CN202440569U - Hardening and tempering device for crystal bar surface - Google Patents

Abstract

A hardening and tempering device for a crystal bar surface comprises a cover body provided with a cavity for accommodating a crystal bar, a heating unit arranged outside the cover body, a protective gas delivery unit and a cooling unit corresponding to the heating unit, wherein the cover body is provided with at least a part of transparent region so that heat radiation of the heating unit passes through the transparent region to heat the crystal bar, and the protective gas delivery unit is communicated with the cavity so as to feed protective gas into the cavity.

Description

The quenching and tempering device on crystal bar surface

One, technical field

A kind of quenching and tempering device refers to a kind of quenching and tempering device that carries out upgrading to the crystal bar surface especially.

Two, background technology

Crystal bar can be because suffered mechanical cutting strength in the process of mechanical workout, and then produce the affected layer on crystal bar surface, and affected layer belongs to the comparatively chaotic and chaotic part of arrangement for single crystal rod or polycrystalline rod; Likewise, wafer can be because cutting force and thermal shocking in the process of diamond disc sharpener, and then produces the residual stress in the wafer, and residual stress can cause phenomenons such as crystal column surface is protruding or recessed; This phenomenon will increase the difficulty of following process process, as can causing silicon wafer surface to break because of residual stress is excessive when the following process, or because of rat or recessedly cause processing back Flatness variation.

Annealing is to control a kind of process technique common in the gold copper-base alloy processing procedure, its main purpose be eliminate in the material (especially metallic substance) because of defective accumulate within stress.The method that annealing is used then is that the material of desiring to anneal is placed following for some time of suitable high temperature, utilizes heat energy to make the interior atom of material have the ability to carry out the rearrangement of crystallographic site, to reduce the defect concentration in the material, comprises crystal grain boundary, difference row and various point defect.A kind of technology of knowing is called rapid thermal annealing processing procedure (RTP), and it has reduced semiconductor subassembly in large quantities and has exposed the time at high temperature during processing.Traditional Rapid Thermal processing technology can comprise with enough energy exposure wafers, in order to the temperature of the wafer that raises apace and maintain one sufficiently long period of this temperature and enable successfully to accomplish processing procedure.

But with prior art; Present lehre all is to design to laminar wafer; Because the transmission of heat is a Different Effects for wafer and crystal bar, for example heat just has sizable difference to the metamorphism that laminar wafer and column crystal bar are caused, and that is to say; Can't be applicable at existing lehre under the situation of anneal of crystal bar that the creator proposes a kind ofly can effectively be directed against the device that crystal bar (or non-lamellar workpiece) carries out anneal.

Three, summary of the invention

One of purpose of this creation is to provide a kind of quenching and tempering device, and the mode of its thermal annealing capable of using is eliminated the affected layer on crystal bar surface.

This creation embodiment provides the quenching and tempering device on a kind of crystal bar surface, is to comprise: a lid, wherein have one be used for a ccontaining crystal bar cavity; One is arranged at the heating unit outside this lid, and wherein this lid has the transparent region of a part at least, makes the thermal radiation of this heating unit see through this transparent region and this crystal bar is heated; One shielding gas supply unit, it is communicated in this cavity to inject shielding gas in this cavity; And the cooling unit corresponding to this heating unit.

The present invention has following useful effect: the present invention mainly utilizes the thermal annealing method that surfaction/modified is carried out at least one surface of crystal bar, the surface of having eliminated crystal bar go up because of processing residual affected layer, use the ordering that reaches crystal bar.

For enabling further to understand the present invention's characteristic and technology contents, see also following detailed description and accompanying drawing, yet appended graphic reference and the explanation usefulness of only providing not is to be used for to the present invention's limitr in addition about the present invention.

Four, description of drawings

Fig. 1 system is the schematic perspective view of the quenching and tempering device of this creation.

Fig. 2 system for the lid cover cap of the quenching and tempering device of this creation in the synoptic diagram of crystal bar.

Fig. 3 system is the diagrammatic cross-section of the quenching and tempering device of this creation.

