CN201191356Y - Flat reflection type fly-eye cold light source exposure system - Google Patents
Flat reflection type fly-eye cold light source exposure system Download PDFInfo
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- CN201191356Y CN201191356Y CNU2008200583700U CN200820058370U CN201191356Y CN 201191356 Y CN201191356 Y CN 201191356Y CN U2008200583700 U CNU2008200583700 U CN U2008200583700U CN 200820058370 U CN200820058370 U CN 200820058370U CN 201191356 Y CN201191356 Y CN 201191356Y
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Abstract
A flat reflective type faceted eye cold light source exposure system belongs to the technical field of photoetching, which comprises a lamp source group, a polygonal mirror group device, a reflective mirror group, an exposure device and the like. The flat reflective type faceted eye cold light source exposure system is characterized in that the polygonal mirror group device comprises an upper layer mirror seat and a lower layer mirror seat, the upper layer mirror seat is closely overlapped on the lower layer mirror seat, the upper layer mirror seat comprises an upper disc, an upper mirror clamping ring and upper disc reflectors, the upper mirror clamping ring is placed between the upper disc and the upper disc reflector, the upper disc reflectors are sequentially closely arranged into a ring to be placed in the upper disc, and the structure of the lower layer mirror seat is similar to that of the upper layer mirror seat. The reflective mirror group comprises a small reflective mirror group and a large reflective mirror group, wherein the small reflective mirror group and the large reflective mirror group are placed parallelly and oppositely, and the included angles of the small and large reflective mirror groups form included angles of 45 degrees with the horizontal plane. The flat reflective type faceted eye cold light source exposure system provides the position arrangement of multiple-layer reflective mirrors, largely increases exposure evenness, and expands the exposure area to be larger.
Description
Technical field
The present invention relates to the exposure system of technical field of lithography, be specifically related to a kind of plane reflection type compound eye cold light source exposure system.
Background technology
Pith in the ic manufacturing process is a photoetching technique, up to now, optical lithography techniques is still occupied absolute leading position in the integrated circuit manufacturing, and exposure wavelength develops to deep ultraviolet, adopted the deep ultraviolet spectrum of 196 nanometers, lithographic line width has also reached nanoscale.
Domestic in China, still in occupation of leading position, the quality of exposure technique will directly have influence on the quality of photoetching lines near contact photoetching machine.
At present, the common at home and abroad exposure technique that adopts has:
(1) poly-lens compound eye exposure system.
Directional light has formed a plurality of pointolites by poly-lens, has reached diffraction pattern and has repaiied equal purpose, is technology commonly used now.But because ultraviolet light luminous energy when scioptics is decayed widely, particularly light wavelength is short more, and it is severe more to decay.Therefore, be difficult to use in the deep ultraviolet exposure system.
(2) polygon prism exposure system
Because the installation and processing debugging is difficulty comparatively, the manufacturing cost height, and be to a large amount of decay of ultraviolet light in transmission process equally, therefore, seldom be used.
(3) multiple reflection mirror compound eye exposure system
Once use too much catoptron (ellipsoidal reflector) exposure technique abroad, utilized the reflection of a plurality of ellipsoids, formed a plurality of pointolites.But because processed complex, manufacturing cost are very high, and the electric light source limited amount (being generally 8 or 12 pointolites) that forms, therefore, the exposition uniformity of exposure system is affected.Can not be widely used.Owing to adopted the technology of reflection, therefore, greatly reduced decay to ultraviolet light.Improved the utilization factor of ultraviolet luminous energy greatly.
As mentioned above, along with the development of the exposure technique of short UV light, the transmission-type exposure system has shown serious technological deficiency; Though and the reflective exposure technique of ellipsoid has solved the problem of luminous energy decay, owing to be subjected to technical restriction, can only form the extremely limited pointolite of quantity, and manufacturing cost is very high, be difficult to be widely used.
Summary of the invention
The purpose of invention is to overcome the deficiencies in the prior art, and a kind of plane reflection type compound eye cold light source exposure system is provided.The invention solves the low problem of the efficiency of light energy utilization of short UV light exposure system, solved the problem of the exposition uniformity difference of large area exposure system.The present invention proposes the positional alignment of multilayer mirror, improved exposition uniformity greatly, and expansion is bigger exposure area.
The present invention is achieved by the following technical solutions, comprising: lamp source group, multiaspect lens assembly device, reflective mirror group, exposure device, case, and the light source center of lamp source group places the central point of multiaspect lens assembly device, and reflective mirror group, exposure device place in the case;
Described lamp source group comprises ultrahigh pressure mercury lamp, ultra high pressure mercury lamp bracket, and ultrahigh pressure mercury lamp is fixed in the ultra high pressure mercury lamp bracket;
Described multiaspect lens assembly device comprises upper strata microscope base, lower floor's microscope base, and the upper strata microscope base is closely superimposed on lower floor's microscope base; Described upper strata microscope base comprises: go up dish, go up the eyeglass trim ring, on coil reflecting piece, last eyeglass trim ring place dish, on coil between the reflecting piece, on coil the reflecting piece lopping of closely going in ring successively and emplace in the Yu Shangpan; Described lower floor microscope base comprises: lower wall, following eyeglass trim ring, lower wall reflecting piece, and following eyeglass trim ring places between lower wall, the lower wall reflecting piece, and the closely belt successively lopping of lower wall reflecting piece emplaces in lower wall;
Described reflective mirror group comprises: little reflective mirror group, big reflective mirror group, little reflective mirror group, the parallel face-off of big reflective mirror group are placed, and with horizontal sextant angle be 45 °;
Described exposure device comprises: shutter group, the accurate mirror group of exposure, collimation seat axle, work plane of exposure, shutter group place between little reflective mirror group, the big reflective mirror group, and shutter group, the accurate mirror group of exposure, work plane of exposure are adapted to light path and place successively;
Described multiaspect lens assembly device has 64 plane reflecting piece and forms.
The arc light that described ultrahigh pressure mercury lamp sends forms 64 pointolites by upper strata microscope base, lower floor's microscope base, projects collimating mirror, and the object distance S of collimating mirror overlaps on the luminous acnode of ultrahigh pressure mercury lamp, converges S ' point through collimating mirror then, and convergent angle is 3 °.
Described 64 plane reflecting piece, the angle U between its every reflective mirror and the ultrahigh pressure mercury lamp light source center is 5.16 °, i.e. SinU=0.09.
Compare with existing conventional art, plane reflection type compound eye cold light source exposure system of the present invention has following beneficial effect:
(1) NA has reached 5.76, has improved the efficiency of light energy utilization greatly, and this is that traditional exposure system is incomparable.
(2) adopt two-layer 64 plane reflecting piece up and down, formed 64 pointolites, each pointolite forms 3 ° of convergent angles separately, has effectively suppressed the influence of diffraction to photoetching, and this is that many ellipsoidal mirrors exposure system is difficult to realize.
(3) multiple spot the Lights section of plane reflection type compound eye cold light source exposure system is a principle of utilizing reflection, has avoided the absorption of optical lens to ultraviolet light effectively, and this also is that traditional exposure system is incomparable.
(4) owing to adopted the technology of plane reflection type compound eye cold light source exposure system, exposure area is enlarged.Effective means can be provided for the photoetching of large-area liquid crystal screen.
The present invention adopts 64 plane reflecting piece, pass through accurate Calculation, 64 plane reflecting piece are carried out permutation and combination by different angles and position, again 64 new pointolites have been formed, and each pointolite is through behind the collimating mirror, the angle of Xing Chenging is 2.5 °～3 ° each other, can imitate to improve the photoetching diffraction effect with having.
Description of drawings
Fig. 1 is the structural representation of exposure system of the present invention.
Fig. 2 is the structural representation of multiaspect lens assembly device and lamp source group (ultrahigh pressure mercury lamp).
Fig. 3 is the structural representation of multiaspect lens assembly device.
Fig. 4 is an exposure system optical principle synoptic diagram of the present invention.
Fig. 5 is 64 plane reflecting piece in the exposure system of the present invention, the angle design diagram of every reflective mirror and light source center.
Fig. 6 is the convergent angle synoptic diagram of optically focused in the traditional poly-lens compound eye exposure system.
Description of symbols:
1-lamp source group, 11-ultrahigh pressure mercury lamp, 12-ultra high pressure mercury lamp bracket, 2-multiaspect lens assembly device, 21-upper strata microscope base, 22-lower floor microscope base, the last dish of 211-, the last eyeglass trim ring of 212-, the last dish of 213-reflecting piece, 221-lower wall, eyeglass trim ring under the 222-, 223-lower wall reflecting piece, the little reflective mirror group of 31-, the big reflective mirror group of 32-, 41-shutter group, the 42-accurate mirror group of exposing, 421-collimating mirror, 43-collimation seat axle, the 44-plane of exposure of working, the 5-case.
Embodiment
Below in conjunction with accompanying drawing embodiments of the invention are elaborated: present embodiment is being to implement under the prerequisite with the technical solution of the present invention, provided detailed embodiment and concrete operating process, but protection scope of the present invention is not limited to following embodiment.
As shown in Figure 1, the present embodiment plane reflection type compound eye cold light source exposure system, comprise: lamp source group 1, multiaspect lens assembly device 2, reflective mirror group, exposure device, case 5, the light source center of lamp source group 1 places the central point of multiaspect lens assembly device 2, reflective mirror group, exposure device to place in the case 5;
As shown in Figure 2, described lamp source group 1 comprises ultrahigh pressure mercury lamp 11, ultra high pressure mercury lamp bracket 12, and ultrahigh pressure mercury lamp 11 is fixed in ultra high pressure mercury lamp bracket 12;
Described multiaspect lens assembly device 2 comprises upper strata microscope base 21, lower floor's microscope base 22, and upper strata microscope base 21 is closely superimposed on lower floor's microscope base 22,
As shown in Figure 3, described upper strata microscope base 21 comprises dish 211, goes up eyeglass trim ring 212, on coil reflecting piece 213, last eyeglass trim ring 212 places and coils 211, on coil between the reflecting piece 213, on coil the closely belt successively lopping of reflecting piece 213 and emplace in last dish 211;
As shown in Figure 3, described lower floor microscope base 22 similar are in upper strata microscope base 21, comprise lower wall 221, following eyeglass trim ring 222, lower wall reflecting piece 223, following eyeglass trim ring 222 places between lower wall 221, the lower wall reflecting piece 223, and the closely belt successively lopping of lower wall reflecting piece 223 emplaces in lower wall 221;
Described reflective mirror group comprises: little reflective mirror group 31, big reflective mirror group 32, little reflective mirror group 31, the 32 parallel face-offs of big reflective mirror group are placed, and with horizontal sextant angle be 45 °;
Described exposure device comprises: shutter group 41, the accurate mirror group 42 of exposure, collimation seat axle 43, work plane of exposure 44, shutter group 41 places between little reflective mirror group 31, the big reflective mirror group 32, and shutter group 41, the accurate mirror group 42 of exposure, work plane of exposure 44 are adapted to light path and place successively;
Described multiaspect lens assembly device 2 has 64 plane reflecting piece and forms, and comprises upper strata microscope base 21, lower floor's microscope base 22.
The arc light that ultrahigh pressure mercury lamp 11 sends is by upper strata microscope base 21, lower floor's microscope base 22, form 64 pointolites, project collimating mirror 421, the object distance S of collimating mirror 421 overlaps on the luminous acnode of ultrahigh pressure mercury lamp 11, converge S ' point through collimating mirror 421 then, convergent angle is 3 °.
Described multiple spot light source is 64 pointolites, is to reflect simultaneously down via 64 plane reflecting piece by the arc light that ultrahigh pressure mercury lamp 11 sends to form;
Described 64 plane reflecting piece, the angle U between its every reflective mirror and ultrahigh pressure mercury lamp 11 light source centers is 5.16 °, i.e. SinU=0.09.
Described upper strata microscope base 21, lower floor's microscope base 22, be the center with light source (ultrahigh pressure mercury lamp 11) respectively, wherein each the closely belt successively lopping of reflex reflector lens emplaces, and the longitudinal section angle of light source center and each reflex reflector lens is 5.16 °, the feasible utilization factor that fully improves light source.
Principle of work of the present invention: show as Fig. 4, comprise ultrahigh pressure mercury lamp 11, upper strata microscope base 21, lower floor's microscope base 22, multiple spot light source, collimating mirror 421, work plane of exposure 44.The present invention utilizes multi-disc reflective mirror optically focused principle, in order to realize the multiple spot light source, multiaspect lens assembly device 2 is designed to two-layer reflex reflector lens group up and down.The arc light that ultrahigh pressure mercury lamp 11 sends is by upper strata microscope base 21, lower floor's microscope base 22, form 64 pointolites, project collimating mirror 421, because the object distance S of collimating mirror 421 overlaps on the luminous acnode of ultrahigh pressure mercury lamp 11, converge S ' point through collimating mirror 421 then, convergent angle is 3 °, rather than traditional directional light.
Light-use of the present invention: in the design of this exposure system, the angle of each reflecting piece and light source center is designed to SinU=0.09, angle is about 5.16 °, shows as Fig. 5.The reflecting piece number of two layers of microscope base is 64 up and down, and therefore, total NA of this system is above-mentioned summation, that is: NA=0.09X64=5.76 that is to say, the NA of total reflection angle of this plane reflection type compound eye cold light source exposure system is 5.76.
Traditional poly-lens compound eye exposure system sees that the convergent angle of Fig. 6 optically focused is about 45 °, SinU=1.
Just can clearly show from above-mentioned calculating contrast: the efficiency of light energy utilization of plane reflection type compound eye cold light source exposure system is far longer than poly-lens compound eye exposure system, about about 5 times.And when ultraviolet light sees through glass mirror, luminous energy also will be absorbed widely.And the reflex exposure system then can not be absorbed except collimating mirror substantially.
Each parameter of present embodiment is
(1) exposure energy: 18mw/cm
2(during the 200w mercury lamp), 30mw/cm
2(during the 350w mercury lamp).
(2) exposure energy unevenness: ± 2%
(3) 5 inches of exposure area: Φ (can expand to 20 inches of Φ)
(4) exposure spectral line: 254nm～436nm
Compare with existing conventional art, the present embodiment plane reflection type compound eye cold light source exposure system has following beneficial effect:
(5) NA has reached 5.76, has improved the efficiency of light energy utilization greatly, and this is that traditional exposure system is incomparable.
(6) adopt two-layer 64 plane reflecting piece up and down, formed 64 pointolites, each pointolite forms 3 ° of convergent angles separately, has effectively suppressed the influence of diffraction to photoetching, and this is that many ellipsoidal mirrors exposure system is difficult to realize.
(7) multiple spot the Lights section of plane reflection type compound eye cold light source exposure system is a principle of utilizing reflection, has avoided the absorption of optical lens to ultraviolet light effectively, and this also is that traditional exposure system is incomparable.
(8) owing to adopted the technology of plane reflection type compound eye cold light source exposure system, exposure area is enlarged.Effective means can be provided for the photoetching of large-area liquid crystal screen.
Present embodiment can be applicable to litho machine, mainly comprises exposure light source, field-splitting microscope, precision stage, conveying silicon chip mechanism and PLC controller etc.Work plane of exposure in the litho machine (being the position of mask and silicon chip) is 100mm apart from the collimating mirror summit.When exposure (during photoetching), 64 pointolites work simultaneously, are radiated at simultaneously on mask and the silicon chip with different angles, and it is even that institute obtains diffraction pattern.Plane reflection type compound eye cold light source exposure system has obtained successful application in litho machine, exposure energy has reached 18mw/cm
2, and successfully developed field-splitting microscope, the maximum branch apparent distance has reached 100mm.
Compared with prior art, present embodiment is applied to litho machine, greatly reduces the energy attenuation of ultraviolet light, has particularly reduced the energy attenuation of short UV light.The wavelength coverage of exposure spectral line can expand 254nm～436nm to, and traditional transmission-type cold light source is difficult to accomplish.
