CN202110510U - Touch control panel - Google Patents
Touch control panel Download PDFInfo
- Publication number
- CN202110510U CN202110510U CN2011201060779U CN201120106077U CN202110510U CN 202110510 U CN202110510 U CN 202110510U CN 2011201060779 U CN2011201060779 U CN 2011201060779U CN 201120106077 U CN201120106077 U CN 201120106077U CN 202110510 U CN202110510 U CN 202110510U
- Authority
- CN
- China
- Prior art keywords
- refractive index
- protective seam
- contact panel
- electrode
- protective layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
The utility model relates to the field of touch control technology, specifically to a touch control panel. The touch control panel comprises an electrode layer and a protective layer, wherein the protective layer is covered on the electrode layer, which comprises a plurality of spaced transparent electrodes. Transparent metallic oxide, which has a refractive index greater than 1.8 and is disposed in the protective layer, enables a refractive index of the protective layer and a refractive index of the transparent electrodes to be matched with each other and enables the panel to be uniformly visible, and thus achieves the effect that a transparent electrode pattern is invisible, thereby enabling the touch control panel to have commendable optical performance.
Description
Technical field
The utility model relates to the touch technology field, relates in particular to a kind of contact panel, has good surface appearance and optical property.
Background technology
In recent years, along with the continuous development of touch technology, contact panel has been widely used in such as in the various electronic products such as mobile phone, PDA(Personal Digital Assistant), game machine input interface, computer touch screen.In practical application; The common formation touch screen that combines with LCD of contact panel is installed on the various electronic product, and the user is through touch screen input data and instruction; Replaced such as traditional input medias such as keyboard, mouses, brought great convenience to the user.
Generally speaking, the transparent conducting glass of contact panel mainly is made up of transparency carrier and transparency conducting layer, on the nonconducting transparency carrier of script; Plate the conductive transparent conductive material of one deck; Usually adopt transparent metal oxide, like tin indium oxide (Indium Tin Oxide is called for short ITO) etc.; And form transparency conducting layer with certain electrode pattern through etching, as forming the electrode pattern of forms such as with unidirectional electrode spaced apart or bipolar electrode is interspersed.
Wherein, electrode pattern comprises ITO zone (being electrode zone) and etching area, no conductive film ITO on the etching area, and light can directly be incident upon on the transparency carrier.Because two zones are different to the ray refraction rate; The user can observe the etching line of ITO zone and etching area handing-over; Display frame often has tomography, image fogization, shows that situations such as granulating or resolution reduction take place, and make image quality not good.In use, the transparent conducting glass of contact panel also needs to fit with face glass, and person easy to use touches, and adopts optical cement (OCA) to fit usually.Although can be so that the not good improvement that obtains to a certain degree of picture, but can not improve the visible problem of etching line well through applying optical cement (OCA).
Publication number is the patent of invention of " CN101078820A "; Name is called " a kind of processing method for rendering transparent electrode on transparent substrate invisible "; It discloses a kind of method that hides etching line on the capacitance type touch-control panel; As shown in Figure 1, be through selecting the close transparent oxide of refractive index and transparent conductive material (ITO) for use, like antimony oxide (Sb
2O
3), titanium dioxide (TiO
2) etc., adopt coating methods such as spraying or sputter on said conductive layer, to be coated with a refractive index match layer 31.Yet owing to adopt high-index material to cover refractive index match layer 31, its thickness can not be too big, otherwise penetrance step-down correspondingly, it is big that the haze value of transparency conducting layer (Haze) can become.Thereby, need cover a protective seam again on the refractive index match layer 31, usually with silicon dioxide (SiO
2) or organic polymer process.And this refractive index match layer is behind high-temperature baking, has poor adhesive force, characteristics that hardness is low.In addition, this method just can embody the sightless effect of etching line after also need adopting optical cement such as OCA and face glass to fit, and has increased processing procedure, makes the manufacturing of contact panel become complicated more, has increased cost simultaneously.
The utility model content
In view of this, the purpose of the utility model is to provide a kind of contact panel, and etching line of transparency electrode is invisible on it, has the good optical characteristic, avoids not planning a successor and image fog, lowers production cost simultaneously.
