CN201567366U - Laser coating device based on transparent material - Google Patents
Laser coating device based on transparent material Download PDFInfo
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- CN201567366U CN201567366U CN2009201089746U CN200920108974U CN201567366U CN 201567366 U CN201567366 U CN 201567366U CN 2009201089746 U CN2009201089746 U CN 2009201089746U CN 200920108974 U CN200920108974 U CN 200920108974U CN 201567366 U CN201567366 U CN 201567366U
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- laser
- transparent material
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- device based
- coating device
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Abstract
The utility model discloses a laser coating device based on a transparent material, which belongs to the field of micromachining, and comprises a computer, a laser connected with the computer, a laser control system installed on the laser, a working platform, a transparent material board, a target material and a panel, wherein the laser is connected with the computer, the working platform is arranged below the laser control system, and the transparent material, the target material and the panel are sequentially placed on the working platform from top to bottom. When coating, the target material is placed below the transparent material board, laser penetrates through the transparent material from the upside to irradiate on the target material, the target material is molten to splash to an adjacent transparent carrier after being heated, a transparent material substrate is slightly molten under the action of high heat, and thereby a coating is formed on the transparent material. The utility model has simple device and low cost, can coat a film with the thickness of micrometer or nano-grade on the surface of the transparent material, has high precision and good controllability, the film has good edge acuity, and the shape of the film can be controlled by the output of the computer.
Description
Technical field
The utility model relates to a kind of laser coating device based on transparent material, and this device can have the rete of controllable thickness at the transparent material surface plating, belongs to little manufacture field.
Background technology
Plating is to utilize electrolysis principle to plate the process of other metal or alloy of skim on some metallic surface.During plating, coated metal is done anode, is oxidized to positively charged ion and enters electroplate liquid; Metal products to be plated is done negative electrode, and the positively charged ion of coated metal is reduced formation coating in the metallic surface.Galvanized purpose is to plate metal plating on base material, changes substrate surface character or size.Plating can strengthen metal erosion resistance (coated metal adopts corrosion resistant metal more), increase hardness, prevent abrasion, improve electroconductibility, oilness, thermotolerance and aesthetics.
Electroless plating is a kind of energising that do not need, and according to principle of oxidation and reduction, utilizes strong reductant in containing metal ion solution, metal ion is reduced into metal and is deposited on the method that various material surfaces form close coatings.
Chemical vapor deposition (CVD) is meant the steam of gaseous reactant that contains formation film element or liquid reactants and reacts required other gas and introduce reaction chamber, in the process of substrate surface generation chemical reaction film former.
Physical vapor deposition is to utilize physical form such as evaporation or sputter, and material is removed from the target source, makes these evaporation particles that carry energy deposit to the surface of matrix or part by vacuum or space, partial vacuum then, to form rete.Physical vaporous deposition mainly contains vacuum evaporation, cathode sputtering and ion plating.
Use electroplating and electroless plating can't be carried out the processing of complicated plating complex pattern, is to cover the coating that can improve its surface properties at material surface, and plating and electroless plating can produce trade effluent, and environment is polluted.Gas-phase deposition coating has better tolerance range, and a lot of films all are to adopt the preparation of CVD method in super large-scale integration.Physics vapor phase deposition method can be used for the manufacturing of various property coating such as the reflectance coating of optical lens and ornamental golden film, silverskin.Yet the common fault of vapor phase deposition method is the sedimentation mechanism complexity, apparatus expensive, and process velocity is slow, and this has limited its development and application to a great extent.
The utility model content
The utility model is intended to solve present coating system complex process, and the expensive and slow-footed difficult problem of cost proposes a kind of laser coating device based on transparent material.This device coating process is simple, convenient and swift, can be complex-shaped at the transparent material surface plating, and the rete with controllable thickness.
To achieve these goals, the utility model has been taked following technical scheme.Laser coating device in the utility model comprises computer, the laser apparatus that links to each other with computer, is installed in laser control system, worktable, transparent material plate, target and flat board on the laser apparatus.Wherein: laser apparatus links to each other with computer, worktable is arranged on the below of laser control system, transparent material, target and flat board are placed on the worktable from top to bottom successively, and worktable, target and transparent material plate place air, vacuum, argon gas or nitrogen.
