CN201367462Y - Flexible substrate continuous chemical water bath deposition device - Google Patents
Flexible substrate continuous chemical water bath deposition device Download PDFInfo
- Publication number
- CN201367462Y CN201367462Y CNU2009200043444U CN200920004344U CN201367462Y CN 201367462 Y CN201367462 Y CN 201367462Y CN U2009200043444 U CNU2009200043444 U CN U2009200043444U CN 200920004344 U CN200920004344 U CN 200920004344U CN 201367462 Y CN201367462 Y CN 201367462Y
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- flexible substrate
- chemical bath
- seat
- bath deposition
- continous way
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Abstract
The utility model discloses a flexible substrate continuous chemical water bath deposition device. In the technical proposal, the two sides of a heater are respectively combined with a substrate rolling unit which comprises a vertical adjusting seat, at least one horizontal adjusting seat and at least one rotary guide wheel; wherein the vertical adjusting seat is combined with the horizontal adjusting seat; the horizontal adjusting seat is combined with the guide wheel; and the guide wheel is arranged above the two sides of the heater. The heating transmission devices can be assembled on the process fixing frame of the chemical water bath deposition device in parallel; the substrate is conveyed continuously on the heater; the guide wheel of the substrate rolling unit can slightly bend the two sides of the substrate; and the chemical liquid input from the substrate can be treated through single-sided deposition and then heated by the heater, thereby realizing the film forming conditions.
Description
Technical field
The utility model relates to a kind of device of flexible substrate continous way chemical bath deposition.
Background technology
Electronic industry develops rapidly now, and many electronic products all need to be applied to physical deposition techniques or chemical deposition technique.The whole world faces problems such as petroleum-based energy is exhausted, with high costs and environmental protection in addition, cause the demand of sun power and hydrogen energy source fuel cell to grow with each passing day, because when solar cell is made, must on a base material, constitute multiple settled layer (film), effectively its function of performance it serves to show that deposition process is electronic industry and very crucial technology of people's livelihood industry.
Known chemical bath deposition (Chemical Bath Deposition, CBD) process and equipment thereof, also be one of deposition technique, it is that a base material that the surface is dealt with in advance (for example stainless steel plate etc.) immerses certain time in the chemical liquid, at this substrate surface formation of deposits semiconductor film.But known chemical bath deposition equipment, be that base material is immersed among the chemical liquid fully, so will cause the two-sided all film forming of this base material, yet only need in this base material practical application that wherein one side is sufficient, redundance is just as the waste of resource, and causes manufacturing cost to increase.
Therefore, how designing a kind of chemical bath depositing device, so that this chemical bath depositing device can carry out chemical bath deposition at the single face of flexible substrate, and can carry out heat treated in good time, will be the current problem that needs solution.
Summary of the invention
Technical problem to be solved in the utility model provides a kind of device of flexible substrate continous way chemical bath deposition, it is by a well heater of this heating transmission gear, and the base material of both sides rolls the roll unit structure design, make the base material of continuous input can be temporarily crooked by this heating transmission gear, carrying out single sided deposition with input chemical liquid on this base material handles, and can carry out surperficial heat treated, and then reach the purpose of making sull at this base material single face continuously by the reaction times of this well heater fiting chemical soup.
In order to address the above problem, the utility model provides a kind of device of flexible substrate continous way chemical bath deposition, comprises: a well heater, be a kind of electric heater, and its upper end is provided with a hot-plate, and roll unit is rolled in conjunction with a base material respectively in its both sides.Base material rolls roll unit, it has one and vertically adjusts seat, should vertically adjust seat goes up in conjunction with at least one horizontal adjustment seat, and laterally adjust seat chosen place in conjunction with rotating at least one guide wheel in this, make this guide wheel position above these well heater both sides, form the device of flexible substrate continous way chemical bath deposition by this.
Compared with prior art, use the utility model, can carry out the single face chemical bath depositing treatment of base material continuously, avoid making unnecessary semiconductor film, reduced manufacturing cost at base material.
Description of drawings
Fig. 1 is the combination stereogram of preferred embodiment of the present utility model;
Fig. 2 is the exploded perspective view of preferred embodiment of the present utility model;
Fig. 3 is the application state stereographic map of preferred embodiment of the present utility model;
Fig. 4 is the using action synoptic diagram of preferred embodiment of the present utility model;
Fig. 5 is the synoptic diagram one of the deposition process of preferred embodiment of the present utility model;
Fig. 6 is the synoptic diagram two of the deposition process of preferred embodiment of the present utility model.
