CN1830813A - Preparation method of nanometer tungsten trioxide crystallite - Google Patents
Preparation method of nanometer tungsten trioxide crystallite Download PDFInfo
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- CN1830813A CN1830813A CN 200610012407 CN200610012407A CN1830813A CN 1830813 A CN1830813 A CN 1830813A CN 200610012407 CN200610012407 CN 200610012407 CN 200610012407 A CN200610012407 A CN 200610012407A CN 1830813 A CN1830813 A CN 1830813A
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Abstract
A process for preparing WO3 nanocrystals from tungsten halide by HF plasma CVD method includes the oxidizing reaction in HF plasma jet, and sudden cooling.
Description
One. technical field
The preparation method of nanometer tungsten trioxide crystallite of the present invention belongs to chemical technology and novel material synthetic technology category, specifically the gasiform tungsten halide is injected in the high frequency plasma attitude jet atmosphere of oxygen enrichment a kind of method of preparation nanometer tungsten trioxide crystallite material.
Two. background technology
The steady oxide of tungsten mainly contains: yellow tungsten (WO
3), blue tungsten (WO
2.90), purple tungsten (WO
2.72) and brown oxide compound (WO
2).Tungstic oxide is yellow tungsten, is the full oxide of tungsten, is the main raw material that the Wimet field produces tungsten powder and wolfram varbide.Nanometer WO
3Hertzian wave there is very strong receptivity, in the utilization of sun power, can makes the excellent absorption material, militarily can make important stealth material; Nanometer WO
3Have huge specific surface, surface effects is remarkable, and many reactions such as hydrogenation dehydrogenation, oxidation, hydrocarbon isomerization, alkylation are had good catalytic performance, can be used as the catalyzer of chemical industry and petroleum industry; Nano level WO
3Oxide compound as transition metal has characteristic of semiconductor, can be used as NO
x, H
2S, NH
3Sensitive material etc. multiple gases; As the Nano semiconductor catalyzer, be applied to photochemical catalysis, photoelectric catalysis degrading processing organic waste water; Also can be used as the promotor of anode of fuel cell, to improve its electro catalytic activity.
At present, the preparation method of nano tungsten trioxide mainly contains solid phase thermal decomposition method, the precipitator method, sol-gel method, micro emulsion method etc.1994, (J.Electrochem.Soc, 141 (8): 2207-2210) with the ammonium paratungstate be raw material, adopt the precipitator method to make the WO of 16～57nm scope such as J.Tamaki
3Uniformed powder; What day equality (synthetic chemistry, 1997 (1): 4-6) with the sodium wolframate be raw material, adopt the micro emulsion method to prepare the ball shaped nano WO of different-grain diameter size first
3Powder; Doe-SikLee etc. (Sensors and Actuators, 1999, B60:57-63) with WCl
6Be raw material, adopt colloidal sol-coprecipitation method to make the WO of 3～9nm
3Powder; (sensor technology, 2001,20 (1): 21-22) the ammonium tungstate thermal decomposition method is made the yellow WO of 10～100nm such as Huang Shizhen
3Powder; It is raw material with the ammonium tungstate that Guo Zhi waits (CN200410090645) suddenly, adopts sol-gel method to make finished product nano level WO
3In aforesaid method, the solid phase decomposition method is gas-solid inhomogeneous reaction, but its preparation technology requires solid feed that very high purity and uniform fineness are arranged, otherwise can't realize that solid feed all transforms; Additive method is real be the different sorts of liquid phase method, and its complex technical process is essentially batchwise operation, is difficult for realizing continuous production, and the product of generation easily reunites, and need carry out aftertreatment etc.
Three. summary of the invention
The preparation method of nanometer tungsten trioxide crystallite of the present invention, its objective is to overcome defective such as complex technical process in the above-mentioned prior art, disclose the technical scheme that a kind of using plasma chemical vapour deposition prepares the nanometer tungsten trioxide crystallite material of high-purity, even particle size distribution.
