of light energy utilization.The shape of diaphragm size, mounting means is directly relevant with the quality of the exposure lines of litho machine and exposure energy etc.
Along with the development of photoetching technique, not only to exposure lines quality require increasingly highly, and the production capacity of litho machine is required also increasingly high, be to reduce cost and improve capacity usage ratio, improve the important means of production capacity.
Non-mask write through photo-etching machine generally all adopts spatial light modulator, is made up of some micro mirrors, owing to the requirement to image quality, generally need carry out the space to light and modulate.At present; Diaphragm in the existing non-mask write through photo-etching machine projecting light path is generally circle; And its diameter also is limited in the scope of zero level hot spot, if surmount this scope, scraggly phenomenon will appear in the edge of its imaging lines; This has just limited the capacity usage ratio of system, and then has caused the reduction of production capacity.
The utility model content
In order to solve the low problem of non-mask write through photo-etching machine capacity usage ratio now, reach the raising energy, increase the purpose of production capacity, this is novel to provide a kind of novel aperture diaphragm with high-energy utilization factor.
The technical scheme that the utility model adopted is:
Have the novel aperture diaphragm of high-energy utilization factor, include apertured plate, have an aperture on the apertured plate, it is characterized in that: said aperture is a strip, and the main part of aperture is a rectangle, and the port section at two ends is semicircle.
Described novel aperture diaphragm with high-energy utilization factor is characterized in that: the length of the main part of said aperture equals the frequency spectrum length of direction of scanning; Width is more than or equal to the diameter of center speck, less than perpendicular to the direction of scanning+1 grade of bee-line with-1 grade of speck, the diameter of the port section at two ends equals the width of main part.
Described novel aperture diaphragm with high-energy utilization factor is characterized in that: the placement direction of said apertured plate is that the long limit of the main part of aperture is parallel to the direction of scanning, and the center of main part overlaps with the center of spatial frequency spectrum.
The utility model has the advantages that: the utility model is reasonable in design; On the direction of scanning, increased the resolution of system; Because the compensation of scanning motion, the scraggly phenomenon in edge that occurs at the quiescent imaging that this side up can be eliminated, and makes its edge recover level and smooth again.Thereby make the image quality that it can loss system, and can improve the capacity usage ratio of system greatly, reach the purpose that improves production capacity.
Description of drawings
Fig. 1 is the structural representation of the utility model.
Fig. 2 is the system schematic of the embodiment of the utility model.
Embodiment
Below in conjunction with accompanying drawing, the utility model is done explanation further through embodiment.
Embodiment:
Novel aperture diaphragm as shown in Figure 1, as to have the high-energy utilization factor includes apertured plate 1, has an aperture 2 on the apertured plate 1, and aperture 2 is a strip, and the main part 2-1 of aperture 2 is a rectangle, and the port section 2-2 at two ends is semicircle.
The length of the main part 2-1 of aperture 2 equals the frequency spectrum length of direction of scanning; Width is more than or equal to the diameter of center speck, less than perpendicular to the direction of scanning+1 grade of bee-line with-1 grade of speck, the diameter of the port section 2-2 at two ends equals the width of main part 2-1.
The placement direction of apertured plate 1 is that the long limit of the main part 2-1 of aperture 2 is parallel to the direction of scanning, and the center of main part 2-1 overlaps with the center of spatial frequency spectrum.
As shown in Figure 2, be a non-mask write through photo-etching machine-1 times imaging system.Form by spatial light modulator 3, projection objective 4, diaphragm 5, projection objective 6, crystal column surface 7.Diaphragm 5 is placed on the focal plane place of projection objective 4, i.e. the spatial frequency spectrum face place of this system, the long limit of bar shaped aperture are parallel to the direction of scanning places, and its center coincides with the center of spatial frequency spectrum.Among this embodiment, the main part of the bar shaped aperture of diaphragm 5 is long to be 18mm, and wide is 4mm, and the port section at two ends is that diameter is the semicircle port of 4mm, and thickness is 0.5mm, and tolerance is ± 0.05mm.This system is imaged on required figure on the crystal column surface 7 through diaphragm scanning.Final obtain the line edge smoothness live width 10% in, satisfy the needs of photoetching process, and improved about 25% than the production capacity of common circular iris.
Claims (3)
1. the novel aperture diaphragm with high-energy utilization factor includes apertured plate, has an aperture on the apertured plate, it is characterized in that: said aperture is a strip, and the main part of aperture is a rectangle, and the port section at two ends is semicircle.
2. the novel aperture diaphragm with high-energy utilization factor according to claim 1 is characterized in that: the length of the main part of said aperture equals the frequency spectrum length of direction of scanning; Width is more than or equal to the diameter of center speck, less than perpendicular to the direction of scanning+1 grade of bee-line with-1 grade of speck, the diameter of the port section at two ends equals the width of main part.
3. the novel aperture diaphragm with high-energy utilization factor according to claim 1; It is characterized in that: the placement direction of said apertured plate is that the long limit of the main part of aperture is parallel to the direction of scanning, and the center of main part overlaps with the center of spatial frequency spectrum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200135359U CN202486496U (en) | 2012-01-13 | 2012-01-13 | Novel aperture diaphragm with high energy utilization ratio |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200135359U CN202486496U (en) | 2012-01-13 | 2012-01-13 | Novel aperture diaphragm with high energy utilization ratio |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202486496U true CN202486496U (en) | 2012-10-10 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200135359U Expired - Lifetime CN202486496U (en) | 2012-01-13 | 2012-01-13 | Novel aperture diaphragm with high energy utilization ratio |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202486496U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015007044A1 (en) * | 2013-07-17 | 2015-01-22 | 京东方科技集团股份有限公司 | Exposure device and exposure method |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
-
2012
- 2012-01-13 CN CN2012200135359U patent/CN202486496U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015007044A1 (en) * | 2013-07-17 | 2015-01-22 | 京东方科技集团股份有限公司 | Exposure device and exposure method |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20121010 |
|
| CX01 | Expiry of patent term |