The primary clustering nomenclature:

1: quenching and tempering device

11: lid

110: cavity

111: the side

112: end face

113: inlet mouth

114: the air outlet

11A: peristome

12: heating unit

121: metal sheet

13: the shielding gas supply unit

14: cooling unit

15: control unit

151: transmitter

16: the crystal bar supporting seat

I: crystal bar

Five, embodiment

This creation mainly provides the quenching and tempering device on a kind of crystal bar surface, and the mode of its available energy radiation conduction especially is coated with the surface of articulamentum and carries out the operation of upgrading at least one surface of crystal bar in successive process.In addition, the heat conduction that can reduce in the crystal bar of the quenching and tempering device on the crystal bar surface of this creation is concentrated/phenomenon of thermal distortion for thermal stresses in the crystal bar.What be worth explanation is; This creation defines it " crystal bar " and can explain widely; Do not refer in particular to the made author of a certain processing procedure, for example utilize crystal ingot (Ingot) raw material polysilicon casting formations, or with brilliant heavy stone used as an anchor butt (squaring), cutting to form the block crystal bar that is similar to cubic cylindricality; More or the crystal bar of processing back that polishes gained behind the butt gained all applicable to this creation, and this creation does not also limit the protection category of single crystal rod, polycrystalline rod; And this creation it " crystal bar " is to have a certain thickness bulk material for a kind of, in particular, thickness of workpiece greater than 1 millimeter bulk promptly applicable to the quenching and tempering device of this creation.

Please refer to Fig. 1, Fig. 3, the synoptic diagram of the quenching and tempering device 1 on the crystal bar surface of its this creation of demonstration, the quenching and tempering device 1 on crystal bar surface comprises lid 11, heating unit 12, shielding gas supply unit 13 and cooling unit 14; Wherein define among the lid 11 one be used for ccontaining crystal bar I cavity 110; And lid 11 has the transparent region of a part at least; The thermal radiation of the heating unit 12 that is positioned at lid 11 outsides can and be heated, to reach modified effect through this transparent region to crystal bar I.

As shown in Figure 2; Lid 11 can be the bright cover structure of a kind of full impregnated; It roughly has four sides 111 and an end face 112 that connects four said sides 111; In other words; Lid 11 sides 111 capable of using define aforementioned cavity 110 with end face 112, but the quantity of side 111 is as limit, and for example lid 11 can have an end face 112 and a side 111 (like the lid 11 of hollow cylindrical) or have an end face 112 and three side 111 various kenels such as (like the lids 11 of hollow triangle column); And lid 11 has more a peristome 11A who is communicated with cavity 110; In view of the above; The user can see through peristome 11A crystal bar I is inserted in the aforementioned cavity 110; To carry out annealing process, cavity 110 is to carry out the required close endless loop border of short annealing processing in order to provide, and its outside vacuum extractor more capable of using (figure does not show) is to keep appropriate vacuum.And in one embodiment, lid 11 can be made by pyroceram, for example quartz etc.

Moreover in the time of in crystal bar I inserts aforementioned cavity 110, side 111 or end face 112 that the thermal radiation of heating unit 12 can see through lid 11 carry out anneal to crystal bar I; And in this specific embodiment; Heating unit 12 is to comprise a plurality of metal sheets 121 and a plurality of rapid heating assembly 122 that is fixed on those metal sheets 121; The size that metal sheet 121 is formed, external form are roughly corresponding to lid 11, and rapid heating assembly 122 then for example is an infrared ray heating tube, and it is to be mounted on metal sheet 121; Carry out quick thermal annealing process with the evolution of heat (like infrared light) to crystal bar I; And as shown in Figure 3, heating unit 12 is to be arranged on the end face 112, and the thermal radiation that infrared ray heating tube is sent is directed against crystal bar I through transparent end face 112 upper surface carries out quick thermal annealing process.

On the other hand; Shielding gas supply unit 13 is to be communicated in cavity 110 to inject shielding gas in cavity 110; And then avoid in quick thermal annealing process, on the surface of crystal bar I, generating by product, or avoid problems such as unwanted dopant under high processing temperature, to take place.Particularly; Shielding gas supply unit 13 can comprise gas source and pipeline etc.; Then have inlet mouth 113 and air outlet 114 on the lid 11; The pipeline of shielding gas supply unit 13 system is connected in inlet mouth 113 and air outlet 114, makes the gas source can be with protective gas, is poured in the cavity 110 like nitrogen etc.

Moreover cooling unit 14 is that vicinity is arranged at heating unit 12 accordingly, and particularly, cooling unit 14 utilizes pipeline to be connected in the metal sheet 121 of heating unit 12, and with cooling media, cools off to heating unit 12 like process pipelines such as water coolants.And in this specific embodiment; Heating unit 12 only need carry out quick thermal annealing process to the upper surface of crystal bar I; And cooling unit 14 can carry out the effect of temperature control to the side of crystal bar I, with the heat affecting of the side that reduces by 12 couples of crystal bar I of heating unit, in other words; Quenching and tempering device 1 heating unit 12 capable of using of this creation optionally carries out modified/upgrading to needed crystal bar surface, utilizes cooling unit 14 will not need the crystal bar surface of upgrading to be controlled at comparatively cryogenic condition simultaneously.

