CN201551952U - Two-stage low temperature plasma waste gas purification device - Google Patents
Two-stage low temperature plasma waste gas purification device Download PDFInfo
- Publication number
- CN201551952U CN201551952U CN2009202005837U CN200920200583U CN201551952U CN 201551952 U CN201551952 U CN 201551952U CN 2009202005837 U CN2009202005837 U CN 2009202005837U CN 200920200583 U CN200920200583 U CN 200920200583U CN 201551952 U CN201551952 U CN 201551952U
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- Prior art keywords
- reactor
- type plasma
- waste gas
- low
- plasma
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- Expired - Fee Related
Links
- 239000002912 waste gas Substances 0.000 title claims abstract description 21
- 238000000746 purification Methods 0.000 title abstract description 10
- 239000000443 aerosol Substances 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 11
- 230000003647 oxidation Effects 0.000 claims description 16
- 238000007254 oxidation reaction Methods 0.000 claims description 16
- 230000004888 barrier function Effects 0.000 claims description 3
- 239000007790 solid phase Substances 0.000 abstract description 14
- 239000007789 gas Substances 0.000 abstract description 11
- 238000005265 energy consumption Methods 0.000 abstract description 7
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 4
- 239000003344 environmental pollutant Substances 0.000 abstract description 3
- 239000007791 liquid phase Substances 0.000 abstract description 3
- 231100000719 pollutant Toxicity 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 abstract 7
- 239000013543 active substance Substances 0.000 abstract 2
- 239000007800 oxidant agent Substances 0.000 abstract 2
- 238000001035 drying Methods 0.000 abstract 1
- 239000012071 phase Substances 0.000 abstract 1
- 238000009736 wetting Methods 0.000 abstract 1
- 239000006227 byproduct Substances 0.000 description 19
- 239000012530 fluid Substances 0.000 description 8
- 238000004581 coalescence Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000011149 active material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- -1 oxidation Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model discloses a two-stage low temperature plasma waste gas purification device, which comprises a high-speed dry type plasma oxidizer. The high-speed dry type plasma oxidizer comprises a first reaction vessel and a first power supply which are mutually connected, and in addition, the purification device further comprises an aerosol grower and a low speed wet-type plasma collecting and processing device; the low speed wet-type plasma collecting and processing device comprises a second power supply, a second reaction vessel and a circulating liquid supplying device which are connected in sequence; and the aerosol grower is respectively connected with the first reaction vessel and the second reaction vessel. The low speed wet-type plasma collecting and processing device of the utility model can make the best of long-life active substances such as O3, H2O2 and the like produced during plasmas drying and wetting process, absorbed gas phase accessory substances can be further oxidized and stabilized in liquid phase, and meanwhile, efficient collection can be performed on the solid phase accessory substances, thereby achieving purpose of making full use of active substances and removing secondary pollutants; and the effects of low energy consumption and zero secondary pollution are achieved.
Description
Technical field
The utility model relates to a kind of device that is used for industrial waste gas purifying, belongs to the field that gas pollutant purifies.
Background technology
At present, plasma technique is considered to realize one of effective way that combined pollutant is removed simultaneously.The energy efficiency in the Low Temperature Plasma Treating gaseous contaminant process that made the experimental study in past 15 years has improved 7-8 doubly.The low temperature plasma that adopts corona discharge pulse and dielectric barrier discharge to produce can make the region of discharge mean electron energy reach 10-12ev, local field strength reaches～150kV/cm, supervene a large amount of free radicals simultaneously and (, OH) and the various active material, reach the purpose of contaminant degradation as O.Though lower temperature plasma technology has special advantages when purifying big air quantity, low concentration gas, but existing plasma-treating technology free radical utilization rate is low and easily produce multiple secondary pollution in degraded waste gas, makes it still face the high and unmanageable dual difficulty of accessory substance of energy consumption in actual applications then.
The utility model content
The purpose of this utility model provides that a kind of energy consumption is low, the two-section low-temperature plasma waste gas purifying device of non-secondary pollution.
For realizing above-mentioned utility model purpose, technical solution adopted in the utility model is: this two-section low-temperature plasma waste gas purifying device mainly comprises high speed and dry plasma oxidation device, this high speed and dry plasma oxidation section comprises interconnective first reactor and first power supply, and, this purifier also comprises aerosol grower and low speed wet type plasma collecting and treating apparatus, described low speed wet type plasma collecting and treating apparatus comprises the second source that is connected in turn, second reactor and circulation liquid feed device, described aerosol grower is connected respectively with second reactor with first reactor.
Further, first reactor described in the utility model is the line cartridge reactor, and first power supply is the pulse power.
Further, first reactor described in the utility model is the medium barrier plasma reactor, and first power supply is an ac high voltage source.
Compared with prior art, the beneficial effects of the utility model are: adopt high speed and dry plasma device to combine with low speed wet type plasma device, realize capture solid, gaseous by-products by employing circulation fluid (water or alkali lye etc.) in the low speed wet type plasma collecting and treating apparatus.Simultaneously, the long-life active material such as the O that do, wet plasma process produce
3, H
2O
2Deng entering liquid film, in liquid phase, increased reaction constant, the oxidation step of going forward side by side, stablize accessory substance, improved the utilization ratio of active material; Simultaneously low speed wet type plasma collecting and treating apparatus can be to being collected by the solid phase byproduct behind charged, the coalescence in high speed and dry plasma processor and aerosol grower, thereby reach the purpose that makes full use of active material and remove secondary pollution, the realization energy consumption is low, the effect of non-secondary pollution.
Description of drawings
Fig. 1 is the utility model two-section low-temperature plasma waste gas purifying device schematic diagram.
The specific embodiment
In order better to understand the utility model, the utility model is described in further detail below in conjunction with accompanying drawing and specific embodiment.
With reference to Fig. 1, two-section low-temperature plasma waste gas purifying device of the present utility model mainly comprises high speed and dry plasma oxidation device 1, low speed wet type plasma collecting and treating apparatus 3, places the aerosol grower 2 between high speed and dry plasma oxidation device 1 and the low speed wet type plasma collecting and treating apparatus 3.High speed and dry plasma oxidation device 1 is made up of first power supply 5 and first reactor 6; Low speed wet type plasma collection and treatment section 3 is made up of the second source 7 and second reactor 8 and the circulation fluid liquid feed device is formed.The circulation fluid liquid feed device is by tank 4, water pump 11, connecting pipe, and the circulation fluid liquid feed device is connected respectively with circulation fluid outlet 10 with the circulation fluid inlet 9 of second reactor 8.
Waste gas flow velocity in the high speed and dry plasma oxidation device can be at 8-20m/s, it comprises interconnective first reactor 6 and first power supply 5, wherein first reactor 6 and first power supply 5 can be line cartridge reactor and crest voltage at 1-± 120kV, pulsewidth is at 0.05-900 μ s, frequency at the compound mode of the positive negative pulse stuffing high voltage source of 1-2000Hz or dielectric impedance reactor and peak-peak voltage at 1-150kV, frequency is in the compound mode of the ac high voltage source of 1Hz-10MHz, the high energy electron that waste gas is produced by the dry type plasma process, O or the bombardment of OH free radical isoreactivity material, oxidation, solid phase byproduct (being aerosol) begins to form and is charged under the highfield effect simultaneously; Aerosol grower 2 can be the container that length connects high speed and dry plasma oxidation device 1 and low speed wet type plasma collecting and treating apparatus 3 in 1-10 rice scope respectively, its effect mainly is to make solid phase byproduct coalescence, the growth that produces at high speed and dry plasma oxidation device 1, so that solid phase byproduct is easy to capture in low speed wet type plasma collecting and treating apparatus 3; The air velocity of low speed wet type plasma collecting and treating apparatus 3 can be between 1-5m/s, it comprises interconnective second reactor 8, second source 7 and circulation liquid feed device, wherein second reactor 8 can be needle plate formula reactor, second source 7 can be the DC high-voltage power supply of 1-150kV or crest voltage at 1-200kV, frequency is at the AC-DC overlaying power of 1-2000Hz, the circulation liquid feed device mainly is made up of tank 4 and water pump 11, circulation fluid can be water or alkaline solution etc., gas through 1 preliminary purification of high speed and dry plasma oxidation device still has not by complete purified waste gas and gas, solid phase byproduct, in low speed wet type plasma collecting and treating apparatus 3, can enter doing of liquid film to not absorbed by complete purified waste gas and gaseous by-products, ozone and H that wet plasma process produces
2O
2Increase reaction constant, be used in further oxidation in the liquid phase, stablize gaseous products, reduced the energy consumption that waste gas purification is handled thus; Simultaneously low speed wet type plasma collecting and treating apparatus 3 can be to being collected by the solid phase byproduct behind charged, the coalescence in high speed and dry plasma processor 1 and aerosol grower 2, thereby reach the purpose that makes full use of active material and remove secondary pollution, the realization energy consumption is low, the effect of non-secondary pollution.
