CN1963376A - Conformity interference scan method - Google Patents
Conformity interference scan method Download PDFInfo
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- CN1963376A CN1963376A CN 200510115621 CN200510115621A CN1963376A CN 1963376 A CN1963376 A CN 1963376A CN 200510115621 CN200510115621 CN 200510115621 CN 200510115621 A CN200510115621 A CN 200510115621A CN 1963376 A CN1963376 A CN 1963376A
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Abstract
This invention relates to integral intervene scanning method, which combines properties of VSI and PSI without measurement range and especially based on VSI and PSI measurement inclination correction factors and displacement correction factors, wherein, it processes data integration of VSI and PSI height data; intervene scanning system can use wide frequency light source to fulfill needed scanning program to lower scanning system complexity and error.
Description
Technical field
The invention relates to a kind of conformity interference scan method, refer to integrate VSI, PSI especially and measure interference scan method.
Background technology
Known interference technique is used optical path difference and principle of interference, be to see through to produce the surface topography that interference illustration is obtained testee, usually this class technology can be divided into vertical scanning technique (VerticalScanning Interferometry with regard to algorithm, VSI) with phase-shift type interference technique (Phase Shifting Interferometry, PSI) two classes.
In the VSI scanning technique, it is to utilize white light to have the advantage of low people having the same aspiration and interest length, remove the noise of interfering, and extrapolate three-dimensional appearance by interference wave bag distribution scenario, the measurement range of VSI algorithm is also unrestricted, can measure and have the high determinand in big offset rank, but if will promote vertical direction resolution, must dwindle the vertical scanning stride, but relative also can spend the more time, measuring accuracy is relatively poor in addition is its major defect, takes a broad view of measurement environment or the measurement of the measured object of the big offset of rough surface tool that VSI is fit to not require precision.In addition, in the PSI scanning technique, it is the various Phase Build Out technology of collocation, can reduce three-dimensional appearance, under the VSI comparison, PSI has preferable precision, but measuring light wavelength restriction depth measurement range, and be subjected to the restriction that 2 π blur (ambiguity), so be not suitable for measuring the measured object that has greater than λ/4 offsets, for example have the high testee in big rank, at this point, existing at present the development dual wavelength light phase shift interference art, can enlarge the high measurement range in rank, but because when people having the same aspiration and interest length is higher, oneself's interference causes noise to increase easily, is to be not easy the difficult problem that solves at present.
In order to utilize the advantage that VSI and PSI measure better and to remedy separately shortcoming, existing as U.S.'s integration measuring method that No. 5471303 patent provided.
Calculate because the zero optical path difference of VSI is the ripple package informatin of vertical scanning, each pixel all is independently, can not be subjected to the influence of other pixel, but PSI then is by calculating the height of this point with the phase change of neighbor.PSI is measured, if use wideband light as light source, spacing (being mean wavelength) because of interference fringe in the actual interference illustration of numerical aperture (NA) influence of optical system, the mean wavelength and the actual average wavelength of being calculated by the interference fringe spacing can produce skew, when causing VSI to combine with the PSI elevation information, height can't directly engage (have drop (intercept) and degree of tilt (influence of slope-NA value) inconsistent).Therefore, in No. 5471303 patent of the U.S.,, be the single-frequency light that needs to use a known wavelength, Cai unlikelyly cause this skew in order will be accurately to measure with PSI.So,,, also need device PSI to measure employed narrow frequency light source in addition except VSI measures the wide frequency light source that uses in this known scanning system.
Yet, having the system architecture of using wide frequency light source and narrow frequency light source simultaneously in the known technology, it is after carrying out the VSI measurement with white light source earlier, to re-use mechanism and switch narrow frequency light, carries out the PSI measurement at desired zone, and reaches the measuring method of two-stage form.The technology of this class mainly can be measured because of using two light sources to carry out VSI and PSI respectively, and needs mechanism's toggle lights, thereby has increased system cost.Simultaneously, because it is to belong to two-stage scanning, and in VSI and PSI, all need carry out vertical scanning capture action, so be unfavorable for efficiency of measurement.
