CN201764768U - Cryogenic treatment device for crystalline silicon material - Google Patents
Cryogenic treatment device for crystalline silicon material Download PDFInfo
- Publication number
- CN201764768U CN201764768U CN2010202931274U CN201020293127U CN201764768U CN 201764768 U CN201764768 U CN 201764768U CN 2010202931274 U CN2010202931274 U CN 2010202931274U CN 201020293127 U CN201020293127 U CN 201020293127U CN 201764768 U CN201764768 U CN 201764768U
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- Prior art keywords
- liquid nitrogen
- storehouse
- workpiece
- crystalline silicon
- silicon material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a cryogenic treatment device for crystalline silicon material. The device comprises a workpiece bin, a liquid nitrogen bin arranged at the outer part of the workpiece bin, a non-contact circulating pump connected with the liquid nitrogen bin, a vacuum gauge and a temperature sensor, wherein, the vacuum gauge and the temperature sensor are connected with the workpiece bin. In the utility model, the workpiece bin can operate at low temperature due to the liquid nitrogen bin at the outer part of the workpiece bin; through the vacuum gauge and the temperature sensor which are connected with the workpiece bin, the temperature and the vacuum degree in the workpiece bin can be monitored during the cryogenic treatment process, so as to ensure normal operation of cryogenic treatment; besides, due to the non-contact circulating pump connected with the liquid nitrogen bin, liquid nitrogen in the liquid nitrogen bin can be recycled, and liquid nitrogen is no longer discharged to the air, so that energy consumption is reduced, and the environment is protected; and the utility model has low cost.
Description
Technical field
The utility model relates to the subzero treatment technical field, more particularly, relates to a kind of cryogenic treatment apparatus of crystalline silicon material.
Background technology
Along with the finiteness of conventional energy resource and the increase of environmental protection pressure, many countries have started the upsurge of development and utilization new forms of energy, wherein, solar energy is developed in the world fast as a kind of renewable and clean energy resource, so photovoltaic module has obtained widespread adoption.Along with the large-scale production of photovoltaic module, photovoltaic module also exposes some shortcomings, and as low etc. as the conversion efficiency of photovoltaic module, countries in the world photovoltaic technology personnel are numerous and confused to be dropped into large quantities of technical forces and this is studied improvement.At present, as the preparation raw material of photovoltaic cell, the hardness and the wearability of crystalline silicon material are relatively poor, service life is shorter, simultaneously, austenitic high fragility causes the easily cracked of crystalline silicon material after the processing, makes the anti-latent fragility of solar battery sheet relatively poor and case hardness is lower.
At present, subzero treatment technology has obtained using widely in industrial production.Crystalline silicon material is carried out subzero treatment, can improve the performance of crystalline silicon material.In the prior art, the cryogenic treatment apparatus of crystalline silicon material is low-temperature receiver with the liquid nitrogen, by constantly feeding liquid nitrogen in the workpiece storehouse of cryogenic treatment apparatus, reaches the purpose of subzero treatment.But this cryogenic treatment apparatus is bigger to liquid nitrogen consumption, has caused energy waste.
The utility model content
In view of this, the technical problems to be solved in the utility model is to provide a kind of cryogenic treatment apparatus of crystalline silicon material, and the cryogenic treatment apparatus that utilizes the utility model to provide carries out subzero treatment, and the liquid nitrogen consumption is little, energy savings.
The utility model provides a kind of cryogenic treatment apparatus of crystalline silicon material, comprising:
The workpiece storehouse;
Be arranged at the liquid nitrogen storehouse of outside, workpiece storehouse;
The contactless circulating pump that links to each other with the liquid nitrogen storehouse;
The vacuum meter and the temperature sensor that link to each other with the workpiece storehouse.
Preferably, also comprise:
Be arranged at the support of below, described liquid nitrogen storehouse.
Preferably, also comprise:
The liquid nitrogen Pressure gauge that links to each other with the liquid nitrogen storehouse.
Preferably, described workpiece storehouse is a cuboid.
Preferably, described liquid nitrogen storehouse is a cuboid.
Preferably, described temperature sensor is one.
Preferably, described vacuum meter is one.