The preparation method of nanometer tungsten trioxide crystallite of the present invention, it is characterized in that it being to adopt the high frequency plasma reactive system of design voluntarily, with the tungsten halide is basic raw material, in the high frequency plasma attitude jet atmosphere of oxygen enrichment, finish oxidizing reaction, through quenching, making particle size range is a kind of method of the nanometer tungsten trioxide crystallite of 20～60nm, and its concrete grammar is:
The first step: the setting of high frequency plasma reactive system,
I is that bilayer sleeve, material are the torch pipe bottom that stainless high frequency plasma reactor 2 places high-frequency plasma generator 1 with structure, connects by ground; The internal diameter of high frequency plasma reactor 2 is 10～100mm, and length is 2～10: 1 with the ratio of internal diameter, and is provided with opening for feed d and opening for feed e,
II is that bilayer sleeve, material are the lower end that stainless water cooler 3 is installed on high frequency plasma reactor 2 with structure, is connected by flange; 3 fens two sections of water cooler: epimere is the reducing expanding reach, and the inlet internal diameter is identical with the internal diameter of high frequency plasma reactor 2, and tapering is 45 °, and the outlet internal diameter is 2～10 times of high frequency plasma reactor 2 internal diameters; Hypomere is isometrical straight section, and its internal diameter is identical with the outlet internal diameter of epimere, and length is 2～10: 1 with the ratio of its internal diameter, be connected by flange between the two sections of water cooler 3,
III with material be stainless steel and in establish 10mm * 10mm stainless steel grid bracing frame and 100～200 order Stainless Steel Cloths product collector 4 inlet be connected by flange with the outlet of water cooler 3,
IV chooses induced draft fan 5, by flange the induced draft fan inlet is connected with the outlet of product collector 4,
V is connected by pipeline exhaust gas treating device 6 with induced draft fan 5,
VI is provided with supplementary unit, earlier source of oxygen 7 is connected by pipeline with the torch pipe inlet mouth a of high-frequency plasma generator 1, again working gas source 8 is connected by pipeline with torch pipe inlet mouth c with the torch pipe inlet mouth b of high-frequency plasma generator 1, at last opening for feed d or the opening for feed e of tungsten halide material carburetor 9 by pipeline and high frequency plasma reactor 2 is joined;
Second step: the last hypomere to high frequency plasma reactor 2 and water cooler 3 feeds water coolant at first respectively, and its flow is respectively 20～200l/h, 50～500l/h and 100～1000l/h; Oxygen is fed among the torch pipe inlet mouth a and torch pipe inlet mouth c of the above-mentioned high-frequency plasma generator that sets 1, its flow is respectively 1～10l/min and 5～100l/min again; After working gas is divided into cold gas and combustion gas two portions, feed respectively among the torch pipe inlet mouth b and torch pipe inlet mouth c of the above-mentioned high-frequency plasma generator that sets 1, wherein the flow of cold gas is 5～250l/min, the flow of combustion gas is 2～100l/min; Connect power supply, under the electromagnetic field effect that 2～20KW high-frequency plasma generator 1 produces, gas carries out high frequency discharge, forms high-purity plasmatorch 10; Open the induced draft fan 5 of 0.2～2KW, the working pressure of high frequency plasma reactive system is little negative pressure: 1～100mm water column; With 9 heating of tungsten halide material carburetor, design temperature is 300～600 ℃, after treating constant temperature, the tungsten halide gaseous feed is injected high frequency plasma reactor 2 from opening for feed, regulating the residence time of material in plasma state jet atmosphere is that 2～10ms product carries out quenching in water cooler 3, make nanometer tungsten trioxide crystallite, and collect by product collector 4.
The preparation method of above-mentioned nanometer tungsten trioxide crystallite is characterized in that described tungsten halide comprises tungsten chloride, tungsten bromide.
The preparation method of above-mentioned nanometer tungsten trioxide crystallite is characterized in that described working gas is argon gas, helium, neon, xenon or their mixed gas.