Summary of the invention
The present inventor is in view of the disappearance of known interferometer measuration system, and eager research is invented, and the scan method of an interference system is provided, and so as to making that the measuring process of interference system can be more quick, simple and easy and correct.
Fundamental purpose of the present invention is providing a kind of conformity interference scan method, by the slope correction factor, the displacement correction factor between VSI measurement and the PSI measurement, altitude information array to VSI, PSI is integrated calculating, makes interference scanning system of the present invention can only use wide frequency light source can finish required scanning sequence.In other words, the present invention utilizes the far field wavelength shift of slope correction factor correction, makes that not being required to be the PSI measurement additionally sets up narrow frequency light source, and then reduces the complexity and the error of scanning system.
Based on above-mentioned purpose, conformity interference scan method of the present invention, be the integrative levels scanning survey (vertical scanning interferometry, VSI), phase shift measures (phase shifting interferometry, PSI) measured altitude information array.
Particularly, conformity interference scan method of the present invention at first scans determinand by the interference scanning system of wide frequency light source, and obtains scanning information.Then, measure the altitude information array of VSI with VSI based on scanning information.At the position of zero optical path difference, change the altitude information array of measuring PSI with PSI based on scanning information.Based on the slope correction factor, the displacement correction factor between VSI measurement and the PSI measurement, the altitude information array of VSI, the altitude information array of PSI are integrated calculating.
Can be further understood by the following detailed description and accompanying drawings about the advantages and spirit of the present invention.
Description of drawings
Fig. 1 is the synoptic diagram that shows interference scanning system of the present invention.
Fig. 2 A～2B integrates the synoptic diagram of the method for VSI, PSI measurement for the present invention.
Among the figure
1 light supply apparatus, 11 incident beams, 2 objective lens, 3 light beam guidance devices, 4 image capture units, 41 folded light beams, 5 logical calculus control modules, 6 determinands
Embodiment
Fig. 1 is the synoptic diagram that shows interference scanning system of the present invention.As shown in Figure 1, interference scanning system of the present invention comprises light supply apparatus 1, objective lens 2, light beam guidance device 3, image capture unit 4 and logical calculus control module 5.
Simple, conformity interference scan method of the present invention mainly is to utilize single and belong to white light source (wide frequency light source) determinand 6 is scanned, and reduces the complexity and the error of scanning system.Scan in order only to use single and to belong to white light source (wide frequency light source), the inventive method is at VSI, the altitude information array of PSI is integrated when calculating, can be because of the slope correction factor between VSI measurement and the PSI measurement, the displacement correction factor, especially slope correction factor correction far field wavelength shift, and can reach No. 5471303 identical even better advantage of patent with the U.S., that is integration VSI, PSI measures advantage separately, and reach the characteristics that do not have measurement range restriction and pinpoint accuracy, and the inventive method still can reduce the complexity and the error of scanning system.
Compare with the U.S. No. 5471303 patent, the inventive method is equally also utilized the characteristics of VSI at large-range measuring and the big offset of energy measurement, earlier determinand 6 is done the measurement of rough property, and in the position of selecting zero optical path difference, other utilizes the characteristics of PSI pinpoint accuracy, and the careful part of measuring of needs is done further measurement.Therefore measure and identical part about PSI, VSI, in this detailed description within reason, the present invention is primarily aimed at the U.S. No. 5471303 patent difference and elaborates.
Two kinds of methods of integrating VSI, PSI measurement of following the present invention of explanation are earlier done explanation, and then how explanation integrates the result that VSI, PSI measure by the slope correction factor, the displacement correction factor, last just rough explanation interference scanning system of the present invention as shown in Figure 1.
The present invention integrates the method that VSI, PSI measure for two kinds, mainly is to select wherein a kind of integration method for use according to the height profile of determinand 6.Wherein a kind of is 90 degree phase shift scannings, and another kind of is that the second order segmentation scans.
See also Fig. 2 A～2B, Fig. 2 A～2B integrates the synoptic diagram of the method for VSI, PSI measurement for the present invention.The present invention 90 degree phase shifts scanning shown in Fig. 2 A mainly is that the determinand 6 of height profile is among a small circle carried out.Because sweep limit is less, can shown in Fig. 2 A, scan once determinand 6 by the interference scanning system by wide frequency light source, carry out VSI, PSI respectively by the scanning information that is obtained then and measure, the second order segmentation scanning of the present invention shown in Fig. 2 B then is suitable for the determinand 6 of height profile on a large scale.
