CN1847973A - Abaxial optical machine with projection LCD system on silicon - Google Patents
Abaxial optical machine with projection LCD system on silicon Download PDFInfo
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- CN1847973A CN1847973A CN 200510065211 CN200510065211A CN1847973A CN 1847973 A CN1847973 A CN 1847973A CN 200510065211 CN200510065211 CN 200510065211 CN 200510065211 A CN200510065211 A CN 200510065211A CN 1847973 A CN1847973 A CN 1847973A
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- liquid crystal
- abaxial
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- optical machine
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Abstract
The present invention provides one kind of abaxial optical machine for LCoS projection system, and the abaxial optical machine includes one silicon crystal panel. The silicon crystal panel includes one liquid crystal layer with major axis direction parallel to the light beam incoming direction to the silicon crystal panel. The liquid crystal molecules in the liquid crystal layer are vertically configured and include one 0-20 deg liquid crystal pre-tilt angle.
Description
Technical field
The present invention relates to a kind of liquid crystal over silicon (LCoS) optical projection system from axle (off-axis) ray machine, particularly relate to a kind of vertical nematic (vertically aligned nematic, VAN) Abaxial optical machine of LCoS optical projection system.
Background technology
The ultimate principle of LCoS (liquid crystal on silicon) optical projection system is similar to the LCD optical projection system, difference is that the LCD optical projection system is to utilize light source to pass liquid crystal to make modulation, belong to penetration, the LCoS optical projection system then is reflective framework, and the silicon wafer panel that utilizes elements such as the circuit of glass substrate, liquid crystal and CMOS chip and reflection horizon to form comes modulation to be come out to desire to be projected to the light signal of screen by light emitted.
The ray machine framework of LCoS optical projection system can roughly be divided into two kinds of designs of three-chip type and one chip according to the number of silicon wafer panel.The light that the three-chip type ray machine sends light source earlier is divided into three coloured light such as redness, blueness and green, this three coloured light is projected to the silicon wafer panel of three correspondences respectively again, and three look images of reflection are projected to screen through closing after the colour system system forms chromatic image again.The characteristic that the one chip ray machine then utilizes a slice silicon wafer panel to persist in conjunction with human eye vision and the space is synthetic is with the synthetic chromatic image of color separation images such as redness, blueness and green.Generally, the one chip ray machine takes up room little, only needs a slice panel, and beam split, to close the photosystem framework fairly simple, therefore has competitive edge on cost.In the design of one chip ray machine, present main flow is still along the design of existing three-chip type ray machine, and (polarization beam splitter PBS) separates the light of the incident silicon wafer panel light with reflection to utilize polarizing beam splitter.
Please refer to Fig. 1, Fig. 1 is the configuration diagram of an existing one chip coaxial (on-axis) ray machine.As shown in Figure 1, coaxial ray machine 10 comprises a light source 12, is used for producing an incident beam b
1, a light pipe 14 is used for being aggregated into irradiating light beam b
1And reduction incident beam b
1Directivity, a colour wheel 16 is used for incident beam b
1Be divided into homogeneous beams such as redness, blueness and green in proper order, a polarizer (polarizer) 18 is used for making incident beam b
1Have a specific polarization direction, S polarized light for example, a polarizing beam splitter 20 is used for making the incident beam b1 of polarization to be incident to a silicon wafer panel 22.When the liquid crystal display in the silicon wafer panel 22 was bright attitude, the S polarized light of incident can be become the P polarized light by modulation and reflect.Folded light beam b
2After silicon wafer panel 22 reflects, polarizing beam splitter 20 can allow light beam with P polarization state by and light beam is projected to an analyzer 24 (analyzer), the light that analyzer 24 only allows to have particular polarization passes through, P polarized light for example, light is projected to screen through projection lens more then.Then be reflected back toward light source 12 as for reflect light beam from silicon wafer panel 22 with S polarization state.
Above-mentioned coaxial ray machine is a sequential color pattern (sequential color type) ray machine, utilize redness in the colour wheel 16, blueness and green colour circle fast rotational to produce homogeneous beams such as redness, blueness and green in proper order, be projected on the screen with three times (or higher) in proper order in the high-frequency of picture switching rate the color separation picture data behind this three primary colors process silicon wafer panel 22, based on the characteristic that human eye vision persists, the observer just can see synthetic chromatic image.
