CN201994322U - Discharging electrode plate array for solar cell deposition - Google Patents
Discharging electrode plate array for solar cell deposition Download PDFInfo
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- CN201994322U CN201994322U CN2010202235719U CN201020223571U CN201994322U CN 201994322 U CN201994322 U CN 201994322U CN 2010202235719 U CN2010202235719 U CN 2010202235719U CN 201020223571 U CN201020223571 U CN 201020223571U CN 201994322 U CN201994322 U CN 201994322U
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Abstract
The utility model relates to a discharging electrode plate array for solar cell deposition, which belongs to the technical field of cells and comprises an electrode plate array formed by a plurality of electrode plate assemblies with shields and a signal feed assembly. Each electrode plate assembly includes at least a pair of cathode plates and an anode plate. One end face of the signal feed assembly is in a shape of rectangle and is contacted with the face of a feed inlet surface of each electrode plate assembly. High frequency or very high frequency power power source signals are fed to a feed inlet in a lower concave face of the central area at the back side of each cathode plate of each electrode plate assembly. The discharging electrode plate array for the solar cells has the advantages of overcoming the consumption of one or more feeds caused by the feed wire distance, obtaining even stable discharging with large area of an electric field driven by the radio frequency or very high frequency power power source and effectively removing standing waves and skin effect caused by very high frequency. Furthermore, the production rate can be improved, and the cost is reduced.
Description
Technical field
The utility model relates to a kind of solar battery technology, definite say a kind of by very high frequency(VHF) power supply (the silicon-based film solar cells settling chamber sparking electrode plate array of 27.12MHz～100MHz) drive.
Background technology
At present, silicon-based film solar cells, using plasma strengthens the opto-electronic conversion P-I-N rete that chemical vapour deposition technique (PECVD) obtains unijunction or many knots, at the general this radio frequency capacitive coupling parallel electrode plate reative cell of thin-film solar cells manufacturing.Constitute the battery lead plate array by electrode plate assembly and in reative cell, carry out plasma activated chemical vapour deposition.Radio frequency capacitive coupling parallel-plate electrode reative cell is widely used in the large tracts of land deposition of material films such as amorphous silicon, amorphous silicon germanium, carborundum, silicon nitride, silica.Silicon-based film solar cells is an important branch of solar energy industry, and the parallel electrode plate capacitive discharge pattern that is adopted is one of core technology of solar cell industry.13.56MHz radio frequency is widely used in the high speed production of amorphous silicon-based film material, production efficiency height, technology cost are low.Specification requirement improves constantly to silica-base film along with solar energy market, and crystallite, nanocrystal silicon based film material are subjected to industry and show great attention to.But under the crystallite process environments, the plasma density that the 13.56MHz rf wave is derived is little, and deposition rate is low, deposition adequate thickness film required time is long, and background contamination is big, thus the film impurities content height of preparing, the photoelectricity poor performance has a strong impact on the product quality performance.How high speed deposition becomes the key that crystallization silica-base film technology can successfully be served industry.
