CN201562122U - Wafer delivery mechanism of photoetching machine - Google Patents
Wafer delivery mechanism of photoetching machine Download PDFInfo
- Publication number
- CN201562122U CN201562122U CN2009202140171U CN200920214017U CN201562122U CN 201562122 U CN201562122 U CN 201562122U CN 2009202140171 U CN2009202140171 U CN 2009202140171U CN 200920214017 U CN200920214017 U CN 200920214017U CN 201562122 U CN201562122 U CN 201562122U
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- CN
- China
- Prior art keywords
- housing
- pump drainage
- litho machine
- transfer mechanism
- wafer transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009202140171U CN201562122U (en) | 2009-11-20 | 2009-11-20 | Wafer delivery mechanism of photoetching machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009202140171U CN201562122U (en) | 2009-11-20 | 2009-11-20 | Wafer delivery mechanism of photoetching machine |
Publications (1)
Publication Number | Publication Date |
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CN201562122U true CN201562122U (en) | 2010-08-25 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009202140171U Expired - Fee Related CN201562122U (en) | 2009-11-20 | 2009-11-20 | Wafer delivery mechanism of photoetching machine |
Country Status (1)
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CN (1) | CN201562122U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108802882A (en) * | 2018-06-05 | 2018-11-13 | 邢明 | A kind of diffraction grating etching machine |
CN108807167B (en) * | 2018-06-05 | 2020-11-10 | 深圳市信展通电子有限公司 | Production and manufacturing method of diode electrode |
-
2009
- 2009-11-20 CN CN2009202140171U patent/CN201562122U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108802882A (en) * | 2018-06-05 | 2018-11-13 | 邢明 | A kind of diffraction grating etching machine |
CN108807167B (en) * | 2018-06-05 | 2020-11-10 | 深圳市信展通电子有限公司 | Production and manufacturing method of diode electrode |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130221 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
TR01 | Transfer of patent right |
Effective date of registration: 20130221 Address after: 100176 No. 18 Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100825 Termination date: 20181120 |