Present embodiment can be applicable to the microelectronic integrated circuit manufacturing and the LCD LCD screen is made the field.Present embodiment has been realized the large tracts of land uv-exposure, can expand to be applied to large-area liquid crystal screen field of lithography.
Claims (4)
1. plane reflection type compound eye cold light source exposure system, comprise: lamp source group, multiaspect lens assembly device, reflective mirror group, exposure device, case, the light source center of lamp source group places the central point of multiaspect lens assembly device, and reflective mirror group, exposure device place in the case, it is characterized in that
Described lamp source group comprises ultrahigh pressure mercury lamp, ultra high pressure mercury lamp bracket, and ultrahigh pressure mercury lamp is fixed in the ultra high pressure mercury lamp bracket;
Described multiaspect lens assembly device comprises upper strata microscope base, lower floor's microscope base, and the upper strata microscope base is closely superimposed on lower floor's microscope base; Described upper strata microscope base comprises: go up dish, go up the eyeglass trim ring, on coil reflecting piece, last eyeglass trim ring place dish, on coil between the reflecting piece, on coil the reflecting piece lopping of closely going in ring successively and emplace in the Yu Shangpan; Described lower floor microscope base comprises: lower wall, following eyeglass trim ring, lower wall reflecting piece, and following eyeglass trim ring places between lower wall, the lower wall reflecting piece, and the closely belt successively lopping of lower wall reflecting piece emplaces in lower wall;
Described reflective mirror group comprises: little reflective mirror group, big reflective mirror group, little reflective mirror group, the parallel face-off of big reflective mirror group are placed, and with horizontal sextant angle be 45 °;
Described exposure device comprises: shutter group, the accurate mirror group of exposure, collimation seat axle, work plane of exposure, shutter group place between little reflective mirror group, the big reflective mirror group, and shutter group, the accurate mirror group of exposure, work plane of exposure are adapted to light path and place successively.
2. plane reflection type compound eye cold light source exposure system as claimed in claim 1 is characterized in that, described multiaspect lens assembly device has 64 plane reflecting piece and forms.
3. plane reflection type compound eye cold light source exposure system as claimed in claim 1, it is characterized in that, the arc light that described ultrahigh pressure mercury lamp sends is by upper strata microscope base, lower floor's microscope base, form 64 pointolites, project collimating mirror, the object distance S of collimating mirror overlaps on the luminous acnode of ultrahigh pressure mercury lamp, converges S ' point through collimating mirror then, and convergent angle is 3 °.
4. plane reflection type compound eye cold light source exposure system as claimed in claim 2 is characterized in that, described 64 plane reflecting piece, and the angle U between its every reflective mirror and the ultrahigh pressure mercury lamp light source center is 5.16 °, i.e. SinU=0.09.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200583700U CN201191356Y (en) | 2008-05-14 | 2008-05-14 | Flat reflection type fly-eye cold light source exposure system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200583700U CN201191356Y (en) | 2008-05-14 | 2008-05-14 | Flat reflection type fly-eye cold light source exposure system |
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|---|---|
| CN201191356Y true CN201191356Y (en) | 2009-02-04 |
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|---|---|---|---|
| CNU2008200583700U Expired - Lifetime CN201191356Y (en) | 2008-05-14 | 2008-05-14 | Flat reflection type fly-eye cold light source exposure system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101349814B (en) * | 2008-05-14 | 2010-04-07 | 上海学泽光学机械有限公司 | Plane reflection type compound eye cold light source exposure system |
| CN109417270A (en) * | 2016-08-26 | 2019-03-01 | 松下知识产权经营株式会社 | Laser module |
-
2008
- 2008-05-14 CN CNU2008200583700U patent/CN201191356Y/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101349814B (en) * | 2008-05-14 | 2010-04-07 | 上海学泽光学机械有限公司 | Plane reflection type compound eye cold light source exposure system |
| CN109417270A (en) * | 2016-08-26 | 2019-03-01 | 松下知识产权经营株式会社 | Laser module |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20090204 Effective date of abandoning: 20080514 |