CN201997325U - Device for preparing high-temperature water vapor rich of activated particles with plasma - Google Patents
Device for preparing high-temperature water vapor rich of activated particles with plasma Download PDFInfo
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- CN201997325U CN201997325U CN2010206939379U CN201020693937U CN201997325U CN 201997325 U CN201997325 U CN 201997325U CN 2010206939379 U CN2010206939379 U CN 2010206939379U CN 201020693937 U CN201020693937 U CN 201020693937U CN 201997325 U CN201997325 U CN 201997325U
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Abstract
The utility model provides a device for preparing high-temperature water vapor rich of activated particles with plasma, which comprises a plasma generator and a high-temperature water vapor generator; the middle part of one end of the high-temperature water vapor generator is provided with a high-temperature plasma inlet which is communicated with the outlet of the plasma generator; the plasma generator is provided with an ionization working substance gas inlet; a circular water vapor inlet is arranged around the high-temperature plasma inlet; and a rotary guiding blade is arranged in the circular water vapor inlet. The shell body of the high-temperature water vapor generator is in a step shape which is enlarged step by step, steps 1 to 4 are classified, and the length of each step is 300mm to 800mm; and a circular narrow port for the water vapor to enter is arranged between two adjacent sections of shell body on each step, and the radial width of the circular narrow port is 3mm to 15mm. The water vapor and a working substance which is ionized into high-temperature plasma through the plasma generator are jetted into the high-temperature water vapor generator through respective inlets to be intensely mixed, the water vapor is heated and activated, and the water vapor with the activated particles is formed.
Description
Technical field
The utility model relates to a kind ofly to be produced high temperature, is rich in the device of active particle water vapour with plasma, the high temperature high water activity steam production technology of the raising intensity of gasification of using especially for the gasification conversion process of coal, living beings and rubbish.
Background technology
The gasification conversion that the water vapour hot plasma is used for coal, living beings and rubbish can improve the intensity of gasification greatly, and the ratio that can regulate available gas H2 in the synthesis gas makes synthesis gas can satisfy different instructions for uses.Therefore the water vapour gasification technology based on hot plasma worldwide obtains paying attention to.Traditional water-vapor plasma gasification process uses the work gas of water vapour as plasma, because water vapour has oxidisability, this has accelerated the loss of electrode to a certain extent, shortens the service life of electrode; This factor has restricted the development of plasma gasification technology.
Patent application 01129931.2 discloses hydrogen, CH4 and water vapour and has produced the method for synthesis gas as the plasma pyrolysis gasification of working gas, because water vapour has oxidisability, makes the export license of plasma generator accelerate, and shorten service life.
Summary of the invention
The purpose of this utility model provides a kind ofly to be produced high temperature, is rich in the device of active particle water vapour with plasma, adopt the working gas of non-oxidizing gas as plasma generator, the high-temperature plasma that generates adds hot water and steam again and produces high temperature, is rich in high activity particle water vapour, avoid contacting of water vapour and electrode, prolonged service life of electrode.
The technical solution of the utility model: of the present utility model with plasma produce high temperature, the device that is rich in the active particle water vapour comprises plasma generator and high-temperature water vapor generator, the one end middle part of its high-temperature water vapor generator is provided with the high-temperature plasma inlet port and is communicated with the plasma generator outlet, plasma generator has the non-oxidizing gas import, around the high-temperature plasma inlet port is annular water vapour import, and rotational guide vane is installed in the annular water vapour import.
The housing of described high-temperature water vapor generator is to become big step-like step by step, divides 1～4 grade of step, the annular narrow orifice that has water vapour to enter between the adjacent two-piece housing at every grade of step place, and annular narrow orifice is connected with the water vapor pressure conveying device.
Become the big every level length scope of step 300～800mm on the housing of described high-temperature water vapor generator step by step.
The radial width of described annular narrow orifice is 3～15mm.
Advantage of the present utility model:
The utility model working gas is selected non-oxidizing gas for use, and article on plasma generator electrode does not have corrosiveness, adds that water vapour enters by independent import, does not contact with the electrode of plasma generator, makes electrode life long.
The utility model water vapour rotates the plasma high-temperature zone that sprays in the high-temperature water vapor generator at a high speed by the import of annular water vapour air-intake guide vane, strong with high-temperature plasma, mix rapidly, water vapour is heated, activates, and is rich in a large amount of active particles.By regulating the import mass flow ratio of plasma and water vapour, making the steam temperature after the heating is 1000K～4000K, satisfies the needs that gasify.Water vapour enters by the annular narrow orifice on the high-temperature water vapor generator body, forms the low temperature moisture film at high-temperature water vapor generator wall place, the protection wall.
Description of drawings
Fig. 1 is for producing high temperature with plasma, being rich in the structural representation of the device of active particle water vapour.
Fig. 2 is the A-A cutaway view of Fig. 1.
Fig. 3 is the B-B cutaway view of Fig. 1.
The specific embodiment
As Fig. 1, Fig. 2, Fig. 3: of the present utility model with plasma produce high temperature, the device that is rich in the active particle water vapour comprises plasma generator 1 and high-temperature water vapor generator 2, the one end middle part of its high-temperature water vapor generator 2 is provided with high-temperature plasma inlet port 4 and is communicated with plasma generator 1 outlet 1b, plasma generator 1 has non-oxidizing gas import 1a, around high-temperature plasma inlet port 4 is annular water vapour import 3d, and rotational guide vane 7 is installed in the annular water vapour import 3d.Annular water vapour import 3d is connected with water vapor pressure conveying device 3 with mouth of pipe 3d1 by ring cavity.The 6th, the porous plate in the annular water vapour import 3d.The 5th, the high temperature of high-temperature water vapor generator 2, be rich in the active particle steam outlet.