It below is the instantiation that adopts two-section low-temperature plasma waste gas purifying device of the present utility model that VOC styrene is handled.Cinnamic initial concentration is at 100-110ppm, and tolerance is 305Nm
3/ h, relative humidity is 30-35%, used power supply operational factor is: crest voltage 40kV, rising edge of a pulse are 7.5 μ s, frequency 30-120Hz.Concrete steps are as follows:
(1) waste gas first reactor 6 that enters high speed and dry plasma oxidation device 1 carries out oxidation processes, obtains gas, gaseous by-products and solid phase byproduct after the preliminary purification, and described solid phase byproduct is by charged;
(2) gas after the preliminary purification, gaseous by-products and entered in the aerosol grower 2 by charged solid phase byproduct, described by charged solid phase byproduct coalescence, growth;
(3) solid phase byproduct after the gas after the preliminary purification, gaseous by-products and coalescence, the growth enters by second reactor 8, the low speed wet type plasma collecting and treating apparatus 3 that second source 7 and circulation liquid feed device are formed, by the further purifying exhaust air of wet type plasma, the solid phase byproduct after circulation fluid absorbs gaseous by-products and collects coalescence, growth simultaneously.
The result shows: use two-section low-temperature plasma waste gas purifying device than only adopting unistage type cleaning plant for waste gas of plasma energy efficiency to improve more than 10%, the gas that produces in waste gas purification, solid phase byproduct are effectively removed and are reached discharging standards, and effect is remarkable.
The utility model can be widely applied to the processing of the foul smell that produces in single or multiple mixing organic exhaust gas and the industry, NOx etc., is a kind of low energy consumption, the purification technology of non-secondary pollution.
Claims (3)
1. two-section low-temperature plasma waste gas purifying device, it comprises high speed and dry plasma oxidation device (1), this high speed and dry plasma oxidation device comprises interconnective first reactor (6) and first power supply (5), it is characterized in that: this purifier also comprises aerosol grower (2) and low speed wet type plasma collecting and treating apparatus (3), described low speed wet type plasma collecting and treating apparatus (3) comprises the second source (7) that is connected in turn, second reactor (8) and circulation liquid feed device, described aerosol grower (2) is connected respectively with second reactor (8) with first reactor (6).
2. a kind of two-section low-temperature plasma waste gas purifying device according to claim 1 is characterized in that: described first reactor (6) is the line cartridge reactor, and first power supply (5) is the pulse power.
3. a kind of two-section low-temperature plasma waste gas purifying device according to claim 1 is characterized in that: described first reactor (6) is the medium barrier plasma reactor, and first power supply (5) is an ac high voltage source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202005837U CN201551952U (en) | 2009-11-19 | 2009-11-19 | Two-stage low temperature plasma waste gas purification device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202005837U CN201551952U (en) | 2009-11-19 | 2009-11-19 | Two-stage low temperature plasma waste gas purification device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201551952U true CN201551952U (en) | 2010-08-18 |
Family
ID=42611624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009202005837U Expired - Fee Related CN201551952U (en) | 2009-11-19 | 2009-11-19 | Two-stage low temperature plasma waste gas purification device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201551952U (en) |
-
2009
- 2009-11-19 CN CN2009202005837U patent/CN201551952U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100818 Termination date: 20131119 |