And in a preferred embodiment, the quenching and tempering device 1 on the crystal bar surface of this creation more can have control unit 15 and crystal bar supporting seat 16.Control unit 15 is to be coupled to heating unit 12, and control unit 15 is to comprise heating controller, with the Heating temperature and the time of accurate control rapid heating assembly 122; Control unit 15 has more a transmitter 151, like thermocouple or the like, in the process of quick thermal annealing process; Transmitter 151 can be arranged at rapid heating assembly 122 with being close to; With the temperature of monitoring rapid heating assembly 122, to feed back to control unit 15, in addition; Transmitter 151 also can be used to measure the surface temperature of crystal bar I, to control the annealing temperature of crystal bar I accurately.

16 of crystal bar supporting seats are mainly used in and carry crystal bar I; In other words; The operator can be fixed in crystal bar I on the crystal bar supporting seat 16 earlier, again with lid 11 cover cap from top to bottom in crystal bar supporting seat 16 and crystal bar I, crystal bar supporting seat 16 and crystal bar I all are placed in the cavity 110; Preferably, crystal bar supporting seat 16 can be a kind of high temperature material, the liner or the like of for example preventing fires.

The quenching and tempering device 1 on the crystal bar surface of this creation can be used for the affected layer of thermal annealing program with elimination crystal bar I, but its operation steps illustration is following:

(1) at first crystal bar I is placed on the crystal bar supporting seat 16, and with lid 11 cover caps it;

(2) utilize shielding gas supply unit 13 input nitrogen in cavity 110;

(3) utilize heating unit 12 crystal bar I to be heated to 300 to 900 ℃ with 50 ℃/second mode; And keep this temperature time enough (about 15 seconds to 45 seconds) and eliminate the affected layer at least one surface of crystal bar I, utilize cooling unit 14 to not needing the crystal bar surface of upgrading to carry out temperature control simultaneously;

(4) place cavity 110 to be chilled to 150 to 200 ℃ crystal bar I, and utilize cooling unit 14 to cool off to heating unit 12 with stove;

(5) close the nitrogen of shielding gas supply unit 13;

(6) with crystal bar I air cooling to normal temperature, promptly accomplish the thermal annealing program.

In sum, this is created heat treatment process capable of using reduce the internal injury situation that crystal bar is produced in procedure for processing.In addition; This creation can have the advantage of low pollution, and this creation can be reduced in the by product of crystal bar surface contamination, also can not cause the surfaceness variation of crystal column surface; In other words, the quenching and tempering device of this creation belongs to the processing procedure of " totally " in the process of its thermal annealing.

The above is merely the present invention's preferable possible embodiments, and non-so limitation the present invention's claim so use the equivalence techniques variation for it of specification sheets of the present invention and diagramatic content institute such as, all is contained in the present invention's the scope.

Claims (10)

1. the quenching and tempering device on a crystal bar surface is to comprise:

One lid, wherein have one be used for a ccontaining crystal bar cavity;

One is arranged at the heating unit outside this lid, and wherein this lid has the transparent region of a part at least, makes the thermal radiation of this heating unit see through this transparent region and this crystal bar is heated;

One shielding gas supply unit, it is communicated in this cavity to inject shielding gas in this cavity; And

One cooling unit corresponding to this heating unit.

2. according to claim 1 the quenching and tempering device on crystal bar surface, wherein this lid system is the bright cover structure of a kind of full impregnated, it has an end face and at least one connects the side of this end face.

3. like the quenching and tempering device on the said crystal bar surface of claim 2, wherein the bright cover structure system of this full impregnated is pyroceram.

4. like the quenching and tempering device on the said crystal bar surface of claim 2, wherein have more an inlet mouth and an air outlet on the bright cover structure of this full impregnated, this shielding gas supply unit system is connected in this inlet mouth and this air outlet.

5. like the quenching and tempering device on the said crystal bar surface of claim 2, wherein this heating unit system is arranged on this end face.

6. like the quenching and tempering device on claim 2,3,4 or 5 said crystal bar surfaces, wherein this heating unit system comprises a plurality of metal sheets and a plurality of rapid heating assembly that is fixed on those metal sheets.

7. like the quenching and tempering device on the said crystal bar surface of claim 6, more comprise a control unit, it is to be coupled to this heating unit, and this control unit have one be arranged at those rapid heating assemblies contiguously transmitter.

8. like the quenching and tempering device on the said crystal bar surface of claim 7, wherein this transmitter system is thermocouple.

9. like the quenching and tempering device on the said crystal bar surface of claim 6, more comprise a crystal bar supporting seat, it is arranged in this cavity and carries this crystal bar.

10. like the quenching and tempering device on the said crystal bar surface of claim 9, wherein this crystal bar supporting seat system is a fire prevention liner.

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