CN201362757Y - Volatilizer and control system of trichlorosilane vaporization device for producing polysilicon - Google Patents
Volatilizer and control system of trichlorosilane vaporization device for producing polysilicon Download PDFInfo
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- CN201362757Y CN201362757Y CNU200820154319XU CN200820154319U CN201362757Y CN 201362757 Y CN201362757 Y CN 201362757Y CN U200820154319X U CNU200820154319X U CN U200820154319XU CN 200820154319 U CN200820154319 U CN 200820154319U CN 201362757 Y CN201362757 Y CN 201362757Y
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- evaporation chamber
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Abstract
The utility model relates to the field of producing polysilicon, in particular to a device for controlling the ratio of trichlorosilane and hydrogen during the producing process of polysilicon. The utility model is also applicable to the producing field of composite optical quartz glass, for controlling the ratio between the silicon tetrachloride and loading material gas during the producing process of the composite optical quartz glass. The volatilizer of the vaporization device consists of a volatizing gutter, an atomizing pipe, a heating pipe, a bearing piece and a bearing seat. The utility model is beneficial to improve the production capacity of a reduction furnace and lower the production loss, and is also beneficial to realize the automation of the polysilicon enterprises and cluster production control.
Description
Technical field:
The utility model relates to production of polysilicon and makes the field, is a kind of device that is used for polysilicon production process control trichlorosilane and hydrogen ratios.The utility model device also can be applied to the synthesizing optical silica glass and manufacture the field, the ratio of control silicon tetrachloride and material containing gas in synthesizing optical silica glass production process.
Technical background:
Producing with the hydrogen reduction of trichlorosilane in the process of polysilicon (policrystalline silicon), trichlorosilane heat to vaporize to be carried by hydrogen in volatilizer and also the proportioning of hydrogen and trichlorosilane stably must be controlled in certain scope when being delivered to reduction furnace.Hydrogen proportioning deficiency is unfavorable for suppressing other side reactions, can reduce the casting yield of silicon; The hydrogen proportioning is excessive, and hydrogen is not fully utilized, and causes waste, also makes the trichlorosilane density loss simultaneously, reduces the probability of collision on trichlorosilane and silicon rod surface, reduces the sedimentation velocity of silicon, and throughput descends.Therefore must carry out strict control to the proportioning of hydrogen and trichlorosilane in the polysilicon production process.
Existing production of polysilicon trichlorosilane vaporization unit and material ratio control system are as shown in Figure 1.SiHCl
3Be fed through volatilization groove L4 by manually operated control valve and filling tube L5, observe SiHCl by liquid level tube L2
3Liquid level.SiHCl in the volatilization groove L4
3Hot water heating vaporization by water jacket L3.Main road hydrogen is by manually operated control valve, under meter and the bubbling pipe L6 SiHCl that vaporizes among the groove L4 that will volatilize
3From discharge nozzle, carry out and be delivered to jet pipe L10.Bypass H2 is by manually operated control valve, and under meter is delivered to jet pipe L10 and SiHCl
3Mix the feeding reduction furnace with main road H2.This Controlling System is simple in structure, but can only adopt the artificial experience regulating and controlling in actual use, can't accurately control the material ratio, particularly is applied to multi-jet large-scale reduction furnace, operates very loaded down with trivial details.Can't realize automatization control.
The utility model content:
Technical problem to be solved in the utility model overcomes above-mentioned the deficiencies in the prior art exactly, and a kind of trichlorosilane vaporization unit and control method that can realize stable accurately control material ratio in polysilicon production process is provided.This device and control method are also manufactured the field applicable to the synthesizing optical silica glass.
The concrete technical scheme of the utility model is as follows:
A kind of volatilizer that is used for the trichlorosilane vaporization unit of production of polysilicon, described volatilizer is by volatilization groove, injection spray pipe, heating tube, and supporting member and supporting base are formed;
Described volatilization groove comprises evaporation chamber, this evaporation chamber both ends of the surface sealing; Left side end socket end face is provided with and is communicated with the location and installation hole with heating tube; This evaporation chamber middle part skin is provided with heating jacket, and the upper and lower of this chuck respectively is provided with water-in and water outlet; Two ends are provided with sewage draining exit and trichlorosilane opening for feed about the bottom of this evaporation chamber; Be provided with the discharge port of trichlorosilane and hydrogen on the top of this evaporation chamber; This evaporation chamber is provided with the connecting port of external liquid level sensor; The right end socket end face of this evaporation chamber is provided with hagioscope, injection spray pipe flange unitor, connects the hole of visual liquidometer;
Described injection spray pipe is made up of pipe and flange, the sealing of pipe one end, and the other end is provided with pipe and connects screw thread, and flange is positioned at pipe and connects thread end, and the pipe wall is provided with some little perforation; Outside the volatilization groove, the injection spray pipe flanged end links to each other with the flange unitor of volatilization groove; In the volatilization groove, the other end is fixed on the supporting member, and supporting member two ends are fixed by welding on the wall of evaporation chamber chamber.