In addition, prior art has the technology of utilizing the synthetic chromatic image in space in addition, it is subdivided into three with each picture element on the colour picture and corresponds to trichromatic sub-picture element respectively, individually to control the picture of this a little picture element, when this a little picture element is healed when meticulous, the observer just can't differentiate this a little picture element, so this type of ray machine is called synthetic color pattern (the spatial color type) ray machine in space again.Please refer to Fig. 2, Fig. 2 is the coaxial ray machine synoptic diagram of the synthetic color pattern in an existing space.As shown in Figure 2, coaxial ray machine 30 comprises a light source 32, is used for producing an incident beam b
1, a polarizer 34 is used for making incident beam b
1Have a specific polarization direction, S polarized light for example, a polarizing beam splitter 36 is used for making the incident beam b of polarization
1Be incident to a silicon wafer panel 38.When the liquid crystal display in the silicon wafer panel 38 was bright attitude, the S polarized light of incident can be become the P polarized light by modulation and reflect.Folded light beam b
2After silicon wafer panel 38 reflects, polarizing beam splitter 36 can allow light beam with P polarization state by and light beam is projected to an analyzer 40, the light that analyzer 40 only allows to have particular polarization passes through, P polarized light for example, and light is projected to screen through projection lens more then.Then be reflected back toward light source 32 as for reflect light beam from silicon wafer panel 38 with S polarization state.
Different with the coaxial ray machine of sequential color pattern 10 is, the synthetic coaxial ray machine 30 of color pattern in space must utilize a colorized optical filtering array spatially to control the picture data that is shown in each sub-picture element, is to utilize colour wheel to control the picture data that is shown in each picture element in time as for 10 of sequential color pattern ray machines.Although difference to some extent, above-mentioned coaxial ray machine 10,30 all must utilize polarizing beam splitter to control the optical axis direction of incident silicon wafer panel and the optical axis direction of reflection.Because polarizing beam splitter involves great expense, and light passes polarizing beam splitter and can cause loss in the brightness again, and therefore coaxial ray machine also is restricted on product is used relatively.
Summary of the invention
Therefore, the object of the present invention is to provide a kind of Abaxial optical machine of LCoS optical projection system, can save the ray machine cost, more can improve the optical appearance of ray machine.
In preferred embodiment of the present invention, this Abaxial optical machine comprises a silicon wafer panel, comprises a liquid crystal layer in the silicon wafer panel, and the liquid crystal long axis direction in the liquid crystal layer is parallel to the direction of one first light beam incident silicon wafer panel.Wherein the liquid crystal molecule in the liquid crystal layer is a vertical orientation, and liquid crystal molecule comprises a liquid crystal pretilt angle between the 0-20 degree.
Because the present invention adjusts the incident light axis angle of silicon wafer panel, make its rough long axis direction that is parallel to liquid crystal molecule, and because the light path of Abaxial optical machine incident silicon wafer panel is different with reflected light path, folded light beam does not need polarizing beam splitter promptly can directly be passed to projection lens, therefore the present invention does not need polarizing beam splitter, naturally the contrast restriction that ray machine cost and polarizing beam splitter cause can be saved, the high-contrast optics performance of approximate coaxial ray machine can be obtained simultaneously.
Description of drawings
Fig. 1 is the configuration diagram of an existing coaxial ray machine;
Fig. 2 is the configuration diagram of existing another coaxial ray machine;
Fig. 3 is the configuration diagram of the present invention's one Abaxial optical machine;
Fig. 4 is the optical axis direction of the present invention's one incident silicon wafer panel and the synoptic diagram between the liquid crystal long axis direction in the silicon wafer panel;
Fig. 5 is the configuration diagram of another Abaxial optical machine of the present invention.
Embodiment
Please refer to Fig. 3, Fig. 3 is the configuration diagram of the present invention's one Abaxial optical machine.As shown in Figure 3, Abaxial optical machine 50 is a sequential color pattern ray machine, and it comprises a light source 52, is used for producing an incident beam b
1, a light pipe 54 is used for being aggregated into irradiating light beam b
1And reduction incident beam b
1Directivity, a colour wheel 56 is used for incident beam b
1Be divided into homogeneous beams such as redness, blueness and green in proper order, a condenser system 58 is used for making the incident beam b after the color separation
1Through a polarizer 60 and be projected to a Reflective mode silicon crystal panel 62.The folded light beam b of silicon wafer panel 62 subsequently
2Be projected to screen again through an analyzer 64 and a projection lens 66.
In the present embodiment, incident beam b
1Redness, blueness and green colour circle fast rotational are to produce homogeneous beams such as redness, blueness and green in proper order in the process colour wheel 56 earlier, and these dichroic beams are through the condenser system 58 of single or multiple lens composition, with adjustment incident beam b subsequently
1Enter the optical axis angle of silicon wafer panel 62.The polarizer 60 has a specific polarization direction, can make incident beam b
1Produce polarization, analyzer 64 also has a specific polarization direction, the folded light beam b that only allows to have particular polarization
2By.According to silicon wafer panel 62 for incident beam b
1With folded light beam b
2The modulation mode of polarization state design (whether to change folded light beam b
2The polarization direction), the polarization direction of analyzer 64 can be parallel to the polarization direction of the polarizer 60, perhaps the polarization direction of analyzer 64 also can be perpendicular to the polarization direction of the polarizer 60.
