CN201259598Y - Exposure device used for optical equipment - Google Patents
Exposure device used for optical equipment Download PDFInfo
- Publication number
- CN201259598Y CN201259598Y CNU2008201336861U CN200820133686U CN201259598Y CN 201259598 Y CN201259598 Y CN 201259598Y CN U2008201336861 U CNU2008201336861 U CN U2008201336861U CN 200820133686 U CN200820133686 U CN 200820133686U CN 201259598 Y CN201259598 Y CN 201259598Y
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- pedestal
- blade
- exposure device
- acting device
- aperture
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Abstract
The utility model relates to an exposure device for optical apparatuses, comprising a base, an actuator electromagnetic valve, an actuator device and a positioning mechanism sequentially arranged on the first surface of the base, and an aperture plate and a vane group arranged on a second surface of the base. The actuator device is provided with a driven arm, a stop arm and an actuation arm which are arranged in a staggered way in a certain angle. The driven arm is driven by the electromagnetic valve to drive the actuator device to rotate, and an actuation rod arranged on the actuation arm and extended downwards drives the vane group nested on the actuation rod to rotate, so as to open and close the aperture hole of the aperture plate. The positioning mechanism is provided with a positioning baffle block which is matched with the stop arm of the actuator device to position the actuator device. When the stop arm of the actuator device is supported on the positioning baffle block, a small aperture is formed on the aperture part correspondingly arranged on the vane group. The exposure device adopts a driving source to drive the vane group to actuate the open-close operation of the shutter and the size switching operation of the aperture; meanwhile, the exposure device for optical apparatuses reduces the cost.
Description
Technical field
The utility model relates to a kind of exposure device, more particularly, relates to a kind of exposure device that is used for optical equipment.
Background technology
In optical equipment, mainly there are aperture and shutter in number and the mechanism of time in order to the control exposure, and wherein, aperture is used to control the number of exposure, and shutter then is used to control the time of exposure.Keying in order to control aperture and shutter has different types of mechanism mode, wherein a kind of for utilizing solenoid control, the novel patent in Taiwan M252040 number " camera and exposure structure thereof " of bulletin promptly was to utilize two solenoid valves to control aperture and shutter respectively as on Dec 1st, 2004.
As shown in Figure 1, in the disclosed exposure structure of this novel patent M252040, side in camera chassis 100 is provided with first solenoid valve 160, move in limited range in order to control blade 120, and be provided with second solenoid valve 180 at the opposite side of camera chassis 100, move in another limited range in order to control aperture blades 140.Wherein, blade 120 is opposite at same axis moving linearly and moving direction with aperture blades 140.When fast aperture of door 124 that first solenoid valve 160 drives blades 120 moved on the through hole 102 of camera chassis 100, fast aperture of door 124 can overlap with the camera lens of camera, and made via the light of camera lens incident by to expose egative film or by the CCD pick-up image; And when diaphragm hole 144 that second solenoid valve 180 drives aperture blades 140 moved on the through hole 102 of camera chassis 100, diaphragm hole 144 can overlap with camera lens, obtains the shooting effect of little aperture by this.
This kind optical exposure device mainly is to use two drive sources to drive the switching function of aperture start and shutter start respectively in configuration.
The utility model content
The technical problems to be solved in the utility model is, need use the defective of two drive sources at above-mentioned prior art, a kind of exposure device that is used for optical equipment is provided, cooperates detent mechanism to control the switching of shutter and the switching of aperture size by single drive source.
The technical scheme that its technical matters that solves the utility model adopts is: propose a kind of exposure device that is used for optical equipment, comprising: pedestal has first surface, second surface and runs through first surface and the hole of second surface; Acting device is located at the first surface of pedestal in mode rotatably, have outwards stagger at a certain angle be subjected to swing arm, stop bit arm and actuating arm, and actuating arm is extended with an operating bar downwards; Make moving electromagnetic valve, be located at acting device one side of pedestal first surface, have a start magnetite that drives the acting device rotation with acting device cooperated by swing arm; Detent mechanism is located at the acting device opposite side of pedestal first surface, has one and cooperates with the stop bit arm of acting device and locate the location link stopper of acting device; Aperture board is located at the second surface of pedestal, has a diaphragm hole; Vane group is located at the pedestal second surface, and the end of described vane group is nestable on the operating bar of the acting device that stretches out second surface from the pedestal first surface, to open and close diaphragm hole by the operating bar driven rotary.
