CN1991594A - Method and device for developing solution recovery treatment - Google Patents
Method and device for developing solution recovery treatment Download PDFInfo
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- CN1991594A CN1991594A CN 200510135206 CN200510135206A CN1991594A CN 1991594 A CN1991594 A CN 1991594A CN 200510135206 CN200510135206 CN 200510135206 CN 200510135206 A CN200510135206 A CN 200510135206A CN 1991594 A CN1991594 A CN 1991594A
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Abstract
A recovery processing method for the developing liquid is disclosed, and the alkaline compounds in the developing liquid is kept at a certain concentration, the developing liquid is used to wash the optical impedance agent on the base plate, it includes: the counting unit counts the developing base plate to obtain a counting value, and the control unit can dispatch the replenishing unit in the replenishing liquid of alkaline compounds according to the counting value; the recovery processing device for the developing liquid includes a counting unit, a replenishing unit and a control unit; the device can control the concentration of developing liquid accurately, reduce the cost, and delay the deterioration of the developing liquid and so on.
Description
Technical field
The invention relates to a kind of solution recovery and treatment method, be meant a kind of developing solution recovery and treatment method especially; In addition, the present invention also relates to a kind of solution recycling and processing device, is meant a kind of developing solution recycling and processing device especially.
Background technology
In semiconductor and crystal liquid substrate processing procedure, in order on substrate, to present earlier for example collection of illustrative plates of logical circuit, therefore need behind coating photoresist on each substrate, to expose through a light shield again, make this photoresist be converted into to desire to remain in photoresist on each substrate, and photoresist two parts of removing of desire; Then fall the photoresist that desire is removed with the developing solution eccysis, the collection of illustrative plates that the institute's desire that begins to develop obtains is to carry out successive process then.
Generally speaking, the principal ingredient of photoresist for example comprises repeatedly nitrogen-4-sulfonic acid of neighbour-naphthoquinones two; Neighbour-naphthoquinones two is nitrogen-5-sulfonic acid repeatedly; Neighbour-naphthoquinones two repeatedly nitrogen-6-sulfonic acid etc. naphthoquinones two repeatedly nitrogen be emulsion (o-naphthoquinone diazide; Be called for short NQD), with the alkali-soluble binding resin (binder resin) of for example novolac resin (Novolac resin) etc., and the interface activating agent etc.; With respect to the employed developing solution of photoresist, the composition that then contains alkali cpd, Tetramethylammonium hydroxide (Tetramethylammonium hydroxide for example, in hereinafter explaining) with its abbreviation " TMAH ", tetraethyl ammonium hydroxide (tetraethylammoniumhydroxide), TPAOH (tetrapropylammoniumhydroxide), TBAH (tetrabutylammoniumhydroxide), methyl triethyl ammonium hydroxide (methyltriethylammoniumhydroxide), trimethyl ethyl ammonium hydroxide (trimethylethylammoniumhydroxide), dimethyl diethyl ammonium hydroxide (dimethyldiethylammonium hydroxide), trimethyl (2-hydroxyethyl) ammonium hydroxide [trimethyl (2-hydroxyethyl) ammoniumhydroxide], triethyl (2-hydroxyethyl) ammonium hydroxide [triethyl (2-hydroxyethyl) ammonium hydroxide], dimethyl two (2-hydroxyethyl) ammonium hydroxide [dimethyldi (2-hydroxyethyl) ammoniumhydroxide], diethyl two (2-hydroxyethyl) ammonium hydroxide [diethyldi (2-hydroxyethyl) ammonium hydroxide], methyl three (2-hydroxyethyl) ammonium hydroxide [methyltri (2-hydroxyethyl) ammoniumhydroxide], ethyl three (2-hydroxyethyl) ammonium hydroxide [ethyltri (2-hydroxyethyl) ammonium hydroxide], four (2-hydroxyethyl) ammonium hydroxide [tetra (2-hydroxyethyl) ammonium hydroxide], and potassium hydroxide (Potassium hydroxide, in hereinafter explaining with its chemical formula " KOH ") etc., select to use according to need for haveing the knack of this skill person.
When developing solution is sprayed on the substrate, can interact by the photoresist of removing with the desire after exposure, it is dissolved and washed away on affiliated substrate; Then, use developing solution later to be collected, and repeat to be sprayed onto on the substrate via circulation line.