From above-mentioned technical scheme as can be seen, the utility model provides a kind of cryogenic treatment apparatus of crystalline silicon material, comprising: the workpiece storehouse; Be arranged at the liquid nitrogen storehouse of outside, workpiece storehouse; The contactless circulating pump that links to each other with the liquid nitrogen storehouse; The vacuum meter and the temperature sensor that link to each other with the workpiece storehouse.The utility model has guaranteed that by the liquid nitrogen storehouse of outside, workpiece storehouse the workpiece storehouse can be implemented in work under the low temperature; By vacuum meter and the temperature sensor that links to each other with the workpiece storehouse, can monitor temperature in the workpiece storehouse and vacuum in the subzero treatment process, guaranteed that subzero treatment can normally move; And, by the contactless circulating pump that links to each other with the liquid nitrogen storehouse, the liquid nitrogen in the liquid nitrogen storehouse can be recycled, need not in air, to discharge liquid nitrogen, thereby reduced the consumption of the energy and protected environment, cost is low.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below, apparently, accompanying drawing in describing below only is embodiment more of the present utility model, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the cryogenic treatment apparatus schematic diagram of the disclosed crystalline silicon material of the utility model embodiment.
The specific embodiment
Below the technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment only is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
The utility model provides a kind of cryogenic treatment apparatus of crystalline silicon material, as shown in Figure 1, comprising: workpiece storehouse 1, liquid nitrogen storehouse 2, contactless circulating pump 3, vacuum meter 4, temperature sensor 5, liquid nitrogen Pressure gauge 6 and support 7.
Workpiece storehouse 1 can be cuboid, can also be square or other shapes, can reach to exist the effect of workpiece to get final product.Outer setting in workpiece storehouse 1 has liquid nitrogen storehouse 2, and the liquid nitrogen in the liquid nitrogen storehouse 2 can reach the effect of low temperature, thereby makes the purpose of the workpiece realization subzero treatment in the workpiece storehouse.There is no particular restriction for liquid nitrogen storehouse 2 moral shapes, can be cuboid, square or other shapes, can reach to deposit liquid nitrogen and get final product with purpose that the workpiece storehouse fully contacts.
Outer setting in liquid nitrogen storehouse 2 has contactless circulating pump 3, by contactless circulating pump 3 liquid nitrogen in the liquid nitrogen storehouse can be recycled, and need not to discharge liquid nitrogen in air, thereby has reduced the consumption of the energy and protected environment, reduces the cost of subzero treatment.
According to the utility model, also comprise the vacuum meter 4 that links to each other with workpiece storehouse 1.Can detect vacuum in the workpiece storehouse by vacuum meter 4, guarantee that workpiece carries out work under the vacuum that requires.There is no particular restriction for the number of against vacuum kilsyth basalt 4, can be for one or more.Temperature sensor 5 links to each other with workpiece storehouse 1, can detect the internal temperature in workpiece storehouse in real time, when the temperature that detects the workpiece storehouse when temperature sensor 5 is not operating temperature, can reach the purpose of control temperature by regulating the amount of the liquid nitrogen in the liquid nitrogen storehouse 2.There is no particular restriction for the number of temperature sensor 5, can be for one or more.
Liquid nitrogen Pressure gauge 6 links to each other with liquid nitrogen storehouse 2, can detect the pressure of the liquid nitrogen in the liquid nitrogen storehouse 2, thereby the assurance subzero treatment can normally be carried out.There is no particular restriction for the number of liquid nitrogen Pressure gauge 6, can be for one or more.
Support 7 is positioned at the below in workpiece storehouse, links to each other with the workpiece storehouse, reaches the purpose of support.
The utility model can carry out subzero treatment to crystalline silicon material as follows.
Steps A: crystalline silicon material is cooled to-192～-196 ℃ and carries out the constant temperature processing;
Step B: the crystalline silicon material after the processing of steps A constant temperature is warming up to 100～120 ℃ carries out the constant temperature processing.