Implement the exposure device that is used for optical equipment of the present utility model, have following beneficial effect: this exposure device adopts a start solenoid-driven vane group to make the shutter on-off action, and cooperate detent mechanism to produce the aperture size change action, and a pair of blade is double as blade and aperture blades simultaneously, thereby this exposure device is simple in structure, and electric influence is little.And,, reduced cost of products because this exposure device only needs a drive source to drive the switching of shutter and the switching of aperture.
Description of drawings
Fig. 1 is the structural representation of a kind of exposure device in the prior art;
Fig. 2 is the three-dimensional exploded view of the exposure device of the utility model one embodiment;
Fig. 3 is the stereographic map of acting device in the exposure device of the utility model one embodiment;
Fig. 4 is the synoptic diagram when being in large aperture in the exposure device shooting state of the utility model one embodiment;
Fig. 5 is the front elevational schematic of vane group among Fig. 4;
Fig. 6 is that the back of the body of vane group is looked synoptic diagram among Fig. 4;
Fig. 7 is the synoptic diagram of the exposure device of the utility model one embodiment when closed;
Fig. 8 is the front elevational schematic of vane group among Fig. 7;
Fig. 9 is that the back of the body of vane group is looked synoptic diagram among Fig. 7;
Figure 10 is the synoptic diagram when being in little aperture in the exposure device shooting state of the utility model one embodiment;
Figure 11 is the front elevational schematic of vane group among Figure 10;
Figure 12 is that the back of the body of vane group is looked synoptic diagram among Figure 10.
Embodiment
About aforementioned and other technology contents, characteristics and effect of the present utility model, in the detailed description of the preferred embodiment that following conjunction with figs. provides, can clearly present.
See also Fig. 2, it is the three-dimensional exploded view of the exposure device of the utility model one embodiment.Shown in exposure device comprise pedestal 10, acting device 20, make moving electromagnetic valve 30, location solenoid valve 40, aperture board 50, vane group 60 and pressing plate 70.
This pedestal 10 has first surface 11, second surface 12 and runs through the hole 13 on first and second surface 11,12.This hole 13 extends at first surface 11 on every side a ring wall 131, at first surface 11 along being provided with start solenoid valve seat 14, acting device seat 15 and location solenoid valve seat 16 on the lateral wall of this ring wall 131 in regular turn, wherein, this start solenoid valve seat 14 is provided with a start magnetite pillar 141; 15 of this acting device seats are provided with a start connecting rod pillar 151, also offer one near these start connecting rod pillar 151 places and run through this first and second surface 11,12 and curved operating bar slide opening 152; This location solenoid valve 16 is provided with a location magnetite pillar 161.
Please cooperate and consult Fig. 2 and shown in Figure 3, Fig. 3 is the stereographic map of acting device in the exposure device of the utility model one embodiment.
This acting device 20 has first main body 21 that is column and is that second main body 22 on plane, this first main body 21 are attached on second main body 22 and have a central shaft hole 23 to run through first and second main body 21,22.This second main body 22 outwards staggers at a certain angle to be respectively equipped with and is subjected to swing arm 24, stop bit arm 25 and actuating arm 26, wherein, is subjected to swing arm 24 to offer a chute 241; Stop bit arm 25 has a stop block 251 in the end; 26 of actuating arms are extended with an operating bar 261 downwards.
Make moving electromagnetic valve 30 and have a start magnetite 31, this start magnetite 31 has a start axis hole 32, is provided with driving stem 33 on an end of start magnetite 31.