But, because above-mentioned photoresist is to belong to acidity, therefore along with developing process carries out constantly, developing solution is when repeating to develop photoresist, the alkali cpd of wherein contained reality and photoresist effect, can be consumed with the photoresist acid-base neutralization gradually, make the effective concentration of developing solution reduce gradually, can't possess good development effect constantly.If regularly upgrade developing solution, has certain level though can guarantee the development effect of solution and product yield, complicated problems such as subsequent treatment program and environmental protection yet discarded developing solution will be derived with effective concentration.
A debita spissitudo need be maintained at based on the alkali cpd concentration in this developing solution and good development effect can be brought into play, take many-sided considering such as environmental protection and cost simultaneously into account, therefore, relevant industry then develops recovery technology or the relevant treatment equipment that developing solution, prolongs the serviceable life of developing solution thus.Its main solution is closed strategy, be when the concentration of the alkali cpd of differentiating this developing solution is lower than a setting value, be about to have the additional liquid of the alkali cpd of a higher concentration, pour in right amount in this developing solution, so that the alkali cpd in this developing solution maintains a suitable concentration.
And whether the alkali cpd concentration of aforementioned this developing solution of differentiation is lower than this setting value, then is by this developing solution is flowed in the various sensor, is detected its alkali cpd concentration then and gets, so that whether should pour into this additional liquid by its result's decision; For example: patent No. 373237, day disclosure special permission spy in Taiwan opens flat 7-235487 case and uses extinction photometer, and a day disclosure special permission spy drives flat 2003-l31398 case working concentration meter etc.
Since these sensors all be need developing solution to flow through wherein can sensing, therefore along with service time with the passing of time, photoresist in this developing solution or other impurity are gradually on the pipeline attached to these sensors, even formation is blocked, cause these sensors to judge the alkali cpd concentration of this developing solution by accident, make this developing solution can't correctly be maintained at suitable alkali cpd concentration jointly, influence the development effect of follow-up developing solution, and the product yield is very huge.
But, the sensing capability of these sensors, be progressively to worsen down long-time, so staff, the person does not particularly lack experience, exactly so can perceive employed sensor in the very first time can't normal operation, and then may make inappropriate processing procedure crisis and handle strategy, it is very huge to influence manufacturer's cost; Moreover for safeguarding the normal operation of these sensors, manufacturer certainly will regularly send someone to clean or eliminate and change renewal, has so also increased occurrences in human life, man-hour, and the cost of each side such as equipment.
Therefore, the alkali cpd concentration of one reusable developing solution is correctly adjusted,, promoted the subsequent product yield to allow it have best development effect, and can synchronously take its required cost into account, promptly become at present relevant industry and desire most ardently the development part.
Summary of the invention
Therefore, purpose of the present invention is promptly providing a kind of developing solution recovery and treatment method that can reply the development effect of this developing solution effectively, and a kind of developing solution recycling and processing device that can accurately regulate and control alkali cpd concentration in this developing solution.
This developing solution recycling and processing device and recovery and treatment method, mainly be the quantity of the substrate that developed according to this developing solution, adjust the alkali cpd amount that replenishes this developing solution, make the alkali cpd in this developing solution to be maintained at a due debita spissitudo accurately, and exempted in the past the shortcoming that mode produced by sensor detecting.
A kind of developing solution recycling and processing device that the present invention at first provides is to be installed in one to be coated with on the developing apparatus of photoresist with each substrate to be developed in order to operation; This developing apparatus includes one and is arranged at below, this operation unit and is installed in the intercepting basin of the developing solution that contains an alkali cpd in order to the operation unit, that moves each substrate, and be communicated with this intercepting basin and make this developing solution circularly to each substrate with the reflux unit of the photoresist on each substrate of eccysis; It is characterized in that this developing solution recycling and processing device then includes:
One counting unit obtains a count value in order to count the number of substrates through developing;
One supplementary units is to be connected in this liquid collecting to be pickled with grains or in wine, and provides the additional liquid that contains alkali cpd to intercepting basin; And
One control module is to connect to control this counting unit and supplementary units, and is supplied to the amount of intercepting basin according to the additional liquid that contains alkali cpd that this count value is controlled this supplementary units.
Wherein, this supplementary units includes one and has the additional pipeline that the additional liquid that contains alkali cpd, the ccontaining supplemental tank, that should replenish liquid are communicated in this supplemental tank and intercepting basin, reaches a flow valve that is arranged on this additional pipeline with the output quantity of controlling this additional liquid; Wherein, this additional liquid is to be transported in this intercepting basin, and this concentration of replenishing alkali cpd in the liquid is the concentration greater than alkali cpd in the developing solution in this intercepting basin.
Wherein, this control module is to include to select from the following group that constitutes: motor controller, PID controller (
Proportional-Integral-Derivative Controller), the PI controller (
Proportional-Integral controller), and the DCS controller (
Digital Contribution System controller).
Wherein also include one and be arranged under the operation unit of this developing apparatus, for this developing solution by to eliminate the froth breaking unit of its foam.
Wherein, this froth breaking unit is the adsorption material that is arranged at this froth breaking plate for a froth breaking plate and, and this froth breaking plate is one to be formed with the through hole that plural number passes through for this developing solution, and is that the material of acid and alkali-resistance is made.
The filter element that wherein also includes this intercepting basin of connection, it is arranged on the reflux unit of this developing apparatus, flow through for this developing solution and flow back into again in this intercepting basin behind contained photoresist of filtering and the impurity, and make photoresist concentration in this developing solution below 0.001 weight %.
Wherein, this filter element is to include to select certainly in the following group that constitutes: microfiltration membranes, ultra filtration membrane, nanofiltration membrane, reverse osmosis membrane, ion exchange resin tubing string, electric dialysis machine, electrolysis installation, and these combination.
A kind of developing solution recovery and treatment method of the present invention is develop inner and outside enforcement of developing apparatus of each substrate be coated with photoresist of a desire, and it contains an intercepting basin that is installed in the developing solution that contains alkali cpd; It is characterized in that the step that this developing solution recovery and treatment method comprises is:
Counting step: be to count the substrate that had developed, and obtain a count value with a counting unit; And
Replenish step: be to should count value with a control module, contain the supplementary units that alkali cpd replenishes liquid and regulate and control one, make it that this is contained alkali cpd and replenish liquid and moderately provide to this intercepting basin, and keep in this intercepting basin that the concentration of alkali cpd is controlled at a suitable numerical value in the developing solution.
Wherein also comprise a froth breaking step, it is a foam of eliminating this developing solution with a froth breaking unit.
Wherein also comprise a filtration step, it is to filter this developing solution with a filter element, so that its contained photoresist concentration is controlled at below the finite concentration.
Therefore, utilize developing solution recovery and treatment method proposed by the invention or developing solution recycling and processing device, can be under the setting of no sensor, accurately the concentration with alkali cpd in the developing solution is maintained at a suitable numerical value, and effects such as every cost of reduction and lifting product dose rate are also arranged simultaneously.
Description of drawings
For further specifying concrete technology contents of the present invention, below in conjunction with embodiment and accompanying drawing describes in detail as after, wherein:
Fig. 1 is a synoptic diagram, and the relative position relation of each set in the preferred embodiment of developing solution recycling and processing device of the present invention member is described; And
Fig. 2 is a synoptic diagram, and the relative position relation of each member of froth breaking unit in this preferred embodiment is described, each roller bearing that wherein is arranged between two roller bearings is to be removed temporarily.
Concrete Real executes mode
Deficiency based on aforementioned known techniques, the applicant is developed and a kind of developing solution recovery and treatment method, it is to implement in a desire is developed the developing apparatus of each substrate be coated with photoresist, and this developing apparatus then contains an intercepting basin that is installed in the developing solution that contains alkali cpd; And the step that this developing solution recovery and treatment method comprises is a counting step, and a replenish step.
This counting step is to count the substrate that had developed with a counting unit, and obtains a count value.This replenish step is to should count value with a control module, contain the supplementary units that alkali cpd replenishes liquid and regulate and control one, make it that this is contained alkali cpd and replenish liquid and moderately provide to this intercepting basin, and keep in this intercepting basin that the concentration of alkali cpd is controlled at a suitable numerical value in the developing solution.
Preferably, this method also includes a froth breaking step, and it is a foam of eliminating this developing solution with a froth breaking unit; And, will help each substrate to be moved more swimmingly by this froth breaking step.
Preferably, this method also includes a filtration step, and it is to filter this developing solution with a filter element, so that its contained photoresist concentration is controlled at below the finite concentration, and can delay the degradation phenomena of this developing solution, increases serviceable life.This filtration step also can be contained within the developing solution recovery and treatment method of the present invention together with this froth breaking step 1.
What deserves to be mentioned is that the froth breaking step and the filtration step of this method are distinctly with respect to this counting step and replenish step and synchronously independent enforcement, and therefore do not have the restriction on the execution sequence.
Because this developing solution recovery and treatment method, be correspondence to implement by this developing solution recycling and processing device, so relevant for the follow-up required counting unit of this method, supplementary units, the control module preferably implemented, and the preferable or better aspect of the associated components of froth breaking unit, filter element etc. and its etc., then illustrate by following this developing solution recycling and processing device.
The developing solution recycling and processing device that the present invention at first proposes is to design according to the creation spirit of this developing solution recovery and treatment method, and it is to be installed in one to be coated with on the developing apparatus of photoresist with each substrate to be developed in order to operation.
This developing apparatus includes one and is arranged at below, this operation unit and is installed in the intercepting basin of the developing solution that contains an alkali cpd in order to the operation unit, that moves each substrate, and be communicated with this intercepting basin and make this developing solution circularly to each substrate with the reflux unit of the photoresist on each substrate of eccysis.
Developing solution recycling and processing device of the present invention then is to include a counting unit, a supplementary units, and a control module.This counting unit is in order to the number of substrates of counting through developing, and obtains a count value.This supplementary units is to be connected in this liquid collecting to be pickled with grains or in wine, and provides the additional liquid that contains alkali cpd to intercepting basin.This control module is to connect to control this counting unit and supplementary units, and the additional liquid that contains alkali cpd of controlling this supplementary units according to this count value is supplied to the amount in this intercepting basin.
Preferably, this supplementary units includes one and has the additional pipeline that the additional liquid that contains alkali cpd, the ccontaining supplemental tank, that should replenish liquid are communicated in this supplemental tank and intercepting basin, reaches a flow valve that is arranged on this additional pipeline with the output quantity of controlling this additional liquid; Wherein, this additional liquid is to be transported in this intercepting basin, and this concentration of replenishing alkali cpd in the liquid is the concentration greater than alkali cpd in the developing solution in this intercepting basin.And in this, more preferably, the concentration that should replenish alkali cpd in the liquid of this supplementary units is 10～80 weight %.In a preferred embodiment of the present invention, the alkali cpd concentration of the additional liquid of this supplementary units is about 25 weight %; In addition, the concentration of alkali cpd is below the 2.5 weight % in the interior developing solution of this intercepting basin.
Preferably, this control module is to include to select certainly in the following group that constitutes: motor controller, PID controller, PI controller, and DCS (DigitalContribution System) controller; In a specific example of the present invention, this control module is to include motor controller, and also includes a liquid level detecting device in order to the liquid level of monitoring developing solution in this intercepting basin.
Preferably, this device also includes a froth breaking unit, and it is arranged under the operation unit of this developing apparatus, for this developing solution by to eliminate its foam.More preferably, this froth breaking unit is the adsorption material that is arranged at this froth breaking plate for a froth breaking plate and, and this froth breaking plate is one to be formed with the through hole that plural number passes through for this developing solution, and is that the material of acid and alkali-resistance is made.In a specific example of the present invention, the material of this acid and alkali-resistance is to be PVC, and this adsorption material is to be adhesive-bonded fabric; Optionally, it can be the aspect of single or multiple lift.
Preferably, this device also includes a filter element, it is to connect this intercepting basin, and be arranged on the reflux unit of this developing apparatus, flow through for this developing solution and flow back to again in this intercepting basin behind contained photoresist of filtering and the impurity, and make photoresist concentration in this developing solution below 0.001 weight %; More preferably, this filter element is to include to select certainly in the following group that constitutes: microfiltration membranes (microfiltration membranes; Abbreviation MF), ultra filtration membrane (ultrafiltration membrane; Abbreviation UF), nanofiltration membrane (monolayernanofiltration membrane; Be called for short NF), reverse osmosis membrane (reverseosmosis is called for short RO), ion exchange resin tubing string (ion exchangetreatment is called for short IE), electric dialysis machine (electrodialysis is called for short ED), electrolysis installation (electrolysis), and these combination.
The above-described parts that are included in this filter element are to be able to adjust it according to operator's demand put in order.In addition, optionally, this microfiltration membranes, ultra filtration membrane, nanofiltration membrane, and reverse osmosis membrane etc. are the aspects that can be single or multiple lift, and its shape does not also limit especially, and can be flat membranaceous, hollow wire etc.; And ion exchange resin tubing string, electric dialysis machine, electrolysis installation etc. are to can be expression of first degree or quadratic aspect.
Employed alkali cpd in this developing solution is the photoresist composition that cooperates institute's desire effect, and selects to use; Illustrate it with regard to the present invention, this alkali cpd is to be TMAH; For having good development effect, preferably, the debita spissitudo of the alkali cpd of this developing solution is about below the 2.5 weight %; More preferably, be between 2.3～2.4 weight %; Best, be to be about 2.38 weight %.And, debita spissitudo is separately arranged then, but all can be and regulated and control by the inventive method and device with regard to other alkali cpd.
Below will further specify the present invention with a preferred embodiment, only this embodiment only is the usefulness that illustrates, but not in order to restriction the present invention.
Embodiment
Developing solution recovery and treatment method of the present invention, be in as shown in Figure 1 a developing apparatus 1, implemented by installing developing solution recycling and processing device thereon, the step that it comprised is: counting step, replenish step, froth breaking step, and filtration step.This developing solution recycling and processing device then comprises, one in order to carry out this counting step and obtain the counting unit 2 of a count value, in order to the control module 3 that carries out this replenish step and supplementary units 4, one in order to carrying out the froth breaking unit 5 of this froth breaking step, and a filter element 6 in order to carry out this filtration step.Wherein, this control module 3 is to should count value and regulate and control this supplementary units 4; This froth breaking step is to eliminate the foam that is produced in the developing process; This filtration step then is the photoresist in the filtering developing solution.
This developing apparatus 1 includes the development treatment chamber 11 of carrying out the development treatment program, and is arranged at these 13 belows, operation unit and is installed in the intercepting basin 15 of the developing solution 14 that contains TMAH in order to the operation unit 13, that moves each substrate 12, and one is communicated with the reflux unit 16 that this developing solution 14 is carried in this intercepting basin 15 and circulation.
Wherein, this moves unit 13, is to include most mutually side by side and with the roller bearing 131 of equidirectional lift-over, each substrate 12 is positioned on these roller bearings 131, and passes in and out this development treatment chamber 11; The TMAH concentration of this developing solution 14 is about 2.38%, and desires to be maintained at this concentration; The bottom of this intercepting basin 15 is to offer an able to turn on or off leakage fluid dram 151, receives or gets rid of developing solution 14 in it to hold, and is convenient to upgrade; In this, the set-up mode of relevant exhaust system is then known and non-this case emphasis by relevant dealer, will not give unnecessary details also and wouldn't represent in this.16 of this reflux units are to include a development pipeline group 161 and a filter pipeline group 162.This development pipeline group 161 all is the root edge that is opened in this intercepting basin 15 with an end of filter pipeline group 162, and wherein, the other end of this development pipeline group 161 then is the place, top that is arranged at these substrates 12, and forms a sprinkler head 163; The other end of this filter pipeline group 162 then is to be communicated in this intercepting basin 15.
Each substrate 12 is before entering this development treatment chamber 11, and its surface is to be coated with to finish exposure-processed, and is divided into the photoresist 121 of desire removal and the photoresist 122 that desire keeps.When a substrate 12 outside this development treatment chamber 11, when being moved to sprinkler head 163 belows that spray developing solution 14,121 of photoresists that this desire is removed are by this developing solution 14 and eccysis, and reach the purpose of development; Afterwards, this developing solution 14 will be dissolved with the photoresist 121 of this desire removal and fall after rise to this intercepting basin 15 along with gravity.
This counting unit 2 is to obtain a count value in order to the quantity of the substrate 12 of counting through developing, and in this, this counting unit 2 is to count meter for a photometry.This control module 3 is to include a motor controller 31, and one in order to knowing the liquid level of developing solution 14 in this intercepting basin 15, and connects the liquid level detecting device of controlling in this motor controller 31 32.
This supplementary units 4 includes one and has the additional pipeline 43 that the ccontaining supplemental tank 42, that should replenish liquid 41 of additional liquid 41, one of TMAH that is about the concentration of 25 weight % is communicated in this supplemental tank 42 and intercepting basin 15, and a flow valve 44 that is arranged on this additional pipeline 43 with the output quantity of controlling this additional liquid 41; Wherein, this additional liquid 41 is to be transported in this intercepting basin 15 via this additional pipeline 43.