Very high frequency(VHF) refers to that frequency is the twice of 13.56MHz or the legal radio frequency of high power more.Use the scope that more very high frequency(VHF) is generally 27.12～200MHz in industry.Yet in the capacitive discharge pattern, standing wave effect and skin effect that very high frequency(VHF) causes are very obvious, and strengthen along with the increase of driving frequency.Professor M.A.Lieberman in California, USA university Berkeley branch school furthers investigate these two kinds of effects.Result of study shows that the critical condition of very high frequency(VHF) PECVD deposition homogeneous film is the free space wavelength (λ of stimulating frequency
0) much larger than the capacitive discharge battery lead plate chamber size factor (X), skin depth (δ) is much larger than holding the thick factor (η.) with machining area 1m
2Be example, under the stimulating frequency of 60MHz, λ
0≈ X, δ ≈ η.Therefore under this stimulating frequency, become skin and standing wave effect are very obvious, cause 1m
2Discharge electrode is inhomogeneous on the battery lead plate.So how realizing uniform large-area discharge that very high frequency(VHF) drives is one of technical barrier of needing to be resolved hurrily of crystallization silica-base film technology, this has caused the very big interest of industry.2003, United States Patent (USP) 2003/0150562A1 disclosed and has utilized magnetic mirror to improve the electric field inhomogeneities that very high frequency(VHF) causes in the capacity plate antenna coupled discharge.Chinese patent 200710150227.4,200710150228.9,200710150229.3 discloses three kinds of designs of very high frequency(VHF) electrode, by the different feed-in forms of very high frequency(VHF) signal, obtains uniform electric field.But existing problem be: 1) VHF-PECVD reative cell electrode design complex structure; 2) still needing to continue improved reason is will often load and unload and constantly clean reative cell and electrode in producing, and all can cause the special-shaped electrode distortion; 3) the multiple spot feed-in structure contact area in the existing patent is less, require each load point path symmetry, can not contact between bonding conductor between the load point and the minus plate, say accurately that bonding conductor needs and minus plate between Isolated Shield could realize effective the discharge.The actual requirement of these structural designs is relatively harsh, and the factor of decision discharge uniformity coefficient is too many, and can not satisfy and actual demand such as unpick and wash in the production.Therefore in industry equipment, the single-point feed-in is the main flow structural design, but because standing wave and skin effect, the single-point feed-in structure can not satisfy the requirement of feed-in high frequency frequency upgrading.For this reason, need do further exploitation and improvement towards the practicality aspect to existing deposition clamp and electrode, in the face of the current market demand, quality be improved, cost reduces.Simultaneously, for the CVD anchor clamps system of handling or deposit multi-disc glass, also be a development trend.Therefore,, adopt the industrialization product exploitation and the design of effective very high frequency(VHF) feed-in pattern, industry development is had important and practical meanings for satisfying production in enormous quantities.
The utility model content
The utility model purpose is intended to solve the discharge non-uniformity problem of very high frequency(VHF) power drives, and the battery lead plate array that the electrode plate assembly that provides a kind of large tracts of land VHF-PECVD settling chamber that obtains uniform electric field to use a kind of novel concept design constitutes, to be applicable to the large tracts of land VHF-PECVD battery lead plate multi-disc array of industrialization.
The utility model comprises for realizing the technical solution that above task proposes: a kind of solar cell deposition sparking electrode plate array is provided, comprise at least one electrode plate assembly, signal feed-in assembly, it is characterized in that also comprising the battery lead plate array that electrode plate assembly and signal feed-in assembly by a plurality of band radomes constitute, this electrode plate assembly comprises at least one pair of minus plate and a positive plate, an end face of signal feed-in assembly is rectangular, the feed-in actinal surface contact of this rectangle end face and electrode plate assembly is connected, feed-in high frequency or the very high frequency(VHF) power power-supply signal feed-in mouth to the central area concave surface at the every minus plate back side of electrode plate assembly.
Effective discharge working face of the minus plate that two faces of the positive plate of described electrode assemblie are placed towards symmetry respectively.
Described signal feed-in assembly comprises the signal feed-in band that is made of the zigzag strip copper feed-in core band and appearance screen.
Described electrode plate assembly comprises minus plate, ceramic insulating layer, the radome of single face discharge, and described radome covers the whole minus plate back side and side.
Described battery lead plate array constitutes the battery lead plate array of chambers with discharge spacing by the minus plate of many covers band radome and the positive plate of many cover ground connection.
Described minus plate radome comprises that also radio frequency or very high frequency(VHF) power power-supply signal are fed into the center at the minus plate back side and the shielding of side all around.
Another termination of described signal feed-in assembly comprises the negative electrode delivery outlet and the power power-supply adaptation of high frequency or very high frequency(VHF) power power-supply signal.
