CN1974873A - Fast stable growth process of alumina film with nanometer pore array in relatively great pore distance - Google Patents

Fast stable growth process of alumina film with nanometer pore array in relatively great pore distance Download PDF

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CN1974873A
CN1974873A CN 200610118666 CN200610118666A CN1974873A CN 1974873 A CN1974873 A CN 1974873A CN 200610118666 CN200610118666 CN 200610118666 CN 200610118666 A CN200610118666 A CN 200610118666A CN 1974873 A CN1974873 A CN 1974873A
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growth process
stable growth
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郑茂俊
李严波
马荔
沈文忠
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Shanghai Jiao Tong University
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Abstract

一种纳米材料技术领域的较大孔间距的氧化铝纳米孔阵列膜的快速稳定生长方法。步骤为:第一,配制磷酸-水-乙醇电解液:其中H2O和C2H5OH体积比为4∶1,H3PO4浓度为0.25-0.5mol/L,电解液总体积为2L;第二,铝片预处理:将圆形铝片放入丙酮中浸泡,擦拭干净,并用去离子水冲洗,使用高氯酸和乙醇混合溶液在恒压条件下电化学抛光;第三,使用低温恒温槽将电解液温度降至-5~-10℃温度,并对电解液进行搅拌,在阳极氧化电压为195V、电流密度为1500-4000Am-2的条件下对铝片进行一次腐蚀;第四,将一次腐蚀后的样品在铬酸混合水溶液中浸泡,温度保持在60℃,以去除一次腐蚀产生的氧化铝;第五,在与第三步相同的条件下对样品进行二次腐蚀。The invention relates to a rapid and stable growth method of an aluminum oxide nano-hole array membrane with relatively large hole spacing in the technical field of nanometer materials. The steps are: first, prepare the phosphoric acid-water-ethanol electrolyte: the volume ratio of H 2 O and C 2 H 5 OH is 4:1, the concentration of H 3 PO 4 is 0.25-0.5 mol/L, and the total volume of the electrolyte is 2L; second, aluminum sheet pretreatment: soak the round aluminum sheet in acetone, wipe it clean, rinse it with deionized water, and use a mixed solution of perchloric acid and ethanol to electrochemically polish it under constant pressure; third, Use a low-temperature constant temperature bath to reduce the temperature of the electrolyte to -5 to -10°C, and stir the electrolyte, and perform primary corrosion on the aluminum sheet under the conditions of an anodic oxidation voltage of 195V and a current density of 1500-4000Am -2 ; Fourth, soak the sample after the primary corrosion in the mixed aqueous solution of chromic acid, and keep the temperature at 60 ° C to remove the alumina produced by the primary corrosion; fifth, perform secondary corrosion on the sample under the same conditions as the third step .

Description

较大孔间距的氧化铝纳米孔阵列膜的快速稳定生长方法Rapid and Stable Growth Method of Aluminum Oxide Nanopore Array Membrane with Large Pore Spacing

技术领域technical field

本发明是一种纳米材料技术领域的制备方法,具体说,涉及的是一种较大孔间距的氧化铝纳米孔阵列膜的快速稳定生长方法。The invention relates to a preparation method in the technical field of nanomaterials, in particular to a method for rapidly and stably growing an aluminum oxide nanohole array membrane with relatively large pore spacing.

背景技术Background technique

采用阳极腐蚀技术所合成氧化铝膜由于在金属防腐保护,金属着色,金属强度设计等方面有着重要的应用,有关膜的结构设计,其合成的工艺研究已引起人们越来越多的关注和兴趣。从1953年美国铝制备公司铝研究实验室的工作直到90年代中期,从事这方面工作研究人员所研究体系主要是致密型氧化铝膜和无序多孔型氧化铝膜。1995年,日本京都大学化学系H.Masuda等在Science杂志上首次报道了合成出Al2O3有序纳米孔阵列膜。氧化铝有序纳米孔阵列膜由于其独特的有序结构以及简单廉价的制作方法,使其在很多领域有着独特和广泛的应用前景(例如,磁存储器,太阳能电池,光子晶体等),因而引起科学家们的极大兴趣和高度关注。The aluminum oxide film synthesized by anodic corrosion technology has important applications in metal anti-corrosion protection, metal coloring, metal strength design, etc. The research on the structure design of the film and its synthesis process has attracted more and more attention and interest. . From 1953 to the work of the Aluminum Research Laboratory of the American Aluminum Preparation Company until the mid-1990s, the research systems of the researchers engaged in this work were mainly dense alumina membranes and disordered porous alumina membranes. In 1995, H. Masuda, Department of Chemistry, Kyoto University, Japan reported for the first time the synthesis of an Al 2 O 3 ordered nanopore array membrane in the journal Science. Due to its unique ordered structure and simple and cheap fabrication method, alumina ordered nanopore array film has unique and wide application prospects in many fields (for example, magnetic memory, solar cells, photonic crystals, etc.), thus causing Great interest and high attention of scientists.