The preparation method of above-mentioned nanometer tungsten trioxide crystallite is characterized in that described high frequency plasma reactor 2 adopts graphite liner 11.
The preparation method of above-mentioned nanometer tungsten trioxide crystallite is characterized in that described opening for feed d is positioned at 1/3 axial place of high frequency plasma reactor 2, be radial symmetric structure, and with axially vertical, diameter is 1～10mm; Opening for feed e is positioned at 1/2 axial place of high frequency plasma reactor 2, is radial symmetric structure, and with axial angle at 45, diameter is 1～10mm.
The preparation method of nanometer tungsten trioxide crystallite of the present invention, its advantage is can be according to the needs of production technique, regulate the operating power of high frequency plasma producer, the flow velocity of regulating the plasma body working gas and the flow rate of unstripped gas etc., thus globule size, distribution and the yield of control gained nanometer tungsten trioxide crystallite.In addition, this preparation process is that single stage method is synthetic, and its technical process is short, the operation continous-stable, is easy to realize producing in batches.
Nanometer tungsten trioxide crystallite of the present invention has broad application prospects.At first, can be used for producing the nano-tungsten powder in Wimet field and wolfram varbide etc., hertzian wave is had very strong receptivity, in the utilization of sun power, can make the excellent absorption material, militarily can make important stealth material; Because of its huge specific surface, surface effects is remarkable, can be used as the catalyzer of chemical industry and petroleum industry, is used for multiple reactions such as hydrogenation dehydrogenation, oxidation, hydrocarbon isomerization, alkylation; Oxide compound as transition metal has characteristic of semiconductor, can be used as NO
x, H
2S, NH
3Etc. the sensitive material of multiple gases, material; As the Nano semiconductor catalyzer, be applied to photochemical catalysis, photoelectric catalysis degrading processing organic waste water; Also can be used as the promotor of anode of fuel cell, improving its electro catalytic activity, thereby might improve present fuel cell performance.
Four. description of drawings
Fig. 1 is a kind of local flow process structural representation that is used to prepare nanometer tungsten trioxide crystallite of the present invention.
Number in the figure is: 1-high-frequency plasma generator, 2-high frequency plasma reactor, 3-water cooler, 10-high frequency plasma torch, 11-graphite liner, the torch pipe inlet mouth of a, b, c-high-frequency plasma generator, the opening for feed of d, e-plasma reactor, →-cooling water intakeoutfall
Fig. 2 is a kind of integrated artistic general flow chart that is used to prepare nanometer tungsten trioxide crystallite of the present invention.
Number in the figure is: 1-high-frequency plasma generator, 2-high frequency plasma reactor, 3-water cooler, 4-product collector, 5-induced draft fan, 6-exhaust gas treating device, 7-raw material source of the gas, 8-working gas source, 9-tungsten halide vaporizer, 12-tungsten halide, 13-oxygen cleaner, 14-working gas cleaner, the 15-gas meter, →-cooling water intakeoutfall
Fig. 3 is X-ray diffraction (XRD) spectrogram of the prepared nanometer tungsten trioxide crystallite of the present invention.
Fig. 4 is the photo that utilizes the prepared nanometer tungsten trioxide crystallite of the present invention that transmission electron microscope (TEM) is taken.
Fig. 5 is the photo that utilizes the prepared nanometer tungsten trioxide crystallite of the present invention that transmission electron microscope (TEM) is taken.
