CN201562122U - Wafer delivery mechanism of photoetching machine - Google Patents

Wafer delivery mechanism of photoetching machine Download PDF

Info

Publication number
CN201562122U
CN201562122U CN2009202140171U CN200920214017U CN201562122U CN 201562122 U CN201562122 U CN 201562122U CN 2009202140171 U CN2009202140171 U CN 2009202140171U CN 200920214017 U CN200920214017 U CN 200920214017U CN 201562122 U CN201562122 U CN 201562122U
Authority
CN
China
Prior art keywords
housing
pump drainage
litho machine
transfer mechanism
wafer transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2009202140171U
Other languages
Chinese (zh)
Inventor
王睿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Manufacturing International Beijing Corp
Original Assignee
Semiconductor Manufacturing International Shanghai Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Manufacturing International Shanghai Corp filed Critical Semiconductor Manufacturing International Shanghai Corp
Priority to CN2009202140171U priority Critical patent/CN201562122U/en
Application granted granted Critical
Publication of CN201562122U publication Critical patent/CN201562122U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Abstract

The utility model relates to a photoetching machine, in particular to a wafer delivery mechanism of a photoetching machine, which comprises a motor, a belt and a guide track arranged inside a casing. The motor drives the belt to move on the guide track, and the casing is hermetically connected with a suction drainage pipeline for sucking and draining powdered solids in the casing. The suction drainage pipeline connected with the casing for sucking and draining powdered solids can suck and drain all of the powdered solids in the casing by virtue of the suction force thereof, which can prevent the powdered solids from blocking the guide track to ensure smooth movement of the belt on the guide track, thereby effectively avoiding motor damage due to overload.

Description

The wafer transfer mechanism of litho machine
Technical field
The utility model relates to a kind of litho machine, relates in particular to a kind of wafer transfer mechanism of litho machine.
Background technology
Existing litho machine comes transferring wafer by wafer transfer mechanism when wafer is carried out photoetching.Described wafer transfer mechanism comprises motor, belt and guide rail.Described belt moves on guide rail under driven by motor.Wafer then is placed on the belt, follows belt movement, so that carry out photoetching.
Yet the wafer transfer mechanism of this litho machine in use phenomenon occurs damaging through regular meeting.By the failure analysis that damages parts is found: generally all be because motor (motor) damage causes.Find and further analyze: motor is to burn out because of overload.The reason of motor overload finds it is to make the change of belt movement resistance cause greatly owing to break flour blocks guide rail after deliberation.
And these break flours produce owing to belt in use weares and teares, and these break flours can stop up guide rail, make belt movement be obstructed, and finally make motor burn because of overload.
Therefore, how preventing that break flour from stopping up guide rail, thereby prevent motor so the accident that is damaged, is the technical matters that those skilled in the art need to be resolved hurrily.
The utility model content
Technical problem to be solved in the utility model provides a kind of wafer transfer mechanism of litho machine, can pump drainage falls the break flour on the guide rail, prevents that break flour from stopping up guide rail and causing the burn-down of electric motor accident.
To achieve the above object, the utility model adopts following technical scheme:
A kind of wafer transfer mechanism of litho machine comprises the motor, belt and the guide rail that place in the housing, and the driven by motor belt moves on guide rail, and described housing seal is connected to a pump drainage pipeline that is used for break flour in the described housing of pump drainage.
In the wafer transfer mechanism of the litho machine of stating, described pump drainage pipeline is connected with vacuum aspirator.
In the wafer transfer mechanism of the litho machine of stating, described pump drainage pipeline is connected with the airduct pipeline of the board that is in negative pressure state.
In the wafer transfer mechanism of the litho machine of stating, described pump drainage pipeline is inhaled the powder case through one and is connected with described housing seal.
In the wafer transfer mechanism of the litho machine of stating, described suction powder case is arranged on the below of housing.
In the wafer transfer mechanism of the litho machine of stating, described suction powder case is arranged on the top of housing.
In the wafer transfer mechanism of the litho machine of stating, described suction powder case is arranged on the side of housing.
The beneficial effects of the utility model are as follows:
The utility model is by connecing a pump drainage pipeline that is used for break flour in the described housing of pump drainage at housing, suction by described pump drainage pipeline is clean with the break flour pump drainage in the housing, prevent that break flour from stopping up guide rail, thereby guarantee belt motion smoothly on guide rail, and then, effectively avoided motor to damage phenomenon because of overload.
Description of drawings
The wafer transfer mechanism of litho machine of the present utility model is provided by following embodiment and accompanying drawing.
Fig. 1 is the structural representation of the wafer transfer mechanism of the utility model litho machine;
Among the figure, 1-housing, 2-pump drainage pipeline, 3-inhale powder case, 4-T-valve.
Embodiment
Below will the wafer transfer mechanism of litho machine of the present utility model be described in further detail.
Below with reference to accompanying drawings the utility model is described in more detail, has wherein represented preferred embodiment of the present utility model, should be appreciated that those skilled in the art can revise the utility model described here and still realize advantageous effects of the present utility model.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as to restriction of the present utility model.
For clear, whole features of practical embodiments are not described.In the following description, be not described in detail known function and structure, because they can make the utility model because unnecessary details and confusion.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details, for example, change into another embodiment by an embodiment according to relevant system or relevant commercial restriction to realize developer's specific objective.In addition, will be understood that this development may be complicated and time-consuming, but only be routine work to those skilled in the art.
For the purpose of this utility model, feature are become apparent, embodiment of the present utility model is further described below in conjunction with accompanying drawing.It should be noted that accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of aid illustration the utility model embodiment lucidly.
Core concept of the present utility model: by connect a pump drainage pipeline that is used for break flour in the described housing of pump drainage at housing, suction by described pump drainage pipeline is clean with the break flour pump drainage in the housing, prevent that break flour from stopping up guide rail, thereby guarantee belt motion smoothly on guide rail, and then, effectively avoided motor to damage phenomenon because of overload.
See also Fig. 1, Figure 1 shows that the structural representation of the wafer transfer mechanism of the utility model litho machine.
The wafer transfer mechanism of this litho machine comprises the motor, belt and the guide rail that place in the housing 1, and the driven by motor belt moves on guide rail, and described housing 1 is sealingly connected to a pump drainage pipeline 2 that is used for break flour in the described housing of pump drainage.
Described pump drainage pipeline 2 can be connected with vacuum aspirator.Certainly, described pump drainage pipeline 2 also can be connected with the airduct pipeline of the litho machine board that is in negative pressure state (among the figure for illustrating).In the present embodiment, because the litho machine board is provided with the airduct pipeline with negative pressure state originally, so described pump drainage pipeline 2 can insert in the airduct pipeline that is in negative pressure state that these litho machine boards itself have by a T-valve 4.
In the present embodiment, set up one between described pump drainage pipeline 2 and the housing 1 and inhale powder case 3, airtight connection between the three.Be that described pump drainage pipeline 2 is tightly connected with described housing 1 by this suction powder case 3.Concrete structure is as follows: described suction powder case 3 is provided with suction inlet and escape hole, and the suction inlet of the interface of described housing 1 and described suction powder case 3 is sealedly and fixedly connected, and the escape hole of described suction powder case 3 and the suction inlet of described pump drainage pipeline 2 are sealedly and fixedly connected.Inhale powder case 3 by setting up, can guarantee to dwindle the sectional area of pump drainage pipeline 2 under certain suction area prerequisite of (this suction area equates with interface area on the housing 1), thus saving tubing, and the volume of minimizing entire mechanism.
In the present embodiment, described suction powder case 3 is arranged on the side of housing 1.Certainly, described suction powder case 3 also can be arranged on housing 1 above or below.When inhaling powder case 3 and be arranged on the below of housing 1, owing to can utilize the gravity of break flour, therefore, pump drainage break flour most effective.
Through experiment repeatedly as can be known, when the suction of described pump drainage pipeline 2 more than or equal to 0.001kg/cm2, can obtain reasonable break flour pump drainage effect.
The utility model is by connecing a pump drainage pipeline that is used for break flour in the described housing of pump drainage at housing, suction by described pump drainage pipeline is clean with the break flour pump drainage in the housing, prevent that break flour from stopping up guide rail, thereby guarantee belt motion smoothly on guide rail, and then, effectively avoided motor to damage phenomenon because of overload.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from spirit and scope of the present utility model.Like this, if of the present utility model these are revised and modification belongs within the scope of the utility model claim and equivalent technologies thereof, then the utility model also is intended to comprise these changes and modification interior.