This be because, when if determinand 6 is the rank height of highly tens of μ m or Bump, if adopt the present invention's 90 degree phase shift scannings shown in Fig. 2 A, whole sweep time will be very long, therefore to the determinand 6 of height profile on a large scale, with the second order segmentation scanning of the present invention shown in Fig. 2 B, just can comparatively fast finish scanning.
In the 90 degree phase shift scannings of the present invention shown in Fig. 2 A, meeting is carried out one-off scanning by the interference scanning system (adopting the sweep span as 90 degree phase places) of wide frequency light source to determinand 6 earlier, and its institute's scanning information that obtains will use for follow-up VSI, PSI measurement.Then, measure the altitude information array (VSI (i of VSI with VSI based on scanning information, j)), then at (the optical pathdifference of the zero optical path difference shown in Fig. 2 A, OPD) position, change the altitude information array (PSI ((i, j)) that measures PSI with PSI based on scanning information.At last, based on the slope correction factor (NA factor), the displacement correction factor (Base Height) between VSI measurement and the PSI measurement, the altitude information array of VSI, the altitude information array of PSI are integrated calculating (can describe in detail after a while and how integrate calculating).
In the second order segmentation scanning of the present invention shown in Fig. 2 B, mainly (first sweep span is greater than second sweep span with first sweep span, second sweep span respectively, second sweep span generally also is 90 degree) carry out the scanning of twice property, and obtain two scanning informations (first scanning information, second scanning information) respectively, and then integrate calculating.
Particularly, the interference scanning system by wide frequency light source scans determinand 6 with first sweep span equally, and obtains first scanning information, measures the altitude information array (VSI (i, j)) of VSI then with VSI based on first scanning information.Then, at the position of zero optical path difference, the interference scanning system by wide frequency light source scans determinand 6 with second sweep span once more, and obtains second scanning information, and change altitude information the array ((PSI (i, j)) that measures PSI with PSI based on second scanning information.At last, still, the altitude information array of VSI, the altitude information array of PSI are integrated calculating based on the slope correction factor, the displacement correction factor between VSI measurement and the PSI measurement.
Utilize the present invention's 90 degree phase shifts shown in Fig. 2 A to scan or the altitude information array of second order segmentation scanning acquisition above-mentioned VSI, PSI of the present invention shown in Fig. 2 B no matter be, conformity interference scan method of the present invention all needs as No. 5471303 patent of the U.S. because the altitude information array (VSI (i of VSI, j)), the altitude information array ((PSI (i of PSI, j)) inequality at the reference point of measuring, and need to consider to engage to proofread and correct.In the methods of the invention, engage correction and mainly be divided into slope and displacement, that is proofread and correct based on the slope correction factor (NA factor), the displacement correction factor (Base Height) between VSI measurement and the PSI measurement.
Because the best pixel of its quality is PSI reference point (seedingpoint) in the altitude information array of PSI, and be the VSI reference point to the starting point that determinand scans.Therefore, VSI reference point VSI (X
Seeding point, Y
Seeding point) and PSI reference point PSI (X
Seeding point, Y
Seeding point) height fall be the displacement correction factor (Base Height).The method of asking about the displacement correction factor can be consulted No. 5471303 patent of the U.S..
For overcome known employing wide frequency light source carry out PSI measure the far field wavelength shift that can run into, mainly utilize the far field wavelength shift of slope correction factor correction in the methods of the invention, additionally do not set up narrow frequency light source and be not required to be the PSI measurement, and then reduce the complexity and the error of scanning system.The calculation equation of the slope correction factor (NAfactor) is:
NA?factor＝Slope(VSI(i，j))/Slope(PSI(i，j))；
That is to say,, obtain the slope { Slope (VSI (i, j)), Slope (PSI (i, j)) } of VSI, PSI respectively with equation of line mould syzygy number based on the altitude information array of VSI, PSI.And then obtain the slope correction factor divided by the slope of PSI with the slope of VSI.