Please refer to Fig. 4, Fig. 4 is the optical axis direction of the present invention's one incident silicon wafer panel and the synoptic diagram between the liquid crystal long axis direction in the silicon wafer panel.As shown in Figure 4, silicon wafer panel 62 comprises two parallel substrates 622 and 626, one alignment film 624 is located on substrate 622 surfaces of substrate 626, and an alignment film 628 is located on substrate 626 surfaces of substrate 622, and a liquid crystal layer 630 is filled in the space of 626 of substrate 622 and substrates.Wherein substrate 622 is the transparency carrier of a permission light penetration, and for example glass substrate is the semiconductor substrate that is provided with elements such as CMOS driving circuit and reflection horizon as for 626 of substrates.In preferred embodiment of the present invention, the liquid crystal molecule of liquid crystal layer 630 is a vertical orientation, and promptly the long axis direction 632 of liquid crystal molecule is perpendicular to alignment film 624,628.It is more even for liquid crystal molecule is distributed, 624,628 pre-dumpings that can form a certain angle of liquid crystal molecule and alignment film, for example can form a liquid crystal pretilt angle θ between the long axis direction 632 of liquid crystal molecule and alignment film 628 normal to a surface directions,, be preferably 3 degree between the 0-20 degree.Incident beam enters silicon wafer panel 62 according to an incident direction 634, and leaves silicon wafer panel 62 according to a reflection direction 636.In order to improve the brightness of folded light beam, the incident direction 634 of incident beam must be according to the optical characteristics of LCoS optical projection system, and for example the parameters such as alignment direction on the gap of substrate 622,626 (cell gap), liquid crystal pretilt angle θ and alignment film 624,628 surfaces are carried out optimization.In preferred embodiment, the incident direction 634 of incident beam must roughly be parallel to the long axis direction 632 of liquid crystal prescription, that is the incident angle α that forms between the incident direction 634 of incident beam and alignment film 628 normal to a surface directions should roughly equal liquid crystal pretilt angle θ, perhaps controls angle between incident angle α and liquid crystal pretilt angle θ less than 1 degree.
Above-mentioned control angle of incidence of light can further be applied in other Abaxial optical machine design with the rough notion that equates of liquid crystal pretilt angle.Please refer to Fig. 5, Fig. 5 is the configuration diagram of another Abaxial optical machine of the present invention.As shown in Figure 5, Abaxial optical machine 70 is the synthetic color pattern ray machine in a space, and it comprises a light source 72, is used for producing an incident beam b
1, a condenser system 74 is used for making light beam b
1Through a polarizer 76 and be projected to a silicon wafer panel 78.The folded light beam b of silicon wafer panel 78 subsequently
2Be projected to screen again through an analyzer 80 and a projection lens 82.The polarizer 76 has a specific polarization direction, can make incident beam b
1Produce polarization, analyzer 80 also has a specific polarization direction, the folded light beam b that only allows to have particular polarization
2By.According to silicon wafer panel 78 for incident beam b
1With folded light beam b
2The modulation mode of polarization state design (whether to change folded light beam b
2The polarization direction), the polarization direction of analyzer 80 can be parallel to the polarization direction of the polarizer 76, perhaps the polarization direction of analyzer 80 also can be perpendicular to the polarization direction of the polarizer 76.In the present embodiment, incident beam b
1The incident direction that enters silicon wafer panel 78 must the rough long axis direction that is parallel to liquid crystal molecule, detailed as shown in Figure 4, do not repeat them here.
In addition, the present invention does not limit only can be applied in the design of one chip Abaxial optical machine, and in other embodiments, above-mentioned control angle of incidence of light can further be applied in the design of three-chip type Abaxial optical machine with the rough notion that equates of liquid crystal pretilt angle.For instance, the three-chip type Abaxial optical machine can utilize X prism or other beam splitting system that the incident beam of polarization is divided into three look homogeneous beams such as redness, blueness and green, respectively this three coloured light is projected to the silicon wafer panel of three correspondences again.Homogeneous beams such as red, blueness or green enter the incident direction of corresponding silicon wafer panel must the rough long axis direction that is parallel to liquid crystal molecule, knows clearly as shown in Figure 4, does not repeat them here.Three look images of reflection close spectrum integration light through X prism or other subsequently and via projection lens projects to screen.
Be compared to existing coaxial ray machine design, the optical axis direction of Abaxial optical machine control light incident silicon wafer panel of the present invention, make its rough pre-dumping direction that is parallel to liquid crystal molecule, omit the setting of polarizing beam splitter simultaneously, the contrast restriction of saving the ray machine cost to reach, avoiding polarizing beam splitter to cause, and the advantages such as high-contrast optics performance that obtain approximate coaxial ray machine.
