CN202102401U

CN202102401U - Transparent touch inductor structure

Info

Publication number: CN202102401U
Application number: CN 201120192037
Authority: CN
Inventors: 林德铮
Original assignee: Young Fast Optoelectronics Co Ltd
Current assignee: Young Fast Optoelectronics Co Ltd
Priority date: 2011-06-09
Filing date: 2011-06-09
Publication date: 2012-01-04
Anticipated expiration: 2021-06-09

Abstract

The utility model discloses a transparent touch inductor structure, which at least comprises a first shaft inducting layer, a second shaft inducting layer and an insulation layer arranged between the first shaft inducting layer and the second shaft inducting layer. The inducting layers are transparent conductive thin films, and the insulation layer is made of transparent insulation thin materials. An electrode area and a waste etching area is defined on the transparent conductive thin films on the inducting layers through first insulation lines, and simulation decorating patterns are defined on the waste etching area through a second insulation line. The electrode area comprises a plurality of inducting electrodes and/or signal guide circuits, and the simulation decorating patterns are composed of a plurality of small areas which are not connected with each other. The small areas can be areas in various geometrical shapes, and the simulation decorating patterns can be composed of one geometrical area or a plurality of geometrical areas simultaneously.

Description

The transparent touch sensor structure

Technical field

The utility model relates to a kind of transparent touch sensor structure, refers to a kind of transparent touch sensor structure that promotes the transmittance homogeneity and reduce the noise capacitance especially.

Background technology

Transparent touch-control panel normally is configured in the display screen (Display) of electrical equipment and goes up use, lets the user can carry out interactive input operation, improves the purpose of linking up the goodwill property of interface between people and the machine and promoting input operation efficient to reach; And like knowledge person; Contact panel is made up of inductor, controller and software jointly; Wherein inductor can be divided into resistance-type, condenser type, infrared-type and ultrasonic formula etc. according to the different summaries with structure of its operation principles; And at present the consumption electronic products of main flow property change mostly gradually and adopt the capacitance inductor with multi-point signal induction usefulness, promoting the touch control operation function, and avoid in the past the single-point type inductor to be subject to scrape undermine breaking and unserviceable disappearance; The structure of general capacitance inductor all has the transparent conductive film that two layers of insulation are provided with; It for example is tin indium oxide (ITO) material; And required electrode pattern is set on each layer conductive film; For example be a plurality of X axle induction stitchings (X-Trace) and Y axle induction stitching (Y-Trace), normally utilize etch process to remove the part of not wanting on the conductive film, to form required X, Y axle induction stitching; And make the gap that keeps proper width each other between each induction stitching, to reach the purpose that insulation is provided with; Yet; Because these electrode districts that induction stitching is set have different transmittance (Transmittance) with the useless etching region (i.e. the hollow out position of this conductive film) that material is removed in etching on this conductive film; So cause the light refraction that penetrates this conductive film uneven; This result has tangible figure and produces in the time of will causing eye-observation, when especially before being configured in display screen, using, will cause the puzzlement of screen deformation of image, fuzzy distortion; And for avoiding aforementioned disappearance; Some way is the material in the useless etching region on the conductive film to be kept do not remove; To reduce the otherness of each transmittance of this conductive film, though above-mentioned means help the transmittance homogeneity of putting forward in rising conductive film, if the pattern layout in the useless etching region is improper; For example: be provided with that area is too big, insulation is provided with bad ... Deng; Can produce phenomenons such as noise capacitance, electromagnetic interference (EMI) during running, cause the induced signal of electrode district to be disturbed or produce rub-out signal, even whole inductor all can't use.

Summary of the invention

In view of this; The fundamental purpose of the utility model provides a kind of transparent touch sensor structure of looking forward or upwards looking property of promoting; It defines required electrode pattern with meticulous insulated wire on nesa coating, and in those non-electrode pattern zones a plurality of small sizes that are not connected each other is set, and promotes the flat appearance degree of this transparent touch inductor and the homogeneity of transmittance in view of the above; And reduce the noise capacitance of this useless etching region, to obtain good electrical specification.

In order to reach above-mentioned utility model purpose, it comprises the insulation course that first inductive layer, second inductive layer and are arranged between first and second inductive layer at least the transparent touch sensor structure that the utility model provided; On these transparent conductive films, defining electrode district and useless etching region by first insulated wire on these inductive layers; And define imitative decorations figure line at this useless etching region by second insulated wire; This electrode district comprises a plurality of induction electrodes and/or signal guide passage, and should be made up of a plurality of small sizes that are not connected each other by imitative decorations figure line.

As the further characteristic of the utility model, these small sizes can be triangle, rectangle, trapezoidal, strip, polygon, circle ... Etc. various geometric figures, and should can form jointly by one or more geometric form area by imitative decorations figure line.

As the further characteristic of the utility model, first insulated wire and second insulated wire can be the hollow out groove or are filled in the megohmite insulant in the hollow out groove.