Among the above-mentioned steps A, crystalline silicon material is carried out subzero treatment, crystalline silicon material is cooled to preferably-195～-196 ℃, more preferably crystalline silicon material is cooled to-196 ℃.Since in the crystalline silicon material austenitic structure of ferro element under low temperature environment very built on the sand, easily decompose, therefore, when crystalline silicon material is carried out subzero treatment, defect part (being mainly the part of micropore and stress concentration) produces plasticity and flows, and tissue generation refinement, so, austenite can change into martensite, and has eliminated internal stress.The internal voids of crystalline silicon material filled up in the martensite that generates, and increases wear-resisting area, thereby improve the flexility of crystalline silicon material, reduced fragment rate.And when ultralow temperature, because the texture in the crystalline silicon material produces volume contraction, lattice paprmeter contracts thin and strengthens the driving force that carbon atom is separated out, so martensitic matrix is separated out a large amount of ultra tiny carbide.Described ultra tiny carbide improves the intensity of crystalline silicon material, has increased pliability and rigidity simultaneously, has improved the cracking resistance of crystalline silicon material.And the capacity of the transferable crystalline silicon atom of subzero treatment makes and can not spread between the atom separately, thereby makes atom in conjunction with tightr.Cooling rate is preferably 0.5～0.6 ℃/min in the described steps A, more preferably 0.5 ℃/min.
The crystalline silicon material that among the step B steps A is obtained heats up preferably to 110～120 ℃, more preferably to 100 ℃ and constant temperature processing.Programming rate is preferably 0.5～0.6 ℃/min among the step B, more preferably 0.5 ℃/min.
In addition, also comprise:
Step C: the crystalline silicon material after the processing of step B constant temperature is cooled to-192～-196 ℃ carries out the constant temperature processing, rise to room temperature then.
The cooling of the crystalline silicon material that among the step C step B obtained is preferred to be preferably-195～-196 ℃ to-192～-196 ℃, and more preferably-196 ℃, and constant temperature handles, and rises to room temperature then.Cooling rate is 0.5～0.6 ℃/min among the described step C, more preferably 0.5 ℃/min.
Above-mentioned steps C is the repeated treatments of carrying out with crystalline silicon material, reaches the optimum efficiency of subzero treatment.The number of times of subzero treatment includes but are not limited to above-mentioned number of times, can also be more times.
This method can be reduced to 1.5～3% with the austenite of crystalline silicon intensive amount 8%～20% after handling.Crystalline silicon material hardness after handling and untreated crystalline silicon material are compared, and the crystalline silicon material hardness after the processing improves HRC1～2.
Embodiment 1
The polysilicon bulk is put into the cryogenic treatment apparatus that is added with liquid nitrogen, it under 25 ℃ of temperature conditions, is cooled to-196 ℃ and constant temperature 18h with 0.5 ℃/min, be warming up to room temperature with 0.5 ℃/min then;
Be heated to 100 ℃ of constant temperature 30min again after above-mentioned polysilicon block ingot is warming up to room temperature with 0.5 ℃/min;
Be cooled to-196 ℃ and constant temperature 18h with being heated to 100 ℃ of polysilicon block ingot speed behind the constant temperature 30min, last 0.5 ℃/min speed is warming up to room temperature.
The austenite content of the crystalline silicon material of above-mentioned processing is 2%, crystalline silicon material hardness after handling and untreated crystalline silicon material are compared, crystalline silicon material hardness after the processing improves HRC2, among the embodiment before and after the fast processing of crystalline silicon performance as shown in table 1.
The performance table of comparisons before and after polysilicon block is handled among table 1 embodiment 1
Embodiment 2
The polysilicon bulk is put into the cryogenic treatment apparatus that is added with liquid nitrogen, it under 25 ℃ of temperature conditions, is cooled to-195 ℃ and constant temperature 17h with 0.5 ℃/min, be warming up to room temperature with 0.5 ℃/min then;
Be heated to 105 ℃ of constant temperature 30min again after above-mentioned polysilicon block ingot is warming up to room temperature with 0.5 ℃/min;
Be cooled to-195 ℃ and constant temperature 17h with being heated to 100 ℃ of polysilicon block ingots behind the constant temperature 30min with 0.5 ℃/min, be warming up to room temperature with 0.5 ℃/min at last.
The austenite content of the crystalline silicon material of above-mentioned processing is 2%, and crystalline silicon material hardness after handling and untreated crystalline silicon material are compared, and the crystalline silicon material hardness after the processing improves HRC1.