The above only is preferred embodiment of the present invention, and all equalizations of doing according to claim of the present invention change and modify, and all should belong to the covering scope of patent of the present invention.
Claims (18)
1. the Abaxial optical machine of a liquid crystal over silicon (LCoS) projection arrangement, it comprises:
At least one silicon wafer panel comprises a liquid crystal layer in this silicon wafer panel;
One light source is used for producing one first light beam; And
One condenser system is used for assembling this first light beam and makes this this silicon wafer panel of first light beam directive, and this first light beam forms an incident angle in this silicon wafer panel surface, and forms an angle less than 1 degree between the liquid crystal pretilt angle of this incident angle and this liquid crystal layer.
2. Abaxial optical machine as claimed in claim 1, wherein this silicon wafer panel is a reflective panel, and this first light beam can form one second light beam in this silicon wafer panel surface reflection.
3. Abaxial optical machine as claimed in claim 1, it comprises a polarizer in addition, be located between this condenser system and this silicon wafer panel, and this polarizer provides one first polarization direction.
4. Abaxial optical machine as claimed in claim 3, it comprises an analyzer in addition, be located between this a silicon wafer panel and the projection lens, and this analyzer provides one second polarization direction.
5. Abaxial optical machine as claimed in claim 4, wherein this first polarization direction is parallel to this second polarization direction.
6. Abaxial optical machine as claimed in claim 4, wherein this first polarization direction is perpendicular to this second polarization direction.
7. Abaxial optical machine as claimed in claim 1, it comprises that in addition a light pipe and a colour wheel be located between this light source and this condenser system, this first light beam can form red beam, blue light beam and green beam in proper order after by this light pipe and this colour wheel.
8. Abaxial optical machine as claimed in claim 1, wherein the liquid crystal molecule in this liquid crystal layer is a vertical orientation.
9. Abaxial optical machine as claimed in claim 1, wherein this liquid crystal pretilt angle is between the 0-20 degree.
10. liquid crystal over silicon (Abaxial optical machine of (LCoS) projection arrangement, it comprises a silicon wafer panel, comprise a liquid crystal layer in this silicon wafer panel, this liquid crystal layer comprises a liquid crystal long axis direction, and this liquid crystal long axis direction is parallel to the direction of one first this silicon wafer panel of light beam incident.
11. Abaxial optical machine as claimed in claim 10, wherein this silicon wafer panel is a reflective panel, and this first light beam can form one second light beam in this silicon wafer panel surface reflection.
12. Abaxial optical machine as claimed in claim 10, it comprises in addition:
One light source is used for producing this first light beam;
One condenser system is used for adjusting the direction of this this silicon wafer panel of first light beam incident;
One polarizer be located between this condenser system and this silicon wafer panel, and this polarizer provides one first polarization direction; And
One analyzer is located between this a silicon wafer panel and the projection lens, and this analyzer provides one second polarization direction.
13. Abaxial optical machine as claimed in claim 12, wherein this first polarization direction is parallel to this second polarization direction.
14. Abaxial optical machine as claimed in claim 12, wherein this first polarization direction is perpendicular to this second polarization direction.
15. Abaxial optical machine as claimed in claim 10, wherein this first light beam comprises in proper order red beam, blue light beam and green beam.
16. Abaxial optical machine as claimed in claim 10, wherein this first light beam comprises red beam, blue light beam or green beam.
17. Abaxial optical machine as claimed in claim 10, wherein the liquid crystal molecule in this liquid crystal layer is a vertical orientation.
18. Abaxial optical machine as claimed in claim 10, wherein the liquid crystal molecule in this liquid crystal layer comprises a liquid crystal pretilt angle, and this liquid crystal pretilt angle is between the 0-20 degree.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510065211 CN1847973A (en) | 2005-04-14 | 2005-04-14 | Abaxial optical machine with projection LCD system on silicon |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510065211 CN1847973A (en) | 2005-04-14 | 2005-04-14 | Abaxial optical machine with projection LCD system on silicon |
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| CN1847973A true CN1847973A (en) | 2006-10-18 |
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| CN 200510065211 Pending CN1847973A (en) | 2005-04-14 | 2005-04-14 | Abaxial optical machine with projection LCD system on silicon |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100526832C (en) * | 2006-12-14 | 2009-08-12 | 中国科学院长春光学精密机械与物理研究所 | Off-axis reflection optical lens focus detection method |
-
2005
- 2005-04-14 CN CN 200510065211 patent/CN1847973A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100526832C (en) * | 2006-12-14 | 2009-08-12 | 中国科学院长春光学精密机械与物理研究所 | Off-axis reflection optical lens focus detection method |
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