Further, the housing of described high-temperature water vapor generator 2 is to become big step-like step by step, divide 1～4 grade of step, with 3 grades is example, the housing of high-temperature water vapor generator 2 comprises 2a, 2b, 2c, the annular narrow orifice 3a, 3b, the 3c that have water vapour to enter between the adjacent two-piece housing at every grade of step place, annular narrow orifice 3a, 3b, 3c are connected with water vapor pressure conveying device 3 with mouth of pipe 3a1,3b1,3c1 by ring cavity separately.
Become the big every level length scope of step 300～800mm on the housing of described high-temperature water vapor generator step by step.Housing is a refractory material.
The radial width of described annular narrow orifice is 3～5mm.
Of the present utility model with plasma produce high temperature, the step that is rich in the active particle water vapour comprises:
1) preparation water vapour and working gas are ionized to high-temperature plasma working medium by plasma generator, and working gas is selected one or more in the non-oxidizing gas for use;
2) high-temperature plasma is spurted into the high-temperature water vapor generator and formed the thermal ionization environment, simultaneously water vapour is sent into the high-temperature water vapor generator at a high speed by rotational guide vane, mix strongly with high-temperature plasma, water vapour is heated, activates, and forms the water vapour with active particle.
Described step 1) working gas is 3000K～12000K by the temperature that plasma generator is ionized to high-temperature plasma.
Described water vapour comprises unsaturated water vapour, saturated vapor and superheated vapour and water vapour and air or/and oxygen mixture, preferably saturated vapor.
Non-oxidizing gas commonly used has Ar, N2, H2, C02, CH4 etc., preferred nitrogen.
Step 2) to spray into the speed of high-temperature water vapor generator be 30～100m/s to high-temperature plasma, and the speed that water vapour sprays into the high-temperature water vapor generator is 5～30m/s; By regulating high-temperature plasma and the mass flow ratio that water vapour enters the high-temperature water vapor generator, the temperature that makes water vapour after heating in the high-temperature water vapor generator reach the exit is 1000K～4000K.
The annular narrow orifice that 1～4 grade of water vapour enters is set on the housing of high-temperature water vapor generator at interval; the part water vapour enters the high-temperature water vapor generator by pressure-feeding apparatus by annular narrow orifice, forms the low temperature moisture film of protection high-temperature water vapor generator wall on high-temperature water vapor generation wall.
The radial width that becomes the big described annular narrow orifice of step every level length scope 300～800mm. on the housing of described high-temperature water vapor generator step by step is 3-15mm.
Core of the present utility model is that water vapour enters the high-temperature water vapor generator by independent import, does not contact with the electrode of plasma generator.Therefore, every sample water steam enters the high-temperature water vapor generator by independent import, all belongs to protection domain of the present utility model.
Claims (5)
1. produce high temperature, be rich in the device of active particle water vapour with plasma for one kind, comprise plasma generator (1) and high-temperature water vapor generator (2), it is characterized in that: the end middle part of high-temperature water vapor generator (2) is provided with high-temperature plasma inlet port (4) and is communicated with the outlet (1b) of plasma generator (1), plasma generator (1) has ionization medium gas feed (1a), around high-temperature plasma inlet port (4) is annular water vapour import (3d), and rotational guide vane (7) is installed in the annular water vapour import (3d).
2. according to claim 1ly produce high temperature, be rich in the device of active particle water vapour with plasma, it is characterized in that: the housing of high-temperature water vapor generator (2) is to become big step-like step by step, divide 1～4 grade of step, the annular narrow orifice that has water vapour to enter between the adjacent two-piece housing at every grade of step place, annular narrow orifice is connected with the water vapor pressure conveying device.
3. according to claim 1 and 2ly produce high temperature, be rich in the device of active particle water vapour, it is characterized in that: become the big every level length scope of step 300～800mm. on the housing of described high-temperature water vapor generator step by step with plasma
4. according to claim 1 and 2ly produce high temperature, be rich in the device of active particle water vapour with plasma, it is characterized in that: the radial width of described annular narrow orifice is 3～15mm.
5. according to claim 2ly produce high temperature, be rich in the device of active particle water vapour with plasma, it is characterized in that: the mouth of pipe in the band chamber of annular narrow orifice by separately is connected with the water vapor pressure conveying device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206939379U CN201997325U (en) | 2010-12-31 | 2010-12-31 | Device for preparing high-temperature water vapor rich of activated particles with plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206939379U CN201997325U (en) | 2010-12-31 | 2010-12-31 | Device for preparing high-temperature water vapor rich of activated particles with plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201997325U true CN201997325U (en) | 2011-10-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2010206939379U Expired - Lifetime CN201997325U (en) | 2010-12-31 | 2010-12-31 | Device for preparing high-temperature water vapor rich of activated particles with plasma |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102125818A (en) * | 2010-12-31 | 2011-07-20 | 武汉凯迪工程技术研究总院有限公司 | Method and device for preparing high-temperature active particle-rich water vapor by plasma |
-
2010
- 2010-12-31 CN CN2010206939379U patent/CN201997325U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102125818A (en) * | 2010-12-31 | 2011-07-20 | 武汉凯迪工程技术研究总院有限公司 | Method and device for preparing high-temperature active particle-rich water vapor by plasma |
| CN102125818B (en) * | 2010-12-31 | 2013-12-11 | 武汉凯迪工程技术研究总院有限公司 | Method and device for preparing high-temperature active particle-rich water vapor by plasma |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20111005 Effective date of abandoning: 20131211 |
|
| RGAV | Abandon patent right to avoid regrant |