When using said apparatus to carry out plated film, its concrete film coating method is as follows:
1) figure that will plating imports in the computer;
2) earlier target is placed on the worktable, then transparent material plate is placed on the target, and keep the plane at the laser beam foucing place that target material surface and laser apparatus send to be in same plane;
Described target is solid or liquid or powder;
If target is solid, target is directly placed below the transparent material plate;
If target is a liquid, earlier liquid is contained in the open containers, and then transparent material plate is placed on the container;
If target is a powder, earlier powder evenly is laid on flat board or contains compacting on the powder device, and then place transparent material plate thereon;
3) adjust the laser coating processing parameter, described laser coating processing parameter comprises laser power, sweep velocity and scanning interval, target can reach fusing or react under this lasing temperature;
4) open laser apparatus, laser control system scans according to the figure signal of computer output, and laser beam passes transparent material plate as high energy beam and is radiated at and carries out sputter coating on the target from above.
5) scanning finishes that back removing sticks on the transparent material plate and not by the target of laser radiation.
Described worktable, target and transparent material plate place air or vacuum or certain protection gas.
Described laser apparatus is optical fiber laser, Nd:YAG solid statelaser or carbon dioxide laser, and employed laser is continuous laser or pulse laser.
Described laser control system is the numerically-controlled machine that scanning galvanometer, digital control laser processing head maybe can be realized two dimension or three-dimensional processing.
Described transparent material plate is sheet glass or crystal slab or macromolecule transparent material.
Described laser is replaced by electron beam or particle beam.
Principle of work of the present utility model: target is placed below the transparent material plate, laser passes transparent material and is radiated on the target, the target melted by heat is sputtered onto on the close transparent substrates, it is little molten that high calorie produces the transparent material substrate, thereby the target plating is formed coating on transparent material.
Laser beam irradiation is controlled thickness and live width size by regulating laser output power or target granularity or defocusing amount or scanning interval or scan mode on target.Because the big energy that carries of laser makes a large amount of heat of generations between target and the transparent substrates material, follows photochemically reactive thermal chemical reaction, therefore can obtain needed resultant of reaction with the interpolation reactant by controlling reaction environment atmosphere.
The utility model device is simple, and is with low cost, can be at transparent material surface plating micron order or nano level rete, and the precision height, controllability is good, and rete has good edge sharpness, and the rete shape can be by computer output control.The utility model can be used for the manufacturing of plating, mask and the exquisite artwork of integrated circuit wiring, functional film layer.
Description of drawings
STRUCTURE DECOMPOSITION synoptic diagram in Fig. 1 the utility model based on the laser coating device of transparent material
Among the figure: 1, computer, 2, laser apparatus, 3, laser control system, 4, transparent material plate, 5, target, 6, flat board, 7, worktable.
Embodiment
The utility model is described in further detail below in conjunction with accompanying drawing:
The film coating apparatus that the utility model adopts comprises computer, the laser apparatus of controlling output signal frequency, computer is connected by data line with laser apparatus, laser apparatus is provided with a laser control system, transparent material and target place on the processing worktable, and worktable, target and transparent material plate place air, vacuum, argon gas or nitrogen.
Use above-mentioned laser coating device based on transparent material to carry out plated film, its method is as follows:
1) computer is connected by data line with laser apparatus, and figure that will plating imports in the computer, and laser control system can carry out work under the control of computer;
2) target is positioned over clear sheet below, keep target material surface and plane, laser beam foucing place to be in same plane.For the powder target, need powder evenly is laid on flat board or contains compacting on the powder device, place transparent material plate more thereon; For the liquid or solid target, target is placed the transparent material plate inboard; If target is thin plate or film, the target flattening is placed the transparent material plate inboard; If transparent material is a clear vial, target is placed in the clear vial;
3) transparent material plate, target and worktable can be placed specific environment atmosphere, as in the air or in the vacuum or in certain shielding gas, with control resultant composition;
4) laser power, sweep velocity and the scanning interval of adjustment laser apparatus, the temperature that makes target under the effect of this laser, can reach fusing or react.