The positive beneficial effect that the utility model produced is, be different from insertion slot type minus plate side feed-in mode, the utility model can obtain the more stable discharging of high evenness and bigger machining area, and it is little to insert electric capacity, actual discharge power is big, and radio frequency interference is little between the battery lead plate array.Also be different from the minus plate center point type feed-in of single chamber deposition system, insert that electric capacity is little, standing wave and skin effect be little, but integrated array formula multicell deposition is greatly enhanced productivity.Therefore, by optimizing the structure of very high frequency(VHF) power supply feed-in form, battery lead plate, solving radio frequency large tracts of land discharge homogeneity question, also is the prerequisite of crystallization silica-base film high-speed and high-efficiency technology of preparing.The utility model is applicable to that the large tracts of land of the very high frequency(VHF) power supply of the interval any legal frequency of any power, 27.12MHz～200MHz evenly discharges.This structure can be applicable to the multi-disc depositing system, improves productive rate greatly and has reduced the battery cost.This utility model breaks through the restriction of conventional electrodes designing technique, has effectively eliminated standing wave and skin effect that very high frequency(VHF) causes, reaches the industrial applications level that is applicable to even discharge.
Description of drawings
Fig. 1 is the utility model battery lead plate array schematic diagram.
Fig. 2 is signal feed-in assembly 201 structural representations among Fig. 1.
Fig. 3 is 203 minus plate structural representations among Fig. 1.
Fig. 4 is 204 minus plate shielding case structure schematic diagrames among Fig. 1.
Fig. 5 is the schematic diagram of the utility model embodiment 2.
Fig. 6 is the schematic diagram of the utility model embodiment 3.
Fig. 7 is a thickness test sampling point distribution map in the case study on implementation.
Fig. 8 is embodiment 2 schematic diagrames of the present utility model, 4 microcrystalline silicon film thickness distribution that different electrode glasses deposit in battery lead plate.
Fig. 9 is a typical microcrystal silicon Raman spectrum among the utility model embodiment 2.
The utility model contribution also has been to solve substantially the uniformity and the consistency problem of the deposit films with high deposition rate of very high frequency(VHF) power drives.Further specify the utility model content below in conjunction with accompanying drawing:
Among Fig. 1-4, vacuum chamber 01, gas system access port 101, vacuum system access port 105, the ceramic insulating layer 207 of minus plate 203, grounded metal guide groove 209, signal feed-in assembly 201, the feed-in face 201-1 of feed-in mouth 203-1, appearance insulation screen 202 is placed on substrate to be deposited on minus plate and the positive plate 206.
By positive plate 208, minus plate 203, minus plate radome 204, the electrod-array that signal feed-in assembly 201 is formed is installed in the vacuum chamber 01, and the feed-in mouth 203-1 of minus plate 203 central areas is rectangles.The feed-in end face 201-1 rectangle of matching used signal feed-in assembly 201, feed-in assembly 201 is zigzag, and flat being convenient to of its waist installed, and signal feed-in loss is few.The problems that existing multiple spot feed-in is difficult to overcome to crystallization silica-base film VHF-PECVD deposition technique have been overcome, as reative cell electrode structure complexity; Electrode is yielding, contact area is less; Path distance requires fully symmetry and shielding etc. fully between each load point.And there are not these problems in of the present utility model feed-in design, solved to obtain the discharge of uniform electric field large tracts of land chamber.Especially efficiently utilize the positive plate double face, for the CVD battery lead plate array system of handling or deposit the multi-disc glass substrate, adopt effective very high frequency(VHF) face feed-in pattern, but obtained the suitability for industrialized production operating procedure, can satisfy the silicon-based film solar cells requirements of large-scale production.