Described heating tube is made up of to heating tube U type dish, and described heating tube is fixed on the supporting member, and the import and export pipe of heating tube passes evaporation chamber location and installation hole, and carries out seal welding, and supporting member and two ends are fixed by welding on the wall of evaporation chamber chamber.
A kind of Controlling System that is used for the trichlorosilane vaporization unit of production of polysilicon comprises above-mentioned volatilizer, cage Float cylinder type level sensing controller is arranged, liquidometer, pressure sensing controller, heat-conducted mol ratio detects controller, main road H2 variable valve, bypass H2 variable valve, trichlorosilane charging valve, safety valve, blast-furnace man's process gases under meter, reduction furnace and other valve and pipeline connects to form; The volatilization groove links by charging adapting pipe and trichlorosilane material pipe, cage Float cylinder type level sensing controller is arranged and link by adapter with volatilizer; The volatilization groove links by discharging adapting pipe and mixed gas pipeline, and bypass is equipped with the pressure sensing controller on mixed gas delivery pipe A point; In mixed gas delivery pipe B point place bypass trichlorosilane and main road hydrogen sampling tube and heat-conducted mol ratio are housed and detect controller and link, pure hydrogen sampling tube is housed and heat-conducted mol ratio detection controller links in main road hydrogen transfer lime D point bypass; Safety valve is equipped with in the bypass of E point before mixed gas enters the reduction operation, and UNICOM is to tail gas drip washing pipe.
Beneficial effect:
Inner heating tube of volatilizer and indirect heating are jacket structured, and the constant control techniques of liquid level, and trichlorosilane vaporization working condition is stable.The special construction of volatilizer 1 can realize that the mol ratio of mixed gas detects control, makes the mol ratio number that finally is delivered to the mixed gas of going back original production be in the ideal controllable state.Adopt volatilization groove discharge port pressure-controlling technology simultaneously, made in reduction operation each reduction furnace feeding quantity change operation unaffectedly, also helped the use of large-scale reduction furnace multi nozzle technology.
The utility model helps improving the throughput of reduction furnace and reduces also original production loss.Also help production of polysilicon enterprise and realize automatization and clustered production control.
Description of drawings:
Existing production of polysilicon trichlorosilane vaporization unit of Fig. 1 and material ratio control system synoptic diagram;
But Fig. 2 the utility model trichlorosilane vaporization unit structural representation;
But Fig. 3 the utility model trichlorosilane vaporization unit parts volatilization groove structural representation;
Fig. 4 the utility model trichlorosilane vaporization unit parts injection spray pipe and mounting structure synoptic diagram;
Fig. 5 the utility model trichlorosilane vaporization unit parts heating tube and mounting structure synoptic diagram;
Fig. 6 the utility model production of polysilicon trichlorosilane vaporization unit and material ratio control system synoptic diagram.
Embodiment:
Embodiment 1:
A kind of trichlorosilane vaporization unit that in polysilicon production process, can stablize accurate control material ratio, volatilizer 1, as shown in Figure 2.Described volatilizer 1 is by volatilization groove 10, injection spray pipe 11, heating tube 1, heating tube 2 13, supporting member 1, supporting member 2 15, supporting member 3 16 and supporting base 17.
Described volatilization groove 10 is made by stainless material.As shown in Figure 3, evaporation chamber 101 is a drum shape, and two ends are ellipsoidal head, and left end socket has four holes 102, is used for the location and installation of heating tube 1 and heating tube 2 13; The middle part skin is added with heating jacket 103, and respectively there are two prosopyle 1031,1032 conduits and posticum 1033,1034 conduits in the chuck upper and lower; Two ends are equipped with two conduits about the bottom of evaporation chamber 101, and left end is blowdown adapting pipe 104, and right-hand member is trichlorosilane charging adapting pipe 105; Upper right quarter at evaporation chamber 101 is equipped with a conduit 106, is the discharge nozzle of trichlorosilane and hydrogen; At evaporation chamber 101 right-hand members a connecting conduit 1071 and 1072 are housed respectively up and down, are used for external liquid level sensor.Right end socket is equipped with hagioscope 108 and injection spray pipe flange unitor 109, and two conduits 10101 and 10102 also are housed, and is used to connect visual liquidometer.
Described injection spray pipe 11 is made by stainless material.As shown in Figure 4, form by a pipe 111 and flange 112, the sealing of pipe 111 1 ends, the other end has pipe to connect screw thread, flange is positioned at pipe and connects thread end, the little perforation of one row is arranged on along its length on pipe 111 walls, and main road hydrogen can evenly enter 101 pairs of trichlorosilane liquid of evaporation chamber by the little perforation of this row and carry out the bubbling vaporization.Outside volatilization groove 10, injection spray pipe 11 flanged ends link to each other with the flange unitor 109 of volatilization groove 10.In volatilization groove 10, the other end then is fixed on the supporting member 1 with the stainless steel U-bolt, and supporting member one 14 two ends are fixed by welding on the evaporation chamber 101 chamber walls.
Described heating tube 12 and 13 is made by stainless material.As shown in Figure 5, form to pipe by three U type dishes, two heating tubes are fixed on supporting member 2 15 and the supporting member 3 16 by the stainless steel U-bolt, import and export pipe and pass four holes 102 of evaporation chamber 101 left end sockets for four of two heating tubes, and carrying out seal welding, supporting member 15 and 16 2 ends are fixed by welding on the evaporation chamber 101 chamber walls.
Embodiment 2:
A kind of is core with trichlorosilane vaporization unit volatilizer 1, realizes the accurately Controlling System of control material ratio in polysilicon production process, as shown in Figure 6.
It is mainly by volatilizer 1, detect controller 5, main road H2 variable valve 6, bypass H2 variable valve 7, trichlorosilane charging valve 8, safety valve 9, blast-furnace man's process gases under meter 10, reduction furnace 11 and other valve and pipeline is formed by cage Float cylinder type level sensing controller 3, liquidometer, pressure sensing controller 4, heat-conducted mol ratio.
In mixed gas (trichlorosilane and hydrogen) transfer lime B point place bypass trichlorosilane and main road hydrogen sampling tube and heat-conducted mol ratio detection controller 5 being housed links, in main road hydrogen transfer lime D point bypass pure hydrogen sampling tube and heat-conducted mol ratio being housed detects controller 5 and links, heat-conducted mol ratio detects 5 pairs two tunnel sample gas of controller and analyzes, control bypass hydrogen variable valve 7 when mixed gas hydrogen and trichlorosilane mol ratio are greater than or less than set(ting)value, regulate bypass hydrogen flow, make bypass hydrogen and main road hydrogen and trichlorosilane mixed gas hydrogen and the trichlorosilane molar ratio after the C point is joined keep constant.
Before mixed gas (trichlorosilane and hydrogen) entered the reduction operation, safety valve 9 was equipped with in the bypass of E point, and UNICOM is to tail gas drip washing pipe, but to guarantee volatilization groove 10 safety reliefs under abnormal conditions, assurance safety.
With respect to prior art, the advantage of described production of polysilicon trichlorosilane vaporization unit and material ratio control system is:
Volatilizer 1 inner heating tube and external heat are jacket structured, and liquid level constant control technology, trichlorine hydrogen Silicon vaporization working condition is stable. The special construction of volatilizer 1 can realize that the mol ratio of mist detects control, Make the mol ratio number that finally is delivered to the mist of going back original production be in desirable controllable state. Adopted simultaneously Volatilization groove 10 discharging opening Pressure Control Technologies are not so that be subjected in each reduction furnace feeding quantity change operation of reduction operation Impact also is conducive to the use of large-scale reduction furnace multi nozzle technology.
The utility model is conducive to improve the production capacity of reduction furnace and reduces also original production loss. Also be conducive to many Crystal silicon manufacturing enterprise realizes automation and clustering production control.