5) open laser apparatus, laser control system will scan according to the figure signal of computer output, and laser beam passes transparent material as high energy beam and is radiated at target and carries out sputter coating from the outside;
6) scanning is finished back removing and is sticked on the transparent material plate and not by the target of laser radiation, stay rete.
Described laser apparatus can be optical fiber laser, Nd:YAG solid statelaser or carbon dioxide laser, and employed laser is continuous laser or pulse laser.
Described laser control system is complied with the different of concrete figure and material, can be scanning galvanometer or digital control laser processing head, and the numerically-controlled machine that can realize two dimension or three-dimensional processing.
Described transparent material can be common sheet glass or crystal slab or poly (methyl methacrylate) plate or armourplate glass or macromolecule transparent material, and its shape can be a clear vial, and its thickness can be selected according to processing request.
Described target can be powder or liquid or thin plate or film, and the target composition can be metal or graphite or slurry or pigment, as metal-powder or non-metal powder, mixed powders such as zinc powder, copper powders or be mixed with the powder of binding agent, and electrocondution slurry etc.
Described flat board can be metal or non-metal board, and as steel plate, stainless steel plate, copper coin, aluminium sheet, sheet glass etc., containing the powder device can be container.
The process that described removing adheres to target can use liquid wash or blower to blow down or or reset mode such as ultrasonic cleaning, as water flushing, alcohol wipe.
Described ambiance can be the atmosphere of air atmosphere or vacuum chamber or gas shield, can also add the material of participation or fill-in light chemical reaction and thermal chemical reaction.
Described high energy beam can be a laser beam, can be high energy beams such as electron beam or particle beam also, and used transparent material plate can be at the high energy beam material transparent
Following example selects that volume is little for use, good beam quality, optical fiber laser easy to process, and wavelength is 1064nm, and laser control system adopts scanning galvanometer; Hang down the good zinc powder of tack as target with fusing point, its powder diameter 6um; With stainless steel plate as shop powder flat board; Select the thick simple glass of 3mm to carry out plated film as transparent material.
Embodiment 1: the zinc oxide film of plating 100mm*100mm
Evenly elaborate zinc powder on stainless steel plate and be compacted into 1mm thickness, place the glass plate that a thickness is 3mm more thereon, keep bisque upper surface and scanning galvanometer focus on same plane.The black that the good physical size of exporting at control laser of computer software inediting is 100*100mm is filled bitmap, and setting machined parameters is power 10W, frequency 80KHZ, scanning interval 0.1mm, sweep velocity 400mm/s.Open laser apparatus, laser is scanned according to the machined parameters of setting.Been scanned is blown down with blower and is not attached on the powder on the sheet glass by laser radiation and uses alcohol wash, can obtain low thickness, lighttight zinc oxide film at glass baseplate surface.
Embodiment 2: the making of exquisite pattern
Evenly elaborate zinc powder on stainless steel plate and be compacted into 1mm thickness, place the glass plate that a thickness is 3mm more thereon, keep bisque upper surface and scanning galvanometer focus on same plane.At the bitmap of the good snowflake shape of computer software inediting of controlling laser output, setting machined parameters is power 10W, frequency 80KHZ, scanning interval 0.1mm, sweep velocity 400mm/s.Open laser apparatus, laser is scanned according to the machined parameters of setting.Been scanned is blown down powder and the water flushing that is not attached on by laser radiation on the sheet glass with blower, can obtain clear snowflake pattern attractive in appearance at glass baseplate surface.
Embodiment 3: the laser deposition of conductor pattern
Evenly elaborate zinc powder on stainless steel plate and be compacted into 1mm thickness, place the glass plate that a thickness is 3mm more thereon, keep bisque upper surface and scanning galvanometer focus on same plane.At the vector diagram of the good fine rule shape of computer software inediting of controlling laser output, setting machined parameters is power 10W, frequency 80KHZ, and, sweep velocity 500mm/s.Open laser apparatus, laser is scanned according to the machined parameters of setting.Been scanned is blown down powder and the water flushing that is not attached on by laser radiation on the sheet glass with blower, and can obtain live width at glass baseplate surface is micron-sized fine rule.