Embodiment
Be fully to understand purpose, feature and the effect of the utility model,, and cooperate appended graphicly, the utility model is described in detail now by following concrete embodiment, illustrate as after:
As shown in Figures 1 and 2, the device of flexible substrate continous way chemical bath deposition of the present utility model, its preferred embodiment comprises a well heater 1, and the base material that reaches well heater 1 both sides rolls roll unit 2 to be formed, wherein:
Base material rolls roll unit 2, as shown in Figures 1 and 2, it has one and vertically adjusts seat 21, vertically adjust on the seat 21 in conjunction with at least one horizontal adjustment seat 22 (be illustrated as two and laterally adjust seat 22) in this, and laterally adjust seat 22 chosen places in conjunction with rotating at least one guide wheel 23 in this, make 23 on this guide wheel above these well heater 1 both sides.
Should vertically adjust seat 21, and comprise a base 211, these base 211 tops are in conjunction with a separable column 212, and and this well heater 1 bonded one fixed plate 213, this column 212 is provided with a through hole 214, and this through hole 214 wears a bolt 215, and this bolt 215 is to be combined on this base 211; The bottom of this base 211 is provided with the T-slot 216 (as Fig. 1 and shown in Figure 3) of slippage on a plurality of anchors 3 that are combined in the chemical bath depositing device, makes base 211 can adjust its locus.
Laterally the adjustment seat 22, comprise to be combined in this vertical permanent seat 221 of adjusting on the seat 21, and this permanent seat 221 is provided with at least one slide rail 222 (being illustrated as two slide rails 222), is provided with a screw 223 in this slide rail 222; An and sliding seat 224, the selected face of this sliding seat 224 is provided with the chute 225 with this slide rail 222 tablings, be provided with the through hole 226 of a strip in this chute 225, wear a screw 227 in this through hole 226, this screw 227 is combined in the screw 223 of this permanent seat 221.By this, can when relaxing this screw 227, adjust the locus of this sliding seat 224, and it is fixing with sliding seat 224 to screw this screw 227.
This guide wheel 23, be the big less cone pulley of upper end diameter of lower end diameter, its center is provided with necessary assembly such as wheel shaft 231, bearing 232, seal assembly 233 and fixation kit 234, this wheel shaft 231 is to be combined in below this sliding seat 224 of laterally adjusting seat 22, makes 23 on this guide wheel above aforementioned these well heater 1 both sides.
Apparatus structure design by above-mentioned flexible substrate continous way chemical bath deposition, as shown in Figure 3, be that a plurality of these heating transmission gears are incorporated on the interior anchor 3 of chemical bath depositing device side by side, between the well heater 1 of each group heating transmission gear, be provided with a roller 4, and roll on the roll unit 2 in addition in conjunction with a pinch roller 5 at selected base material, by this as shown in Figure 4, promptly composition can allow a base material 6 carry continuously by the depositing devices on each group heating transmission gear.
When the heating transmission gear of chemical bath depositing device of the present utility model is used, extremely shown in Figure 6 as Fig. 4, be on the well heater 1 (hot-plate 11) of base material 6 by feeding device 7 these heating transmission gears of input of the stainless steel that will deal with in advance or other material, the dual-side of this base material 6 will be pushed by the guide wheel 23 that this base material rolls roll unit 2 and up crooked (as shown in Figure 4), and utilize this pinch roller 5 temporarily base material 6 to be remained on conveying case of bending under.If this can import (splash) chemical liquid by the chemical bath depositing device on this base material 6, the single face of this base material 6 is soaked by chemical liquid, and then in base material 6 generation chemical bath sedimentations, by this, can make specific compound absorption (Adsorption) on base material 6, form semiconductor film.And this well heater 1 is controlled between 0 ℃～350 ℃, but the reaction times of fiting chemical soup heats and sintering processes, when base material 6 is finished by thermal treatment and after exporting heating transmission gear, can be removed the state of these base material 6 dual-side bendings, and furled by material collecting device 8.So can carry out the single face chemical bath depositing treatment of base material 6 continuously.
As mentioned above, the utility model is by the apparatus structure design of flexible substrate continous way chemical bath deposition, make the base material of continuous input can be temporarily crooked by this heating transmission gear, carrying out single sided deposition with input chemical liquid on this base material handles, and can carry out surperficial heat treated, and then reach the effectiveness of making semiconductor film at this base material single face continuously by the reaction times of this well heater fiting chemical soup.Utilize the utility model institute deutero-product, when the demand that can fully satisfy existing market.
The above; it only is the preferable embodiment of the utility model; but protection domain of the present utility model is not limited thereto; anyly be familiar with the people of this technology in technical scope disclosed in the utility model; the variation that can expect easily or replacement all should be encompassed within the protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with the protection domain of claim.
Claims (9)
1, a kind of device of flexible substrate continous way chemical bath deposition is characterized in that, comprises:
One well heater is a kind of electric heater, and its upper end is provided with a hot-plate, and roll unit is rolled in conjunction with a base material respectively in its both sides;
Described base material rolls roll unit, it has one and vertically adjusts seat, should vertically adjust seat goes up in conjunction with at least one horizontal adjustment seat, and laterally adjust seat chosen place in conjunction with rotating at least one guide wheel in this, make this guide wheel be positioned at the top of described well heater both sides, form the device of flexible substrate continous way chemical bath deposition by this.
2, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1 is characterized in that, the hot-plate of described well heater is a flat board.
3, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1, it is characterized in that, vertical adjustment seat that described base material rolls roll unit is to comprise a base, this base top is in conjunction with a separable column, this column is provided with a through hole, this through hole wears a bolt, and this bolt is combined in this base.
4, the device of flexible substrate continous way chemical bath deposition as claimed in claim 3, it is characterized in that, the bottom of described base is the T-slot that is provided with slippage on a plurality of anchors that are combined in the chemical bath depositing device, and the top of this base is provided with and described well heater bonded one fixed plate.
5, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1 is characterized in that, the horizontal seat of adjusting that described base material rolls roll unit is to comprise to be combined in a described vertical permanent seat of adjusting on the seat, and this permanent seat is provided with at least one slide rail; And a sliding seat, its selected face is provided with a chute chimeric with slide rail.
6, the device of flexible substrate continous way chemical bath deposition as claimed in claim 5, it is characterized in that, the slide rail of described permanent seat is provided with a screw, the chute of described sliding seat is provided with the through hole of a strip, wear a screw in this through hole, this screw is the screw that is combined in this permanent seat.
7, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1, it is characterized in that, described guide wheel is the big and less cone pulley of upper end diameter of lower end diameter, its center is provided with wheel shaft, bearing, seal assembly and fixation kit, and this wheel shaft is to be combined in below the described horizontal adjustment seat.
8, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1 is characterized in that, more comprises on the anchor that a plurality of heating transmission gears are incorporated into the chemical bath depositing device side by side.
9, the device of flexible substrate continous way chemical bath deposition as claimed in claim 1 is characterized in that, described base material rolls on the roll unit in addition in conjunction with a pinch roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009200043444U CN201367462Y (en) | 2009-02-04 | 2009-02-04 | Flexible substrate continuous chemical water bath deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009200043444U CN201367462Y (en) | 2009-02-04 | 2009-02-04 | Flexible substrate continuous chemical water bath deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201367462Y true CN201367462Y (en) | 2009-12-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2009200043444U Expired - Lifetime CN201367462Y (en) | 2009-02-04 | 2009-02-04 | Flexible substrate continuous chemical water bath deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201367462Y (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103160815A (en) * | 2011-12-14 | 2013-06-19 | 财团法人工业技术研究院 | Chemical water bath method coating equipment |
| CN103587146A (en) * | 2013-11-20 | 2014-02-19 | 无锡鼎茂机械制造有限公司 | Material pressing device for bag making machine |
| CN114672792A (en) * | 2022-04-20 | 2022-06-28 | 深圳市恒博智造有限公司 | Nickel plating nickel cylinder device with load and nickel plating time control function |
-
2009
- 2009-02-04 CN CNU2009200043444U patent/CN201367462Y/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103160815A (en) * | 2011-12-14 | 2013-06-19 | 财团法人工业技术研究院 | Chemical water bath method coating equipment |
| CN103160815B (en) * | 2011-12-14 | 2016-02-24 | 财团法人工业技术研究院 | Chemical water bath method coating equipment |
| CN103587146A (en) * | 2013-11-20 | 2014-02-19 | 无锡鼎茂机械制造有限公司 | Material pressing device for bag making machine |
| CN114672792A (en) * | 2022-04-20 | 2022-06-28 | 深圳市恒博智造有限公司 | Nickel plating nickel cylinder device with load and nickel plating time control function |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20091223 |