The exterior contour of aperture board 50 is similar to the exterior contour of pedestal 10, aperture board 50 has a diaphragm hole 51, offer the slide opening 52 of the operating bar slide opening 152 on the corresponding pedestal 10 in this aperture board 50 near outer rim places, then symmetry respectively is provided with an axis hole 53,54 in the both sides of slide opening 52.
Vane group 60 has the first blade 60A and the second blade 60B, and this first and second blade 60A, 60B roughly are the dartlike weapon shape.The first blade 60A has a light shielding part 61A, in order to the diaphragm hole 51 of shield light girth sheets 50, is formed with a 62A of bore portion in the inner edge bending place of the first blade 60A, then is provided with an axis hole 63A and a start hole 64A in its end; The shape of the second blade 60B and the first blade 60A is identical and be symmetry, the second blade 60B has light shielding part 61B, the 62B of bore portion, axis hole 63B and start hole 64B equally, wherein, the start hole 64B of the start hole 64A of the first blade 61A and the second blade 61B is overlapping.
The exterior contour of pressing plate 70 is similar to the exterior contour of pedestal 10, and pressing plate 70 has a center pit 71, is provided with a slide opening 72 near the outer rim place, and is symmetrical in these slide opening 72 both sides and is provided with axis hole 73,74; Wherein, the operating bar 261 of the operating bar slide opening 152 of the slide opening 52 of start hole 64A, the 64B of slide opening 72 and vane group 60, aperture board 50, pedestal 10 and acting device 20 is on same straight line.
During assembling, the central shaft hole 23 of acting device 20 is set on the start connecting rod pillar 151 of pedestal 10, rotates so that acting device 20 can make moving connecting rod pillar 151, and operating bar 261 passes operating bar slide opening 152 in addition, with the switching of driven vane group 60; Do on the start solenoid valve seat 14 that moving electromagnetic valve 30 places pedestal 10, and start magnetite pillar 141 passed start axis hole 32, can make moving magnetite pillar 141 rotations so that make the start magnetite 31 of moving electromagnetic valve 30, this driving stem 33 of making moving electromagnetic valve 30 then passes the chute 241 that is subjected to swing arm 24 on the acting device 20, to drive acting device 20 rotations; 40 of the solenoid valves in location place on the location solenoid valve seat 16 of pedestal 10, and will locate magnetite pillar 161 and pass positioning shaft hole 42, so that the location magnetite 41 of location solenoid valve 40 can rotate around location magnetite pillar 161, position block 43 then offsets with the stop block 251 of acting device 20 upper position-arresting arms 25; Aperture board 50 is arranged on the second surface 12 of pedestal 10, the operating bar slide opening 152 of slide opening 52 corresponding pedestals 10, make the operating bar 261 of acting device 20 can pass this slide opening 52 and the switching of driven vane group 60, be positioned at the blade pillar (be not shown in figure) of the axis hole 53,54 of these slide opening 52 both sides, pass and be used for the assembling and positioning of aperture board 50 and pedestal 10 for this blade pillar corresponding to pedestal 10 second surfaces 12; The first blade 61A and the second blade 61B of vane group 60 all are arranged on the another side of this aperture board 50, start hole 64A, 64B is overlapping and be set on the operating bar 261 of acting device 20, axis hole 63A, 63B on first and second blade 61A, the 61B then is set on the blade pillar (not being shown in figure) of pedestal 10 second surfaces 12, so can drive the blade pillar (be not shown in figure) of vane group 60 on pedestal 10 second surfaces 12 and rotate, and then realize the switching of shutter and the switching of aperture size by the operating bar on the acting device 20 261; The slide opening 72 of pressing plate 70 is set on the operating bar 26 of acting device 20; 73,74 of axis holes are set on the blade pillar (not being shown in figure) of pedestal 10 second surfaces 12; the outer rim of pressing plate 70 and pedestal fasten, thereby aperture board 50 and vane group 60 are pressed together between pedestal 10 and the pressing plate 80 and can be effectively protected.