The technical scheme that the utility model adopted is:
A kind of contact panel; Comprise electrode layer and protective seam; Said protective seam is covered on the said electrode layer; Comprise the transparency electrode that a plurality of intervals are provided with on the said electrode layer, include refractive index in the said protective seam, make the refractive index of this protective seam and the refractive index of said transparency electrode be complementary evenly visual to reach panel greater than 1.8 transparent metal oxide.
Wherein, said transparent metal oxide is titania or zirconium dioxide.
The refractive index of said protective seam is 1.6-2.0, and its thickness is 0.5-3 μ m.
The contact panel that the utility model provided; Be directly to utilize the protective layer material of high index of refraction to cover on transparency electrode; Dwindle etching area and transparency electrode zone difference to ray refractive index; Thereby problems such as the image qualities of effectively avoiding causing because of refractive index is different are not good make contact panel have the good surface appearance quality.
Description of drawings
Fig. 1 is the structural representation of existing contact panel;
Fig. 2 is the structural representation of contact panel of the present invention;
Fig. 3 is that the present invention is at the reflectance curve figure that covers the contact panel surface that records before and after the protective seam;
Fig. 4 is the process flow diagram flow chart of contact panel manufacturing approach of the present invention.
Embodiment
Below in conjunction with accompanying drawing and embodiment the present invention is described in further detail.
As shown in Figure 2; A kind of contact panel 10 comprises transparency carrier 1, transparent electrode layer 2 and protective seam 4; Said transparent electrode layer 2 adopts to be processed like tin indium oxide transparent conductive materials such as (ITO); This transparent electrode layer 2 comprises that a plurality of transparency electrodes 21 compartment of terrains are laid on the transparency carrier 1 and forms electrode pattern that this electrode pattern can be divided into the ITO zone at etching area 22 and transparency electrode 21 places, no transparent conductive material ITO on the said etching area 22.Protective seam 4 covering transparent electrode layers 2, the material of protective seam 4 is filled in the etching area 22.Said protective seam 4 can fit through optical cements such as OCA 5 and a face glass 6, forms contact panel 10 structures.
Be added with refractive index in the material of this protective seam 4 greater than 1.8 transparent metal oxide,, make this protective seam and the regional refractive index of ITO at said transparency electrode 21 places be complementary in order to improve the refractive index of protective seam 4.Wherein, said protective seam is a silicone layer, and the material of said protective seam 4 is mainly polysiloxane, in this material, adds the titania of high index of refraction, makes that the refractive index of this protective seam 4 is 1.6-2.0.Said titania accounts for the number percent of protective layer material (before covering; By its percentage by weight) be 1%-20%; And in protective layer material, add the silicon dioxide of 1-10% (by its percentage by weight), make said titania be dispersed in the said protective layer material.
Say that from principle the visible problem of the etching line of transparency electrode is owing to the refractive index of transparency electrode 21 (ITO zone) refractive index with neighboring area (etching area 22) differs than cause greatly.Said transparency carrier 1 can adopt glass, polymethylmethacrylate (PMMA), PVC (PVC), polypropylene (PP) or polyethylene terephthalate transparent materials such as (PET) to process; Its refractive index is between between 1.4-1.5; The refractive index of ITO is then between 1.8-2.2 on the ITO zone; Because of the difference of refractive index shows the difference to the light reflection, cause the reflectance curve obvious difference of ITO zone and etching area 22, the human eye easy identification.The present invention fills protective layer material at etching area 22; Include the oxide material of high index of refraction in this protective layer material; Make etching area 22 identical with the optical reflectivity convergence in ITO zone; Reduce the reflectance curve difference of ITO zone and etching area 22, thereby make transparent electrode pattern invisible.In the material of protective seam 4, add between the titania (refractive index is 2.3-2.75) of high index of refraction and can improve the refractive index of said protective seam, so reduce and transparency electrode between to the difference of ray refractive index and reflectivity, human eye can not be discovered.Fig. 3 is covering the protective seam front and back, the reflectance curve figure on the contact panel that records surface for the present invention.Wherein, Curve 1 is the reflectance curve of transparency carrier 1; Curve 2 is that ITO is covered the reflectance curve behind transparency carrier 1; Curve 3 is that the protective layer material that high refractive index oxide is arranged is covered the reflectance curve behind the transparency conducting layer 2 of patterning, and curve 4 is that the protective layer material that high refractive index oxide is arranged directly is laid in the reflectance curve behind the transparency carrier 1.Compare with the difference between the curve 1 with curve 2; Obvious difference between curve 3 and the curve 4 has dwindled; This shows, have the protective seam of refractive index match effect in increase after, the gap of its surface reflectivity can obviously be dwindled; Human eye can not be discovered, thereby improve the exterior quality of contact panel.