Embodiment
Embodiment 1:
In conjunction with Fig. 1-4 explanation present embodiment operation principle.Two minus plate 203 shared positive plates 208 are formed two pairs of electrodes, and four substrates 206 of plated film simultaneously successively can forming array, improving the operating efficiency of the utility model array, thereby improve the battery chip productive rate.Gas-phase deposition system is mainly by vapor deposition chamber, gas system, power-supply system, vacuum system, heating system, compositions such as control system, gas system mainly provides the various desired gas and the gas piping of vapour deposition, needed radio frequency or the very high frequency(VHF) power supply that is ionized into plasmoid when power-supply system mainly provides deposition, vacuum system mainly provides when deposition extracting vacuum state with equipment and pipeline, heating system mainly is to heat to vapor deposition chamber, control system mainly is that deposition process and parameter are controlled, and vapor deposition chamber is to realize gas aggradation on substrate 206 and finish the device of plated film.Vapor deposition chamber mainly is made up of vacuum chamber 01, battery lead plate array.Vacuum chamber 01 is used for realizing vacuum state, and the battery lead plate array is used for realizing plasma discharge, with gas aggradation on substrate 206.The battery lead plate array mainly is made up of minus plate 203, minus plate radome 204, ceramic insulating layer 207, positive plate 208, signal feed-in assembly 201, appearance insulation screen 202.Be connected with grounded metal guide groove 209 on the vacuum chamber 01, be used for fixing positive plate 208, minus plate 203, cathode shield 204, positive plate 208 directly inserts in the metal guide groove 209 and with groove and contacts, and minus plate radome 204 is contacted with metal guide groove 209, install ceramic insulating layer 207 additional between minus plate 203 and the cathode shield 204 it can not be contacted.Positive plate 208 is grounded by contacting with metal guide groove 209 to contact with vacuum chamber 01 with cathode shield 204 again.In the concave surface of central area, minus plate 203 back side, feed-in mouth 203-1 is arranged, signal feed-in assembly 201 is the signal feed-in band of a zigzag strip, an end face of its signal feed-in band is rectangular to be contacted with minus plate feed-in mouth 203-1 face, radio frequency power power-supply signal is fed into minus plate 203, minus plate radome 204 covers the whole minus plate back side and side, in the middle of minus plate radome 204, have hole 204-1 corresponding to feed-in mouth 203-1 position, make signal feed-in assembly 201 when minus plate 203 is drawn, not contact with minus plate radome 204, be with appearance insulation screen 202 on the signal feed-in assembly 201, in case contact with minus plate radome 204.Substrate 206 is fixed on the battery lead plate, the battery lead plate array is placed vacuum chamber 01, be evacuated down to perfect condition earlier by vacuum system, the depositing operation of ventilating is again finished gas-phase deposition coating.
Minus plate feed-in mouth is a rectangle, and signal feed-in assembly is that waist is flat.
Fig. 5, present embodiment adopt vertical settling chamber, and two minus plate 203 shared positive plates 208 are formed two pairs of electrodes, simultaneously four substrates 206 of plated film.Concrete steps are as follows:
A) with 4 glass substrates 206 that have a thick nesa coating of 600nm (1640mm * 707mm * 3mm) is positioned over four substrate position in the vacuum chamber 01, face outwardly, glass is towards battery lead plate.
B) vacuum is extracted into 5.0 * 10
-4After the Pa, feed argon gas, when cavity pressure reaches 60Pa, open 40.68MHz very high frequency(VHF) power supply, with 400W power discharge clean vacuum chambers 2 minutes, powered-down.
C) pumping high vacuum to 5.0 * 10 afterwards
-4About Pa, clean twice with argon gas.
D) feed mixed air (silane adds hydrogen) according to 5slpm, internal gas pressure reaches 60Pa when the chamber, opens 40.68MHz very high frequency(VHF) power supply, with the 400W power discharge, and deposition micro crystal silicon intrinsic layer 40 minutes.
E) powered-down, pumping high vacuum.