Please consult Fig. 4, Fig. 5 and Fig. 6 simultaneously, Fig. 4 is the synoptic diagram when being in large aperture in the exposure device shooting state of the utility model one embodiment, and Fig. 5 is the front elevational schematic of vane group among Fig. 4, and Fig. 6 is that the back of the body of vane group is looked synoptic diagram among Fig. 4.
When being used as moving electromagnetic valve 30 and driving its start magnetites 31 and clockwise rotate, penetrating acting device 20 can rotate counterclockwise by drive acting devices 20 by the chute 241 interior driving stems 33 of swing arm 24, and then clockwise rotate around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12 by the operating bar on the acting device 20 261 rotating counterclockwise and driving the first blade 60A in operating bar slide opening 152, the second blade 60B then rotates counterclockwise (its rotation direction sees also Fig. 5) around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12, win blade 60A and the second blade 60B are rotated in the opposite direction and deviate from gradually, and then open the diaphragm hole 51 of aperture board 50.When start magnetite 31 dextrorotations of being used as moving electromagnetic valve 30 go to primary importance shown in Figure 4, the first blade 60A and the second blade 60B complete opening, at this moment, the location magnetite 41 of location solenoid valve 40 is in original state, and the stop block 251 on the acting device 20 stop bit arms 25 is because of being rotated counterclockwise near the position block 43 on this location magnetite 41.
Please consult Fig. 7, Fig. 8 and Fig. 9 simultaneously, Fig. 7 is the synoptic diagram of the exposure device of the utility model one embodiment when closed, and Fig. 8 is the front elevational schematic of vane group among Fig. 7, and Fig. 9 is that the back of the body of vane group is looked synoptic diagram among Fig. 7.
When being used as moving electromagnetic valve 30 and driving start magnetites 31 and rotate counterclockwise, penetrating acting device 20 can clockwise rotate by drive acting devices 20 by the chute 241 interior driving stems 33 of swing arm 24, and then rotate counterclockwise around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12 by the clockwise rotating and driving the first blade 60A in operating bar slide opening 152 of the operating bar 261 on this acting device 20, the second blade 60B then clockwise rotates (its rotation direction sees also Fig. 8) around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12, win blade 60A and the second blade 60B are rotated toward each other and close gradually, and then close the diaphragm hole 51 of aperture board 50 gradually.When the start magnetite 31 of being used as moving electromagnetic valve 30 is rotated counterclockwise to the second place shown in Figure 7, the first blade 60A and the second blade 60B can overlap each other and close the diaphragm hole 51 of aperture board 50 fully, at this moment, the location magnetite 41 of location solenoid valve 40 still is in original state, and the stop block 251 on the acting device 20 stop bit arms 25 is because of dextrorotation then away from the position block 43 on the magnetite 41 of location.
Please consult Figure 10, Figure 11 and Figure 12 simultaneously, Figure 10 is the synoptic diagram when being in little aperture in the exposure device shooting state of the utility model one embodiment, and Figure 11 is the front elevational schematic of vane group among Figure 10, and Figure 12 is that the back of the body of vane group is looked synoptic diagram among Figure 10.
When solenoid valve 40 driving location magnetite 41 dextrorotations in location go to predetermined position location, making moving electromagnetic valve 30 also drives start magnetite 31 and clockwise rotates, penetrating acting device 20 can rotate counterclockwise by drive acting devices 20 by the chute 241 interior driving stems 33 of swing arm 24, and then clockwise rotate around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12 by the operating bar on the acting device 20 261 rotating counterclockwise and driving the first blade 60A in operating bar slide opening 152, the second blade 60B then rotates counterclockwise (its rotation direction sees also Figure 11) around the blade pillar (not being shown in figure) on pedestal 10 second surfaces 12, makes the first blade 60A of overlapped closure and the second blade 60B deviate from unlatching gradually.When 31 dextrorotations of start magnetite go to the 3rd position shown in Figure 10, stop block 251 on the acting device 20 stop bit arms 25 is because of being rotated counterclockwise just in time against the position block 43 of firmly locating on the magnetite 41, and the positioning port 431 on the position block 43 can match with stop block 251 and better locating effect is provided; At this moment, the 62A of bore portion of the first blade 60A is relative and partly overlapping with the opening meeting of the 62B of bore portion of the second blade 60B, and forms predetermined little aperture C (as shown in figure 11).
Comprehensively above-mentioned, the various start processes of the exposure device of the utility model one embodiment are summarized as follows:
Under the normality, the first blade 60A and the second blade 60B are closed and the diaphragm hole 51 of aperture board 50 is covered fully, as shown in Figure 7.
When exposure device opens to large aperture, do 31 dextrorotations of moving electromagnetic valve 30 driving start magnetites and go to primary importance (as shown in Figure 4), driving stem 33 drives acting devices 20 and is rotated counterclockwise, and then drives the first blade 60A open aperture board 50 fully with second blade 60B rotation diaphragm hole 51 (as shown in Figure 5) by operating bar 261.
When exposure device is closed, making moving electromagnetic valve 30 driving start magnetites 31 is rotated counterclockwise to the second place (as shown in Figure 7), driving stem 33 drives acting device 20 and turns clockwise, and then rotates and the diaphragm hole 51 (as shown in Figure 8) of complete closed aperture board 50 by the operating bar 261 drive first blade 60A and the second blade 60B.
When exposure device switches to little aperture, location solenoid valve 40 drives location magnetite 41 and goes to predetermined position location (as shown in figure 10) from the initial position dextrorotation, do 31 dextrorotations of moving electromagnetic valve 30 driving start magnetites and go to the 3rd position, at this moment, driving stem 33 drives the stop block 251 that acting devices 20 are rotated counterclockwise to the acting device 20 stop bit arms 25 and offsets with position block 43 on the magnetite 41 of location, operating bar 261 is rotated counterclockwise the drive first blade 60A and the second blade 60B rotates and partially opens, make the 62A of bore portion, 62B forms little aperture C (as shown in figure 11), wherein, the 3rd position is between the primary importance and the second place.
From little aperture to exposure device when closed, making moving electromagnetic valve 30 drives start magnetite 31 again and is rotated counterclockwise to the second place (as shown in Figure 7), driving stem 221 drives acting device 20 and turns clockwise, and then rotates and the diaphragm hole 51 of complete closed aperture board 50 by the operating bar 26 drive first blade 60A and the second blade 60B.
As shown in the above description, the exposure device of the utility model embodiment can utilize one to make moving electromagnetic valve drive acting device and a location mechanism and acting device generation positoning function, makes acting device generation shutter switching and aperture switch this two kinds of actions.In simple terms, exposure device of the present utility model only utilizes a drive source (making moving electromagnetic valve), utilizes a gear (location) mechanism to produce two kinds of functions by an acting device again.The detent mechanism of the various embodiments described above has adopted the location solenoid valve, and obviously, among other embodiment of the present utility model, this detent mechanism can also adopt the locating device of existing other form such as link stopper to realize.
The above only is preferred embodiment of the present utility model, when not limiting the scope that the utility model is implemented with this, promptly the simple equivalent of doing according to the utility model claim and description generally changes and modifies, and all still belongs in the scope that the utility model patent contains.
Claims (10)
1, a kind of exposure device that is used for optical equipment is characterized in that, comprising:
Pedestal has first surface, second surface and runs through first surface and the hole of second surface;
Acting device rotatably is located at the first surface of pedestal, have outwards stagger at a certain angle be subjected to swing arm, stop bit arm and actuating arm, and actuating arm is extended with an operating bar to the one side;
Make moving electromagnetic valve, be located at acting device one side of pedestal first surface, have a start magnetite that drives the acting device rotation with acting device cooperated by swing arm;
Detent mechanism is located at the acting device opposite side of pedestal first surface, has one and cooperates with the stop bit arm of acting device and locate the position block of acting device;
Aperture board is located at the second surface of pedestal, has a diaphragm hole;
Vane group is located at the pedestal second surface, and the end of described vane group is nestable on the operating bar of the acting device that stretches out second surface from the pedestal first surface, to open and close diaphragm hole by the operating bar driven rotary.
