CN202217645U - Air draft cover plate of polysilicon wet engraving machine - Google Patents
Air draft cover plate of polysilicon wet engraving machine Download PDFInfo
- Publication number
- CN202217645U CN202217645U CN2011203357525U CN201120335752U CN202217645U CN 202217645 U CN202217645 U CN 202217645U CN 2011203357525 U CN2011203357525 U CN 2011203357525U CN 201120335752 U CN201120335752 U CN 201120335752U CN 202217645 U CN202217645 U CN 202217645U
- Authority
- CN
- China
- Prior art keywords
- exhausting
- cover plate
- air draft
- hole
- row
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model discloses an air draft cover plate of a polysilicon wet engraving machine. Reference air draft holes are formed in the middles of air draft cover plates in the longitudinal direction; a plurality of rows of air draft holes with gradually increasing radial sizes are parallelly arranged on two sides of the reference air draft holes; and at least three columns of air draft holes are formed in the horizontal direction, so that the volume of the air draft is larger, the air draft is uniform, and the stability of the electrical property of a polysilicon solar cell is enhanced.
Description
Technical field
the utility model relates to the exhausting cover plate of a kind of polysilicon machine at wet quarter.
Background technology
Produce the general polysilicon machine at wet quarter that adopts the wet quarter of
polysilicon solar battery slice, polysilicon has medical solution pool in the machine wet quarter, and the top of medical solution pool is provided with the exhausting cover plate; Wet quarter, machine generally can allow 5 road material loadings, and promptly 5 polysilicon chips floated on soup simultaneously, and silicon chip has only lower surface and contacts side surfaces to soup; Upper surface is owing to be diffusingsurface, and the diffusion back produces square resistance, so soup does not cover upper surface; This wet lithography is commonly called as the technology of floating waterborne, can discharge gas and acid gas when silicon chip and soup reaction, and gas and acid gas are siphoned away by extractor fan through the exhausting cover plate; The exhausting cover plate of existing polysilicon machine at wet quarter is generally offered 6-8 the identical exhausting hole of radial dimension of running through self on the body longitudinal direction, not only can not in time take gas and acid gas away; And exhausting is inhomogeneous, causes acid gas to contact with the silicon chip upper surface and has increased square resistance, has influenced the electrical property of battery sheet; And the square resistance rising value of per pass silicon chip is different; Differ bigger each other, do not meet critical field, influenced the conversion efficiency of battery sheet.
Summary of the invention
The purpose of
the utility model provides and can timely, evenly must siphon away gas and acid gas, and then the exhausting cover plate of the polysilicon machine at wet quarter of the electrical property of enhancement polysilicon solar battery slice.
are for achieving the above object; The technical scheme that the utility model adopts is: the exhausting cover plate of a kind of polysilicon machine at wet quarter; Offer a row along the middle part of said exhausting cover plate longitudinal direction and run through the front of self, the benchmark exhausting hole at the back side; Be parallel to said benchmark exhausting hole and on said exhausting cover plate, offer many row's exhausting hole; Said exhausting hole is intensive, even must to be arranged on the said exhausting cover board body, and said exhausting hole is placed with three row in a lateral direction at least said exhausting cover plate, and the said exhausting of every row hole is parallel to each other.
preferably, said exhausting hole is circle or polygon.
preferably, the radial dimension in said exhausting hole is increased to both sides by said benchmark exhausting hole by row, the radial dimension in the said exhausting of every row hole is identical.
owing to the utilization of technique scheme, the utility model compared with prior art has advantage: offer the front of running through the exhausting cover plate, the exhausting hole at the back side, in a longitudinal direction; Benchmark exhausting hole with exhausting cover plate middle part is that benchmark is provided with the parallel exhausting hole of many rows, and more outwards then radial dimension is big more from benchmark exhausting hole in the exhausting hole, guarantees to be provided with at least three row exhausting holes in a lateral direction; The exhausting hole is evenly intensive as to be arranged on the exhausting cover plate; The quantity in exhausting hole is more, can in the unit interval, siphon away more gas and acid gas, and more away from the benchmark suction opeing; The radial dimension of suction opeing is just big more; Under the situation that suction weakens gradually, this has guaranteed the even of exhausting, and the electrical property of the polysilicon solar battery slice after wet the quarter is better.
