CN201454394U - Adsorption equipment of exhaust pipe of vacuum chemical reaction cavity equipment - Google Patents
Adsorption equipment of exhaust pipe of vacuum chemical reaction cavity equipment Download PDFInfo
- Publication number
- CN201454394U CN201454394U CN2009200743988U CN200920074398U CN201454394U CN 201454394 U CN201454394 U CN 201454394U CN 2009200743988 U CN2009200743988 U CN 2009200743988U CN 200920074398 U CN200920074398 U CN 200920074398U CN 201454394 U CN201454394 U CN 201454394U
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- closed container
- equipment
- chemical reaction
- reaction cavity
- water tank
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Abstract
The utility model discloses adsorption equipment of an exhaust pipe of vacuum chemical reaction cavity equipment, which comprises a closed container, wherein the closed container is arranged on a pipe between the outlet end of a pump and a noxious substance treating device, a plurality of nozzles are arranged in the closed container and are connected with a water tank arranged outside the closed container through a pipe, and the water tank is connected with a compressed air generating device. The utility model can collect reaction granule sediments before reaction gases enter the noxious substance treating device and fix the range of removing the sediments, thereby controlling the cleaning range and the period, avoiding the stop caused by the blockage of the exhaust pipe, controlling the blockage condition of the pipe through periodically cleaning the closed container, reducing the influenced machines, lowering the workload and improving the production capacity of the equipment. The utility model can prolong the service life of the noxious substance treating device at the rear end, reduce the treatment cost and be easy to treat wastes.
Description
Technical field
The utility model relates to a kind of semiconductor manufacturing facility, is specifically related to a kind of discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment.
Background technology
Dry etching in the semiconductor integrated circuit manufacturing/low pressure depositing technics is realized under vacuum state, dry etching/low pressure depositing technics equipment adopts gas extraction system as shown in Figure 1 at present, and this gas extraction system is responsible for and is formed by pump, nuisance treating apparatus (tube of promptly removing the evil), discharge duct, exhaust branch pipe, exhaust.According to different process condition, can install the heating tape additional on the pipeline, stop dry etching/low pressure deposit product and time product to stop up the discharge duct section of heating tape.But because the variation of temperature and pressure, the reaction particles that produces in reaction particles that the vacuum chemical reaction cavity produces and the gas exhaust piping is deposited in the pipeline with air-flow, usually be deposited in the pipeline, cause exhaust charge and house steward to stop up, need frequent dredging pipeline owing to reaction particles is uncontrollable.Especially AL etching technics; the gas extraction system of SiN depositing technics because reaction product is many, is easy to attached on the discharge duct; through regular meeting dry etching/low pressure deposit product taking place and cause arm and house steward's line clogging with time product obstruction discharge duct, causes equipment downtime.And need the discharge duct of cleaning long, uncontrollable, and workload is big, and it is many to influence board, has a strong impact on normally carrying out of production.
The utility model content
Technical problem to be solved in the utility model provides a kind of discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment, and it can be collected the particle in the discharge duct and adsorb pernicious gas.
For solving the problems of the technologies described above, the technical solution of the discharge duct adsorbent equipment of the utility model vacuum chemical reaction cavity equipment is:
Comprise a closed container, this closed container is arranged on the pipeline between delivery side of pump end and the nuisance treating apparatus, be provided with a plurality of nozzles in the closed container, nozzle is connected in the outer water tank of closed container by pipeline, and water tank connects the Compressed Gas generating apparatus.
The arrival end and the port of export of described closed container are respectively arranged with Pressure gauge.
Described water tank is provided with temperature control equipment.
Described closed container is installed on the pipeline by the demountable tube connector.
The house steward that described water tank leads to closed container is provided with the total flow meter.
The branch road that described water tank leads to each nozzle is provided with the branch flow meter.
Described Compressed Gas generating apparatus is inert gas generating apparatus or soda acid gas generating device.
The technique effect that the utility model can reach is:
The utility model can carry out the collection of reaction particles deposit before reacting gas enters the nuisance treating apparatus; the scope of removing deposit is fixed; thereby control clean range and cycle, avoid improving the production capacity of equipment because discharge duct stops up the shutdown that causes.
The utility model can be by regularly cleaning closed container, and the blockage of control pipeline reduces influenced board, reduces workload, improves the production capacity of equipment.
The utility model is used for centralized collection reactive deposition thing, prolongs the life-span of rear end nuisance treating apparatus, reduces disposal cost, is easy to waste disposal.
Description of drawings
Below in conjunction with the drawings and specific embodiments the utility model is described in further detail:
Fig. 1 is the schematic diagram of prior art gas extraction system;
Fig. 2 is the schematic diagram of the discharge duct adsorbent equipment of the utility model vacuum chemical reaction cavity equipment.
Description of reference numerals among the figure:
A is the Compressed Gas generating apparatus, and B is a water tank,
C is a temperature control equipment, and D is the total flow meter,
E is the branch flow meter, and F is a nozzle,
G is a Pressure gauge, and H is the reactive deposition thing,
I is a pump, and J is the demountable tube connector,
K is the nuisance treating apparatus.