Five. embodiment
The employing tungsten chloride is a basic raw material.The power of high frequency plasma producer 1 is 2.5KW; The internal diameter of high frequency plasma reactor 2 is 20mm, and length is 4: 1 with the ratio of internal diameter; The internal diameter of water cooler 3 is 75mm, and length is 4: 1 with the ratio of its internal diameter; Stainless Steel Cloth in the product collector 4 is 200 orders, and the power of induced draft fan 5 is 250W.The cooling water flow of the last hypomere of high frequency plasma reactor 2 and water cooler 3 is respectively 20l/h, 50l/h and 100l/h; With the argon gas is the plasma working gas, and the volumetric flow rate of combustion gas and cold gas is respectively 4l/min and 12l/min; Oxygen is respectively 1.5l/min and 8l/min at the flow of inlet mouth a and inlet mouth c; The working pressure of regulation system is: negative pressure, 8mm water column; The design temperature of tungsten halide material carburetor is 360 ℃, and unstripped gas enters the high frequency plasma reactor from opening for feed a, and the diameter of opening for feed a is 3mm.Reaction times is 20min, obtains flaxen powder product.Get micro-example, measure its composition (Fig. 3) by X-ray diffraction, by transmission electron microscope can observe a large amount of narrow distributions, median size is the nanometer tungsten trioxide crystallite (Fig. 4) of 40nm.
The employing tungsten chloride is a basic raw material.The power of high frequency plasma producer 1 is 3KW; The internal diameter of high frequency plasma reactor 2 is 25mm, and length is 3: 1 with the ratio of internal diameter; The internal diameter of water cooler 3 is 75mm, and length is 4: 1 with the ratio of its internal diameter; Stainless Steel Cloth in the product collector 4 is 160 orders, and the power of induced draft fan 5 is 300W.The cooling water flow of the last hypomere of high frequency plasma reactor 2 and water cooler 3 is respectively 25l/h, 75l/h and 200l/h; With the argon gas is the plasma working gas, and the volumetric flow rate of combustion gas and cold gas is respectively 5l/min and 15l/min; Oxygen is respectively 2l/min and 12l/min at the flow of inlet mouth a and inlet mouth c; The working pressure of regulation system is: negative pressure, 15mm water column; The design temperature of tungsten halide material carburetor is 360 ℃, and unstripped gas enters the high frequency plasma reactor from opening for feed a, and the diameter of opening for feed a is 3mm.Reaction times is 20min, obtains flaxen powder product.Get micro-example, can observe the nanometer tungsten trioxide crystallite (Fig. 5) of a large amount of narrow distributions by transmission electron microscope.
The employing tungsten bromide is a basic raw material.The power of high frequency plasma producer 1 is 10KW; The internal diameter of high frequency plasma reactor 2 is 40mm, and length is 4: 1 with the ratio of internal diameter; The internal diameter of water cooler 3 is 150mm, and length is 6: 1 with the ratio of its internal diameter; Stainless Steel Cloth in the product collector 4 is 120 orders, and the power of induced draft fan 5 is 1200W.The cooling water flow of the last hypomere of high frequency plasma reactor 2 and water cooler 3 is respectively 100l/h, 250l/h and 500l/h; With the argon gas is the plasma working gas, and the volumetric flow rate of combustion gas and cold gas is respectively 20l/min and 100l/min; Oxygen is respectively 5l/min and 25l/min at the flow of inlet mouth a and inlet mouth c; The working pressure of regulation system is: negative pressure, 30mm water column; The design temperature of tungsten halide material carburetor is 560 ℃, and unstripped gas enters the high frequency plasma reactor from opening for feed b, and the diameter of opening for feed a is 6mm.Reaction times is 25min, obtains flaxen powder product.Get micro-example, can be observed similar nanometer tungsten trioxide crystallite with Fig. 5 by transmission electron microscope.