Description of drawings
accompanying drawing 1 is the structural representation of the utility model.
Embodiment
The structure of the utility model is further set forth in
below in conjunction with accompanying drawing.
are referring to shown in Figure 1; In the present embodiment, offer a row along the medium position of exhausting cover plate 2 and run through the front of self, the circular horizon exhausting hole 1 at the back side, row more than offering along the longitudinal direction of exhausting cover plate 2 in the both sides in benchmark exhausting hole 1 is parallel to the circular exhausting of the row hole in benchmark exhausting hole 1 as 3; Every row's exhausting hole is identical like the radial dimension in 3 exhausting hole; In a lateral direction, arranging at least in circular exhausting hole is three row, and every row exhausting hole is parallel to each other; This arrangement mode has guaranteed that the exhausting hole is even on exhausting cover plate 2, intensive as to arrange; Make the exhausting hole of arranging on the exhausting cover plate 2 more, the gas that is siphoned away in the unit interval and the amount of acid gas are more, greatly reduce the acid gas amount in whole medical solution pool zone; Reduced the rising value of square resistance, reduced the influence of acid gas the electrical property of polysilicon solar battery slice.
in Fig. 1, the radial dimension in benchmark exhausting hole 1 is minimum in all exhausting holes, simultaneously; Extractor fan also is arranged in this place, makes that the suction force at this place is maximum, and the every row's exhausting hole that is provided with to both sides by benchmark exhausting hole 1 increases like 3 radial dimension by row; Simultaneously, apart from position far away more, benchmark exhausting hole 1, suction force more a little less than; So the change of aspirating hole radial dimension has greatly effectively improved its rate of air sucked in required, this structure makes the rate of air sucked in required of respectively arranging aspirating hole be tending towards evenly, makes the square resistance rising value of each road silicon chip even; Improve the stability of product electrical property, improved the qualification rate of product.
Claims (3)
1. the exhausting cover plate of polysilicon machine at wet quarter; It is characterized in that: offer a row along the middle part of said exhausting cover plate longitudinal direction and run through the front of self, the benchmark exhausting hole at the back side; Be parallel to said benchmark exhausting hole and on said exhausting cover plate, offer many row's exhausting hole; Said exhausting hole is intensive, even must to be arranged on the said exhausting cover board body, and said exhausting hole is placed with three row in a lateral direction at least said exhausting cover plate, and the said exhausting of every row hole is parallel to each other.
2. the exhausting cover plate of polysilicon according to claim 1 machine at wet quarter, it is characterized in that: said exhausting hole is circle or polygon.
3. the exhausting cover plate of polysilicon according to claim 1 and 2 machine at wet quarter, it is characterized in that: the radial dimension in said exhausting hole is increased to both sides by said benchmark exhausting hole by row, and the radial dimension in the said exhausting of every row hole is identical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203357525U CN202217645U (en) | 2011-09-08 | 2011-09-08 | Air draft cover plate of polysilicon wet engraving machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203357525U CN202217645U (en) | 2011-09-08 | 2011-09-08 | Air draft cover plate of polysilicon wet engraving machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202217645U true CN202217645U (en) | 2012-05-09 |
Family
ID=46016884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203357525U Expired - Fee Related CN202217645U (en) | 2011-09-08 | 2011-09-08 | Air draft cover plate of polysilicon wet engraving machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202217645U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103000508A (en) * | 2011-09-08 | 2013-03-27 | 昊诚光电（太仓）有限公司 | Air draft cover plate of polycrystalline silicon wet etching machine |
| CN108348017A (en) * | 2015-07-23 | 2018-07-31 | 吉纽斯私人投资有限公司 | Cooling garment |
-
2011
- 2011-09-08 CN CN2011203357525U patent/CN202217645U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103000508A (en) * | 2011-09-08 | 2013-03-27 | 昊诚光电（太仓）有限公司 | Air draft cover plate of polycrystalline silicon wet etching machine |
| CN108348017A (en) * | 2015-07-23 | 2018-07-31 | 吉纽斯私人投资有限公司 | Cooling garment |
| CN108348017B (en) * | 2015-07-23 | 2021-10-08 | 帕特里克·G·贝耶勒 | Cooling clothes |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120509 Termination date: 20170908 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |