CN1996096A - Polarization beam splitter based on wave-structured film positive and negative refraction - Google Patents
Polarization beam splitter based on wave-structured film positive and negative refraction Download PDFInfo
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- CN1996096A CN1996096A CNA200610053946XA CN200610053946A CN1996096A CN 1996096 A CN1996096 A CN 1996096A CN A200610053946X A CNA200610053946X A CN A200610053946XA CN 200610053946 A CN200610053946 A CN 200610053946A CN 1996096 A CN1996096 A CN 1996096A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/007—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of negative effective refractive index materials
Abstract
The invention relates to a polarization beam splitter based on wavelike structure positive and negative refraction. The thin film is made alternatively by two high and low media materials plated on the substrate grating, showing wave like two dimensional periodic structure based on the modulating effect of the profile of the grating surface. The electromagnetic wave from incidence from outside has two polarization states, one of them conforming to the normal refraction with the incidence light and refraction light at both sides of the normal line, wave structure thin film similar to an even media material with positive reflective ratio, the other showing negative refraction with the incidence and refraction light at both sides of the normal line, wave structure thin film similar to a block of even media material with negative reflective ratio to divide two polarized electromagnetic waves from the wave structure thin film to realize polarized beam splitting. The multi layer media thin film realizes the polarized beam splitting, with small size, simple process, high polarization degree, with two dimensional size pantographic feature, suitable for microwave, infrared and visible light.
Description
Affiliated technical field
The present invention relates to the polarization beam splitting device, specifically is a kind of polarization beam apparatus based on wave-structured film positive and negative refraction.
Background technology
Wave-structured film is a kind of dielectric medium structure of two-dimensional and periodic, be similar to 2 D photon crystal, different is that it has the layer structure feature, and common 2 D photon crystal is to be arranged according to the two-dimensional grid cycle by the scatterer that is separated from each other to form, and does not possess the stratiform feature.The effect of polarization beam apparatus is that the unpolarized electromagnetic wave with incident resolves into the electromagnetic wave that two bundles have different polarization states.Electromagnetic wave can resolve into electric field when propagating in the two-dimensional and periodic dielectric structure direction of vibration is parallel to and perpendicular to two polarization states on two-dimension periodic plane.
China Patent No. 200410101822.5 is authorized notification number CN1641382A, is authorized July 20 2005 day for announcing, and name is called " two-dimensional photon crystal polarization beam dividing device ", this patent disclosure a kind of two-dimensional photon crystal polarizer of transmission-type.It is based on the anisotropic properties of 2 D photon crystal, and promptly photonic crystal has different mean refractive indexs to different polarization states on the whole, requires incident wavelength much larger than photonic crystal lattice constant, is 10: 1 to 30: 1 such as the ratio of wavelength and grating constant.Shortcoming is only to be applicable to microwave or the longer wave band of wavelength, for shortwave such as infrared and visible light, certainly will require grating constant to reach nanometer scale, and manufacture difficulty is very big, and cost is too high.
China Patent No. 200510060208.3, be authorized notification number CN1737616A, be authorized February 22 2006 day for announcing, name is called " based on the polarization beam apparatus and the beam-splitting method of light quantum crystal positive/negative refraction ", this patent disclosure a kind of polarization beam apparatus of the transmission-type based on light quantum crystal positive/negative refraction, applicable to infrared and light-wave band.Shortcoming is the microstructure processing technology complexity of two-dimensional and periodic cylindrical-array, relates to operations such as photoetching, etching, needs the manufacturing equipment of large quantities of costlinesses.
Document [Y.Y.Li, Acta Phys.Sin.55,4918,2006] has been proved Wave-structured film and can have been produced the negative refraction effect to electromagnetic wave, and promptly incident ray and refracted ray are positioned at the same side of interface normal.
Summary of the invention
The purpose of this invention is to provide a kind of polarization beam apparatus based on wave-structured film positive and negative refraction, operation wavelength can be chosen in microwave, infrared and visible light wave range according to structural design, adopts traditional thin film preparation process, reduces the cost of manufacture of device.