As the further characteristic of the utility model, first insulated wire is the hollow out groove below the width 200 μ m of line footpath, and second insulated wire is the hollow out groove below the width 100 μ m of line footpath; The degree of depth that is provided with of hollow out groove just can be blocked the conductive film of this inductive layer fully, makes conductive film be separated out two parts of insulation; This hollow out groove by etch process to be formed on the conductive film; And this etch process can adopt the dry-etching processing procedure; For example laser etching, electric paste etching ... Deng, or use wet etch process, for example print etching, gold-tinted etching, ink-jet etching ... Etc. technological means.

Further characteristic as the utility model; First inductive layer and second inductive layer are the transparent conductive film with good conductive characteristic; Its material is to be selected from tin indium oxide, indium zinc oxide, zinc oxide aluminum or to gather enedioxy thiophene etc., but the material ranges of implementing is not exceeded with previous materials.

Further characteristic as the utility model; This insulation course is one or more common composition of transparent viscose thin layer of transparent hard sheet, flexible film or the insulativity of insulativity; Transparent hard sheet or flexible film are the thin layer of a plane formula or non-planar; Its material is to be selected from glass or polycarbonate, polyester, polymethylmethacrylate or cycloolefin co-polymer etc.; But the material ranges of implementing is not exceeded with previous materials, and all kinds of soft or rigid, transparent or semitransparent substrates all are suitable for; The material that aforementioned transparent viscose thin layer uses is selected from ultraviolet hardening resin, optical cement or isoprene rubber etc., but the material ranges of implementing is not exceeded with previous materials.

This will further illustrate other function and the technical characterictic of the utility model hereinafter, know and can realize the utility model according to this after present technique person pores over the explanation in the literary composition.

Description of drawings

Fig. 1 is the planimetric map of the component composition of the utility model embodiment;

Fig. 2 is the side cut-away view of the component composition of the utility model embodiment;

Fig. 3 is the planimetric map of the substrate of the utility model embodiment;

Fig. 4 is the planimetric map of the top panel of the utility model embodiment;

Fig. 5 is the synoptic diagram that the A portion of Fig. 4 amplifies;

Fig. 6 is the side cut-away view at the profile line position of Fig. 5;

Fig. 7 is the another kind of schematic layout pattern of the imitative decorations figure line in useless etching region;

Fig. 8 is another schematic layout pattern of the imitative decorations figure line in useless etching region; And

Fig. 9 is another schematic layout pattern of the imitative decorations figure line in useless etching region, shows that the pattern of another inductive layer that coincides of layout collocation of this imitative decorations figure line is provided with.

Embodiment

In following examples, will explain as example, but the utility model practical range is not limited to use capacitance type touch-control panel, for example uses electric resistance touch-control panel or electromagnetic touch-control panel also applicable, close first Chen Ming with capacitance type touch-control panel.

Extremely shown in Figure 4 like Fig. 1 is a preferred embodiment of the utility model; This capacitance touching control sensor structure comprises a substrate 1 and top panel 2; On a main surface of this substrate 1 and top panel 2, respectively establish a capacitive sensing layer 3,4 respectively, and the two plates gluing that coincides is become a transparent plate body by a cementing layer 5; Wherein, this substrate 1 and top panel 2 optional usefulness have the sheets of glass or the polyester film of high transmission rate, and the transparent UV glue of this cementing layer 5 for having insulation characterisitic.

As shown in Figure 3; Below inductive layer 3 in substrate 1 upper surface is the transparent conductive film of a tin indium oxide material; And the meticulous groove that on nesa coating, is formed by the etching means is to mark off electrode district 31 and useless etching region 32; And form imitative decorations figure line (dummy pattern) at this useless etching region; Wherein, this electrode district is made up of the X axle induction stitching 31a array that multiple tracks is arranged in parallel with each other, and makes the electric respectively signal guide passage 35 that is located at this substrate 1 edge that is connected to of one of aforementioned each X axis traces ora terminalis; Same, as shown in Figure 4, inductive layer 4 is the transparent conductive film of a tin indium oxide material above these top panel 2 basal surfaces, and the meticulous groove that on nesa coating, is formed by the etching means is to mark off required figure; And it is detailed extremely shown in Figure 6 like Fig. 5; Electrode district 41 that defines by the first insulated wire C1 on this pattern conductive film and useless etching region 42; And in this useless etching region, define imitative decorations figure line (dummy pattern) with the second insulated wire C2; Wherein, this electrode district 41 is made up of the Y axle induction stitching 41a array that multiple tracks is arranged in parallel with each other, and makes the electric respectively signal guide passage 45 that is located at these substrate 2 edges that is connected to of an ora terminalis of aforementioned each Y axis traces; And in this embodiment; Aforementioned imitative decorations figure line then is made up of a plurality of evenly distributed sexangle small size 42a, and the aforementioned first insulated wire C1 is the hollow out groove that is set as the about 50 μ m of line footpath width, and the second insulated wire C2 is made as the hollow out groove of the about 30 μ m of line footpath width; And it is provided with the degree of depth and just can this nesa coating be blocked fully, makes conducting film can be separated out two parts (as shown in Figure 6) of insulation.

In addition; Like Fig. 1 and shown in Figure 2; Also be provided with the opaque color frame 6 that metal sputtering forms at the basal surface of this top panel 2 and above this between the inductive layer 4 and near the outer peripheral edges position, it just can be in order to cover the

signal guide passage

35,45 that is located at top panel 2 and substrate 1 edge.

During above-mentioned component composition; Be above aforementioned inductive layer 4 and below between the inductive layer 3 across the cementing layer 5 of this insulativity and adhere together to form a transparent plate body; And make orthogonal thereto setting between Y axle induction stitching 41a and the X axis traces 31a, and the induced signal that its upper and lower inductive layer is triggered can be sent to follow-up signal processing circuit via these

signal guide passages

35,45.

And the utility model embodiment is provided with the imitative decorations figure line of being made up of a plurality of tiny areas in the

useless etching region

32,42 of nesa coating; Therefore can significantly reduce the ratio of the openwork part on the capacitive sensing layer 3,4; Thereby, improve the disappearance of the fuzzy distortion of video picture to promote the uniformity coefficient of contact panel appearance flatness and transmittance; Again, its utilization is divided into discontinuous small size unit with these useless etching regions, also can effectively reduce the noise capacitance, reaches the purpose of avoiding noise.

The utility model is not limited to the above form; Clearly with reference to after the above-mentioned explanation; The improvement and the variation of more how technological isotropism can be arranged, for example be: though the imitative decorations figure line in these useless etching regions is made up of a plurality of hexagonal small size in the aforementioned embodiment; But it is understandable; These small sizes are not limited to use hexagonal, in fact, also can adopt triangle area (as shown in Figure 7), rectangular area (as shown in Figure 8), strip, polygon, circle ... Etc. various geometric figures; Also can arrange in pairs or groups another inductive layer that coincides pattern and implement the imitative decorations figure line (as shown in Figure 9) of different layouts, the therefore said small size of forming imitative decorations figure line according to this can be by one or more common composition of aforementioned geometric form area; And as aforementioned change be provided with and all reach and before take off the same or similar usefulness of embodiment, so should with the utility model before to take off technological true matter identical; Be with, all have in following any modification or change of making relevant the utility model of identical utility model spirit, all must be included in the category of the utility model intention protection.

Above-mentioned embodiment is exemplary, is to be the restriction that this patent is comprised scope in order better to make those skilled in the art can understand this patent, can not to be interpreted as; So long as according to spirit that this patent discloses done anyly be equal to change or modify, all fall into the scope that this patent comprises.

Claims

1. transparent touch sensor structure, it comprises the insulation course that first inductive layer, second inductive layer and are arranged between first and second inductive layer at least; These inductive layers are transparent conductive film; And said insulation course is transparent insulativity layer material; It is characterized in that: on said transparent conductive film, defining electrode district and useless etching region by first insulated wire on the said inductive layer, and defining imitative decorations figure line at this useless etching region by second insulated wire; Said electrode district comprises a plurality of induction electrodes and/or signal guide passage, and said imitative decorations figure line is made up of a plurality of small sizes that are not connected each other.

2. transparent touch sensor structure according to claim 1 is characterized in that: said small size can be triangle, rectangle, trapezoidal, strip, polygon or circular geometric form area.

3. transparent touch sensor structure according to claim 2 is characterized in that: said imitative decorations figure line can be made up of one or more geometric form area jointly.

4. transparent touch sensor structure according to claim 1; It is characterized in that: said first insulated wire is the hollow out groove below the width 200 μ m of line footpath; And the degree of depth that is provided with of this hollow out groove just can be blocked the conductive film of said inductive layer fully, makes said conductive film be separated out two parts of insulation.

5. transparent touch sensor structure according to claim 1; It is characterized in that: said second insulated wire is the hollow out groove below the width 100 μ m of line footpath; And the degree of depth that is provided with of this hollow out groove just can be blocked the conductive film of said inductive layer fully, makes said conductive film be separated out two parts of insulation.

6. transparent touch sensor structure according to claim 1 is characterized in that: said transparent conductive film, its material are to be selected from tin indium oxide, indium zinc oxide, zinc oxide aluminum or to gather one of enedioxy thiophene.

7. transparent touch sensor structure according to claim 1 is characterized in that: said insulation course is one or more common composition of transparent viscose thin layer of transparent hard sheet, flexible film or the insulativity of insulativity.

8. transparent touch sensor structure according to claim 7; It is characterized in that: said insulation course is the transparent hard sheet or the flexible film of insulativity, and its material is selected from one of glass, polycarbonate, polyester, polymethylmethacrylate or cycloolefin co-polymer.

9. transparent touch sensor structure according to claim 7 is characterized in that: said insulation course is the transparent viscose thin layer of insulativity, and its material is selected from one of ultraviolet hardening resin, optical cement or isoprene rubber.