2, the exposure device that is used for optical equipment according to claim 1 is characterized in that, described start magnetite has a start axis hole and is set on the start magnetite pillar of pedestal first surface.
3, the exposure device that is used for optical equipment according to claim 1, it is characterized in that, described detent mechanism is a location solenoid valve, the location magnetite of described location solenoid valve has a location shaft hole sleeve and is located on the location magnetite pillar of pedestal first surface, and described position block then is arranged on the end of this location magnetite.
4, the exposure device that is used for optical equipment according to claim 3 is characterized in that, described location link stopper has a positioning port, and the stop bit arm of described acting device has a stop block that offsets with described positioning port in the end.
5, the exposure device that is used for optical equipment according to claim 1 is characterized in that, the swing arm that is subjected to of described acting device offers a chute, and the end of described start magnetite is provided with driving stem and inserts in the described chute that is subjected to swing arm.
6, the exposure device that is used for optical equipment according to claim 1 is characterized in that, described acting device has a central shaft hole and is set on the start connecting rod pillar of pedestal first surface.
7, the exposure device that is used for optical equipment according to claim 1, it is characterized in that, described pedestal offers an operating bar slide opening that runs through first surface and second surface, and the operating bar of described acting device passes described operating bar slide opening and aperture board and vane group socket.
8, the exposure device that is used for optical equipment according to claim 1 is characterized in that, described vane group has first blade and second blade at least, and described first blade and second blade have and be oppositely arranged to form the bore portion of little aperture.
9, the exposure device that is used for optical equipment according to claim 8, it is characterized in that, described first blade is identical with second blade shape and be symmetrical arranged, respectively be provided with on the nestable operating bar in a start hole in an end side close to each other, respectively be provided with on the blade pillar that a shaft hole sleeve is located at the pedestal second surface in a described end side away from each other at acting device.
10, the exposure device that is used for optical equipment according to claim 9, it is characterized in that, described aperture board offer near the outer rim place with pedestal on the corresponding slide opening of operating bar slide opening, and be provided with the axis hole that passes for the blade pillar in the slide opening symmetria bilateralis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008201336861U CN201259598Y (en) | 2008-09-12 | 2008-09-12 | Exposure device used for optical equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008201336861U CN201259598Y (en) | 2008-09-12 | 2008-09-12 | Exposure device used for optical equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201259598Y true CN201259598Y (en) | 2009-06-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008201336861U Expired - Fee Related CN201259598Y (en) | 2008-09-12 | 2008-09-12 | Exposure device used for optical equipment |
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| Country | Link |
|---|---|
| CN (1) | CN201259598Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017211595A (en) * | 2016-05-27 | 2017-11-30 | 日本電産コパル株式会社 | Focal plane shutter and imaging device |
| CN108535934A (en) * | 2018-05-02 | 2018-09-14 | 中山市美景光学信息有限公司 | A kind of optical lens of iris ring |
| TWI708113B (en) * | 2019-07-10 | 2020-10-21 | 致能機電工業股份有限公司 | Aperture film transfer device |
| CN112505979A (en) * | 2019-08-26 | 2021-03-16 | 致能机电工业股份有限公司 | Aperture plate transfer device |
-
2008
- 2008-09-12 CN CNU2008201336861U patent/CN201259598Y/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017211595A (en) * | 2016-05-27 | 2017-11-30 | 日本電産コパル株式会社 | Focal plane shutter and imaging device |
| CN108535934A (en) * | 2018-05-02 | 2018-09-14 | 中山市美景光学信息有限公司 | A kind of optical lens of iris ring |
| TWI708113B (en) * | 2019-07-10 | 2020-10-21 | 致能機電工業股份有限公司 | Aperture film transfer device |
| CN112505979A (en) * | 2019-08-26 | 2021-03-16 | 致能机电工业股份有限公司 | Aperture plate transfer device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090617 Termination date: 20150912 |
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| EXPY | Termination of patent right or utility model |