Embodiment 4: plating dihedral film
Evenly elaborate zinc powder on stainless steel plate and be compacted into 1mm thickness, place the glass plate that a thickness is 3mm more thereon, keep bisque upper surface and scanning galvanometer focus on same plane.At the vector diagram of the good triangular shape of computer software inediting of controlling laser output, setting machined parameters is power 10W, frequency 80KHZ, and, sweep velocity 700mm/s, scanning interval 0.01mm.Open laser apparatus, laser is scanned according to the machined parameters of setting.Been scanned is blown down powder and the water flushing that is not attached on by laser radiation on the sheet glass with blower, can obtain the dihedral film of high sharpness at glass baseplate surface.
Be necessary to be pointed out that at this above example only is used for the utility model is further specified, can not be interpreted as restriction the utility model protection domain.
Claims (8)
1. the laser coating device based on transparent material is characterized in that: comprise computer, the laser apparatus that links to each other with computer, be installed in laser control system, worktable, transparent material plate, target and flat board on the laser apparatus; Wherein: laser apparatus links to each other with computer, and worktable is arranged on the below of laser control system, and transparent material, target and flat board are placed on the worktable from top to bottom successively.
2. a kind of laser coating device based on transparent material according to claim 1, it is characterized in that: described worktable, target and transparent material plate place air, vacuum, argon gas or nitrogen.
3. a kind of laser coating device based on transparent material according to claim 1 is characterized in that: described laser apparatus is optical fiber laser, Nd:YAG solid statelaser or carbon dioxide laser, and employed laser is continuous laser or pulse laser.
4. a kind of laser coating device based on transparent material according to claim 1 is characterized in that: described laser control system is scanning galvanometer, digital control laser processing head or the numerically-controlled machine for realizing that two dimension or three-dimensional are processed.
5. a kind of laser coating device based on transparent material according to claim 1 is characterized in that: described transparent material plate is sheet glass or crystal slab or macromolecule transparent material plate.
6. a kind of laser coating device based on transparent material according to claim 1 is characterized in that: described target is solid or powder;
If target is a solid, target directly places below the transparent material plate;
If target is a powder, powder evenly is laid on flat board or contains compacting on the powder device, and transparent material plate is placed on the target.
7. a kind of laser coating device based on transparent material according to claim 1 is characterized in that: described target is a liquid, and target is contained in the open containers, and transparent material plate is placed on the container.
8. a kind of laser coating device based on transparent material according to claim 3 is characterized in that: described laser is replaced by electron beam or particle beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009201089746U CN201567366U (en) | 2009-06-05 | 2009-06-05 | Laser coating device based on transparent material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009201089746U CN201567366U (en) | 2009-06-05 | 2009-06-05 | Laser coating device based on transparent material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201567366U true CN201567366U (en) | 2010-09-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009201089746U Expired - Fee Related CN201567366U (en) | 2009-06-05 | 2009-06-05 | Laser coating device based on transparent material |
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| CN (1) | CN201567366U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104812935A (en) * | 2012-11-27 | 2015-07-29 | 帝斯曼知识产权资产管理有限公司 | Process of depositing a metallic pattern on a medium |
| CN113099620A (en) * | 2021-03-29 | 2021-07-09 | 华南理工大学 | Method for preparing metal circuit on glass by utilizing laser plasma sputtering |
-
2009
- 2009-06-05 CN CN2009201089746U patent/CN201567366U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104812935A (en) * | 2012-11-27 | 2015-07-29 | 帝斯曼知识产权资产管理有限公司 | Process of depositing a metallic pattern on a medium |
| US9674966B2 (en) | 2012-11-27 | 2017-06-06 | Dsm Ip Assets B.V. | Process of depositing a metallic pattern on a medium |
| CN113099620A (en) * | 2021-03-29 | 2021-07-09 | 华南理工大学 | Method for preparing metal circuit on glass by utilizing laser plasma sputtering |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100901 Termination date: 20130605 |