In addition, the thickness of said protective seam 4 is 0.5-3 μ m, is preferably 1.1-3 μ m.Wherein, the ITO thickness in the transparency conducting layer 2 is generally 20-30nm.Reflectance curve figure when the curve 3 shown in Fig. 4 is the 1.5-2 μ m left and right sides for protective seam 4 thickness.This protective seam 4 has passivation, contacts with extraneous in order to intercept said transparent electrode layer, and it is bad to prevent that its oxidized or scratch etc. from causing.
Shown in Figure 4 is a kind of contact panel manufacturing approach, may further comprise the steps: S10, lay a plurality of transparency electrodes 21 earlier on a transparency carrier 1; S20; Again protective layer material is covered on said transparency carrier 1 and transparency electrode 21; Be added with refractive index in the described protective layer material greater than 1.8 transparent metal oxide, make 4 pairs of ray refraction rates of protective seam level off to the refractive index of transparency electrode 21, and then reach the effect that is complementary; S30 carries out high-temperature heat treatment, and employing after high-temperature baking 30-60 minute, forms the protective seam 4 with high-index material more than 200 ℃ on transparency electrode 21.Can be made into the sightless contact panel of transparency electrode etching line according to above-mentioned contact panel manufacturing approach.
Before covering protective layer material; Earlier refractive index is added in the protective layer material greater than 1.8 transparent metal oxide particle; Said protective layer material is mainly processed with polysiloxane, may further comprise the steps: S201 is added into titania (transparent metal oxide particle) in the protective layer material; S202 adds silicon dioxide (cosolvent) again the transparent metal oxide particle is evenly dispersed in the protective layer material; S203 forms the protective layer material with high-index material, and its refractive index is 1.6-2.0.Wherein, the silicon dioxide that adds in the protective layer material and some spreading agent equal solvents can help the dissolving and the dispersion of titania, and titania is dispersed in the protective layer material.
Evidence, the size of protective seam 4 refractive indexes is directly proportional with the addition of titania, and the titania of interpolation is many more, and the refractive index of protective seam 4 is big more.Table 1 is the content of the titania of interpolation in the test and the relation table of its protection layer corresponding 4 refractive indexes, through changing the addition of titania, can adjust the refractive index of said protective seam 4.
Table 1
| Protective seam 4 refractive indexes | TiO 2Content | SiO 2Content |
| ?1.6 | 1-10％ | 1-5％ |
| ?1.7 | 2-15％ | 2-7％ |
| 1.75 | 3-18％ | 2-8％ |
| 1.8 | 8-20％ | 3-10％ |
| 2.0 | 10-20％ | 3-10％ |
Said titania can also adopt zirconium dioxide to substitute, and the refractive index of zirconium dioxide is between the 1.9-2.3, according to can the be protected ranges of indices of refraction 1.6-2.0 of layer of different proportionings, in order to reach the refractive index match with transparency electrode.Its principle and aforementioned titania similar be not so give unnecessary details at this.
The above is merely the preferred embodiment of the utility model; Not in order to restriction the utility model; All within the spirit and principle of the utility model, any modification of being made, be equal to replacement, improvement etc., all should be included within the scope of the utility model protection.
Claims (6)
1. a contact panel comprises electrode layer and protective seam, it is characterized in that:
Said protective seam is covered on the said electrode layer, comprises the transparency electrode that a plurality of intervals are provided with on the said electrode layer, includes refractive index in the said protective seam greater than 1.8 transparent metal oxide.