This motor controller 31 is to connect to control in this counting unit 2 and flow valve 44, to control the keying degree of this flow valve 44 according to this count value; Thus, this additional liquid 41 will be along with the level gauging of this count value and this liquid level detecting device 32, and is provided in right amount in this intercepting basin 15.
Referring to Fig. 1, Fig. 2, this froth breaking unit 5 is to include the plural froth breaking plate of installing abreast along this operation unit 13 thereunder 51, and is arranged at the adsorption material 52 of these froth breaking plate 51 belows.Each froth breaking plate 51 is one to be formed with the through hole 511 that plural number passes through for this developing solution 14, and is the made plate body of material of acid and alkali-resistance; 52 of this adsorption material are adhesive-bonded fabric.
Because in developing process, when this developing solution 14 dissolves and washes away photoresist repeatedly, will follow and collect the interface activating agent that it contained, and because of spraying the stressed increasing foam that produces repeatedly, and foam can remain on this operation unit 13 successively, little by little allow the friction force deficiency of each substrate 12 of being transferred and these roller bearing 131 surface of contact, make substrate 12 successfully to be moved.And by the setting of this froth breaking unit 5, can in this developing solution 14 by the time, absorption wherein the interface activating agent and eliminate foam, with the negative effect that it was produced of releiving.
Referring to Fig. 1, this filter element 6 is the impurity of filter collection can be got rid of, it is arranged on this filter pipeline group 162, flow through and flow back to again in this intercepting basin 15 behind the contained photoresist 121 of filtering for this developing solution 14, and allow photoresist 121 concentration in this developing solution 14 below 0.001 weight %.This filter element 6 is to include the ultra filtration membrane 61 that passes through in regular turn for this developing solution 14, TMAH can be electrolyzed to produce tetramethyl ammonium (TAA
+) and hydroxide ion (OH
-) electric dialysis machine or electrolysis installation 62, and the ion exchange resin tubing string 63 of adsorbable photoresist composition; By various assembly in order to filtration and purifying, can positively photoresist 121 concentration in this developing solution 14 be controlled at below the 0.001 weight %, effectively delay the degradation of this developing solution 14.
Manufacturer can according to its separately the processing procedure experience and set this motor controller 31, only exemplify unrestricted dual mode in this for explanation, decide the opportunity and the opening degree that open and close this flow valve 44:
1, measures in advance the photoresist 121 that desire is removed on the substrate 12 of the some same specifications that develop and understand the TMAH amount that consumes, and calculate an average plate base 12 required additional liquid 41 that are supplied in this intercepting basin 15 that develop and measure a;
2, set this motor controller 31, it is connected controls in this flow valve 44, replenish liquid 41 amount a and be able to once provide by a slice, or the multi-disc batch type process of (for example develop 300 then provide replenish liquid 41 amount 300a) once, this intercepting basin 15 is added liquid 41 amounts of replenishing.
Moreover, carrying out above-mentioned TMAH when replenishing, this froth breaking unit 5 also synchronously carries out froth breaking step and filtration step with filter element 6, make that this control module 3 and supplementary units 4 can be merely according to the substrate film numbers that has developed, the additional liquid that scheduled volume is provided and allows the TMAH of this developing solution 14 be maintained at the concentration of 2.38 weight % in this intercepting basin 15.
Therefore, developing solution 14 in the intercepting basin 15 in this developing apparatus 1, to be docile and obedient this reflux unit 16 and be transferred, the filter element 6 that also synchronously passes through developing solution recycling and processing device of the present invention in addition is with after filtering out photoresist 121 and other impurity residue wherein, then after being transported to the place, top of each substrate 12 to be developed, flow out this sprinkler head 163 and spill in these substrates 12, dissolve and wash away the photoresist 121 that the desire on it is removed, leave over the photoresist 122 that is formed with specific collection of illustrative plates to dash.Afterwards, this developing solution 14 will be recovered in this intercepting basin 15 then by this froth breaking unit 5 to eliminate foam.