From technique scheme as can be seen, the cryogenic treatment apparatus of the crystalline silicon material that provides of the utility model comprises: the workpiece storehouse; Be arranged at the liquid nitrogen storehouse of outside, workpiece storehouse; The contactless circulating pump that links to each other with the liquid nitrogen storehouse; The vacuum meter and the temperature sensor that link to each other with the workpiece storehouse.The utility model has guaranteed that by the liquid nitrogen storehouse of outside, workpiece storehouse the workpiece storehouse can be implemented in work under the low temperature; By vacuum meter and the temperature sensor that links to each other with the workpiece storehouse, can monitor temperature in the workpiece storehouse and vacuum in the subzero treatment process, guaranteed that subzero treatment can normally move; And, by the contactless circulating pump that links to each other with the liquid nitrogen storehouse, the liquid nitrogen in the liquid nitrogen storehouse can be recycled, need not in air, to discharge liquid nitrogen, thereby reduced the consumption of the energy and protected environment, cost is low.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the utility model.Multiple modification to these embodiment will be conspicuous concerning those skilled in the art, and defined herein General Principle can realize under the situation that does not break away from spirit or scope of the present utility model in other embodiments.Therefore, the utility model will can not be restricted to these embodiment shown in this article, but will meet and principle disclosed herein and features of novelty the wideest corresponding to scope.
Claims (7)
1. the cryogenic treatment apparatus of a crystalline silicon material is characterized in that, comprising:
The workpiece storehouse;
Be arranged at the liquid nitrogen storehouse of outside, workpiece storehouse;
The contactless circulating pump that links to each other with the liquid nitrogen storehouse;
The vacuum meter and the temperature sensor that link to each other with the workpiece storehouse.
2. cryogenic treatment apparatus according to claim 1 is characterized in that, also comprises: the support that is arranged at below, described liquid nitrogen storehouse.
3. cryogenic treatment apparatus according to claim 1 is characterized in that, also comprises: the liquid nitrogen Pressure gauge that links to each other with the liquid nitrogen storehouse.
4. cryogenic treatment apparatus according to claim 1 is characterized in that, described workpiece storehouse is a cuboid.
5. cryogenic treatment apparatus according to claim 1 is characterized in that, described liquid nitrogen storehouse is a cuboid.
6. cryogenic treatment apparatus according to claim 1 is characterized in that, described temperature sensor is one.
7. cryogenic treatment apparatus according to claim 1 is characterized in that, described vacuum meter is one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202931274U CN201764768U (en) | 2010-08-13 | 2010-08-13 | Cryogenic treatment device for crystalline silicon material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202931274U CN201764768U (en) | 2010-08-13 | 2010-08-13 | Cryogenic treatment device for crystalline silicon material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201764768U true CN201764768U (en) | 2011-03-16 |
Family
ID=43717377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010202931274U Expired - Fee Related CN201764768U (en) | 2010-08-13 | 2010-08-13 | Cryogenic treatment device for crystalline silicon material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201764768U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109556337A (en) * | 2018-12-03 | 2019-04-02 | 天津市热处理研究所有限公司 | A kind of dual chamber cryogenic treatment apparatus |
| CN110425819A (en) * | 2019-08-20 | 2019-11-08 | 中国科学院理化技术研究所 | A kind of cryogenic treatment apparatus |
-
2010
- 2010-08-13 CN CN2010202931274U patent/CN201764768U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109556337A (en) * | 2018-12-03 | 2019-04-02 | 天津市热处理研究所有限公司 | A kind of dual chamber cryogenic treatment apparatus |
| CN110425819A (en) * | 2019-08-20 | 2019-11-08 | 中国科学院理化技术研究所 | A kind of cryogenic treatment apparatus |
| CN110425819B (en) * | 2019-08-20 | 2021-12-17 | 中国科学院理化技术研究所 | Cryogenic treatment device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: LIXIAN YINGLI NEW ENERGY RESOURCES CO., LTD. Free format text: FORMER OWNER: YINGLI GREEN ENERGY (CHINA) CO., LTD. Effective date: 20120608 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 071051 BAODING, HEBEI PROVINCE TO: 071400 BAODING, HEBEI PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20120608 Address after: 071400 Hebei city of Baoding province Lixian County Yongsheng North Street, hi tech Industrial Park Patentee after: Li County Yingli New Energy Co., Ltd. Address before: 071051 Chaoyang North Street, Hebei, Baoding, No. 3399 Patentee before: Yingli Energy (China) Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110316 Termination date: 20180813 |