CN201109746Y - Annular zanjon oxidation ditch - Google Patents
Annular zanjon oxidation ditch Download PDFInfo
- Publication number
- CN201109746Y CN201109746Y CNU2007200463511U CN200720046351U CN201109746Y CN 201109746 Y CN201109746 Y CN 201109746Y CN U2007200463511 U CNU2007200463511 U CN U2007200463511U CN 200720046351 U CN200720046351 U CN 200720046351U CN 201109746 Y CN201109746 Y CN 201109746Y
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- CN
- China
- Prior art keywords
- oxidation ditch
- annular
- zanjon
- oxidation
- ditch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
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- Aeration Devices For Treatment Of Activated Polluted Sludge (AREA)
Abstract
The utility model discloses an annular zanjon oxidation ditch, which is characterized in that: the annular zanjon oxidation ditch comprises an annular oxidation ditch, the depth is 6 to 12 meters, a water inlet and a water outlet are arranged on a concentric wall, and a surface aerator is arranged in the annular oxidation ditch. A ring form is adopted by the oxidation ditch, thus the sludge at the bottom of the oxidation ditch is driven to form circumfluence only through the installation of a surface aeration device in the oxidation ditch without adding a push-flow device, thereby reducing the energy consumption and the occupied area.
Description
Technical field
The utility model belongs to sewage treatment area, particularly biological sewage treatment oxidation Ditch Technology field.
Background technology
Trade effluent and sanitary sewage are discharged into natural water body, cause the serious environmental pollution, and therefore, the method that main at present employing dirty water living creature processing technique is a core is handled, and reduces organism and nutrient concentrations in the sewage.The oxidation ditch biological sewage treatment technology is in annular channel, by active sludge oxidation, absorption or decomposing organic matter and nutritive salt.Usually provide dissolved oxygen by aerator, propelling fluid flows in raceway groove simultaneously, makes mud and sewage and dissolved oxygen thorough mixing, realizes the saprobia degraded.Common oxidation ditch system floor space is big, because modern city is densely populated, and the soil anxiety, and have a large population, need the sewage quantity of processing big, need the little sewage disposal technology of floor space.Increase the oxidation ditch degree of depth and can reduce the oxidation ditch floor space.Surface aeration machine is the supporting aeration and mixing of oxidation ditch, and it is low to have energy consumption, characteristics simple in structure.But, it has been generally acknowledged that dark oxidation ditch sewage disposal technology can not only use surface aeration equipment to drive the mobile and mixing of zanjon oxidation ditch mixed solution as changeing brush and plate-spinning; It has been generally acknowledged that surface aeration equipment such as changeing brush and plate-spinning can only promote the surface liquid motion, thereby can not drive the darker oxidation ditch of raceway groove, can only be applied to the oxidation ditch of the degree of depth less than 4-5 rice.Existing zanjon oxidation ditch often adopts under water the impeller plug-flow or uses jet aerator plug-flow under water, makes channel depth reach 6-10 rice, but these measures increase zanjon oxidation ditch energy consumption, and deficiency in economic performance is mainly used in the very nervous situation in soil usually.
The utility model content
The purpose of this utility model provides a kind of annular zanjon oxidation ditch of independent use surface aeration equipment, because oxidation ditch adopts annular, by surface aeration equipment is installed in oxidation ditch, do not need to increase plug-flow equipment, the mud that can drive the oxidation ditch bottom forms circulation, reduced energy expenditure, with floor space.
Technical solutions of the utility model are:
The zanjon oxidation ditch is characterized in that comprising annular oxidation ditch, and more than degree of depth 6-12 rice reached, the concentric(al) circles wall was provided with water-in and water outlet, in the annular oxidation ditch surface aeration machine is installed.
Described annular zanjon oxidation ditch is characterized in that described annular oxidation ditch is made of base plate and concentric(al) circles wall.
Described annular zanjon oxidation ditch is characterized in that described surface aeration machine is for changeing brush or plate-spinning.
Described annular zanjon oxidation ditch is characterized in that being between described annular oxidation ditch cross section upper plate and side wall arcuate structure.
In annular zanjon oxidation ditch, current are under aerator promotes, along channel current flows, simultaneously, centrifugal force is given birth in the flowing water miscarriage, causes transverse circulating current, makes whole channel current flows even, simultaneously, the annular channel radius is big, and the circulation flow velocity is little, and resistance is little, make raceway groove V-bar bigger, make below such as the surface aeration equipment that changes brush and plate-spinning flow velocity be higher than 0.3m/s, thereby produce good plug-flow mixing effect, effectively prevent active sludge precipitation in the mixed solution, system uses the surface aeration equipment with higher aeration efficient, do not need to increase plug-flow equipment, just can reach good plug-flow effect, guaranteed system performance, therefore, system energy consumption is lower.
The annular oxidation ditch is made of base plate and concentric(al) circles wall, can improve turning radius under floor space the same terms, reduces curve resistance, thereby improves the raceway groove inner fluid speed, prevents sludgd deposition.
Adopt arcuate structure between annular oxidation ditch cross section upper plate and side wall, can reduce bend transverse circulating current resistance, thereby improve the raceway groove inner fluid speed, prevent sludgd deposition.
The zanjon oxidation ditch of the utility model utility model has reduced the oxidation ditch floor space, guarantees simultaneously, is not increasing under the plug-flow power condition, keeps the raceway groove flow velocity greater than 0.3m/s, satisfies the biologic process for treating sewage requirement.
Description of drawings
Fig. 1 is this practical new texture synoptic diagram.
Embodiment
Annular zanjon oxidation ditch 1 outer raceway groove external diameter is 21 meters, 15 meters of interior raceway groove external diameters, dark 8 meters, adopt arcuate structure between raceway groove cross section upper plate and side wall, 1.4 meters plate-spinnings 4 of two diameters are installed in the oxidation ditch 1, the plate-spinning running speed is 43 rev/mins, dissolved oxygen is provided, the amount of disposing of sewage 2000-4000 side/sky simultaneously, makes raceway groove fluid movement V-bar reach 0.3m/s, be provided with water-in 2 and water outlet 3, sewage and mud mixed liquid enter raceway groove from water-in 2, through after the active sludge treatment, from water outlet 3 discharge grooves.
Claims (4)
1, annular zanjon oxidation ditch is characterized in that comprising annular oxidation ditch, and more than degree of depth 6-12 rice reached, the concentric(al) circles wall was provided with water-in and water outlet, in the annular oxidation ditch surface aeration machine is installed.
2, annular zanjon oxidation ditch according to claim 1 is characterized in that described annular oxidation ditch is made of base plate and concentric(al) circles wall.
3, annular zanjon oxidation ditch according to claim 1 is characterized in that described surface aeration machine is for changeing brush or plate-spinning.
4, annular zanjon oxidation ditch according to claim 1 and 2 is characterized in that being between described annular oxidation ditch cross section upper plate and side wall arcuate structure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2007200463511U CN201109746Y (en) | 2007-09-21 | 2007-09-21 | Annular zanjon oxidation ditch |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2007200463511U CN201109746Y (en) | 2007-09-21 | 2007-09-21 | Annular zanjon oxidation ditch |
Publications (1)
Publication Number | Publication Date |
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CN201109746Y true CN201109746Y (en) | 2008-09-03 |
Family
ID=39894272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNU2007200463511U Expired - Lifetime CN201109746Y (en) | 2007-09-21 | 2007-09-21 | Annular zanjon oxidation ditch |
Country Status (1)
Country | Link |
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CN (1) | CN201109746Y (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101973626A (en) * | 2010-10-27 | 2011-02-16 | 西安建筑科技大学 | Microporous aerating variable-speed oxidation ditch |
-
2007
- 2007-09-21 CN CNU2007200463511U patent/CN201109746Y/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101973626A (en) * | 2010-10-27 | 2011-02-16 | 西安建筑科技大学 | Microporous aerating variable-speed oxidation ditch |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20080903 |
|
CX01 | Expiry of patent term |