利用草酸和硫酸电解液只可获得孔间距小于100nm的氧化铝有序纳米孔阵列膜,限制了氧化铝有序纳米孔阵列膜在一些领域的应用。因而开发较大孔间距(几百nm以上)的氧化铝纳米孔阵列膜受到人们的高度关注。一些实验结果表明,利用磷酸电解液可实现制备较大孔间距(几百nm)的氧化铝有序孔阵列膜,但由于在磷酸电解液中进行阳极氧化,要求的反应电压很高(195V),铝片在电解液中被氧化的反应非常剧烈,发热量很大且很快,导致实验不能稳定持续进行,不能获得高质量氧化铝纳米孔阵列膜。所以为了保证溶液恒温、铝片表面很快散热,实验中都要求必须使用迅速散热技术,反应溶液温度要求较低(0℃)。但传统的方法下,为了实现氧化铝纳米孔阵列膜的稳定生长,都保持在一个非常低的生长速率(小于200nm min-1)条件下,并且为了获得高质量的较大孔间距(几百nm)的氧化铝纳米孔阵列膜所需的生长时间很长(大于10小时以上)。The use of oxalic acid and sulfuric acid electrolytes can only obtain alumina ordered nanopore array membranes with a pore spacing of less than 100 nm, which limits the application of alumina ordered nanopore array membranes in some fields. Therefore, the development of aluminum oxide nanoporous array membranes with larger pore spacing (above hundreds of nm) has attracted people's attention. Some experimental results show that the aluminum oxide ordered pore array membrane with large pore spacing (hundreds of nm) can be prepared by using phosphoric acid electrolyte, but due to the anodic oxidation in phosphoric acid electrolyte, the required reaction voltage is very high (195V). , the oxidation reaction of the aluminum sheet in the electrolyte is very violent, and the heat is very large and very fast, which leads to the inability to carry out the experiment stably and continuously, and the high-quality aluminum oxide nanoporous array membrane cannot be obtained. Therefore, in order to ensure the constant temperature of the solution and the rapid heat dissipation on the surface of the aluminum sheet, the rapid heat dissipation technology must be used in the experiment, and the temperature of the reaction solution is required to be low (0°C). However, in the traditional method, in order to realize the stable growth of the aluminum oxide nanopore array film, it is kept at a very low growth rate (less than 200nm min -1 ), and in order to obtain high-quality larger pore spacing (hundreds of nm) The growth time required for the aluminum oxide nanopore array film is very long (more than 10 hours).

经对现有技术的文献检索发现,Sachiko Ono等在Electrochemical andSolid-State Letters(电化学和固态快报,2004年,第7期,第B21-B24页)上发表的“Self-Ordering of Anodic Porous Alumina Induced by Local CurrentConcentration:Burning”(局部电流汇集诱导的阳极多孔氧化铝的自有序:烧蚀),该文中提出高的电流密度、亦即高电场是影响孔排列有序性最重要的因素,采用195V的阳极氧化电压,在0.2mol/L的磷酸溶液中进行电解,在发生烧蚀的区域周围观察到了较为有序的孔排列。其不足在于:由于烧蚀现象,膜不能稳定生长,影响了多孔氧化铝膜的整体质量。Found through literature search to prior art, "Self-Ordering of Anodic Porous Alumina" published by Sachiko Ono etc. on Electrochemical and Solid-State Letters (Electrochemical and Solid State Letters, 2004, No. 7, page B21-B24) Induced by Local Current Concentration: Burning" (self-ordering of anodic porous alumina induced by local current concentration: ablation), the paper proposes that high current density, that is, high electric field is the most important factor affecting the order of the pores. Using an anodic oxidation voltage of 195V, the electrolysis was carried out in 0.2mol/L phosphoric acid solution, and a more orderly arrangement of pores was observed around the ablated area. The disadvantage is that due to the ablation phenomenon, the film cannot grow stably, which affects the overall quality of the porous alumina film.