Claims (7)

1. the wafer transfer mechanism of a litho machine comprises the motor, belt and the guide rail that place in the housing, and the driven by motor belt moves on guide rail, it is characterized in that, described housing seal is connected to a pump drainage pipeline that is used for break flour in the described housing of pump drainage.
2. the wafer transfer mechanism of litho machine as claimed in claim 1 is characterized in that, described pump drainage pipeline is connected with vacuum aspirator.
3. the wafer transfer mechanism of litho machine as claimed in claim 1 is characterized in that, described pump drainage pipeline is connected with the airduct pipeline of the litho machine board that is in negative pressure state.
4. the wafer transfer mechanism of litho machine as claimed in claim 1 is characterized in that, described pump drainage pipeline is inhaled the powder case through one and is connected with described housing seal.
5. the wafer transfer mechanism of litho machine as claimed in claim 4 is characterized in that, described suction powder case is arranged on the below of housing.
6. the wafer transfer mechanism of litho machine as claimed in claim 4 is characterized in that, described suction powder case is arranged on the top of housing.
7. the wafer transfer mechanism of litho machine as claimed in claim 4 is characterized in that, described suction powder case is arranged on the side of housing.
CN2009202140171U 2009-11-20 2009-11-20 Wafer delivery mechanism of photoetching machine Expired - Fee Related CN201562122U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009202140171U CN201562122U (en) 2009-11-20 2009-11-20 Wafer delivery mechanism of photoetching machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2009202140171U CN201562122U (en) 2009-11-20 2009-11-20 Wafer delivery mechanism of photoetching machine

Publications (1)

Publication Number Publication Date
CN201562122U true CN201562122U (en) 2010-08-25

Family

ID=42627270

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009202140171U Expired - Fee Related CN201562122U (en) 2009-11-20 2009-11-20 Wafer delivery mechanism of photoetching machine

Country Status (1)

Country Link
CN (1) CN201562122U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108802882A (en) * 2018-06-05 2018-11-13 邢明 A kind of diffraction grating etching machine
CN108807167B (en) * 2018-06-05 2020-11-10 深圳市信展通电子有限公司 Production and manufacturing method of diode electrode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108802882A (en) * 2018-06-05 2018-11-13 邢明 A kind of diffraction grating etching machine
CN108807167B (en) * 2018-06-05 2020-11-10 深圳市信展通电子有限公司 Production and manufacturing method of diode electrode

Similar Documents

Publication Publication Date Title
EP1806086A3 (en) Cleaner system comprising robot cleaner and docking station
CN201562122U (en) Wafer delivery mechanism of photoetching machine
CN211757325U (en) Dustproof device for notebook computer interface
CN101963070B (en) Drain device for mine gas extraction system
CN103046959A (en) Full negative pressure automatic water-discharging device
CN203640027U (en) Pedestal toilet odor pumping device
CN208961601U (en) A kind of machining components scrap cleaning plant
CN202189226U (en) Scrap-discharging mechanism of solar silicon chip lithography machine
CN205533283U (en) Water pump
CN201460960U (en) Drainage device for colliery gas extracting system
CN108404235A (en) A kind of ICU nursing quick drainage device
CN204643988U (en) A kind of vacuum core Suction filtration device
CN105240282A (en) Self sucking pump with backflow prevention suspension sphere
CN202347636U (en) Water drainer of water collection pit of semi-underground circulating water pump room
CN208838683U (en) A kind of hals,Nasen und Ohrenheilkunde multifunctional ceiling sputum device
CN207245956U (en) A kind of draw-off pump station outlet side positive-pressure water draining device
CN206934975U (en) Deduster energy-saving anti-blocking control pressurer system
CN207363903U (en) A kind of assisted drainage for dry and wet dust catcher pumps
CN101463841A (en) Negative-pressure siphon device of open container
CN215633090U (en) Mine underground structure
CN103016356A (en) Automatic drainage device with air pump
CN204291621U (en) Balanced type air-cored axis is with jet mounting head
CN212048859U (en) Material tank for production of latent curing agent
CN215100680U (en) Electric air locker for pneumatic conveying system
CN201737199U (en) Air suction inlet of packer

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING

Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Effective date: 20130221

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING

TR01 Transfer of patent right

Effective date of registration: 20130221

Address after: 100176 No. 18 Wenchang Avenue, Beijing economic and Technological Development Zone

Patentee after: Semiconductor Manufacturing International (Beijing) Corporation

Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18

Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100825

Termination date: 20181120