Technical scheme of the present invention is: alternately be coated with the dielectric material of two kinds of refractive indexes of height on the one-dimensional grating substrate, be subjected to the modulating action film of grating surface pattern to present sinuous two-dimensionally periodic structure.The ratio of the refractive index of two kinds of membraneous materials should be greater than 1.6, and the substrate grating must be the transmission-type grating that does not contain birefringence effect.Described two-dimensional and periodic is meant that wherein the undulation cycle of rete is identical with the cycle of substrate grating along the repetition period of the height two media material of film growth direction with perpendicular to undulation cycle of the rete of this direction.For reaching the perfect complex of film, according to the film growth theory, the wavy profile of film can only be two kinds of triangle and sinusoidals.
Polarization beam splitting method based on wave-structured film positive and negative refraction is: to be coated on wavy texture multilayer film on the grating substrate as electromagnetic polarization beam splitting element, incident electromagnetic wave comprises two polarization states, one of them polarization state is followed normal refraction after the Wave-structured film one side incident, incident ray and refracted ray lay respectively at the normal both sides, and Wave-structured film is similar to a uniform dielectric material with positive refracting power; It is negative refraction that another kind of polarization state presents abnormal refraction, incident ray and refracted ray are positioned at the normal homonymy, Wave-structured film is similar to a uniform dielectric material with negative index, thereby in Wave-structured film inside the electromagnetic wave of two kinds of polarization states is separated, realized the polarization beam splitting of transmission-type.The gross thickness of desirable polarization separation effect requirements Wave-structured film can not be too thin, thereby the repetition period number of high low-index film at least should be more than 30.
Beneficial effect of the present invention: the present invention has the scale character of two-dimensionally periodic structure, be that operation wavelength becomes a fixed proportion with the cycle of device architecture, structural cycle amplified or dwindle a factor, the corresponding work wavelength also amplifies thereupon or dwindles the identical factor, and guarantees that the performance index of polarization beam splitting device are constant.The present invention can make two polarization states take place to separate and transmission simultaneously in the inside configuration of device, and transmitance is big, the degree of polarization height.Device manufacture method involved in the present invention is simply more a lot of than existing two-dimensional photonic crystal polarization beam splitter spare, only needs on the substrate grating, to be coated with multilayer film, and technical maturity, repeatable high, be suitable for industrialized mass production
Description of drawings
Fig. 1 is the structural principle synoptic diagram of Wave-structured film transmission-type polarization beam apparatus: 1, normal, 2, incident electromagnetic wave, 3, high refractive index layer, 4, low-index film, 5, the refraction electromagnetic wave, 6, the substrate grating, 7, the refraction electromagnetic wave.
Fig. 2 is the equifrequency face structural representation corresponding to the Wave-structured film of polarization state I.
Fig. 3 is the equifrequency face structural representation corresponding to the Wave-structured film of polarization state II.
Embodiment
As shown in Figure 1, on two dimensional surface, polarization beam apparatus is made of wavy texture multilayer film and substrate grating 6, and peripheral medium is air (refractive index is 1).Rete 3 thickness of high-index material in the multilayer film (refractive index is 3.5) are 0.32a (the following grating constant a that all uses is as long measure), rete 4 thickness of low-index material (refractive index is 1.5) are 0.68a, the grating cycle is a, wavy overall film thickness should be more than 30a, and the wavy profile of rete remains triangle.Unpolarized incident electromagnetic wave 2 is entered by the Wave-structured film lopsidedness, and frequency is ω=0.3 (2 π c/ α).Incident electromagnetic wave 2 comprises two polarization states, and wherein, polarization state I follows normal refraction, and incident electromagnetic wave 2 lays respectively at normal 1 both sides with refraction electromagnetic wave 7; Polarization state II presents negative refraction in Wave-structured film inside, and incident electromagnetic wave 2 is positioned at normal 1 homonymy with refraction electromagnetic wave 5.
Wave-structured film polarization beam apparatus involved in the present invention, equifrequency face structure in its operating frequency range is shown in Fig. 2 and 3, frequency of operation is ω=0.3～0.34 (2 π c/ α), and polarization state I is operated in normal refraction, and the equivalent refractive index of Wave-structured film is for just; Polarization state II is operated in negative refraction, and the equivalent refractive index of Wave-structured film is for negative.The ranges of incidence angles of incident electromagnetic wave 2 is 15 °～60 °, and the polarization separation angle is 25 °～75 °.
Claims (7)
1, based on the polarization beam apparatus of wave-structured film positive and negative refraction, it is characterized in that, be alternately to be coated on two-dimensional periodic structure on the substrate grating (6) by height two media material, the ratio of the refractive index of dielectric material should be greater than 1.6, substrate grating (6) must be the transmission-type grating, and all the other all can grating material except that birefringece crystal.
2, according to power 1 described polarization beam apparatus based on wave-structured film positive and negative refraction, it is characterized in that described two-dimensional and periodic is meant along the repetition period of the height two media material of film growth direction with perpendicular to undulation cycle of the rete of this direction.
According to power 1 described polarization beam apparatus, it is characterized in that 3, the undulation cycle of rete is identical with the cycle of substrate grating (6) based on wave-structured film positive and negative refraction.
4, according to power 1 described polarization beam apparatus, it is characterized in that based on wave-structured film positive and negative refraction, at least should be along the rete repetition period number of the height two media material of film growth direction more than 30.
According to power 1 described polarization beam apparatus, it is characterized in that 5, the wavy profile of rete can only be two kinds of triangle and sinusoidals based on wave-structured film positive and negative refraction.
6, based on the polarization beam apparatus of wave-structured film positive and negative refraction, it is characterized in that, to be coated on wavy texture multilayer film on the substrate grating (6) as electromagnetic polarization beam splitting element, incident electromagnetic wave (2) comprises two polarization states, one of them polarization state is followed normal refraction after the Wave-structured film one side incident, incident electromagnetic wave (2) lays respectively at normal (1) both sides with refraction electromagnetic wave (7), and Wave-structured film is similar to a uniform dielectric material with positive refracting power; It is negative refraction that another kind of polarization state presents abnormal refraction, incident electromagnetic wave (2) is positioned at normal (1) homonymy with refraction electromagnetic wave (5), Wave-structured film is similar to a uniform dielectric material with negative index, thereby in Wave-structured film inside the electromagnetic wave of two kinds of polarization states is separated, realized the polarization beam splitting of transmission-type.
According to power 6 described polarization beam apparatus based on wave-structured film positive and negative refraction, it is characterized in that 7, electromagnetic ranges of incidence angles is 15 °～60 °, the refraction angle of departure of two kinds of polarization states is 25 °～75 °.
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| Application Number | Priority Date | Filing Date | Title |
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| CNA200610053946XA CN1996096A (en) | 2006-10-25 | 2006-10-25 | Polarization beam splitter based on wave-structured film positive and negative refraction |
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| CNA200610053946XA CN1996096A (en) | 2006-10-25 | 2006-10-25 | Polarization beam splitter based on wave-structured film positive and negative refraction |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102478679A (en) * | 2011-03-15 | 2012-05-30 | 深圳光启高等理工研究院 | Electromagnetic wave splitting element |
| WO2012122837A1 (en) * | 2011-03-15 | 2012-09-20 | 深圳光启高等理工研究院 | Electromagnetic wave component |
| CN112433364A (en) * | 2020-11-16 | 2021-03-02 | 邵阳学院 | Filter design method based on transmission rate and high-pass filtering of electromagnetic hyperdielectric abnormality |
| CN113451381A (en) * | 2021-06-29 | 2021-09-28 | 京东方科技集团股份有限公司 | Light-emitting unit, preparation method thereof, display panel and display device |
-
2006
- 2006-10-25 CN CNA200610053946XA patent/CN1996096A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102478679A (en) * | 2011-03-15 | 2012-05-30 | 深圳光启高等理工研究院 | Electromagnetic wave splitting element |
| WO2012122837A1 (en) * | 2011-03-15 | 2012-09-20 | 深圳光启高等理工研究院 | Electromagnetic wave component |
| CN102478679B (en) * | 2011-03-15 | 2013-03-27 | 深圳光启高等理工研究院 | Electromagnetic wave splitting element |
| CN112433364A (en) * | 2020-11-16 | 2021-03-02 | 邵阳学院 | Filter design method based on transmission rate and high-pass filtering of electromagnetic hyperdielectric abnormality |
| CN113451381A (en) * | 2021-06-29 | 2021-09-28 | 京东方科技集团股份有限公司 | Light-emitting unit, preparation method thereof, display panel and display device |
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