2. contact panel according to claim 1 is characterized in that: said transparent metal oxide is titania or zirconium dioxide.
3. contact panel according to claim 1 is characterized in that: said protective seam is a silicone layer.
4. contact panel according to claim 1 is characterized in that: the refractive index of said protective seam is 1.6-2.0.
5. contact panel according to claim 1 is characterized in that: the thickness of said protective seam is 0.5-3 μ m.
6. contact panel according to claim 1 is characterized in that: also comprise a substrate, the transparency electrode of said electrode layer is arranged on this substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201060779U CN202110510U (en) | 2011-04-04 | 2011-04-04 | Touch control panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201060779U CN202110510U (en) | 2011-04-04 | 2011-04-04 | Touch control panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202110510U true CN202110510U (en) | 2012-01-11 |
Family
ID=45435955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011201060779U Expired - Lifetime CN202110510U (en) | 2011-04-04 | 2011-04-04 | Touch control panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202110510U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104714307A (en) * | 2015-01-30 | 2015-06-17 | 深圳莱宝高科技股份有限公司 | 3D touch display device |
| CN106569624A (en) * | 2015-10-09 | 2017-04-19 | 群创光电股份有限公司 | Touch substrate and touch device |
| CN107533402A (en) * | 2015-04-24 | 2018-01-02 | Tdk株式会社 | Transparent conductive body and its manufacture method and touch panel |
-
2011
- 2011-04-04 CN CN2011201060779U patent/CN202110510U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104714307A (en) * | 2015-01-30 | 2015-06-17 | 深圳莱宝高科技股份有限公司 | 3D touch display device |
| CN107533402A (en) * | 2015-04-24 | 2018-01-02 | Tdk株式会社 | Transparent conductive body and its manufacture method and touch panel |
| CN107533402B (en) * | 2015-04-24 | 2021-02-02 | Tdk株式会社 | Transparent conductor, method for manufacturing same, and touch panel |
| CN106569624A (en) * | 2015-10-09 | 2017-04-19 | 群创光电股份有限公司 | Touch substrate and touch device |
| CN106569624B (en) * | 2015-10-09 | 2020-09-29 | 群创光电股份有限公司 | Touch substrate and touch device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102736764B (en) | Contact panel and manufacture method thereof | |
| CN102087566A (en) | Capacitive touch display panel | |
| CN102999199B (en) | Touch sensing device and electronic installation | |
| US9079384B2 (en) | Touch sensor panel having an index matching passivation layer | |
| CN102541345A (en) | Method and system for forming curved touch sensor | |
| CN104298381A (en) | Touch control panel, optical matching adhesive applied to touch control panel and manufacturing method of optical matching adhesive | |
| CN203480453U (en) | Touch panel | |
| CN104881178A (en) | Touch display screen, manufacturing method and display device thereof | |
| US20140339067A1 (en) | Flat Surface Touch Device for Introducing Visual Effect | |
| KR20130046728A (en) | Transparent panel and manufacturing method thereof | |
| US20140126040A1 (en) | Electronic paper display | |
| CN203019740U (en) | Protective film for electronic device | |
| CN204215379U (en) | Touch panel and touch display device | |
| CN202110510U (en) | Touch control panel | |
| CN103823591A (en) | Touch display equipment and touch sensor thereof | |
| CN202033552U (en) | Touch type liquid crystal display screen | |
| CN102152563A (en) | Transparent conductive material | |
| TW201421308A (en) | Touch OLED display panel and display device comprising the same | |
| US10173400B2 (en) | Transparent conductive film | |
| CN104182067B (en) | A kind of contact panel and its manufacture method | |
| CN104714698A (en) | Touch substrate as well as production method thereof and touch display panel | |
| CN107544716A (en) | ITO electrode layer, comprehensively screen and electronic equipment | |
| CN203909742U (en) | Touch control display panel | |
| TWI597630B (en) | Touch panel | |
| CN104076983B (en) | A kind of protection glass, touch screen, display and the method for touch screen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |