Background technology
LCD (Liquid Crystal Display LCD) is flat-panel monitor at present commonly used, wherein thin film transistor (TFT) (Thin Film Transistor, TFT)-LCD is the main product in the LCD.Along with the development of TFT-LCD industry, the competition of TFT-LCD product is growing more intense, and producer all employs new technology and reduces the cost of product, thereby improves the competitive power of its product on market.(Gate Driver On Array, GOA) technology is the typical case's representative in these new technologies to the capable driving of array base palte.
In the GOA technology,, realize order driving grid line successively through on the TFT substrate, making different TFT and the electric capacity of a plurality of functions that vary in size.Yet; When the GOA technology is used under lower environment temperature; TFT on the TFT substrate in the GOA zone descends because of the carrier mobility decrease in efficiency causes ON state current, can not realize when ON state current is too low that the driving grid line opens in proper order, the GOA phenomenon of defective driving at low temperatures therefore occurs.In order to guarantee the GOA driven, usually need increase the size of TFT in the GOA zone in the prior art, the increase of TFT size can cause product to produce very big power consumption, influences properties of product.
In addition, in the prior art, TFT substrate and colored filter (Color Film; CF) substrate stacks when installing; Since the common electrode layer on the CF be one whole layer of tin indium oxide (Indium-Tin Oxide, ITO), and the gate line on the TFT substrate also is metal; Therefore, be easy to produce the gate line load capacitance between the common electrode layer of gate line on the TFT substrate and CF.The gate line load capacitance is big more, and what the TFT size also need be done in the GOA driving circuit is big more, could realize the driven to gate line.
Thus it is clear that, because the existence of the factor of above-mentioned generation gate line load capacitance, cause comprising bigger, the poor performance of power consumption of the liquid crystal panel product of CF and TFT substrate in the prior art, and more increased the weight of the phenomenon of GOA low temperature defective driving.
Embodiment
To exist in the prior art since the product power consumption that the grid load capacitance that the gate line of CF common electrode layer and TFT substrate forms causes greatly, poor performance and the problem that increases the weight of GOA low temperature defective driving phenomenon; The utility model embodiment provides a kind of liquid crystal panel; This liquid crystal panel is arranged in the LCD; The structure of above-mentioned liquid crystal panel is as shown in Figure 1, comprising: first polaroid 11; Be arranged at the TFT substrate 12 on first polaroid 11; Be arranged at the CF10 on the TFT substrate 12; Be arranged at second polaroid 13 on the CF10.Wherein, comprise driving circuit in the TFT substrate 12, have the slit to be used for filling liquid crystal between TFT substrate 12 and the CF10, the liquid crystal of filling is not shown in Fig. 1.
The structure of above-mentioned CF10 is as shown in Figure 2; Specifically comprise: glass plate 101 is arranged at black matrix (Black Matrix, BM) 102 on the glass plate 101; Be arranged at the three primary colours layer 103 in the BM gap; The zone that zone that the zone that grid is filled, right oblique line are filled and vertical line are filled is represented three primary colours zone-blue area, red sector, Green Zone respectively, and these three zones are positioned at on one deck, are arranged at the common electrode layer 104 on BM102 and the three primary colours layer 103; Be arranged on the common electrode layer 104 cylindrical spacer (Photo Spacer, PS) layer 105.
Concrete; As shown in Figure 3; The common electrode layer 104 of above-mentioned CF10 comprises: the area of the pattern 1402 of coating public electrode metal and first pattern-free zone 1041 of uncoated public electrode metal; First pattern-free zone 1041 is corresponding with the gate line regional location of TFT substrate under being arranged in CF10, and the shape of first pattern-free regional 1041 is according to the shape set of gate line.
Concrete, the shape in first pattern-free zone is identical with the shape in the gate line zone of TFT substrate.
Shown in Figure 4 be on the TFT substrate 12 gate line 1201 synoptic diagram, first pattern-free zone, 1041 set positions according to the gate line on the TFT substrate 1201, and with TFT substrate 12 on the shape of gate line 1201 the same.Be exactly the gate line load capacitance that produces between the common electrode layer that reduces gate line and CF on the TFT substrate as far as possible like this.
More excellent, regional big or small consistent of the size in first pattern-free zone and the gate line of TFT substrate; Or the edge in the first pattern-free zone exceeds the width that the edge in the gate line zone of TFT substrate is set.
When the gate line zone of the size in first pattern-free zone and TFT substrate big or small consistent, the gate line load capacitance that produces between gate line on the TFT substrate and the common electrode layer of CF is just very little, can be good at solving the problem that exists in the prior art.
More excellent, the width at edge that the edge in first pattern-free zone exceeds the gate line zone of TFT substrate is 0-5 μ m.
If the edge in first pattern-free zone exceeds more than the width 5 μ m at the regional edge of the gate line of TFT substrate; Will make part liquid crystal between CF and the TFT substrate be in the state of no electric field so; So; These liquid crystal molecules just can not turn to, and being reflected on the liquid crystal panel is exactly that the viewing area can occurrence of color not change, and this has just influenced the quality of product.So the width at edge that more excellent scheme is the edge in first pattern-free zone exceeds the gate line zone of TFT substrate is 0-5 μ m.
Concrete, as shown in Figure 5, the common electrode layer of CF10 also comprises: 1043, the second pattern-frees zone 1043, second pattern-free zone is corresponding with TFT substrate GOA regional location, and the shape in second pattern-free zone 1043 is according to the shape set in TFT substrate GOA zone.
Concrete, the TFT substrate can be provided with monolateral GOA zone or bilateral GOA zone, that is to say that arbitrary limit, the left and right sides or both sides that the GOA zone is positioned at the TFT substrate all are fine.Fig. 5 and Fig. 6 show the synoptic diagram corresponding to second pattern-free zone of the monolateral GOA zone of TFT substrate or the setting of bilateral GOA zone respectively.
Be applied to print a lot of parallel gate lines on the TFT substrate of liquid crystal panel; These gate lines are the lines that connect the TFT grid in each pixel; One side or two parallel Bian Shanghui at the TFT substrate are provided with the GOA zone, have also made a lot of TFT and electric capacity in these zones.In the GOA technology, the TFT through the GOA zone controls driving grid line successively exactly, and then realizes showing different colors.In the prior art, the last common electrode layer of CF is whole one deck ITO, will form load capacitance between the gate line on ITO on the CF and the TF substrate like this, and these load capacitances can make product produce very big power consumption.Behind the common electrode layer setting first pattern-free zone corresponding with gate line in the TFT substrate, reduced original load capacitance, also just effectively reduce the power consumption of product.
When the common electrode layer on the CF comprises first pattern-free zone, can solve the problem that exists in the prior art, more excellent technical scheme is in the common electrode layer setting of the CF second pattern-free zone corresponding with TFT substrate GOA regional location.The last common electrode layer of CF scribbles the part of metal also can produce load capacitance with GOA zone on the TFT substrate, after this part common electrode layer on the etching CF, just can effectively reduce load capacitance, has reduced the power consumption of product.
Concrete, as shown in Figure 6, be provided with manyly between two long limits in first pattern-free zone 1041 to connecting line 1044, connecting line 1044 connects the adjacent area of the pattern 1042 that is separated by first pattern-free zone 1041.
When the second pattern-free zone of the common electrode layer of CF during corresponding to the bilateral GOA zone on the TFT substrate; The coconnected part of the common electrode layer of CF becomes very little; Even the public motor layer of CF is partitioned into the several separate zone fully, and this situation is not shown in the drawings.For the current potential that guarantees whole common electrode layer consistent, can with the TFT substrate in regional two the long limits of the corresponding pattern-free in every gate line position between be provided with many to connecting line.
Concrete, the regional shape of the shape in second pattern-free zone and the GOA on the TFT substrate is identical.
Second pattern-free zone is according to the set positions in the zone of the GOA on the TFT substrate, and with the TFT substrate on the regional shape of GOA the same.Be exactly the load capacitance that produces between the common electrode layer that reduces GOA zone and CF on the TFT substrate as far as possible like this.
Concrete, the GOA zone on the size in second pattern-free zone and the TFT substrate big or small consistent, or the regional edge of second pattern-free exceeds the width of the regional edge setting of the GOA of TFT substrate.
When the GOA zone on the size in second pattern-free zone and the TFT substrate big or small consistent, the load capacitance that produces between the common electrode layer of the regional and CF of the GOA on the TFT substrate is just very little, can better solve the problem that exists in the prior art.
Concrete, the width at edge that the edge in second pattern-free zone exceeds the GOA zone of TFT substrate is 0-5 μ m.
If the edge in second pattern-free zone exceeds more than the width 5 μ m at the regional edge of the GOA of TFT substrate; Will make part liquid crystal between CF and the TFT substrate be in the state of no electric field so; So; These liquid crystal molecules just can not turn to, and being reflected on the liquid crystal panel is exactly that the viewing area can occurrence of color not change, and this has just influenced the quality of product.So the edge in more excellent is second pattern-free zone exceeds the width at edge in GOA zone of TFT substrate between 0-5 μ m.
Shown in Fig. 3-Fig. 6 is the synoptic diagram that amplify in first pattern-free zone on the CF, and shown in Fig. 7 is the actual visual effect figure in first pattern-free zone on the CF.
The preparation process of CF in the utility model is following: at first on glass plate, deposit the BM layer, the moulding of exposure etching; Deposit bluish-green red three primary colours layer then successively, the moulding of exposure etching, this is deposited upon in the space of black matrix; And then deposition ITO layer directly deposits one deck ITO as common electrode layer in the prior art, need be shaped to patterned ITO to the ITO etching of making public in the utility model; Deposit the PS layer at last in the above, the moulding of exposure etching, this one deck mainly is passive between CF and TFT substrate.
A kind of colored filter, liquid crystal panel and LCD that the utility model embodiment provides; The common electrode layer of CF comprises first pattern-free zone of uncoated public electrode metal; This first pattern-free zone be arranged on CF under the TFT substrate in the gate line regional location corresponding; Since there is not the public electrode metal in the CF zone corresponding with the gate line regional location of TFT substrate, more excellent, be provided with and the second corresponding pattern-free of TFT substrate GOA regional location.So just reduced the load capacitance that between the gate line zone of the common electrode layer of CF and TFT substrate and GOA zone, forms; The TFT size that is positioned at the GOA zone that reduces to make of load capacitance reduces; The power consumption that reduces to have reduced product of load capacitance has been improved the phenomenon of GOA low temperature defective driving simultaneously.Be positioned at the area that reduces also to have reduced the GOA zone of the TFT size in GOA zone in addition, help the narrow frame design of LCD, improve the quality of product and the competitive power on market.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from the spirit and the scope of the utility model.Like this, belong within the scope of the utility model claim and equivalent technologies thereof if these of the utility model are revised with modification, then the utility model also is intended to comprise these changes and modification interior.