Embodiment 4
The employing tungsten bromide is a basic raw material.The power of high frequency plasma producer 1 is 20KW; The internal diameter of high frequency plasma reactor 2 is 100mm, and length is 6: 1 with the ratio of internal diameter; The internal diameter of water cooler 3 is 400mm, and length is 10: 1 with the ratio of its internal diameter; Stainless Steel Cloth in the product collector 4 is 100 orders, and the power of induced draft fan 5 is 2KW.The cooling water flow of the last hypomere of high frequency plasma reactor 2 and water cooler 3 is respectively 200l/h, 500l/h and 1000l/h; With argon gas and helium mix thing is the plasma working gas, and the ratio of argon gas and helium is 5: 1, and the volumetric flow rate of combustion gas and cold gas is respectively 100l/min and 250l/min; Oxygen is respectively 10l/min and 100l/min at the flow of inlet mouth a and inlet mouth c; The working pressure of regulation system is: negative pressure, 100mm water column; The design temperature of tungsten halide material carburetor is 560 ℃, and unstripped gas enters the high frequency plasma reactor from opening for feed b, and the diameter of opening for feed b is 10mm.Reaction times is 20min, obtains flaxen powder product.Get micro-example, can be observed similar nanometer tungsten trioxide crystallite with Fig. 5 by transmission electron microscope.
Claims (5)
1. the preparation method of a nanometer tungsten trioxide crystallite, it is characterized in that it being to adopt high frequency plasma attitude chemical Vapor deposition process, and adopt the high frequency plasma reactive system of design voluntarily, with the tungsten halide is basic raw material, in the high frequency plasma attitude jet atmosphere of oxygen enrichment, finish oxidizing reaction, through quenching, make the nanometer tungsten trioxide crystallite that particle size range is 20～60nm, its concrete processing step is:
The first step: the setting of high frequency plasma reactive system,
I is that stainless steel, structure are the torch pipe bottom that the high frequency plasma reactor (2) of bilayer sleeve places high-frequency plasma generator (1) with material, connects by ground; The internal diameter of high frequency plasma reactor (2) is 10～100mm, and length is 2～10: 1 with the ratio of internal diameter, and is provided with opening for feed (d) and opening for feed (e),
II is that bilayer sleeve, material are the lower end that stainless water cooler (3) is installed on high frequency plasma reactor (2) with structure, is connected by flange; Water cooler (3) divides two sections: epimere is the reducing expanding reach, and the inlet internal diameter is identical with the internal diameter of high frequency plasma reactor (2), and tapering is 45 °, and the outlet internal diameter is 2～10 times of high frequency plasma reactor (2) internal diameter; Hypomere is isometrical straight section, and its internal diameter is identical with the outlet internal diameter of epimere, and length is 2～10: 1 with the ratio of its internal diameter, be connected by flange between the two sections of water cooler (3),
III with material be stainless steel and in establish 10mm * 10mm stainless steel grid bracing frame and 100～200 order Stainless Steel Cloths product collector (4) inlet be connected by flange with the outlet of water cooler (3),
IV chooses induced draft fan (5), by flange the induced draft fan inlet is connected with the outlet of product collector (4),
V is connected by pipeline exhaust gas treating device (6) with induced draft fan (5),
VI is provided with supplementary unit, earlier source of oxygen (7) is connected by pipeline with the torch pipe inlet mouth (a) of high-frequency plasma generator (1), again working gas source (8) are connected by pipeline with torch pipe inlet mouth (c) with the torch pipe inlet mouth (b) of high-frequency plasma generator (1), at last opening for feed (d) or the opening for feed (e) of tungsten halide material carburetor (9) by pipeline and high frequency plasma reactor (2) are joined;
Second step: the last hypomere to high frequency plasma reactor (2) and water cooler (3) feeds water coolant at first respectively, and its flow is respectively 20～200l/h, 50～500l/h and 100～1000l/h; Oxygen is fed in the torch pipe inlet mouth (a) and torch pipe inlet mouth (c) of the above-mentioned high-frequency plasma generator that sets (1), its flow is respectively 1～10l/min and 5～100l/min again; After working gas is divided into cold gas and combustion gas two portions, feed respectively in the torch pipe inlet mouth (b) and torch pipe inlet mouth (c) of the above-mentioned high-frequency plasma generator that sets (1), wherein the flow of cold gas is 5～250l/min, and the flow of combustion gas is 2～100l/min; Connect power supply, under the electromagnetic field effect that 2～20KW high-frequency plasma generator (1) produces, gas carries out high frequency discharge, forms high-purity plasmatorch (10); Open the induced draft fan (5) of 0.2～2KW, the working pressure of high frequency plasma reactive system is little negative pressure: 1～100mm water column; With tungsten halide material carburetor (9) heating, design temperature is 300～600 ℃, treat constant temperature after, the tungsten halide gaseous feed is injected high frequency plasma reactor (2) from opening for feed, regulating the residence time of material in plasma state jet atmosphere is 2～10ms; Product carries out quenching in water cooler (3), make nanometer tungsten trioxide crystallite, and collects by product collector (4).