The specific embodiment
As shown in Figure 2, the discharge duct adsorbent equipment of the utility model vacuum chemical reaction cavity equipment, comprise a closed container, this closed container is arranged on the port of export and the pipeline between the nuisance treating apparatus K of pump I, the arrival end of closed container and the port of export are respectively arranged with Pressure gauge G, can monitor the pressure of pipeline according to the pressure reduction between two Pressure gauge G, thereby judge the blocked state of closed container.
Be provided with a plurality of nozzle F in the closed container, nozzle F is installed in the diverse location of air flow path by demand; Nozzle F is connected in the outer water tank B of closed container by pipeline, and water tank B connects Compressed Gas generating apparatus A.Water tank B is provided with temperature control equipment C.By the water temperature among the temperature control equipment C control water tank B, thereby regulate the content of aqueous vapor by the water temperature saturated concentration.
Closed container is installed on the pipeline by demountable tube connector J.
The house steward that water tank B leads to closed container is provided with total flow meter D, the branch road that water tank B leads to each nozzle F is provided with branch flow meter E, water temperature by temperature control equipment C regulating tank B, by the flow of total flow meter D and branch flow meter E adjustments of gas, can control the water content of input closed container and the content of Compressed Gas.
The size of closed container, shape can change according to demand.
Air-flow can change according to demand at the path and the gas circuit pipeline of closed container.
The variation of pipeline each point interfacial area can change according to demand in gas circuit cross sectional shape and the closed container.
During use; Compressed Gas generating apparatus A imports humidification water tank B with Compressed Gas; Compressed Gas sprays in closed container by nozzle F after by humidification; gas in the discharge duct in closed container by humidification; the bottom that makes interior particle of gas or pernicious gas fall to closed container becomes reactive deposition thing H.The utility model can be collected in most reaction particles deposits in the closed container, reduces owing to discharge duct stops up the equipment downtime phenomenon that causes, and improves the production capacity of equipment.
Compressed Gas generating apparatus A of the present utility model can be the inert gas generating apparatus, and inert gas is imported closed container, can be used for explosion-proof, anti-flaming; Compressed Gas generating apparatus A also can be the soda acid gas generating device, with soda acid gas input closed container, and the acid-base value of gas in can be used for and in the discharge duct.
The utility model is provided with damping device water tank B, water is imported closed container, can be used for dust collection, and can adsorb some reaction residual gas, as CL2, thereby with the pernicious gas solidification, avoid CL2 and contain the H2O air-flow and react and cause product to be adsorbed in the device, help the collection and the processing of nuisance, also can reduce the processing cost of back segment nuisance treating apparatus K, the life-span of the bucket of removing the evil is increased.
Claims (7)
1. the discharge duct adsorbent equipment of a vacuum chemical reaction cavity equipment, it is characterized in that: comprise a closed container, this closed container is arranged on the pipeline between delivery side of pump end and the nuisance treating apparatus, be provided with a plurality of nozzles in the closed container, nozzle is connected in the outer water tank of closed container by pipeline, and water tank connects the Compressed Gas generating apparatus.
2. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: the arrival end and the port of export of described closed container are respectively arranged with Pressure gauge.
3. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: described water tank is provided with temperature control equipment.
4. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: described closed container is installed on the pipeline by the demountable tube connector.
5. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: the house steward that described water tank leads to closed container is provided with the total flow meter.
6. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: the branch road that described water tank leads to each nozzle is provided with the branch flow meter.
7. the discharge duct adsorbent equipment of vacuum chemical reaction cavity equipment according to claim 1 is characterized in that: described Compressed Gas generating apparatus is inert gas generating apparatus or soda acid gas generating device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200743988U CN201454394U (en) | 2009-08-12 | 2009-08-12 | Adsorption equipment of exhaust pipe of vacuum chemical reaction cavity equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200743988U CN201454394U (en) | 2009-08-12 | 2009-08-12 | Adsorption equipment of exhaust pipe of vacuum chemical reaction cavity equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201454394U true CN201454394U (en) | 2010-05-12 |
Family
ID=42381738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009200743988U Expired - Fee Related CN201454394U (en) | 2009-08-12 | 2009-08-12 | Adsorption equipment of exhaust pipe of vacuum chemical reaction cavity equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201454394U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109115419A (en) * | 2018-08-31 | 2019-01-01 | 上海华力微电子有限公司 | Boiler tube exhaust system and its leak hunting method |
| CN114588762A (en) * | 2020-12-03 | 2022-06-07 | 中国科学院微电子研究所 | Exhaust device and method for semiconductor processing equipment |
-
2009
- 2009-08-12 CN CN2009200743988U patent/CN201454394U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109115419A (en) * | 2018-08-31 | 2019-01-01 | 上海华力微电子有限公司 | Boiler tube exhaust system and its leak hunting method |
| CN114588762A (en) * | 2020-12-03 | 2022-06-07 | 中国科学院微电子研究所 | Exhaust device and method for semiconductor processing equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131217 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20131217 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100512 Termination date: 20150812 |
|
| EXPY | Termination of patent right or utility model |