The above-mentioned slope correction factor of reentrying (NA factor), the displacement correction factor (Base Height) afterwards, this altitude information array that just can utilize these two factors that the altitude information array of PSI is transformed into VSI is done to integrate and is calculated.It integrates equation:
If (Height (i j) is the PSI chosen area)
Height(i，j)＝PSI(i，j)x?NA?factor+Base?Height
else
Height(i，j)＝VSI(i，j)
That is to say that the altitude information array of PSI multiply by the slope correction factor and adds after the displacement correction factor, the altitude information array of PSI begins and the altitude information array of VSI is done integration calculating.
As shown in Figure 1, No. 5471303 patent of the interference scanning system of the present invention and the U.S. compared, the employed light supply apparatus 1 of interference scanning system of the present invention only has one group of wide frequency light source, and owing to need not switch between two light sources, so interference scanning system of the present invention does not have the mechanism and the demand for control of switching yet.
Light supply apparatus 1 is the device of incident beam 11 light signals of generation, and can produce the incident beam 11 of white light source signal; This objective lens 2 is the focus adjustment portions that include interference objective and objective lens; This light beam guidance device 3 is optical facilities, and in order to the light signal in the guidance system, for instance, these class optical facilities can be spectroscopes; This image capture unit 4 is one to have the optical devices of image capture portion, and for instance, these class optical devices can be a CCD or CMOS optics sensing component and relevant control and signal transmission electric wiring thereof; And this logical calculus control module 5 is to have logical calculus portion, memory portion and control part and can be by electronic circuit or the computer system person of reaching, its logical calculus portion comprises vertical scanning (Vertical Scanning Interferometry, VSI) calculation and phase-shift type are interfered (Phase Shifting Interferometry, PSI) calculation.Seeing through aforesaid this light supply apparatus 1 provides an incident beam 11 to reflex to this objective lens 2 through light beam guidance device 3, make incident beam 11 arrive at determinand 6 and reflect to form the folded light beam 41 of carrying interference signal, folded light beam 41 penetrated light beam guidance device 3 through after this objective lens 2, and was captured by image capture unit 4.Therefore, this logical calculus control module 5 can see through its control part and memory portion, write down determinand 6 optical information that this image capture unit 4 is captured, make the scan method of interference system of the present invention can see through the logical calculus portion that this logical calculus control module 5 is had, calculate the optical information that image capture unit 4 is captured, and obtain the surface profile information of determinand 6.
By the above detailed description of preferred embodiments, be to wish to know more to describe feature of the present invention and spirit, and be not to come category of the present invention is limited with above-mentioned disclosed preferred embodiment.On the contrary, its objective is that hope can contain in the category of claim of being arranged in of various changes and tool equality institute of the present invention desire application.
Claims (10)
1. a conformity interference scan method is that measured altitude information array is measured in integrative levels scanning survey, phase shift, and this altitude information array can be used to calculate the surface profile of determinand, and this conformity interference scan method comprises:
Interference scanning system by wide frequency light source scans this determinand, and obtains scanning information;
Measure this altitude information array of VSI with VSI based on this scanning information;
At the position of zero optical path difference, change this altitude information array of measuring PSI with PSI based on this scanning information; And
Based on the slope correction factor, the displacement correction factor between VSI measurement and the PSI measurement, this altitude information array of VSI, this altitude information array of PSI are integrated calculating.
2. conformity interference scan method as claimed in claim 1, wherein this interference scanning system mainly is made up of this wide frequency light source, objective lens, light beam guidance device, image capture unit, logical calculus control module.
3. conformity interference scan method as claimed in claim 1, wherein the account form of this slope correction factor further comprises:
Based on this altitude information array of VSI, PSI, obtain the slope of VSI, PSI respectively with equation of line mould syzygy number; And
Slope with VSI obtains this slope correction factor divided by the slope of PSI.
4. conformity interference scan method as claimed in claim 1, wherein the best pixel of its phase place quality is the PSI reference point in this altitude information array of PSI, the starting point that this determinand is scanned is the VSI reference point, and the account form of this displacement correction factor further comprises:
The height fall of this VSI reference point and this PSI reference point is this displacement correction factor.