F) charge into nitrogen to atmospheric pressure, open the vacuum chamber fire door, cool off TCO glass at room temperature.
After finishing, coating process, detects the each point thickness at these 40 points of sampling on glass (as shown in Figure 7).Wherein the microcrystal silicon thickness test result of deposition is as shown in table 1 on substrate 206:
Four glass plate microcrystalline silicon film difference in thickness as shown in Figure 8.
The typical controlled micro crystallization degree of its film as shown in Figure 9.
Can draw as drawing a conclusion from above data: adopt this feed-in form, can realize the uniform electric field of 40.68MHz very high frequency(VHF) power supply, on glass at the TCO of 1640mm * 707mm (long * wide) can deposited film thickness ununiformity evenness be about 5% microcrystalline silicon film, and the crystallite degree is adjustable.
Below in conjunction with the accompanying drawings embodiment of the present utility model has been done detailed description, but the utility model is not limited to the foregoing description, especially the shape of feed-in assembly and minus plate, in the ken that those of ordinary skills possessed, can also under the prerequisite that does not break away from the utility model aim, make various variations.
Claims (7)
1. solar cell deposition sparking electrode plate array, comprise at least one electrode plate assembly, signal feed-in assembly, it is characterized in that also comprising the battery lead plate array that electrode plate assembly and signal feed-in assembly by a plurality of band radomes constitute, this electrode plate assembly comprises at least one pair of minus plate and a positive plate, an end face of signal feed-in assembly is rectangular, the feed-in actinal surface contact of this rectangle end face and electrode plate assembly is connected, feed-in high frequency or the very high frequency(VHF) power power-supply signal feed-in mouth to the central area concave surface at the every minus plate back side of electrode plate assembly.
2. solar cell deposition sparking electrode plate array according to claim 1 is characterized in that effective discharge working face of the minus plate that two faces of the positive plate of described electrode assemblie are placed towards symmetry respectively.
3. solar cell deposition sparking electrode plate array according to claim 1 is characterized in that described signal feed-in assembly comprises the signal feed-in band that is made of the zigzag strip copper feed-in core band and appearance screen.
4. solar cell deposition sparking electrode plate array according to claim 1 is characterized in that described electrode plate assembly comprises minus plate, ceramic insulating layer, the radome of single face discharge, and described radome covers the whole minus plate back side and side.
5. solar cell deposition sparking electrode plate array according to claim 1 and 2 is characterized in that described battery lead plate array by the minus plate of many covers band radome and the positive plate of many cover ground connection, constitutes the battery lead plate array of chambers with discharge spacing.
6. a kind of according to claim 1 or 5 discharge electrode plate array for thin film solar cell settling, it is characterized in that described minus plate radome, comprise that also radio frequency or very high frequency(VHF) power power-supply signal are fed into the center at the minus plate back side and the shielding of side all around.
7. solar cell deposition sparking electrode plate array according to claim 1, another termination that it is characterized in that described signal feed-in assembly comprises the negative electrode delivery outlet and the power power-supply adaptation of high frequency or very high frequency(VHF) power power-supply signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202235719U CN201994322U (en) | 2010-06-11 | 2010-06-11 | Discharging electrode plate array for solar cell deposition |
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| CN2010202235719U CN201994322U (en) | 2010-06-11 | 2010-06-11 | Discharging electrode plate array for solar cell deposition |
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| CN201994322U true CN201994322U (en) | 2011-09-28 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110029328A (en) * | 2019-05-22 | 2019-07-19 | 上海稷以科技有限公司 | It is a kind of for improving the boxlike electrode of positive and negative planar depositions uniformity |
-
2010
- 2010-06-11 CN CN2010202235719U patent/CN201994322U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110029328A (en) * | 2019-05-22 | 2019-07-19 | 上海稷以科技有限公司 | It is a kind of for improving the boxlike electrode of positive and negative planar depositions uniformity |
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Granted publication date: 20110928 |
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