And see through the measured count value of this counting unit 2, and the online control of motor controller 31, this flow valve 44 is opened and closed according to this count value in good time and moderately, to carry an amount of additional liquid 41 to this intercepting basin 15, and because this filter element 6 with photoresist 121 and other Impurity removal, be to be able to the count value that merely obtained with regard to this counting unit 2 with this control module 3 and supplementary units 4, and regulation and control desire to provide magnitude of recruitment to this supplemental tank 15, make that TMAH is maintained at this debita spissitudo in this developing solution 14.
By above explanation, the present invention is by substrate 12 quantity of counting through developing as can be known, decide the start opportunity and the keying degree of flow valve 44 in this supplementary units 4, thus an amount of additional liquid 41 is provided to this intercepting basin 15, so that the TMAH in the developing solution 14 wherein maintains 2.38 weight %.Other cooperates the setting of froth breaking unit 5 and filter element 6, can make these substrates 12 more smooth and easy by operation ground, and the impurity in this developing solution 14 of filtering synchronously, so except can controlling the concentration of TMAH in this developing solution accurately, and have the deterioration rate that can delay this developing solution 14, the relevant cost load that increases pot life, enhancement operation fluency, reduction manufacturer, promote advantages such as the follow-up yield of product.
Only above-described, it only is preferred embodiment of the present invention, when can not limiting scope of the invention process with this, promptly every simple equivalent of being done according to the present patent application claim and invention description content changes and modifies, and all still belongs in the scope that patent of the present invention contains.
Claims (10)
1. developing solution recycling and processing device is to be installed in one to be coated with on the developing apparatus of photoresist with each substrate to be developed in order to operation; This developing apparatus includes one and is arranged at below, this operation unit and is installed in the intercepting basin of the developing solution that contains an alkali cpd in order to the operation unit, that moves each substrate, and be communicated with this intercepting basin and make this developing solution circularly to each substrate with the reflux unit of the photoresist on each substrate of eccysis; It is characterized in that this developing solution recycling and processing device then includes:
One counting unit obtains a count value in order to count the number of substrates through developing;
One supplementary units is to be connected in this liquid collecting to be pickled with grains or in wine, and provides one to contain the additional liquid of alkali cpd to this intercepting basin; And
One control module is to connect to control this counting unit and this supplementary units, and is supplied to the amount of this intercepting basin according to this additional liquid that contains alkali cpd that this count value is controlled this supplementary units.
2. according to claim 1 a described developing solution recycling and processing device, it is characterized in that, wherein, this supplementary units comprise have this additional liquid that contains alkali cpd, the ccontaining supplemental tank, that should replenish liquid is communicated in one of this supplemental tank and this intercepting basin and replenishes pipeline, reaches a flow valve that is arranged on this additional pipeline with the output quantity of controlling this additional liquid; Wherein, this additional liquid is to be transported in this intercepting basin, and this concentration of replenishing alkali cpd in the liquid is the concentration greater than alkali cpd in the developing solution in this intercepting basin.
3. according to claim 1 a described developing solution recycling and processing device, it is characterized in that wherein, this control module is to include to select certainly in the following group that constitutes: motor controller, PID controller, PI controller, and DCS controller.
4. according to claim 1 a described developing solution recycling and processing device, it is characterized in that, wherein also include an operation unit below that is arranged on this developing apparatus, for this developing solution by to eliminate the froth breaking unit of its foam.
5. according to claim 4 a described developing solution recycling and processing device, it is characterized in that, wherein, this froth breaking unit is an adsorption material that is arranged at this froth breaking plate for a froth breaking plate and, this froth breaking plate is one to be formed with the through hole that plural number passes through for this developing solution, and is that the material of acid and alkali-resistance is made.
6. according to claim 1 a described developing solution recycling and processing device, it is characterized in that, a filter element that wherein also includes this intercepting basin of connection, it is arranged on the The reflux unit of this developing apparatus, flow through for this developing solution and flow back into again in this intercepting basin behind contained photoresist of filtering and the impurity, and make photoresist concentration in this developing solution below 0.001 weight %.
7. according to claim 6 a described developing solution recycling and processing device, it is characterized in that, wherein, this filter element is to include to select certainly in the following group that constitutes: microfiltration membranes, ultra filtration membrane, nanofiltration membrane, reverse osmosis membrane, ion exchange resin tubing string, electric dialysis machine, electrolysis installation, and these combination.