2. the preparation method of nanometer tungsten trioxide crystallite according to claim 1 is characterized in that described tungsten halide comprises tungsten chloride, tungsten bromide.
3. the preparation method of nanometer tungsten trioxide crystallite according to claim 1 is characterized in that described working gas is argon gas, helium, neon, xenon or their mixed gas.
4. the preparation method of nanometer tungsten trioxide crystallite according to claim 1 is characterized in that described high frequency plasma reactor (2) adopts graphite liner (11).
5. the preparation method of claim 1 nanometer tungsten trioxide crystallite is characterized in that described opening for feed (d) is positioned at 1/3 axial place of high frequency plasma reactor (2), is radial symmetric structure, and with axially vertical, diameter is 1～10mm; Opening for feed (e) is positioned at 1/2 axial place of high frequency plasma reactor (2), is radial symmetric structure, and with axial angle at 45, diameter is 1～10mm.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100417600C (en) * | 2006-09-15 | 2008-09-10 | 重庆大学 | Method of preparing nano tungsten trioxide from microemulsion |
| CN101311367B (en) * | 2008-04-11 | 2011-06-29 | 清华大学 | Tungsten oxide nano-material and method for preparing same |
| CN101733405B (en) * | 2008-11-18 | 2012-01-11 | 广东兴发铝业有限公司 | Preparation method of radio frequency glow discharge inductively coupled plasmas of nano powder material |
| CN102719891A (en) * | 2011-06-14 | 2012-10-10 | 中国科学院金属研究所 | Method for preparing tungsten trioxide crystals with controllable growth of crystal surfaces |
| CN104402046A (en) * | 2014-11-21 | 2015-03-11 | 太原理工大学 | Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner |
| CN114477293A (en) * | 2022-03-29 | 2022-05-13 | 吉林大学 | Ultra-long one-dimensional tungsten dihalide dioxide material and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1031184C (en) * | 1993-11-05 | 1996-03-06 | 中国科学院化工冶金研究所 | Method for prepn. of nanometer calcium using plasma |
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2006
- 2006-02-15 CN CNB2006100124071A patent/CN100406391C/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100417600C (en) * | 2006-09-15 | 2008-09-10 | 重庆大学 | Method of preparing nano tungsten trioxide from microemulsion |
| CN101311367B (en) * | 2008-04-11 | 2011-06-29 | 清华大学 | Tungsten oxide nano-material and method for preparing same |
| CN101733405B (en) * | 2008-11-18 | 2012-01-11 | 广东兴发铝业有限公司 | Preparation method of radio frequency glow discharge inductively coupled plasmas of nano powder material |
| CN102719891A (en) * | 2011-06-14 | 2012-10-10 | 中国科学院金属研究所 | Method for preparing tungsten trioxide crystals with controllable growth of crystal surfaces |
| CN102719891B (en) * | 2011-06-14 | 2014-09-03 | 中国科学院金属研究所 | Method for preparing tungsten trioxide crystals with controllable growth of crystal surfaces |
| CN104402046A (en) * | 2014-11-21 | 2015-03-11 | 太原理工大学 | Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner |
| CN114477293A (en) * | 2022-03-29 | 2022-05-13 | 吉林大学 | Ultra-long one-dimensional tungsten dihalide dioxide material and preparation method thereof |
| CN114477293B (en) * | 2022-03-29 | 2023-12-22 | 吉林大学 | One-dimensional dihalide tungsten dioxide material and preparation method thereof |
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