Claims (4)
1. a volatilizer that is used for the trichlorosilane vaporization unit of production of polysilicon is characterized in that, described volatilizer is by volatilization groove (10), injection spray pipe (11), heating tube (12), and supporting member (14) and supporting base (17) are formed;
Described volatilization groove comprises evaporation chamber (101), this evaporation chamber both ends of the surface sealing; Left side end socket end face is provided with heating tube (12) and is communicated with location and installation hole (102); This evaporation chamber middle part skin is provided with heating jacket (103), and the upper and lower of this chuck respectively is provided with water-in (1031) and water outlet (1033); Two ends are provided with sewage draining exit (104) and trichlorosilane opening for feed (105) about the bottom of this evaporation chamber (101); Be provided with the discharge port (106) of trichlorosilane and hydrogen on the top of this evaporation chamber (101); This evaporation chamber (101) is provided with the connecting port (1071) of external liquid level sensor; The right end socket end face of this evaporation chamber (101) is provided with hagioscope (108), injection spray pipe flange unitor (109), connects the hole (10101) of visual liquidometer;
Described injection spray pipe (11) is made up of pipe (111) and flange (112), the sealing of pipe (111) one ends, and the other end is provided with pipe and connects screw thread, and flange is positioned at pipe and connects thread end, and pipe (111) wall is provided with some little perforation; Outside volatilization groove (10), injection spray pipe (11) flanged end links to each other with the flange unitor (109) of volatilization groove (10); In volatilization groove (10), the other end is fixed on the supporting member (14), and supporting member (14) two ends are fixed by welding on the wall of evaporation chamber (101) chamber.
Described heating tube (12) is made up of to heating tube U type dish, described heating tube is fixed on supporting member (15), (16), the import and export pipe of heating tube passes evaporation chamber (101) location and installation hole (102), and carrying out seal welding, supporting member (15) and (16) two ends are fixed by welding on the wall of evaporation chamber (101) chamber.
2. the volatilizer that is used for the trichlorosilane vaporization unit of production of polysilicon according to claim 1 is characterized in that, described evaporation chamber (101) also comprises prosopyle (1032) and posticum (1034); This evaporation chamber (101) also is provided with the connecting port (1072) of external liquid level sensor; Right end socket also is equipped with the hole (10102) that connects visual liquidometer.
3. the volatilizer that is used for the trichlorosilane vaporization unit of production of polysilicon according to claim 1 and 2 is characterized in that, described volatilization groove (10), injection spray pipe (11), heating tube (12) are stainless material.
4. Controlling System that is used for the trichlorosilane vaporization unit of production of polysilicon, it is characterized in that, comprise volatilizer as claimed in claim 1 (1), cage Float cylinder type level sensing controller (3) is arranged, liquidometer, pressure sensing controller (4), heat-conducted mol ratio detects controller (5), main road H2 variable valve (6), bypass H2 variable valve (7), trichlorosilane charging valve (8), safety valve (9), blast-furnace man's process gases under meter (10), reduction furnace (11) and other valve and pipeline connects to form; Volatilization groove (10) links by charging adapting pipe (105) and trichlorosilane material pipe, cage Float cylinder type level sensing controller (3) is arranged and link with volatilizer (1) by taking over (1071) and (1072); Volatilization groove (10) links by discharging adapting pipe (106) and mixed gas pipeline, and bypass is equipped with pressure sensing controller (4) on mixed gas delivery pipe A point; In mixed gas delivery pipe B point place bypass trichlorosilane and main road hydrogen sampling tube and heat-conducted mol ratio are housed and detect controller (5) and link, pure hydrogen sampling tube is housed and heat-conducted mol ratio detection controller (5) links in main road hydrogen transfer lime D point bypass; Safety valve (9) is equipped with in the bypass of E point before mixed gas enters the reduction operation, and UNICOM is to tail gas drip washing pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200820154319XU CN201362757Y (en) | 2008-10-22 | 2008-10-22 | Volatilizer and control system of trichlorosilane vaporization device for producing polysilicon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200820154319XU CN201362757Y (en) | 2008-10-22 | 2008-10-22 | Volatilizer and control system of trichlorosilane vaporization device for producing polysilicon |
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| Publication Number | Publication Date |
|---|---|
| CN201362757Y true CN201362757Y (en) | 2009-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU200820154319XU Expired - Fee Related CN201362757Y (en) | 2008-10-22 | 2008-10-22 | Volatilizer and control system of trichlorosilane vaporization device for producing polysilicon |
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| Country | Link |
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| CN (1) | CN201362757Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110436467A (en) * | 2019-08-16 | 2019-11-12 | 洛阳中硅高科技有限公司 | Polycrystalline silicon reducing furnace feeding system |
-
2008
- 2008-10-22 CN CNU200820154319XU patent/CN201362757Y/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110436467A (en) * | 2019-08-16 | 2019-11-12 | 洛阳中硅高科技有限公司 | Polycrystalline silicon reducing furnace feeding system |
| CN110436467B (en) * | 2019-08-16 | 2024-03-19 | 洛阳中硅高科技有限公司 | Feeding system of polysilicon reduction furnace |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091216 Termination date: 20111022 |