发明内容Contents of the invention

针对现有技术中存在的不足和缺陷,本发明提供一种较大孔间距的氧化铝纳米孔阵列膜的快速稳定生长方法。本发明通过向电解液中添加乙醇以降低其凝固点,使电解液温度降至零下十度而不结冰。所添加的乙醇不仅可以降低电解液凝固点,而且可以作为散热剂带走氧化铝膜生长过程中产生的大量热量。在此低温的环境下借助常规搅拌装置,实现高场下(1500-4000A m-2)阳极氧化铝膜的快速、稳定的生长。Aiming at the deficiencies and defects in the prior art, the invention provides a method for rapid and stable growth of aluminum oxide nano-hole array membranes with relatively large hole spacing. In the invention, ethanol is added to the electrolytic solution to lower its freezing point, so that the temperature of the electrolytic solution is reduced to ten degrees below zero without freezing. The added ethanol can not only reduce the freezing point of the electrolyte, but also act as a cooling agent to take away a large amount of heat generated during the growth of the aluminum oxide film. In this low temperature environment, the rapid and stable growth of the anodic aluminum oxide film under high field (1500-4000A m -2 ) is realized by means of a conventional stirring device.

本发明是通过以下技术方案实现的,具体步骤为:The present invention is realized through the following technical solutions, and the concrete steps are:

第一,配制磷酸-水-乙醇电解液:其中H2O和C2H5OH体积比为4∶1,H3PO4浓度为0.25-0.5mol/L,电解液总体积为2L;First, prepare the phosphoric acid-water-ethanol electrolyte: the volume ratio of H 2 O and C 2 H 5 OH is 4:1, the concentration of H 3 PO 4 is 0.25-0.5mol/L, and the total volume of the electrolyte is 2L;

第二,铝片预处理:将直径为2cm的圆形铝片(纯度大于等于99.999%)放入丙酮中浸泡20分钟,用棉球将其表面擦拭干净,并用去离子水冲洗,使用体积比为1∶4的高氯酸和乙醇混合溶液在恒压条件下电化学抛光;Second, aluminum sheet pretreatment: soak a circular aluminum sheet with a diameter of 2 cm (purity greater than or equal to 99.999%) in acetone for 20 minutes, wipe the surface with a cotton ball, and rinse it with deionized water. Electrochemical polishing of a 1:4 mixed solution of perchloric acid and ethanol under constant pressure;

第三,使用低温恒温槽将电解液温度降至-5~-10℃温度,并对电解液进行搅拌,在阳极氧化电压为195V、电流密度为1500-4000Am-2的条件下对铝片进行一次腐蚀若干分钟;Third, use a low-temperature constant temperature tank to lower the temperature of the electrolyte to -5 to -10°C, and stir the electrolyte. Under the conditions of an anodic oxidation voltage of 195V and a current density of 1500-4000Am -2 , the aluminum sheet is corrode for several minutes at a time;

第四,将一次腐蚀后的样品在温度为60℃的磷酸(6wt.%)和铬酸(1.8wt.%)混合水溶液中浸泡若干小时,以去除一次腐蚀产生的氧化铝;Fourth, soak the sample after the primary corrosion in a mixed aqueous solution of phosphoric acid (6wt.%) and chromic acid (1.8wt.%) at a temperature of 60°C for several hours to remove the alumina produced by the primary corrosion;

第五,在与第三步相同的条件下对样品进行二次腐蚀,腐蚀时间在十分钟之内。Fifth, the sample is subjected to secondary corrosion under the same conditions as in the third step, and the corrosion time is within ten minutes.

采用本发明制备的多孔阳极氧化铝,具有稳定快速生长(4-10μm min-1)、孔径均匀和孔有序排列程度高等优点。与传统方法相比,本发明将制备多孔阳极氧化铝膜的效率提高了近100倍,且制备过程中不会发生烧蚀现象,膜生长十分稳定,孔径均匀性和孔排列有序度也得到大大提高。更重要的是,在保持195V的阳极氧化电压下,通过调节磷酸浓度、电解液温度、阳极与阴极的面积比等条件可获得不同的阳极氧化电流密度(1500-4000A m-2),进而获得不同孔间距(320-380nm)的多孔阳极氧化铝膜。这为获得孔间距可任意调控的多孔阳极氧化铝膜提供了一种有效的方法。The porous anodized aluminum prepared by the invention has the advantages of stable and rapid growth (4-10 μm min -1 ), uniform pore size and high orderly arrangement of pores. Compared with the traditional method, the present invention increases the efficiency of preparing porous anodic aluminum oxide membrane by nearly 100 times, and no ablation phenomenon occurs during the preparation process, the membrane growth is very stable, and the pore size uniformity and pore arrangement order are also improved. Greatly improve. More importantly, at an anodic oxidation voltage of 195V, different anodic oxidation current densities (1500-4000A m -2 ) can be obtained by adjusting phosphoric acid concentration, electrolyte temperature, area ratio of anode and cathode, etc., and then obtained Porous anodized aluminum oxide membranes with different pore spacing (320-380nm). This provides an effective method for obtaining porous anodized aluminum oxide membranes with freely adjustable pore spacing.

具体实施方式Detailed ways

下面对本发明的实施例作详细说明:本实施例在以本发明技术方案为前提下进行实施,给出了详细的实施方式和过程,但本发明的保护范围不限于下述的实施例。The embodiments of the present invention are described in detail below: this embodiment is implemented under the premise of the technical solution of the present invention, and detailed implementation methods and processes are provided, but the protection scope of the present invention is not limited to the following embodiments.

实施例1Example 1

电解液由H2O、C2H5OH和H3PO4配制而成,其中H2O和C2H5OH体积比为4∶1,H3PO4含量为0.25mol/L,电解液总体积为2L。将直径为2cm的圆形铝片(纯度大于等于99.999%)放入丙酮中浸泡20分钟,用棉球将其表面擦拭干净,并用去离子水冲洗,使用体积比为1∶4的高氯酸和乙醇混合溶液在恒压条件下电化学抛光。使用低温恒温槽将电解液温度降至-5℃,借助常规的搅拌手段将铝片在阳极电压为195V、电流密度为1500mA/m2的条件下一次腐蚀5分钟。将一次腐蚀后的样品在温度为60℃的磷酸(6wt.%)和铬酸(1.8wt.%)混合水溶液中浸泡4小时,以去除一次腐蚀产生的氧化铝。在与一次腐蚀相同的条件下,对样品进行二次腐蚀10分钟。制备出的多孔氧化铝膜,表面结构单元间彼此呈六角密排分布,孔洞分布高度有序,孔径为80nm,孔间距为380nm,阻碍层厚度为150nm,膜厚度约为40μm。The electrolyte is prepared from H 2 O, C 2 H 5 OH and H 3 PO 4 , wherein the volume ratio of H 2 O and C 2 H 5 OH is 4:1, and the content of H 3 PO 4 is 0.25mol/L. The total volume of the solution is 2L. Soak a circular aluminum sheet with a diameter of 2 cm (purity greater than or equal to 99.999%) in acetone for 20 minutes, wipe the surface with a cotton ball, rinse with deionized water, and use perchloric acid with a volume ratio of 1:4 The mixed solution with ethanol was electrochemically polished under constant pressure. Use a low-temperature thermostat to lower the temperature of the electrolyte to -5°C, and corrode the aluminum sheet for 5 minutes at a time under the conditions of an anode voltage of 195V and a current density of 1500mA/ m2 by means of conventional stirring means. The sample after the primary corrosion was immersed in a mixed aqueous solution of phosphoric acid (6wt.%) and chromic acid (1.8wt.%) at a temperature of 60°C for 4 hours to remove the alumina produced by the primary corrosion. Under the same conditions as the primary corrosion, the sample was subjected to secondary corrosion for 10 minutes. The prepared porous alumina membrane has a hexagonal close-packed distribution of surface structural units, highly ordered pore distribution, a pore diameter of 80nm, a pore spacing of 380nm, a barrier layer thickness of 150nm, and a film thickness of about 40μm.

实施例2Example 2

电解液由H2O、C2H5OH和H3PO4配制而成,其中H2O和C2H5OH体积比为4∶1,H3PO4含量为0.3mol/L,电解液总体积为2L。将直径为2cm的圆形铝片(纯度大于等于99.999%)放入丙酮中浸泡20分钟,用棉球将其表面擦拭干净,并用去离子水冲洗,使用体积比为1∶4的高氯酸和乙醇混合溶液在恒压条件下电化学抛光。使用低温恒温槽将电解液温度降至-6℃,借助常规的搅拌手段将铝片在阳极电压为195V、电流密度为2000mA/m2的条件下一次腐蚀3分钟。将一次腐蚀后的样品在温度为60℃的磷酸(6wt.%)和铬酸(1.8wt.%)混合水溶液中浸泡2小时,以去除一次腐蚀产生的氧化铝。在与一次腐蚀相同的条件下,对样品进行二次腐蚀10分钟。制备出的多孔氧化铝膜,表面结构单元间彼此呈六角密排分布,孔洞分布高度有序,孔径为90nm,孔间距为360nm,阻碍层厚度为140nm,膜厚度约为50μm。The electrolyte is prepared from H 2 O, C 2 H 5 OH and H 3 PO 4 , wherein the volume ratio of H 2 O and C 2 H 5 OH is 4:1, and the content of H 3 PO 4 is 0.3mol/L. The total volume of the solution is 2L. Soak a circular aluminum sheet with a diameter of 2 cm (purity greater than or equal to 99.999%) in acetone for 20 minutes, wipe the surface with a cotton ball, rinse with deionized water, and use perchloric acid with a volume ratio of 1:4 The mixed solution with ethanol was electrochemically polished under constant pressure. Use a low-temperature thermostat to lower the temperature of the electrolyte to -6°C, and corrode the aluminum sheet for 3 minutes at a time under the conditions of an anode voltage of 195V and a current density of 2000mA/ m2 by means of conventional stirring means. The sample after the primary corrosion was soaked in a mixed aqueous solution of phosphoric acid (6wt.%) and chromic acid (1.8wt.%) at a temperature of 60°C for 2 hours to remove the alumina produced by the primary corrosion. Under the same conditions as the primary corrosion, the sample was subjected to secondary corrosion for 10 minutes. The prepared porous alumina membrane has a hexagonal close-packed distribution of surface structural units, highly ordered pore distribution, a pore diameter of 90nm, a pore spacing of 360nm, a barrier layer thickness of 140nm, and a film thickness of about 50μm.

实施例3Example 3

电解液由H2O、C2H5OH和H3PO4配制而成,其中H2O和C2H5OH体积比为4∶1,H3PO4含量为0.5mol/L,电解液总体积为2L。将直径为2cm的圆形铝片(纯度大于等于99.999%)放入丙酮中浸泡20分钟,用棉球将其表面擦拭干净,并用去离子水冲洗,使用体积比为1∶4的高氯酸和乙醇混合溶液在恒压条件下电化学抛光。使用低温恒温槽将电解液温度降至-10℃,借助常规的搅拌手段将铝片在阳极电压为195V、电流密度为4000mA/m2的条件下一次腐蚀2分钟。将一次腐蚀后的样品在温度为60℃的磷酸(6wt.%)和铬酸(1.8wt.%)混合水溶液中浸泡3小时,以去除一次腐蚀产生的氧化铝。在与一次腐蚀相同的条件下,对样品进行二次腐蚀10分钟。制备出的多孔氧化铝膜,表面结构单元间彼此呈六角密排分布,孔洞分布高度有序,孔径为120nm,孔间距为320nm,阻碍层厚度为120nm,膜厚度约为100μm。The electrolyte is prepared from H 2 O, C 2 H 5 OH and H 3 PO 4 , wherein the volume ratio of H 2 O and C 2 H 5 OH is 4:1, and the content of H 3 PO 4 is 0.5mol/L. The total volume of the solution is 2L. Soak a circular aluminum sheet with a diameter of 2 cm (purity greater than or equal to 99.999%) in acetone for 20 minutes, wipe the surface with a cotton ball, rinse with deionized water, and use perchloric acid with a volume ratio of 1:4 The mixed solution with ethanol was electrochemically polished under constant pressure. Use a low-temperature thermostat to lower the temperature of the electrolyte to -10°C, and corrode the aluminum sheet for 2 minutes at a time under the conditions of an anode voltage of 195V and a current density of 4000mA/ m2 by means of conventional stirring means. The sample after the primary corrosion was soaked in a mixed aqueous solution of phosphoric acid (6wt.%) and chromic acid (1.8wt.%) at a temperature of 60°C for 3 hours to remove the alumina produced by the primary corrosion. Under the same conditions as the primary corrosion, the sample was subjected to secondary corrosion for 10 minutes. The prepared porous alumina membrane has a hexagonal close-packed distribution of surface structural units, highly ordered pore distribution, a pore diameter of 120nm, a pore spacing of 320nm, a barrier layer thickness of 120nm, and a film thickness of about 100μm.