8. developing solution recovery and treatment method is develop inner and outside enforcement of developing apparatus of each substrate of being coated with photoresist of a desire, and it contains an intercepting basin that is installed in the developing solution that contains alkali cpd; It is characterized in that the step that this developing solution recovery and treatment method comprises is:
One counting step: be to count the substrate that had developed, and obtain a count value with a counting unit; And
One replenish step: be to should count value with a control module, contain the supplementary units that alkali cpd replenishes liquid and regulate and control one, make it that this is contained alkali cpd and replenish liquid and moderately provide to this intercepting basin, and keep in this intercepting basin that the concentration of alkali cpd is controlled at below the 2.5 weight % in the developing solution.
9. according to claim 8 a described developing solution recovery and treatment method, it is characterized in that, wherein also comprise a froth breaking step, it is a foam of eliminating this developing solution with a froth breaking unit.
10. according to claim 8 a described developing solution recovery and treatment method, it is characterized in that wherein also comprise a filtration step, it is to filter this developing solution with a filter element, so that its contained photoresist concentration is controlled at below the 0.0O1 weight %.
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| CN 200510135206 CN1991594A (en) | 2005-12-27 | 2005-12-27 | Method and device for developing solution recovery treatment |
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| CN 200510135206 CN1991594A (en) | 2005-12-27 | 2005-12-27 | Method and device for developing solution recovery treatment |
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| CN1991594A true CN1991594A (en) | 2007-07-04 |
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| CN 200510135206 Pending CN1991594A (en) | 2005-12-27 | 2005-12-27 | Method and device for developing solution recovery treatment |
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| CN (1) | CN1991594A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101122751B (en) * | 2007-08-31 | 2012-02-01 | 友达光电股份有限公司 | Liquid reclamation device for developing machine platform and the developing machine platform comprising same |
| CN103197515A (en) * | 2013-04-18 | 2013-07-10 | 合肥格林达电子材料有限公司 | Preparation method of photoetching developing liquid |
| CN106310723A (en) * | 2015-06-30 | 2017-01-11 | 细美事有限公司 | Bubble removing unit and substrate treating apparatus including the same |
| CN107552254A (en) * | 2017-08-08 | 2018-01-09 | 武汉华星光电半导体显示技术有限公司 | A kind of developing apparatus and developing method |
| CN108267937A (en) * | 2018-02-07 | 2018-07-10 | 武汉华星光电技术有限公司 | Solution recovery device and process equipment |
| WO2019080164A1 (en) * | 2017-10-27 | 2019-05-02 | 武汉华星光电技术有限公司 | Cleaning liquid filtering device and method for use in linear coater, and linear coater |
| CN111258192A (en) * | 2020-02-11 | 2020-06-09 | Tcl华星光电技术有限公司 | Photoresist stripping device and photoresist stripping method |
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2005
- 2005-12-27 CN CN 200510135206 patent/CN1991594A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101122751B (en) * | 2007-08-31 | 2012-02-01 | 友达光电股份有限公司 | Liquid reclamation device for developing machine platform and the developing machine platform comprising same |
| CN103197515A (en) * | 2013-04-18 | 2013-07-10 | 合肥格林达电子材料有限公司 | Preparation method of photoetching developing liquid |
| CN106310723A (en) * | 2015-06-30 | 2017-01-11 | 细美事有限公司 | Bubble removing unit and substrate treating apparatus including the same |
| US10166492B2 (en) | 2015-06-30 | 2019-01-01 | Semes Co., Ltd. | Bubble removing unit and substrate treating apparatus including the same |
| CN107552254A (en) * | 2017-08-08 | 2018-01-09 | 武汉华星光电半导体显示技术有限公司 | A kind of developing apparatus and developing method |
| WO2019080164A1 (en) * | 2017-10-27 | 2019-05-02 | 武汉华星光电技术有限公司 | Cleaning liquid filtering device and method for use in linear coater, and linear coater |
| US20200030723A1 (en) * | 2017-10-27 | 2020-01-30 | WUHAN CHINA STAR OPTOELECTRONICSTECHNOLOGY Co.,Ltd. | Cleaning solution filter for linear coater, method for filtering cleaning solution and linear coater |
| CN108267937A (en) * | 2018-02-07 | 2018-07-10 | 武汉华星光电技术有限公司 | Solution recovery device and process equipment |
| CN111258192A (en) * | 2020-02-11 | 2020-06-09 | Tcl华星光电技术有限公司 | Photoresist stripping device and photoresist stripping method |
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