5. conformity interference scan method as claimed in claim 1 is wherein integrated calculating to this altitude information array of VSI, this altitude information array of PSI, further comprises:
This altitude information array of PSI multiply by this slope correction factor and adds after the displacement correction factor, and this altitude information array of PSI can be done to integrate and calculate with this altitude information array of VSI.
6. a conformity interference scan method is that measured altitude information array is measured in integrative levels scanning survey, phase shift, and this altitude information array can be used to calculate the surface profile of determinand, and this conformity interference scan method comprises:
Interference scanning system by wide frequency light source scans this determinand with first sweep span, and obtains first scanning information;
Measure this altitude information array of VSI with VSI based on this first scanning information;
At the position of zero optical path difference, this determinand is scanned with second sweep span by the interference scanning system of wide frequency light source, and obtain second scanning information;
At the position of zero optical path difference, change this altitude information array of measuring PSI with PSI based on this second scanning information; And
Based on the slope correction factor, the displacement correction factor between VSI measurement and the PSI measurement, this altitude information array of VSI, this altitude information array of PSI are integrated calculating;
Wherein, this first sweep span is greater than this second sweep span.
7. conformity interference scan method as claimed in claim 5, wherein this interference scanning system mainly is made up of this wide frequency light source, objective lens, light beam guidance device, image capture unit, logical calculus control module.
8. conformity interference scan method as claimed in claim 5, wherein the account form of this slope correction factor further comprises:
Based on this altitude information array of VSI, PSI, obtain the slope of VSI, PSI respectively with equation of line mould syzygy number; And
Slope with VSI obtains this slope correction factor divided by the slope of PSI.
9. conformity interference scan method as claimed in claim 5, wherein the best pixel of its phase place quality is the PSI reference point in this altitude information array of PSI, the starting point that this determinand is scanned is the VSI reference point, and the account form of this displacement correction factor further comprises:
The height fall of this VSI reference point and this PSI reference point is this displacement correction factor.
10. conformity interference scan method as claimed in claim 5 is wherein integrated calculating to this altitude information array of VSI, this altitude information array of PSI, further comprises:
This altitude information array of PSI multiply by this slope correction factor and adds after the displacement correction factor, and this altitude information array of PSI can be done to integrate and calculate with this altitude information array of VSI.
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| CN101975559A (en) * | 2010-09-07 | 2011-02-16 | 天津大学 | System and method for testing microstructure based on nano measurement and oblique scanning white-light interferometry |
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| US5995222A (en) * | 1995-12-28 | 1999-11-30 | Fuji Photo Optical Co., Ltd. | Subject positioning device for optical interferometer |
| US5640270A (en) * | 1996-03-11 | 1997-06-17 | Wyko Corporation | Orthogonal-scanning microscope objective for vertical-scanning and phase-shifting interferometry |
| US6028670A (en) * | 1998-01-19 | 2000-02-22 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
| JP4246326B2 (en) * | 1999-08-27 | 2009-04-02 | 東レエンジニアリング株式会社 | Surface shape measuring method and apparatus |
| JP2004061330A (en) * | 2002-07-30 | 2004-02-26 | Rikogaku Shinkokai | Optical filter and surface profile measuring apparatus |
| JP3867724B2 (en) * | 2004-02-27 | 2007-01-10 | オムロン株式会社 | Surface condition inspection method, surface condition inspection apparatus and substrate inspection apparatus using the method |
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| CN101975559A (en) * | 2010-09-07 | 2011-02-16 | 天津大学 | System and method for testing microstructure based on nano measurement and oblique scanning white-light interferometry |
| CN101975559B (en) * | 2010-09-07 | 2012-01-11 | 天津大学 | System and method for testing microstructure based on nano measurement and oblique scanning white-light interferometry |
| CN105190227A (en) * | 2013-03-18 | 2015-12-23 | Snu精度株式会社 | Three-dimensional shape measuring device capable of measuring color information |
| CN104534980A (en) * | 2015-02-04 | 2015-04-22 | 程灏波 | Reflection type lens-free digital holography measuring device |
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| CN106767496A (en) * | 2016-11-18 | 2017-05-31 | 中国科学院光电技术研究所 | 3D morphology recovery method combining phase shift interference and vertical scanning interference |
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