Claims (8)

1, a kind of fast stable growth process of alumina film with nanometer pore array of relatively great pore distance is characterized in that, concrete steps are:
The first, preparation phosphoric acid-water-ethanol electrolytic solution: H wherein 2O and C 2H 5The OH volume ratio is 4: 1, H 3PO 4Concentration is 0.25-0.5mol/L, and the electrolytic solution cumulative volume is 2L;
The second, aluminium flake pre-treatment: circular aluminium flake is put into acetone soak,, and use deionized water rinsing, use perchloric acid and alcohol mixed solution electrochemical etching under constant-pressure conditions with its surperficial wiped clean;
The 3rd, use low temperature thermostat bath electrolyte temperature to be reduced to-5~-10 ℃ of temperature, and electrolytic solution is stirred, be that 195V, current density are 1500-4000Am at anodic oxidation voltage -2Condition under aluminium flake is once corroded;
The 4th, the sample after once corroding to be soaked in the chromic acid mixed aqueous solution, temperature remains on 60 ℃, to remove the aluminum oxide that once corrosion produces;
The 5th, under the condition identical, sample is carried out anticaustic with the 3rd step.
2, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, described circular aluminium flake, its diameter are 2cm, adopts purity more than or equal to 99.999% aluminium flake.
3, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, in second step, and described immersion, the time is 20 minutes.
4, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, described perchloric acid and alcohol mixed solution, and perchloric acid and ethanol volume ratio are 1: 4.
5, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, described once corrosion, and the time is 2~5 minutes.
6, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, in the 4th step, and described immersion, the time is 2~4 hours.
7, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, described phosphoric acid and chromic acid mixed aqueous solution, and wherein the weight percent of phosphoric acid and chromic acid is respectively 6% and 1.8%.
8, the fast stable growth process of the alumina film with nanometer pore array of relatively great pore distance according to claim 1 is characterized in that, described anticaustic, and the time is within ten minutes.
CN 200610118666 2006-11-23 2006-11-23 Fast stable growth process of alumina film with nanometer pore array in relatively great pore distance Pending CN1974873A (en)

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CN103147108A (en) * 2013-03-14 2013-06-12 山西师范大学 Anodic aluminum oxide film and preparation method thereof
CN103243370A (en) * 2013-04-25 2013-08-14 东华大学 Method for preparing ordered macroporous anodic alumina film by two-step anodic oxidation
CN105543931A (en) * 2016-01-13 2016-05-04 西安交通大学 Aluminium alloy based surface dimension adjustable nanopore array and quick preparation method thereof
CN105887156A (en) * 2013-05-17 2016-08-24 江苏理工学院 Preparation method of highly ordered porous anodic aluminum oxide film
CN114277419A (en) * 2021-12-09 2022-04-05 广东工业大学 Large-pore-spacing anodic aluminum oxide film based on parabolic equation boosting and preparation method and application thereof
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CN103147108A (en) * 2013-03-14 2013-06-12 山西师范大学 Anodic aluminum oxide film and preparation method thereof
CN103147108B (en) * 2013-03-14 2016-03-16 山西师范大学 A kind of anodic alumina films and preparation method thereof
CN103243370A (en) * 2013-04-25 2013-08-14 东华大学 Method for preparing ordered macroporous anodic alumina film by two-step anodic oxidation
CN103243370B (en) * 2013-04-25 2015-12-23 东华大学 A kind of two step anonizings prepare the method for ordered big hole anodic aluminum oxide film
CN105887156A (en) * 2013-05-17 2016-08-24 江苏理工学院 Preparation method of highly ordered porous anodic aluminum oxide film
CN105543931A (en) * 2016-01-13 2016-05-04 西安交通大学 Aluminium alloy based surface dimension adjustable nanopore array and quick preparation method thereof
CN114277419A (en) * 2021-12-09 2022-04-05 广东工业大学 Large-pore-spacing anodic aluminum oxide film based on parabolic equation boosting and preparation method and application thereof
CN114277419B (en) * 2021-12-09 2023-05-23 广东工业大学 Macroporous-spacing anodic aluminum oxide film based on parabolic equation boosting and preparation method and application thereof
WO2024244395A1 (en) * 2023-05-29 2024-12-05 重庆大学 Aluminum oxide film structure for heat dissipation and cooling of high-voltage bare conductor and preparation method

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